| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/08/2013 | CN103088308A Temperature monitoring device |
| 05/08/2013 | CN103088287A Film formation apparatus and film formation method |
| 05/08/2013 | CN103084599A Surface coating cutting tool with hard coating layer playing excellent fracture resistance |
| 05/08/2013 | CN103084598A Surface coating cutting tool with hard coating layer playing excellent fracture resistance |
| 05/08/2013 | CN102312225B Method for depositing silicon oxide on silicon nitride surface |
| 05/08/2013 | CN102277562B Multi-stage plasma enhanced chemical vapor deposition (PECVD) equipment for thin-film solar batteries |
| 05/08/2013 | CN102226271B Double-layer quartz tube |
| 05/08/2013 | CN102217054B Wafer heating apparatus, electrostatic chuck, and method for manufacturing wafer heating apparatus |
| 05/08/2013 | CN102093430B Organic phosphine-stabilized alkyl silver disulfonate complex, and synthetic method and application thereof |
| 05/08/2013 | CN101479401B Wear-resistant coating and production method for the same |
| 05/07/2013 | US8435886 Method and system for binding halide-based contaminants |
| 05/07/2013 | US8435606 Polymer-infused carbon nanotube array and method |
| 05/07/2013 | US8435601 Method for forming carbon nanotube |
| 05/07/2013 | US8435596 Oxidizing method and oxidizing apparatus |
| 05/07/2013 | US8435593 Method of inspecting a substrate and method of preparing a substrate for lithography |
| 05/07/2013 | US8435353 Thin film forming apparatus and method |
| 05/07/2013 | US8435352 Apparatus and method for coating a substrate |
| 05/07/2013 | US8435351 Method and system for measuring a flow rate in a solid precursor delivery system |
| 05/07/2013 | US8435350 Supply device |
| 05/07/2013 | US8435349 Epitaxial reactor for mass production of wafers |
| 05/07/2013 | US8434423 Substrate carrying apparatus having circumferential sidewall and substrate processing system |
| 05/02/2013 | WO2013063360A1 Method for producing thin layers of crystalline or polycrystalline materials |
| 05/02/2013 | WO2013062866A1 Window and mounting arrangement for twist-and-lock gas injector assembly of inductively coupled plasma chamber |
| 05/02/2013 | WO2013062264A1 Method of manufacturing graphene using metal catalyst |
| 05/02/2013 | WO2013062033A1 Catalytic cvd and device therefor |
| 05/02/2013 | WO2013061660A1 Vapor deposition device |
| 05/02/2013 | WO2013061659A1 Vapor deposition device |
| 05/02/2013 | WO2013061649A1 Vapor deposition device |
| 05/02/2013 | WO2013061634A1 Method for forming film on glass substrate |
| 05/02/2013 | WO2013061506A1 Vacuum processing apparatus |
| 05/02/2013 | WO2013060256A1 Carbon layer material having protective layer structure and preparation process thereof |
| 05/02/2013 | WO2013040127A3 Gas delivery and distribution for uniform process in linear-type large-area plasma reactor |
| 05/02/2013 | US20130109196 Film forming apparatus and method of operating the same |
| 05/02/2013 | US20130109195 Film forming apparatus and method of operating the same |
| 05/02/2013 | US20130109193 Substrate processing apparatus and semiconductor device manufacturing method |
| 05/02/2013 | US20130109159 Gas dispersion apparatus |
| 05/02/2013 | US20130108959 Use of a composition comprising vinyl monomer-comprising polymer, solvent and at least one halogen-free biocide |
| 05/02/2013 | US20130108886 Metal component, method for producing a metal component, and fitting, piece of furniture and household appliance |
| 05/02/2013 | US20130108804 Plasma treatment of substrates |
| 05/02/2013 | US20130108803 Open Air Plasma Deposition System and Method |
| 05/02/2013 | US20130108789 Method for deposition |
| 05/02/2013 | US20130108788 Vapor-phase process apparatus, vapor-phase process method, and substrate |
| 05/02/2013 | US20130106266 Method for making device housing and device housing made by same |
| 05/02/2013 | US20130104804 Batch-Type Remote Plasma Processing Apparatus |
| 05/02/2013 | US20130104801 Mask for use in evaporation coating device |
| 05/02/2013 | US20130104800 Film-forming method and film-forming apparatus |
| 05/02/2013 | DE112010003248T5 Plasma-CVD-Vorrichtung, Plasma-Elektrode und Verfahren zum Herstellen einerHalbleiterschicht Plasma CVD apparatus, a plasma electrode and method for fabricating a semiconductor layer |
| 05/02/2013 | DE102009057903B4 Hochtemperaturgasverdampfungsvorrichtung und Verfahren zur Hochtemperaturgasverdampfung High-temperature gas evaporation apparatus and method for high temperature gas evaporation |
| 05/02/2013 | DE102009000821B4 Verfahren zum Aufbringen einer Beschichtung auf Werkstücke und/oder Werkstoffe aufweisend mindestens ein leicht oxidierbares Nichteisenmetall sowie Werkstück und/oder Werkstoff hergestellt nach dem Verfahren A method for applying a coating to workpieces and / or materials comprising at least one easily oxidizable non-ferrous metal, as well as the workpiece and / or material produced by the process |
| 05/01/2013 | EP2587524A1 Vapor deposition apparatus |
| 05/01/2013 | EP2586890A1 Pipe for evacuating gas and related evacuation method |
| 05/01/2013 | EP2585471A2 Coating liquid, method for manufacturing optical component, and photographic optical system |
| 05/01/2013 | EP2585274A1 Surface treatment of rubber using low pressure plasma |
| 05/01/2013 | CN202913057U New sealing structure of parylene horizontal vacuum deposition system |
| 05/01/2013 | CN202913056U Chemical vapor deposition device for preparing graphene membrane |
| 05/01/2013 | CN202913054U Carrier for vacuum cavity |
| 05/01/2013 | CN103080375A Nozzle head |
| 05/01/2013 | CN103080374A Apparatus |
| 05/01/2013 | CN103080373A Apparatus and method |
| 05/01/2013 | CN103080372A Nozzle head |
| 05/01/2013 | CN103080371A Method of coating a substrate for manufacturing a solar cell |
| 05/01/2013 | CN103080370A Method for producing a coated amorphous metal part |
| 05/01/2013 | CN103080115A Use of trialkylaluminum for the growth of al2o3 thin films for photovoltaic applications |
| 05/01/2013 | CN103079807A Laminate, and laminate production method |
| 05/01/2013 | CN103078035A Semiconductor light emitting device including zinc oxide-based transparent conductive thin film, and fabrication method thereof |
| 05/01/2013 | CN103078016A LED (Light Emitting Diode) epitaxial wafer deposition method and LED epitaxial wafer deposition equipment |
| 05/01/2013 | CN103077917A Substrate supporting seat and semiconductor processing equipment applying same |
| 05/01/2013 | CN103074675A 气体系统 Gas System |
| 05/01/2013 | CN103074674A Reaction chamber air inlet device for metal organic chemical vapor deposition (MOCVD) equipment |
| 05/01/2013 | CN103074617A 控制系统及其控制方法 Control system and control method |
| 05/01/2013 | CN103074616A Method for depositing multiple material layers on substrate and chemical vapor deposition equipment |
| 05/01/2013 | CN103074615A Chemical vapor deposition apparatus |
| 05/01/2013 | CN103074614A 激光cvd镀膜设备 Laser cvd coating equipment |
| 05/01/2013 | CN103074613A Microwave excitation CVD coating equipment |
| 05/01/2013 | CN103074612A Heating device and CVD (Chemical Vapor Deposition) equipment |
| 05/01/2013 | CN103074611A Substrate bearing device and metal organic chemical vapor deposition device |
| 05/01/2013 | CN103074610A Substrate supporting structure and reaction chamber containing the same |
| 05/01/2013 | CN103074609A Graphite plate and special-shaped substrate |
| 05/01/2013 | CN103074608A Method for arranging substrates in graphite plate, and graphite plate |
| 05/01/2013 | CN103074607A Graphite plate and reaction chamber with graphite plate |
| 05/01/2013 | CN103074606A Graphite plate, reaction chamber with graphite plate, and substrate heating method |
| 05/01/2013 | CN103074605A Spray header and chemical vapor deposition equipment |
| 05/01/2013 | CN103074604A Spraying nozzle for chemical vapor deposition process and method for improving process uniformity |
| 05/01/2013 | CN103074603A 薄膜沉积系统及薄膜沉积方法 Thin film deposition systems and thin film deposition method |
| 05/01/2013 | CN103074602A Reaction chamber of chemical vapor deposition apparatus |
| 05/01/2013 | CN103074601A Spray head used in chemical vapor deposition process |
| 05/01/2013 | CN103074600A Etching roasting equipment |
| 05/01/2013 | CN103074599A 反应腔室 The reaction chamber |
| 05/01/2013 | CN103074598A Chemical vapor deposition equipment |
| 05/01/2013 | CN103074597A 反应腔室 The reaction chamber |
| 05/01/2013 | CN103074596A CVD equipment adopting electromagnetic heating |
| 05/01/2013 | CN103074595A Reaction chamber for vapor deposition process |
| 05/01/2013 | CN103074594A Quartz tube used in tablet PECVD equipment and installation method thereof |
| 05/01/2013 | CN103072333A Copper material provided with anti-oxidative protection layer and manufacture method thereof |
| 05/01/2013 | CN103071353A Gas filtration treatment structure, tail gas treatment system and tail gas treatment method thereof |
| 05/01/2013 | CN102268656B Sprinkler of metal organic chemical vapor deposition (MOCVD) equipment as well as manufacture method and use method thereof |
| 05/01/2013 | CN102181846B Cavity-type graphite boat |
| 05/01/2013 | CN102084469B 等离子体处理装置 Plasma processing apparatus |
| 05/01/2013 | CN101996843B Plasma processing device and focusing ring |
| 05/01/2013 | CN101971303B Method for Sr-Ti-o-based film formation and storage medium |