| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/11/2013 | WO2013051670A1 Cobalt-film-forming method, cobalt-film-forming material, and novel compound |
| 04/11/2013 | WO2013051644A1 Insulating film and production method for same |
| 04/11/2013 | WO2013051248A1 Plasma processing apparatus |
| 04/11/2013 | WO2013050741A1 A method for producing a coating by atmospheric pressure plasma technology |
| 04/11/2013 | WO2013016237A3 Heteroleptic pyrrolecarbaldimine precursors |
| 04/11/2013 | WO2012175334A3 Deposition method and device |
| 04/11/2013 | US20130089934 Material Delivery System and Method |
| 04/11/2013 | US20130089681 Plasma-enhanced deposition of titanium-containing films for various applications using amidinate titanium precursors |
| 04/11/2013 | US20130089680 Plasma-enhanced deposition of ruthenium-containing films for various applications using amidinate ruthenium precursors |
| 04/11/2013 | US20130089679 Plasma-enhanced deposition of manganese-containing films for various applications using amidinate manganese precursors |
| 04/11/2013 | US20130089678 Plasma-enhanced deposition of nickel-containing films for various applications using amidinate nickel precursors |
| 04/11/2013 | US20130089667 Evaporation apparatus and method of forming organic film |
| 04/11/2013 | US20130089666 Substrate Holder for Graphene Film Synthesis |
| 04/11/2013 | US20130089665 Self-limiting reaction deposition apparatus and self-limiting reaction deposition method |
| 04/11/2013 | US20130089659 Selenophene-Based Low Band Gap Active Layers by Chemical Vapor Deposition |
| 04/11/2013 | US20130089656 Direct dispense device and method |
| 04/11/2013 | US20130088706 Hydrogen passivation of nonlinear optical crystals |
| 04/11/2013 | US20130087099 In-Situ Hydroxylation Apparatus |
| 04/11/2013 | US20130087097 Film deposition apparatus and substrate processing apparatus |
| 04/11/2013 | DE112011102142T5 Filmbildungsvorrichtung und Verfahren zum Instandhalten einer Filmbildungsvorrichtung Film forming apparatus and method for maintaining a film-forming apparatus |
| 04/11/2013 | DE102012004505B3 Pyrometer pipe for measuring temperatures at measurement point within chambers in vacuum treatment plant, comprises a pyrometer having a specific end which is set with a transparent partition wall as particle shield, in measuring range |
| 04/11/2013 | DE102011084137A1 Vorrichtung und Verfahren zur Abscheidung von polykristallinemSilicium Apparatus and method for deposition of polykristallinemSilicium |
| 04/11/2013 | CA2850929A1 Methods for coating tubular devices used in oil and gas drilling, completions and production operations |
| 04/10/2013 | EP2579301A1 Method and apparatus for producing silicon nitride film |
| 04/10/2013 | EP2579300A1 Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride film |
| 04/10/2013 | EP2578726A1 Method for manufacturing a coated member |
| 04/10/2013 | EP2578725A1 Covered member and process for production thereof |
| 04/10/2013 | EP2578724A1 Apparatus and process for deposition of polycrystalline silicon |
| 04/10/2013 | EP2578723A1 Method for selectively depositing noble metals on metal/metal nitride substrates |
| 04/10/2013 | EP2578669A1 Lubricant composition for low-friction sliding material and sliding mechanism using same |
| 04/10/2013 | EP2578556A2 Method and ceramic component |
| 04/10/2013 | EP2576872A2 Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings |
| 04/10/2013 | EP2576866A1 Method for diffusing metal particles within a composite layer |
| 04/10/2013 | EP2576865A1 Metallic articles with hydrophobic surfaces |
| 04/10/2013 | EP2576860A1 Method for providing lateral thermal processing of thin films on low-temperature substrates |
| 04/10/2013 | EP2576859A1 Vacuum processing device |
| 04/10/2013 | EP2576858A1 Sliding element |
| 04/10/2013 | EP2576857A1 Device for plasma treatment of workpieces |
| 04/10/2013 | EP2576856A1 Device and method for reactive gas separation in inline coating installations |
| 04/10/2013 | EP2575912A2 Glassy calcium phosphate particulates, coatings and related bone graft materials |
| 04/10/2013 | CN202865341U Tray for bearing MOCVD (metal organic chemical vapor deposition) graphite disc |
| 04/10/2013 | CN202865340U Baffle-type fixing frame for preparing pyrolytic boron nitride product |
| 04/10/2013 | CN202865339U Rotary fixed mount for preparing pyrolytic boron nitride product |
| 04/10/2013 | CN202865338U MO (Metal Organic) source bottle bracket |
| 04/10/2013 | CN202865337U Pyrolysing boron nitride fine neck evaporative crucible |
| 04/10/2013 | CN202865336U Film deposition system |
| 04/10/2013 | CN202865335U Water-cooling control system for reaction chamber |
| 04/10/2013 | CN202865334U Annular-air thermal-insulation vapor phase deposition furnace for preparing pyrolytic boron nitride product |
| 04/10/2013 | CN202865333U Graphite mould for manufacturing pyrolytic boron nitride narrow-necked evaporator crucible |
| 04/10/2013 | CN202865318U Plasma cleaning device in double-sided turnover door structure |
| 04/10/2013 | CN103038399A Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings |
| 04/10/2013 | CN103038392A Method for diffusing metal particles within a composite layer |
| 04/10/2013 | CN103038389A Method for providing lateral thermal processing of thin films on low-temperature substrates |
| 04/10/2013 | CN103035466A Precleaning method and plasma device |
| 04/10/2013 | CN103031556A Deposition preparation method of ZnO/Al/ZnO photoelectric transparent conducting thin film |
| 04/10/2013 | CN103031546A Atomic layer deposition equipment and use method thereof |
| 04/10/2013 | CN103031545A Atomic layer deposition equipment with volume-adjustable deposition chamber |
| 04/10/2013 | CN103031544A Atomic layer deposition device capable of rapidly processing data |
| 04/10/2013 | CN103031543A Top electrode and plasma processing equipment using top electrode |
| 04/10/2013 | CN103031542A Method and apparatus to help promote contact of gas with vaporized material |
| 04/10/2013 | CN103031541A Nozzle unit, and apparatus and method for treating substrate with the same |
| 04/10/2013 | CN103031540A Reaction cavity device and substrate processing equipment with same |
| 04/10/2013 | CN103031539A Fixed sealing method for three-proofing membrane on surface of thermoelectric refrigeration component |
| 04/10/2013 | CN103031538A Self-limiting reaction deposition apparatus and self-limiting reaction deposition method |
| 04/10/2013 | CN103031537A Film deposition apparatus and substrate processing apparatus |
| 04/10/2013 | CN103031536A Cleaning apparatus and cleaning method for components of metal organic chemical vapor deposition device |
| 04/10/2013 | CN103031535A Thin film process device and thin film making method |
| 04/10/2013 | CN103031534A Thin film process device and thin film making method |
| 04/10/2013 | CN103031533A Atomic layer deposition device capable of processing data in real time |
| 04/10/2013 | CN103031532A Atomic layer deposition equipment with high safety |
| 04/10/2013 | CN103031531A Preparation method and system for transparent conductive film of flexible carbon nanotube |
| 04/10/2013 | CN103031530A Thin film forming method and film forming apparatus |
| 04/10/2013 | CN103028737A Method for preparing graphene-metal nano particle composite material |
| 04/10/2013 | CN103028560A Spray head washing device |
| 04/10/2013 | CN103028270A Vapor delivery vessel and method for providing vaporizable source material in vessel |
| 04/10/2013 | CN102332504B Method for improving interface performance of P-type layer and I-type layer in amorphous silicon solar cell |
| 04/10/2013 | CN102296281B Preparation method for carbon nanotube, nickel and aluminum composite powder enhanced polyethylene based composite material |
| 04/10/2013 | CN102016100B Process for production of water-reactive Al film and constituent members for film deposition chambers |
| 04/09/2013 | US8415885 Plasma processing apparatus and plasma processing method |
| 04/09/2013 | US8415237 Method of manufacturing semiconductor device and substrate processing apparatus |
| 04/09/2013 | US8415218 Atomic layer deposition epitaxial silicon growth for TFT flash memory cell |
| 04/09/2013 | US8414974 Method of manufacturing silicon nanotubes using doughnut-shaped catalytic metal layer |
| 04/09/2013 | US8414973 Low temperature CNT growth using gas-preheat method |
| 04/09/2013 | US8414736 Plasma reactor with tiltable overhead RF inductive source |
| 04/09/2013 | US8414735 Ring-shaped component for use in a plasma processing, plasma processing apparatus and outer ring-shaped member |
| 04/09/2013 | US8414734 Versatile system for self-aligning deposition equipment |
| 04/09/2013 | US8414705 Seal mechanism, seal trench, seal member, and substrate processing apparatus |
| 04/09/2013 | US8414704 Bonding structure and semiconductor device manufacturing apparatus |
| 04/09/2013 | US8414703 Advanced mixing system for integrated tool having site-isolated reactors |
| 04/09/2013 | US8414702 Plasma processing apparatus |
| 04/09/2013 | US8413604 Slotted electrostatic shield modification for improved etch and CVD process uniformity |
| 04/09/2013 | CA2622924C Corrosion resistant coating based on silicon, carbon, hydrogen and nitrogen |
| 04/09/2013 | CA2597785C Composite material consisting of a porous matrix and metal or metal oxide nanoparticles |
| 04/04/2013 | WO2013048751A1 Deposition of silicon oxide by atmospheric pressure chemical vapor deposition |
| 04/04/2013 | WO2013048258A1 Reactor and method for production of silicon by chemical vapor deposition |
| 04/04/2013 | WO2013048026A1 Deposition apparatus |
| 04/04/2013 | WO2013048016A2 Substrate supporting unit and substrate processing device, and method for producing substrate supporting unit |
| 04/04/2013 | WO2013047634A1 Barrier laminate, gas-barrier film, and device using said barrier laminate and gas-barrier film |
| 04/04/2013 | WO2013047506A1 Nitride semiconductor fabrication device material washing method and nitride semiconductor fabrication device material washing device |
| 04/04/2013 | WO2013047361A1 Method for producing substrate having buffer layer structure for growing nitride semiconductor layer |