| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/21/2013 | WO2013040127A2 Gas delivery and distribution for uniform process in linear-type large-area plasma reactor |
| 03/21/2013 | WO2013039866A2 Activated silicon precursors for low temperature deposition |
| 03/21/2013 | WO2013039718A1 A component of a substrate support assembly producing localized magnetic fields |
| 03/21/2013 | WO2013038980A1 Substrate having buffer layer structure for growing nitride semiconductor layer |
| 03/21/2013 | WO2013038899A1 Plasma processing apparatus and method for manufacturing silicon thin-film solar cells using same |
| 03/21/2013 | WO2013038484A1 Oxide film deposition method and oxide film deposition device |
| 03/21/2013 | WO2013038104A1 Photocatalytic material and glazing or photovoltaic cell comprising said material |
| 03/21/2013 | WO2013038023A1 Vapor source for depositing thin films |
| 03/21/2013 | WO2013038000A1 Grain boundary engineered alpha-alumina coated cutting tool |
| 03/21/2013 | WO2013037998A2 Sulfur containing alpha-alumina coated cutting tool |
| 03/21/2013 | WO2013037997A1 Cutting insert and method for production thereof |
| 03/21/2013 | WO2013037951A1 Catalyst deposition for the preparation of carbon nanotubes |
| 03/21/2013 | WO2013037780A1 Method and device for determining the deformation of a substrate |
| 03/21/2013 | WO2013009913A3 Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films |
| 03/21/2013 | WO2012158953A3 Coated electronic devices and associated methods |
| 03/21/2013 | WO2012149327A3 Method and apparatus for gas delivery |
| 03/21/2013 | US20130072002 Batch-Type Remote Plasma Processing Apparatus |
| 03/21/2013 | US20130072000 Thin film processing equipment and the processing method thereof |
| 03/21/2013 | US20130071671 Silicon nitride film for semiconductor element, and method and apparatus for manufacturing silicon nitride film |
| 03/21/2013 | US20130071580 Activated Silicon Precursors For Low Temperature Deposition |
| 03/21/2013 | US20130071567 Thin film processing equipment and the processing method thereof |
| 03/21/2013 | US20130071566 Process for forming a silica coating on a glass substrate |
| 03/21/2013 | US20130071565 Apparatuses and Methods for Large-Scale Production of Hybrid Fibers Containing Carbon Nanostructures and Related Materials |
| 03/21/2013 | US20130071564 Graphene defect alteration |
| 03/21/2013 | US20130071551 Coating method and apparatus |
| 03/21/2013 | US20130069091 Progressive-refractivity antireflection layer and method for fabricating the same |
| 03/21/2013 | US20130068690 Adsorption devices, systems and methods |
| 03/21/2013 | US20130068521 Electromagnetic shielding method using graphene and electromagnetic shiedling material |
| 03/21/2013 | US20130068469 Pressurized Polymer Beads As Proppants |
| 03/21/2013 | US20130068391 Slit valve apparatus, systems, and methods |
| 03/21/2013 | US20130068165 Microfluidic device and method using double anodic bonding |
| 03/21/2013 | US20130068164 Heating unit and film-forming apparatus |
| 03/21/2013 | US20130068163 Film deposition apparatus |
| 03/21/2013 | US20130068161 Gas delivery and distribution for uniform process in linear-type large-area plasma reactor |
| 03/21/2013 | US20130068160 Evaporation device and evaporation apparatus |
| 03/21/2013 | DE112011101910T5 Reduzieren von Kupfer- oder Spurenmetallverunreinigungen bei elektrolytischen Plasmaoxidationsbeschichtungen Reducing copper or trace metal contamination in electrolytic plasma oxidation coatings |
| 03/21/2013 | DE112010005624T5 Anlage zur Bildung eines Metalloxidfilmes, Verfahren zur Bildung eines Metalloxidfilmes und Metalloxidfilm System to form a metal oxide film, process for forming a metal oxide film, and metal oxide |
| 03/21/2013 | DE112010003501T5 Geladene Filmkassette fur Gasaufdampfung Uploaded film cassette for Gasaufdampfung |
| 03/21/2013 | DE112009002717T5 Elektrodenschaltung, Schichterzeugungsvorrichtung, Elektrodeneinheit und Schichterzeugungsverfahren Electrode circuit layer forming apparatus electrode unit and layer forming method |
| 03/21/2013 | DE102011113751A1 Verfahren zum stetigen und/oder sequentiellen abscheiden einer dielektrischen schicht aus der gasphase auf einem substrat A method of continuous and / or sequential depositing a dielectric layer from the gas phase on a substrate |
| 03/21/2013 | DE102011113406A1 Dampfquelle zur Abscheidung dünner Schichten Steam source for the deposition of thin films |
| 03/21/2013 | DE102011083139A1 Substrate processing system such as vacuum coating equipment, has substrate carriers that mesh with each other in substrate transfer position such that they are pivoted back and forth between two tilt positions, in inclined manner |
| 03/21/2013 | DE102011053705A1 Schneideinsatz und Verfahren zu dessen Herstellung Cutting insert, and method for its production |
| 03/21/2013 | DE102008037944B4 Verfahren zum elektronenstrahlinduzierten Abscheiden von leitfähigem Material A method for electron beam induced deposition of conductive material |
| 03/20/2013 | EP2571065A1 Group iii nitride semiconductor device and method for producing same |
| 03/20/2013 | EP2570523A1 Method for producing gallium trichloride gas and method for producing nitride semiconductor crystal |
| 03/20/2013 | EP2570522A1 Epitaxial silicon carbide single-crystal substrate and method for producing the same |
| 03/20/2013 | EP2570513A1 Thin film processing equipment and the processing method thereof |
| 03/20/2013 | EP2570512A1 Thin film processing equipment and the processing method thereof |
| 03/20/2013 | EP2570511A1 Grain boundary engineered alpha-alumina coated cutting tool |
| 03/20/2013 | EP2570510A1 Sulfur containing alpha-alumina coated cutting tool |
| 03/20/2013 | EP2569611A1 Vessel outgassing inspection methods |
| 03/20/2013 | EP2569459A1 A method for producing a deposit and a deposit on a surface of a silicon substrate |
| 03/20/2013 | CN202816895U Transfer part |
| 03/20/2013 | CN202808941U Continuous chemical vapor deposition equipment of materials for lithium ion battery |
| 03/20/2013 | CN202808940U Automatic circulation plasma vapor phase deposition system |
| 03/20/2013 | CN202808939U Gas flow guide device of spray head |
| 03/20/2013 | CN202808938U Gas flow guide device of spray head |
| 03/20/2013 | CN202808937U Chemical vapor deposition equipment with pressure regulating valve easy to clean |
| 03/20/2013 | CN202808936U Vapor deposition device |
| 03/20/2013 | CN202808935U Device for improving optical-induced degradation of amorphous silicon membrane |
| 03/20/2013 | CN202808934U Coating equipment |
| 03/20/2013 | CN102985857A Process for producing metamaterial, and metamaterial |
| 03/20/2013 | CN102985593A Apparatus and method for coating glass substrate |
| 03/20/2013 | CN102985592A Linear batch chemical vapor deposition system |
| 03/20/2013 | CN102985591A 真空处理装置 The vacuum processing apparatus |
| 03/20/2013 | CN102985363A System and method for polycrystalline silicon deposition |
| 03/20/2013 | CN102983217A Improved method of solar battery performance and structure of solar battery |
| 03/20/2013 | CN102983211A Method for manufacturing three-layer antireflection film for polycrystalline silicon solar cell |
| 03/20/2013 | CN102978590A Multi-cycle rapid thermal annealing method of amorphous silicon film |
| 03/20/2013 | CN102978589A PECVD (plasma enhanced chemical vapor deposition) spray electrode |
| 03/20/2013 | CN102978588A Method for preparing titanium-stibium-tellurium (Ti-Sb-Te) phase change material and method for preparing phase change storage unit |
| 03/20/2013 | CN102978587A Novel flat type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment and gas channel connecting hole structure thereof |
| 03/20/2013 | CN102978586A Film deposition apparatus and film deposition method |
| 03/20/2013 | CN102978585A Chemical vapor deposition device used for flat-panel display |
| 03/20/2013 | CN102978584A Device used for forming SiN film on substrate |
| 03/20/2013 | CN102978583A Method for manufacturing tungsten pipe |
| 03/20/2013 | CN102978582A Production device of pure tungsten capillary tube |
| 03/20/2013 | CN102978575A Plasma coating device |
| 03/20/2013 | CN102268654B Method for solving tilting deformation of MOCVD machine station filament |
| 03/20/2013 | CN102112654B Method of forming a tantalum-containing layer on a substrate |
| 03/20/2013 | CN102057079B Arrangement in connection with ALD reactor |
| 03/20/2013 | CN102017082B Group III nitride semiconductor device and method for manufacturing the same, group III nitride semiconductor light-emitting device and method for manufacturing the same, and lamp |
| 03/20/2013 | CN101994096B Vacuum film coater |
| 03/20/2013 | CN101994095B Coated umbrella stand |
| 03/20/2013 | CN101962754B Film coating device |
| 03/20/2013 | CN101937954B Epitaxial growth method for improving inner quantum efficiency of GaN-based LED |
| 03/20/2013 | CN101906622B Device and method for controlling temperature and uniformity of epitaxial wafers in MOCVD system |
| 03/20/2013 | CN101752242B Method for manufacturing insulation layer and method for manufacturing semiconductor device using the insulation layer |
| 03/20/2013 | CN101736316B High efficiency UV cleaning of a process chamber |
| 03/20/2013 | CN101586235B Apparatus for supplying source and apparatus for deposition thin film having the same |
| 03/20/2013 | CN101527263B Production method for semiconductor device |
| 03/20/2013 | CN101395297B Methods of depositing ruthenium film and memory medium readable by computer |
| 03/20/2013 | CN101316945B A method to improve the ashing/wet etch damage resistance and integration stability of low dielectric constant films |
| 03/19/2013 | US8399695 Organometallic precursor compounds |
| 03/19/2013 | US8399362 Apparatus for forming a film and an electroluminescence device |
| 03/19/2013 | US8399072 Process for improved chemcial vapor deposition of polysilicon |
| 03/19/2013 | US8399056 Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing |
| 03/19/2013 | US8398816 Method and apparatuses for reducing porogen accumulation from a UV-cure chamber |
| 03/19/2013 | US8398815 Plasma processing apparatus |