Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/2013
02/21/2013US20130042790 VAPOR DEPOSITION METHODS OF SiCOH LOW-K FILMS
02/21/2013US20130042465 Process Including Converting Resistive Powder to Fused Heater Element using Laser Metal Deposition Apparatus
02/21/2013DE102011081219A1 Activating and/or modifying a surface using a gas flame produced by a gas mixture including e.g. a fuel gas and a gas containing oxygen, comprises adding, water to the fuel gas, the gas containing oxygen or to the gas mixture
02/21/2013DE102010000002B4 Verfahren zur Abscheidung von Mehrlagenschichten und/oder Gradientenschichten A process for the deposition of multilayer coatings and / or gradient
02/20/2013EP2560193A1 Gas injection unit and a thin-film vapour-deposition device and method using the same
02/20/2013EP2559791A1 Single-crystal substrate, single-crystal substrate having crystalline film, crystalline film, method for producing single-crystal substrate having crystalline film, method for producing crystalline substrate, and method for producing element
02/20/2013EP2558615A1 Device and method for simultaneously precipitating a plurality of semiconductor layers in a plurality of process chambers
02/20/2013EP2558614A1 Method for producing a coating on an extrusion die
02/20/2013EP2558613A1 Coating for a cocrmo substrate
02/20/2013EP2558612A1 A method and apparatus for depositing a microcrystalline material in photovoltaic applications
02/20/2013EP2558611A1 Process for internally coating functional layers with a through-hardened material
02/20/2013EP2558609A1 Device for coating a substrate inside a vacuum chamber by means of plasma-assisted chemical vapor deposition
02/20/2013CN202750325U Vertical plasma generating apparatus
02/20/2013CN202744625U Photo-induced chemical deposition device for solar battery
02/20/2013CN202744620U Carbon layer structure with protective layer structure
02/20/2013CN102939406A Film forming apparatus
02/20/2013CN102939405A Fluidized bed pyrocarbon coating
02/20/2013CN102938389A Depositing device
02/20/2013CN102938369A Epitaxial growth pretreatment method and epitaxial growth pretreatment process chamber
02/20/2013CN102936720A Atomic layer deposition device and process of low pressure hot wall intensive mounting sheet
02/20/2013CN102936006A Low-cost low-pollution gallium nitride nano-wire preparation generation method
02/20/2013CN101688301B Plasma-enhanced substrate processing method and apparatus
02/19/2013US8378163 Catalysts having catalytic material applied directly to thermally-grown alumina and catalytic methods using same, improved methods of oxidative dehydrogenation
02/19/2013US8377518 In-situ flux measurement devices, methods, and systems
02/19/2013US8377511 Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition
02/19/2013US8377510 Methods of forming hardfacing materials including PCD particles, and welding rods including such PCD particles
02/19/2013US8377501 Coating and developing system control method of controlling coating and developing system
02/19/2013US8377343 Optical function layers, in particular zinc-oxide sulfide layers, exhibiting variable dielectric responses
02/19/2013US8377255 Plasma processing apparatus and method of controlling distribution of a plasma therein
02/19/2013US8377254 Plasma processing apparatus
02/19/2013US8377214 Vapor chamber and method for manufacturing the same
02/19/2013US8377213 Slit valve having increased flow uniformity
02/19/2013US8377212 Chamber, device and method for annealing a semi-conductor material of II-VI type
02/19/2013US8377211 Device for vacuum processing
02/19/2013US8377210 Film forming apparatus
02/19/2013US8377209 Linear plasma source for dynamic (moving substrate) plasma processing
02/19/2013US8377208 System and method for manufacturing polycrystal silicon
02/19/2013US8377207 Purge gas assembly
02/19/2013US8377206 Apparatus and method of forming semiconductor devices
02/19/2013US8375893 Gas supply system, substrate processing apparatus and gas supply method
02/19/2013US8375892 Methods and apparatus for incorporating nitrogen in oxide films
02/19/2013US8375891 Vacuum vapor processing apparatus
02/19/2013US8375890 Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafers
02/19/2013US8375889 System and method for providing an improved shutter for use with a shadow tab mask
02/14/2013WO2013022669A2 Systems and methods for processing vapor
02/14/2013WO2013022545A1 High surface area flexible chemiresistive biosensor by oxidative chemical vapor deposition
02/14/2013WO2013022339A1 Method and apparatus for depositing atomic layers on a substrate
02/14/2013WO2013022306A2 Apparatus for plasma generation, method for manufacturing rotating electrodes for plasma generation apparatus, method for plasma treatment of substrate, and method for forming thin film of mixed structure using plasma
02/14/2013WO2013022097A1 Structure including thin primer film, and process for producing said structure
02/14/2013WO2013021947A1 Epitaxial wafer manufacturing device and manufacturing method
02/14/2013WO2013021909A1 Epitaxial wafer manufacturing device and manufacturing method
02/14/2013WO2013021705A1 Apparatus, method and program for manufacturing nitride film
02/14/2013WO2013021599A1 Film-forming apparatus and film-forming method
02/14/2013WO2013021149A2 Methods for forming an organic layer on a substrate
02/14/2013WO2013020679A1 Coating increasing the friction coefficient and production thereof by means of atmospheric pressure plasma coating
02/14/2013WO2013020589A1 Adjustable mask
02/14/2013WO2013006522A9 Deposition cartridge for production materials via the chemical vapor deposition process
02/14/2013WO2012148085A9 Antimony amino alkoxide compound and method for preparing same, and method for forming a thin film containing antimony using the antimony amino alkoxide compound and an atomic layer deposition technique
02/14/2013US20130041170 Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films
02/14/2013US20130040459 Substrate wiring method and semiconductor manufacturing device
02/14/2013US20130040258 Heating chamber having reaction preventing layer and layer forming method thereof
02/14/2013US20130040247 Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
02/14/2013US20130040102 Methods of Coating Surfaces Using Initiated Plasma-Enhanced Chemical Vapor Deposition
02/14/2013US20130040072 Plasma Booster for Plasma Treatment Installation
02/14/2013US20130040056 Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
02/14/2013US20130040055 Surface processing method
02/14/2013US20130040054 Coating device and method for operating a coating device having a shielding plate
02/14/2013US20130040047 Method for manufacturing el device
02/14/2013US20130039987 Method for increasing the solubility of a transcriptase inhibitor composition
02/14/2013US20130039843 Apparatus for forming metal oxide film, method for forming metal oxide film, and metal oxide film
02/14/2013US20130037873 Film forming method, manufacturing method of semiconductor device using the same, film forming apparatus, and semiconductor device
02/14/2013US20130037618 Method and system for producing antennas
02/14/2013US20130037090 Capping Layers for Improved Crystallization
02/14/2013US20130036973 Method and apparatus for counting particles in a gas
02/14/2013US20130036968 Film-forming apparatus and method
02/13/2013EP2557591A1 Heating control system, deposition device provided therewith, and temperature control method
02/13/2013EP2557205A1 Process for producing epitaxial single-crystal silicon carbide substrate and epitaxial single-crystal silicon carbide substrate obtained by the process
02/13/2013EP2557198A1 Method and apparatus for depositing atomic layers on a substrate
02/13/2013EP2556181A2 Titanium-containing precursors for vapor deposition
02/13/2013EP2556180A1 Method for manufacturing a porous synthetic diamond material
02/13/2013EP2555850A2 Method for the manufacture of electronic devices with purified fluorine
02/13/2013EP2555712A2 Hip implant
02/13/2013CN202730229U Control device of nanometer grating deposition substrate location within vacuum container
02/13/2013CN202730228U Vacuum equipment for depositing amorphous silicon membrane
02/13/2013CN202730227U Plate-type ETP PECVD (Expanding Thermal Plasma-Plasma Enhanced Chemical Vapor Deposition) structure
02/13/2013CN202730226U Water-cooled copper plate used for extended thermal plasma-plasma enhanced chemical vapor deposition (ETP-PECVD) plasma generator
02/13/2013CN1715442B Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
02/13/2013CN102934202A Mixture gas supply device
02/13/2013CN102933743A Showerhead support structure for improved gas flow
02/13/2013CN102933742A Textured alumina layer
02/13/2013CN102933512A Method of producing optical element forming mold and optical element forming mold
02/13/2013CN102933339A Process for coating cobalt nonoparticles with copper and copper oxide
02/13/2013CN102931284A Method for preparing SiOx-SiNx laminated films of crystal silicon solar cell
02/13/2013CN102931270A Weak light type amorphous silicon solar cell and manufacturing method thereof
02/13/2013CN102931078A Annealing method of sapphire substrate transfer graphene
02/13/2013CN102925875A Dual-mode system used for film growth and control method of dual-mode system
02/13/2013CN102925874A Cleaning method and system for CVD reaction chamber
02/13/2013CN102925873A Reaction chamber temperature control apparatus and semiconductor processing apparatus applying the same
02/13/2013CN102925872A Modification method for nickel plating film on surface of carbon nanotube
02/13/2013CN102925858A Carbon layer materials with protection layer structure
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