Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2013
03/28/2013WO2013041506A1 Method for the photocatalytically active coating of surfaces
03/28/2013WO2013041179A1 Carousel carrier for a vacuum treatment installation
03/28/2013WO2013040800A1 Exhaust pipe of vacuum pump for chemical vapor deposition machine station and corresponding vacuum pump
03/28/2013WO2012169747A3 Plasma-generating source comprising a belt-type magnet, and thin-film deposition system using same
03/28/2013WO2012104535A3 Structure for forming solar cells
03/28/2013US20130078789 Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
03/28/2013US20130078788 Producing method of semiconductor device and production device used therefor
03/28/2013US20130078455 Metal-Aluminum Alloy Films From Metal PCAI Precursors And Aluminum Precursors
03/28/2013US20130078454 Metal-Aluminum Alloy Films From Metal Amidinate Precursors And Aluminum Precursors
03/28/2013US20130078424 Hexagonal Boron Nitride Substrate With Monatomic Layer Step, And Preparation Method And Application Thereof
03/28/2013US20130078376 Metal nitride containing film deposition using combination of amino-metal and halogenated metal precursors
03/28/2013US20130078375 Deposition source integration into coater
03/28/2013US20130078374 Method of forming carbon nanotubes from carbon-rich fly ash
03/28/2013US20130075977 Piston ring for engine and manufacturing method thereof
03/28/2013US20130074774 Heating systems for thin film formation
03/28/2013US20130074773 Heating systems for thin film formation
03/28/2013US20130074772 Thin-film solar cell manufacturing system
03/28/2013US20130074771 Apparatus for forming energy storage and photovoltaic devices in a linear system
03/28/2013US20130074770 Film deposition apparatus and substrate processing apparatus
03/28/2013DE102012018360A1 Beschichtete Pelletiermatrizen Coated Pelletiermatrizen
03/28/2013DE102011083245A1 Verfahren und Vorrichtung zum Abscheiden einer Schicht auf einer Halbleiterscheibe durch Gasphasenabscheidung in einer Prozesskammer Method and apparatus for depositing a layer on a semiconductor wafer by vapor deposition in a process chamber
03/28/2013DE102011007349B4 Verfahren zur Kennzeichnung eines Substrates Method for the identification of a substrate
03/28/2013CA2849042A1 Method for the photocatalytically active coating of surfaces
03/28/2013CA2849024A1 Carousel carrier for a vacuum treatment installation
03/27/2013EP2573803A1 Silicon nitride film for semiconductor element, and method and apparatus for manufacturing silicon nitride film
03/27/2013EP2573206A1 Method for growing a group (iii) metal nitride film
03/27/2013EP2573202A1 Thin film forming apparatus
03/27/2013EP2573098A1 Vanadium-organic compounds and their use for thin films deposition
03/27/2013EP2573097A1 Niobium-organic compounds and their use for thin films deposition
03/27/2013EP2573096A1 Tantalum-organic compounds and their use for thin films deposition
03/27/2013EP2573095A1 Novel vanadium-organic compounds and their use for thin films deposition
03/27/2013EP2573094A1 Novel niobium-organic compounds and their use for thin films deposition
03/27/2013EP2572016A1 Apparatus and method for supplying electric power to a cvd - reactor
03/27/2013EP2572015A1 Chemical vapor deposition of metal layers for improved brazing
03/27/2013CN202839567U Conveyer used for feeding material and discharging material for vacuum reaction cavity
03/27/2013CN202836460U Micrometer and chemical vapor deposition equipment
03/27/2013CN202830169U Chemical vapor deposition device for metal organic matters
03/27/2013CN202830168U Reactant gas supply device
03/27/2013CN202830167U Metal organics chemical vapor deposition equipment and isolating device used in the same
03/27/2013CN202830166U Reaction chamber for vapor deposition process
03/27/2013CN202830165U Silicon nitride film sedimentation equipment
03/27/2013CN202830164U Device for preventing gas from backswing and organometallic chemistry vapor deposition equipment
03/27/2013CN202830163U Working table used for manual blanking of plate-type plasma enhanced chemical vapor deposition (PECVD) device
03/27/2013CN202830162U Wafer loading platform structure
03/27/2013CN202830161U Glass substrate holder
03/27/2013CN202830155U Furnace-tube automatic recovery system
03/27/2013CN103003931A Epitaxial substrate for semiconductor element, semiconductor element, pn junction diode, and production method for epitaxial substrate for semiconductor element
03/27/2013CN103003920A Polycrystalline aluminum nitride substrate for growing gan-based semiconductor crystal, and gan-based-semiconductor manufacturing method using same
03/27/2013CN103003402A Lubricant composition for low-friction sliding material and sliding mechanism using same
03/27/2013CN103003374A Process for preparing articles having anti-fog layer by layer coating and coated articles having enhanced anti-fog and durability properties
03/27/2013CN103003195A Method of manufacturing carbon nanotube, monocrystal substrate for manufacturing carbon nanotube, and carbon nanotube
03/27/2013CN103002835A Hip implant
03/27/2013CN103000760A Preparation method of titanium dioxide solar cell antireflection film
03/27/2013CN103000706A Crystalline silicon solar cell three-layer antireflection film and preparation method thereof
03/27/2013CN103000555A Thermal treatment apparatus, temperature control system, thermal treatment method, and temperature control method
03/27/2013CN103000549A Cavity device and substrate processing equipment comprising same
03/27/2013CN103000535A Preparation method for side gating graphene field effect transistor
03/27/2013CN102994983A MOCVD apparatus and method for forming white light LED by using the same
03/27/2013CN102994982A Plasma-enhanced chemical vapor deposition electrode plate device, deposition method and deposition device
03/27/2013CN102994981A Substrate processing apparatus and film deposition apparatus
03/27/2013CN102994980A Preparation method and device of high-conductivity carbon nanotube film
03/27/2013CN102994979A Chamber conditioning method
03/27/2013CN102994978A Nano-grade high-precision-control hot filament chemical vapor deposition thin film material growth device
03/27/2013CN102994977A Cavity apparatus, and substrate processing device possessing it
03/27/2013CN102994976A Multi-element substrate, graphene capable of continuously adjusting layer number based on multi-element substrate and preparation method
03/27/2013CN102994975A Preparation method of aluminum-doped zinc oxide transparent conductive oxide film
03/27/2013CN102994974A Manufacturing method of thick oxide film
03/27/2013CN102994973A Diamond thick film prepared with direct-current plasma jet method
03/27/2013CN102994967A Ultra high speed preparation method for ultra thick diamond-like coating
03/27/2013CN102993050A Metal(IV) tetra-amidinate compounds and their use in vapor deposition
03/27/2013CN102991021A Ultrahigh-temperature anti-oxidation composite coating and preparation method thereof
03/27/2013CN102989456A Double-doped photocatalyst material
03/27/2013CN102321867B Carbon layer material with protective layer structure and preparation method thereof
03/27/2013CN102300383B Inductance coupling apparatus and plasma processing equipment applying same
03/27/2013CN102067279B Method and system for supplying a cleaning gas into a process chamber
03/27/2013CN102024741B Method for forming shallow trench isolation structure
03/27/2013CN102011098B Liquid composition containing aminoether for deposition of metal-containing films
03/27/2013CN102011089B Method for preparing nanocrystalline resistance conversion material
03/27/2013CN101978477B Method for film formation, apparatus for film formation, and computer-readable recording medium
03/27/2013CN101962758B Method for forming Hf-based gate medium film on germanium substrate by atomic layer deposition at low temperature
03/27/2013CN101859694B Film forming apparatus and film forming method
03/27/2013CN101481796B Gas injector and film deposition apparatus having the same
03/27/2013CN101466868B Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing the device
03/27/2013CN101378007B Plasma processing apparatus
03/27/2013CN101285174B Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes
03/27/2013CN101180243B Coated substrate and process for the production of a coated substrate
03/27/2013CN101010445B Layered composite including cubic boron nitride
03/26/2013US8404878 Titanium-containing precursors for vapor deposition
03/26/2013US8404571 Film deposition method
03/26/2013US8404353 Barrier laminate and device sealed with it, and method of sealing device
03/26/2013US8404313 Synthesis of nanocrystalline diamond fibers
03/26/2013US8404306 Method for the deposition of a ruthenium containing film
03/26/2013US8404177 System for recovery of cadmium telluride (CdTe) from system components used in the manufacture of photovoltaic (PV) modules
03/26/2013US8404080 Apparatus to treat a substrate
03/26/2013US8404050 Plasma processing apparatus and method
03/26/2013US8404049 Epitaxial barrel susceptor having improved thickness uniformity
03/26/2013US8404048 Off-angled heating of the underside of a substrate using a lamp assembly
03/26/2013US8404047 Electron beam vapor deposition apparatus and method
03/26/2013US8402918 Showerhead electrode with centering feature
03/26/2013US8402845 Dual path gas distribution device
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