Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2013
05/01/2013CN101956182B Gas wall structure for chemical vapor deposition equipment
05/01/2013CN101809192B Delivery device for deposition
05/01/2013CN101778719B Biodegradable resin container having deposited film, and method for formation of deposited film
05/01/2013CN101553600B Hybrid layers for use in coatings on electronic devices or other articles
05/01/2013CN101418438B High quality silicon oxide films by remote plasma cvd from disilane precursors
05/01/2013CN101359585B Apparatus for manufacturing thin-film laminated member
05/01/2013CN101233598B Plasma amplifier for plasma treatment plant
04/2013
04/30/2013US8431439 Thin film laminated body manufacturing apparatus and method
04/30/2013US8431240 Metal plating using seed film
04/30/2013US8431233 Gas-barrier film, device and optical component comprising same, and method for producing gas-barrier film
04/30/2013US8431190 Method for depositing hard metallic coatings
04/30/2013US8431189 Carbon nanotube-nanofiber composite structure
04/30/2013US8431188 Abrasion resistant coatings with color component for gemstones and such
04/30/2013US8431035 Plasma processing apparatus and method
04/30/2013US8430992 Protective self-aligned buffer layers for damascene interconnects
04/30/2013US8430967 Hydrophobicizing apparatus, hydrophobicizing method and storage medium
04/30/2013US8430966 Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate
04/30/2013US8430965 Epitaxial growth system for fast heating and cooling
04/30/2013US8430964 Coating apparatus
04/30/2013US8430963 Cool-down system and method for a vapor deposition system
04/30/2013US8430962 Gas supply device, substrate processing apparatus and substrate processing method
04/30/2013US8430961 Source gas flow path control in PECVD system to control a by-product film deposition on inside chamber
04/30/2013US8430960 Deposition systems and susceptor assemblies for depositing a film on a substrate
04/30/2013US8430054 Portable fingerprint development system
04/25/2013WO2013059698A1 Method and apparatus for fabricating silicon heterojunction solar cells
04/25/2013WO2013059542A1 Method and apparatus for fabricating silicon heterojunction solar cells
04/25/2013WO2013058559A1 Method of obtaining graphene
04/25/2013WO2013058451A1 Ruthenium compound having excellent step coverage, and thin film deposited using same
04/25/2013WO2013058050A1 Method for cleaning transparent electrode film
04/25/2013WO2013057835A1 Thin film forming apparatus
04/25/2013WO2013057321A1 A single crystal high dielectric constant material
04/25/2013WO2013022669A3 Systems and methods for processing vapor
04/25/2013WO2012170166A3 Method and system for inline chemical vapor deposition
04/25/2013WO2012078464A9 Article and method of making and using the same
04/25/2013US20130102159 Substrate processing apparatus, substrate transfer method and method for manufacturing semiconductor device
04/25/2013US20130102156 Components of plasma processing chambers having textured plasma resistant coatings
04/25/2013US20130102155 Icp source design for plasma uniformity and efficiency enhancement
04/25/2013US20130101818 Surface coating film for a forming machine and method of manufacturing the same
04/25/2013US20130101806 Method for adhering a coating to a substrate structure
04/25/2013US20130101730 Microwave plasma reactors
04/25/2013US20130101241 Substrate support bushing
04/25/2013US20130098556 Plasma processing apparatus
04/25/2013US20130098455 Multiple complementary gas distribution assemblies
04/25/2013US20130098294 Conveyor assembly with removable rollers for a vapor deposition system
04/25/2013US20130098293 Chemical vapor deposition apparatus
04/25/2013US20130098292 Processing System
04/25/2013US20130098291 Substrate treatment equipment and manufacturing method of substrate
04/25/2013DE112005001539B4 Vakuumbearbeitungsvorrichtung und Verfahren zum Austausch einer Vakuumbearbeitungskammer einer solchen Vorrichtung Vacuum processing apparatus and method for replacement of a vacuum processing chamber of such a device
04/25/2013DE102012213766A1 Oberflächenbeschichtungsfolie für eine Formgebungsmaschine und Verfahren zum Herstellen derselben Surface coating film for a forming machine and method for manufacturing the same
04/25/2013DE102011115782B4 Reaktor mit beschichtetem Reaktorgefäß und Beschichtungsverfahren Reactor with coated reactor vessel and coating processes
04/25/2013CA2853137A1 Drill having a coating
04/24/2013EP2584588A1 Method of forming MIM capacitor with Ru-comprising oxygen diffusion barrier
04/24/2013EP2582859A1 Method for aluminizing a surface by means of the advance deposition of a platinum and nickel layer
04/24/2013EP2582858A1 Apparatus and method for coating glass substrate
04/24/2013CN202905768U A hook assembly used for coating a solar energy battery graphite frame with film
04/24/2013CN202905663U Deposition clamp used for uniform film plating of amorphous silicon thin film
04/24/2013CN202904399U Temperature control system, metal organic chemical vapor deposition equipment and semiconductor film deposition equipment
04/24/2013CN202898537U Plasma vapor deposition equipment for amorphous silicon battery deposition
04/24/2013CN202898536U Substrate bearing plate for metal organic chemical vapor deposition equipment
04/24/2013CN202898535U Gas pipeline device
04/24/2013CN202898534U Cleaning device for spraying plate of metal organic chemical vapor deposition (MOCVD) equipment
04/24/2013CN202898533U Organic metal microbubble output device
04/24/2013CN202898532U Plasma enhanced chemical vapor deposition equipment
04/24/2013CN202898531U Transfer device for graphite plate of metal organic chemical vapor deposition equipment
04/24/2013CN202898520U Double-cavity vacuum loading cavity of shared vacuum system
04/24/2013CN202898519U Vacuum loading chamber with heating function
04/24/2013CN103069485A Protective film, and magnetic recording medium having protective film
04/24/2013CN103069043A Method and apparatus for deposition
04/24/2013CN103066200A Forming method and forming device of magnetic tunnel junction with three-dimensional structure
04/24/2013CN103066132A Double-layer silicon nitride antireflection film for solar cell and preparation method thereof
04/24/2013CN103060910A Method for electrochemically preparing sea-urchin-shaped ZnO nanowire arrays on organic flexible material
04/24/2013CN103060909A Method for preparing ZnO nanowire/nanotube arrays with adjustable diameter and height on organic flexible substrate
04/24/2013CN103060906A Square spray nozzle structure for vapor phase epitaxy of material
04/24/2013CN103060778A Flat plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) device
04/24/2013CN103060777A Coating apparatus for laser excitating chemical vapor deposition (CVD)
04/24/2013CN103060776A A constant temperature system for a heating stage
04/24/2013CN103060775A Polyhedron funnel type air inlet unit for CVD (chemical vapor deposition) equipment and CVD equipment
04/24/2013CN103060774A Chamber device and substrate processing equipment with same
04/24/2013CN103060773A Preparation method of superhydrophobic surface material
04/24/2013CN103060772A Chemical vapor deposition device and chemical vapor deposition method
04/24/2013CN103060771A Single crystal type polycrystal nano-diamond composite film and preparation method thereof
04/24/2013CN103060770A Preparation method of iron-clad aluminum type composite powder and product thereof
04/24/2013CN103060769A Etching and baking equipment and operation method thereof
04/24/2013CN103060749A Surface coating film for forming machine and method of manufacturing same
04/24/2013CN103060745A Surface treatment process for forming alloy by carrying out titanium-coating and titanizing on metal surface
04/24/2013CN103058196A Apparatus and process for deposition of polycrystalline silicon
04/24/2013CN102260860B Growth process for silicon nitride in silicon oxide nitride oxide silicon (SONOS) structure
04/24/2013CN102211218B Diamond coated cutter and application thereof in processing of fiber composite material
04/24/2013CN102206812B InGaN thin film with larger band gap and preparation method thereof
04/24/2013CN102206811B InGaN film with small band gap and preparation method thereof
04/24/2013CN102112652B Device for plasma-assisted coating of the inner side of tubular components
04/24/2013CN101962753B Film coating device
04/24/2013CN101878322B Plasma-deposited barrier coating including at least three layers, method for obtaining one such coating and container coated with same
04/24/2013CN101863667B Ceramics and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
04/24/2013CN101809712B Gas feeding device for semiconductor manufacturing facilities
04/24/2013CN101809194B Method of patterning a mesoporous nano particulate layer
04/24/2013CN101770973B Plasma process equipment and static chuck device
04/24/2013CN101665926B Film deposition apparatus exposing substrate to plural gases in sequence
04/24/2013CN101550531B Method for preparing silicon nano structures
04/24/2013CN101538277B Novel tin amino-alkoxide complexes and process for preparing same
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