Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2013
03/19/2013US8398813 Processing apparatus and processing method
03/19/2013US8398777 System and method for pedestal adjustment
03/19/2013US8398776 Method and apparatus for supporting workpieces in a coating apparatus
03/19/2013US8398775 Electrode and arrangement with movable shield
03/19/2013US8398774 Method of manufacturing organic light emitting device and vapor deposition system
03/19/2013US8398773 Thermal processing furnace and liner for the same
03/19/2013US8398772 Method and structure for processing thin film PV cells with improved temperature uniformity
03/19/2013US8398771 Substrate processing apparatus
03/19/2013US8398770 Deposition system for thin film formation
03/19/2013US8398769 Chemical vapor deposition apparatus
03/19/2013US8397668 Plasma processing apparatus
03/19/2013US8397667 Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters
03/14/2013WO2013035746A1 Glass substrate having alkali barrier layer attached thereto, and glass substrate having transparent conductive oxide film attached thereto
03/14/2013WO2013035691A1 Sic epitaxial wafer and method for manufacturing same
03/14/2013WO2013035683A1 Functional film and method of producing functional film
03/14/2013WO2013035682A1 Functional film and method of producing functional film
03/14/2013WO2013035558A1 Film-forming material, sealing film using same, and use of sealing film
03/14/2013WO2013035472A1 Substrate for epitaxial growth, and crystal laminate structure
03/14/2013WO2013035377A1 Plasma generation device, cvd device and plasma treatment particle generation divice
03/14/2013WO2013035375A1 Plasma generator and cvd device
03/14/2013WO2013035232A1 Material vaporization supply device equipped with material concentration detection mechanism
03/14/2013WO2013035124A1 Method to prepare supported nanomaterials based on iron(iii) oxide by the cvd technique and synthesis method of fe(hfa)2tmeda
03/14/2013WO2013034411A2 Vacuum coating apparatus
03/14/2013WO2013034409A1 Vacuum leadthrough, and vacuum coating device having vacuum leadthroughs
03/14/2013WO2013034404A1 Vacuum coating apparatus
03/14/2013WO2013012210A3 Tray for loading substrates
03/14/2013US20130066082 Metal-Enolate Precursors For Depositing Metal-Containing Films
03/14/2013US20130065706 Golf club head
03/14/2013US20130065402 Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and recording medium
03/14/2013US20130065391 Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
03/14/2013US20130065048 Layered thermal barrier coating with blended transition and method of application
03/14/2013US20130064992 Process for Eliminating Fog Particles on a Surface of High P Concentration PSG Film
03/14/2013US20130064977 Method and apparatus for depositing atomic layers on a substrate
03/14/2013US20130064976 Method for liquid precursor atomization
03/14/2013US20130064975 Vapor transport deposition system and method employing removable shields
03/14/2013US20130064974 Methods and apparatuses for converting expanded polystyrene into a rigid material
03/14/2013US20130064973 Chamber Conditioning Method
03/14/2013US20130064969 Vapor deposition mask, and manufacturing method and manufacturing device for organic el element using vapor deposition mask
03/14/2013US20130064967 Liquid adhesive boundary control
03/14/2013US20130061805 Epitaxial wafer susceptor and supportive and rotational connection apparatus matching the susceptor
03/14/2013US20130061804 Substrate processing apparatus and film deposition apparatus
03/14/2013US20130061803 Roll-To-Roll PVD System and Method to Manufacture Group IBIIIAVIA Photovoltaics
03/14/2013DE112011101454T5 Epitaxialwafer-Suszeptor und dem Suszeptor angepasste Halte- und Dreh-Verbindungsvorrichtung Epitaxial wafer susceptor and the susceptor adapted holding and rotating connection device
03/14/2013DE112010003505T5 Vorrichtung und Verfahren zum Entladen einer Filmkassette für Gasaufdampfung Apparatus and method for unloading a film cassette for Gasaufdampfung
03/14/2013DE102011113484A1 Separation device, useful for firing a silicon body in a separator actuator, comprises an attachment unit comprising the silicon body connectable with electrodes of the actuator, and heating device comprising a resistance heating element
03/14/2013DE102009058038B4 Anordnung zum Temperieren von bandförmigen Substraten Arrangement for controlling the temperature of the band-shaped substrates
03/13/2013EP2568062A1 Stage heater and method for producing shaft
03/13/2013EP2568061A2 Device and method for coating a substrate
03/13/2013EP2566597A1 Method for the plasma-supported treatment of internal surfaces of a hollow body, fluid separator, and use thereof
03/13/2013CN202797045U Graphite boat ceramic rod
03/13/2013CN202796901U Structure for loading wafer carrying platform manually
03/13/2013CN202796885U Silicon wafer bearing device used for film coating of crystalline silicon solar cell
03/13/2013CN202792948U Evaporator crucible with pyrolyzed boron nitride protective layers
03/13/2013CN202792947U Evaporator crucible with silicon carbide protective layers
03/13/2013CN202786426U Continuous vacuum chemical vapor deposition equipment of lithium ion battery materials
03/13/2013CN202786425U PECVD (Plasma Enhanced Chemical Vapor Deposition) radio frequency electrode contact
03/13/2013CN202786424U PECVD (Plasma Enhanced Chemical Vapor Deposition) electrode plate
03/13/2013CN202786423U Novel aluminum wafer heating plate
03/13/2013CN202786422U Special C/C support plate hook for PECVD equipment
03/13/2013CN202786421U Graphite boat ceramic loop
03/13/2013CN202786420U Gas phase depositing furnace used for preparing pyrolytic boron nitride products and provided with air inlets in multiple directions
03/13/2013CN202786419U Gas phase depositing furnace used for preparing pyrolytic boron nitride products and provided with separated air inlets
03/13/2013CN202786418U MOCVD (Metal Organic Chemical Vapor Deposition Equipment)
03/13/2013CN202786417U Vertical type chemical vapor deposition device
03/13/2013CN202786416U Gas phase depositing furnace used for preparing pyrolytic boron nitride products and provided with phase change heat-insulating layer
03/13/2013CN202786415U Exhaust ring
03/13/2013CN202779005U Cleaning tool
03/13/2013CN102971449A Film-forming apparatus
03/13/2013CN102971331A Coating liquid, method for manufacturing optical component, and photographic optical system
03/13/2013CN102969366A Composite film material with optical antireflection and wavelength conversion functions
03/13/2013CN102969104A Deposition method of stannic oxide thin-film resistor
03/13/2013CN102965666A Flexible substrate nanometer diamond film and preparation method thereof
03/13/2013CN102965643A Substrate processing apparatus and film deposition apparatus
03/13/2013CN102965642A Manufacutring method for burner chemical vapor deposition device and decoratives
03/13/2013CN102965641A Selenizing method of CIGS (Copper Indium Gallium Selenide) layer of thin film solar cell
03/13/2013CN102965640A Method for preparing carbon nano spiral electromagnetic wave absorbent coated by magnetic material
03/13/2013CN102965639A Cutting insert with a titanium oxycarbonitride coating and method for making the same
03/13/2013CN102965638A Method for preparing C-coated HfC (hybrid fiber coaxial) whiskers
03/13/2013CN102965637A Carbon film coating element and manufacturing method
03/13/2013CN102154629B Device and method for adjusting mixed gas inflow and outflow of polycrystalline silicon CVD (Chemical Vapor Deposition) furnace
03/13/2013CN102121099B Method for depositing film by using LPCVD process
03/13/2013CN102094186B 气体供应设备 Gas supply equipment
03/13/2013CN101981660B Organometallic-compound feeder
03/13/2013CN101811385B Diamond coating for cutting tool
03/13/2013CN101790596B Method for producing a metal-oxide-coated workpiece surface with predeterminable hydrophobic behavior
03/13/2013CN101611043B Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same
03/13/2013CN101552185B Reaction tube and heat processing apparatus for a semiconductor process
03/13/2013CN101342602B Coated cutting tool
03/13/2013CN101300096B Production of nano-scale metal particles
03/12/2013USRE44069 Method of producing carbon nanostructure
03/12/2013US8395250 Plasma processing apparatus with an exhaust port above the substrate
03/12/2013US8394725 Systems and methods for forming metal oxide layers
03/12/2013US8394455 Method for forming diamond-like carbon film
03/12/2013US8394454 Method and apparatus for precursor delivery system for irradiation beam instruments
03/12/2013US8394449 Differential coat weight measurement by means of nuclear or X-ray gauges
03/12/2013US8394447 Abluminal stent coating apparatus and method using a brush assembly
03/12/2013US8394233 Electrode orientation and parallelism adjustment mechanism for plasma processing systems
03/12/2013US8394232 Plasma processing apparatus
03/12/2013US8394231 Plasma process device and plasma process method
03/12/2013US8394230 Plasma processing apparatus
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