Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2013
04/24/2013CN101522943B Precursor delivery system
04/24/2013CN101511772B Imide complex, method for producing the same, metal-containing thin film and method for producing the same
04/24/2013CN101429651B Multi-port pumping system for substrate processing chambers
04/24/2013CN101407124B Nb/Re composite multilayer material and preparation thereof
04/23/2013US8426764 Plasma processing apparatus and plasma processing method
04/23/2013US8425987 Surface charge enhanced atomic layer deposition of pure metallic films
04/23/2013US8425978 Fluorine compounds for doping conductive oxide thin films
04/23/2013US8425977 Substrate processing chamber with off-center gas delivery funnel
04/23/2013US8425719 Plasma generating apparatus
04/23/2013US8425682 High strip rate downstream chamber
04/23/2013US8424485 Substrate treatment equipment and manufacturing method of substrate
04/23/2013CA2712249C Low thermal conductivity, cmas-resistant thermal barrier coatings
04/18/2013WO2013055921A1 Deposition system
04/18/2013WO2013055141A2 Apparatus and method for surface modification of biological material
04/18/2013WO2013054916A1 Crystal layered structure and method for manufacturing same, and semiconductor element
04/18/2013WO2013054876A1 Cvd device, method for manufacturing susceptor in which cvd device is used, and susceptor
04/18/2013WO2013054863A1 Raw material for chemical vapor deposition which comprises organic platinum compound, and chemical vapor deposition method using said raw material for chemical vapor deposition
04/18/2013WO2013054802A1 Plasma treatment method
04/18/2013WO2013054776A1 Vacuum treatment device
04/18/2013WO2013054655A1 Method for manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
04/18/2013WO2013054652A1 Substrate processing apparatus, substrate processing method, semiconductor device fabrication method and memory medium
04/18/2013WO2013053495A1 Coating for a reactor vessel and coating process
04/18/2013WO2013024226A9 Antireflection glazing unit equipped with a porous coating
04/18/2013WO2012139006A3 Metal-organic vapor phase epitaxy system and process
04/18/2013US20130095669 Substrate processing method and substrate processing apparatus
04/18/2013US20130095658 Metal organic chemical vapor deposition method and apparatus
04/18/2013US20130095256 Impact and erosion resistant thermal and environmental barrier coatings
04/18/2013US20130095243 Metal titanium production device and metal titanium production method
04/18/2013US20130095242 Continuous Deposition System
04/18/2013US20130095231 Sealant coating equipment for liquid crystal panel and its coating method
04/18/2013US20130092085 Linear atomic layer deposition apparatus
04/18/2013US20130092084 Systems and Methods for Measuring, Monitoring and Controlling Ozone Concentration
04/18/2013DE19853598B4 Dünnschichtherstellungsverfahren mit atomarer Schichtabscheidung Thin film forming method with atomic layer deposition
04/18/2013DE112011101379T5 Beschichtung für Schneidwerkzeuge Coating for cutting tools
04/18/2013DE102011115782A1 Reaktor mit beschichtetem Reaktorgefäß und Beschichtungsverfahren Reactor with coated reactor vessel and coating processes
04/18/2013DE102011054566A1 Method for separating multi-component metal-organic semiconductor layers on substrate, involves enabling process gas total flow so that partial fluxes are introduced in process chamber to optimize lateral homogeneity on deposited layer
04/18/2013DE102008034372B4 Verfahren zum Herstellen einer dielektrischen Schicht in einem elektroakustischen Bauelement sowie elektroakustisches Bauelement A method for producing a dielectric layer in an electro-acoustic component and electroacoustic component
04/18/2013DE102006009822B4 Verfahren zur Plasmabehandlung von Glasoberflächen, dessen Verwendung sowie Glassubstrat und dessen Verwendung A process for plasma treatment of glass surfaces, as well as its use glass substrate and the use thereof
04/17/2013EP2581949A1 Surface feed-in electrode for deposition of thin film solar battery and signal feed-in method thereof
04/17/2013EP2581934A1 Apparatus and method for the production of photovoltaic modules
04/17/2013EP2581925A2 Plasma reactor for removal of contaminants
04/17/2013EP2581377A1 Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film
04/17/2013EP2580371A2 Low-temperature synthesis of silica
04/17/2013EP2580370A1 Textured alumina layer
04/17/2013EP2580369A1 Method for producing a coated amorphous metal part
04/17/2013EP2580368A1 Apparatus and method for chemical vapor deposition control
04/17/2013EP2580367A1 Method and apparatus for deposition
04/17/2013CN202881386U Terminal connector for hot wire chemical vapor deposition (HWCVD) system
04/17/2013CN202881385U Wafer heating device
04/17/2013CN202881384U Control structure provided with eight U-type grooves and used for plate-type PECVD (Plasma Enhanced Chemical Vapor Deposition) specific gas pipeline
04/17/2013CN202881383U Gas balancing device for metal-organic chemical vapor deposition (MOCVD) equipment reaction chamber
04/17/2013CN202881382U PECVC (Plasma Enhanced Chemical Vapor Deposition) deposition equipment and quartz tube thereof
04/17/2013CN202881381U Saving type graphite boat washer
04/17/2013CN202881372U Furnace door opening limiting mechanism of vertical vacuum coating machine
04/17/2013CN103052734A Surface treatment device and surface treatment method
04/17/2013CN103050553A Crystalline silicon solar cell with double-side passivation and preparing method thereof
04/17/2013CN103050350A Preparation method of field emitting cathode
04/17/2013CN103048307A Enhanced Raman detection substrate based on natural biology super-hydrophobic structure surface and preparation method thereof
04/17/2013CN103046030A Atomic layer deposition equipment based on pressure measurement module and application method thereof
04/17/2013CN103046029A Atomic layer deposition equipment for self-adaptive pressure control based on simulated annealing algorithm
04/17/2013CN103046028A Atomic layer deposition equipment based on high-precision PID (Proportion Integration Differentiation) temperature control
04/17/2013CN103046027A Surface field enhancement device for large plate-type PECVD equipment
04/17/2013CN103046026A CVD equipment with optical heating effect
04/17/2013CN103046025A Cooling air inflow layout structure
04/17/2013CN103046024A Anti-reflux atomic layer deposition device and using method thereof
04/17/2013CN103046023A Thermal treatment furnace structure
04/17/2013CN103046022A Atomic layer deposition equipment based on extension-type chamber and using method of atomic layer deposition equipment
04/17/2013CN103046021A Preparation method of porous silicon-based tungsten oxide nanowire composite gas-sensitive material
04/17/2013CN103046020A Preparation method of TiSiN nano composite coating on surface of titanium alloy
04/17/2013CN103046019A Metal organic chemical vapor deposition method and apparatus
04/17/2013CN103044063A Shower plate, method for manufacturing the shower plate, plasma processing apparatus using the shower plate, plasma processing method and electronic device manufacturing method
04/17/2013CN102367571B Preparation method for improving surface hydrophilicity of nanometer polyethylene terephthalate (PET) films
04/17/2013CN102312217B Method for growing semiconductor film by using composite mode, and apparatus thereof
04/17/2013CN102212795B Growth method of high-compactness nano diamond film
04/17/2013CN102148153B Substrate cleaning method and substrate cleaning apparatus
04/17/2013CN102020263B Method for synthesizing graphene film material
04/17/2013CN101985745B Chemical vapor deposition (CVD) apparatus and substrate processing apparatus
04/17/2013CN101802273B Epitaxial SIC single crystal substrate and method for manufacturing epitaxial SIC single crystal substrate
04/17/2013CN101643896B Method and apparatus for silicon oxide deposition on large area substrates
04/17/2013CN101517704B Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
04/17/2013CN101413112B Multi-gas straight channel showerhead
04/16/2013US8420208 High-k dielectric material and methods of forming the high-k dielectric material
04/16/2013US8420170 Methods of forming glass on a substrate
04/16/2013US8420169 Method of manufacturing organic thin film
04/16/2013US8420168 Delivery device for deposition
04/16/2013US8420167 Method of manufacturing a semiconductor device
04/16/2013US8420043 Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
04/16/2013US8420041 High-pressure vessel for growing group III nitride crystals and method of growing group III nitride crystals using high-pressure vessel and group III nitride crystal
04/16/2013US8419894 Plasma generator, plasma control method and method of producing substrate
04/16/2013US8419893 Shielded lid heater assembly
04/16/2013US8419857 Electron beam vapor deposition apparatus and method of coating
04/16/2013US8419856 Substrate processing apparatus
04/16/2013US8419855 Substrate processing chamber with off-center gas delivery funnel
04/16/2013US8419854 Film-forming apparatus
04/16/2013US8419341 Linear vacuum robot with Z motion and articulated arm
04/16/2013US8418650 Inner electrode for barrier film formation and apparatus for film formation
04/16/2013US8418649 Composite showerhead electrode assembly for a plasma processing apparatus
04/11/2013WO2013052546A1 Methods for coating tubular devices used in oil and gas drilling, completions and production operations
04/11/2013WO2013052460A1 Vapor transport deposition method and system for material co-deposition
04/11/2013WO2013052364A1 Method of and apparatus for multiple channel flow ratio controller system
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