| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/15/2013 | CN103109351A Epitaxial substrate for semiconductor element, method for producing epitaxial substrate for semiconductor element, and semiconductor element |
| 05/15/2013 | CN103109343A Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ |
| 05/15/2013 | CN103108986A Method and apparatus for contactlessly advancing substrates |
| 05/15/2013 | CN103108985A Apparatus |
| 05/15/2013 | CN103108984A Nozzle head and apparatus |
| 05/15/2013 | CN103108983A Apparatus |
| 05/15/2013 | CN103108982A Growth of AI2O3 thin films for photovoltaic applications |
| 05/15/2013 | CN103108716A Surface-coated cutting tool |
| 05/15/2013 | CN103107234A Hetero-junction solar cell and manufacturing method thereof |
| 05/15/2013 | CN103107176A Solid-state image sensor and manufacturing method thereof, and camera |
| 05/15/2013 | CN103107120A Processes and integrated systems for engineering a substrate surface for metal deposition |
| 05/15/2013 | CN103107057A Air guide electrode plate |
| 05/15/2013 | CN103103502A Metal organic chemical vapor deposition apparatus and method |
| 05/15/2013 | CN103103501A Fan-shaped spray head structure for vapor phase epitaxy of material |
| 05/15/2013 | CN103103500A Multipoint-gas-inlet multi-region adjusting device used for PECVD (Plasma Enhanced Chemical Vapor Deposition) |
| 05/15/2013 | CN103103499A Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus |
| 05/15/2013 | CN103103498A Graphite plate baking tray assembly |
| 05/15/2013 | CN103103497A Atomic layer deposition equipment |
| 05/15/2013 | CN103103496A Film blowing method |
| 05/15/2013 | CN103103495A Full-automatic downward transmission system |
| 05/15/2013 | CN103103494A Method for preparing oxide surface on surface enhanced raman scattering (SERS) substrate through atomic layer deposition technology |
| 05/15/2013 | CN103103493A Production device of graphene copper wire |
| 05/15/2013 | CN103103492A Preparation method of graphene/carbon nanotube composite conductive film |
| 05/15/2013 | CN103103490A Annular component supporting mechanism capable of alternatively switching supporting point in rotation |
| 05/15/2013 | CN102064236B Manufacture method of thin-film solar cell |
| 05/15/2013 | CN101910467B Metal catalyzed selective deposition of materials including germanium and antimony |
| 05/15/2013 | CN101532126B Film formation apparatus for semiconductor process and method for using same |
| 05/15/2013 | CN101527254B Rotating temperature controlled substrate pedestal for film uniformity |
| 05/14/2013 | US8441077 Method for forming a ruthenium metal layer and a structure comprising the ruthenium metal layer |
| 05/14/2013 | US8440270 Film deposition apparatus and method |
| 05/14/2013 | US8440261 Housing and surface treating method for making the same |
| 05/14/2013 | US8440260 Diruthenium complex, and material and method for chemical vapor deposition |
| 05/14/2013 | US8440259 Vapor based combinatorial processing |
| 05/14/2013 | US8440255 Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film |
| 05/14/2013 | US8440066 Tin electroplating bath, tin plating film, tin electroplating method, and electronic device component |
| 05/14/2013 | US8440021 Apparatus and method for deposition for organic thin films |
| 05/14/2013 | US8440020 Apparatus and method for the production of flexible semiconductor devices |
| 05/14/2013 | US8440019 Lower liner with integrated flow equalizer and improved conductance |
| 05/14/2013 | US8440018 Apparatus for supplying source and apparatus for deposition thin film having the same |
| 05/14/2013 | US8438990 Multi-electrode PECVD source |
| 05/10/2013 | WO2013066749A1 Methods for applying a coating to a substrate in rolled form |
| 05/10/2013 | WO2013065806A1 Tris (dialkylamide) aluminum compound, and method for producing aluminum-containing thin film using same |
| 05/10/2013 | WO2013065666A1 Gas nozzle, plasma device using same, and method for manufacturing gas nozzle |
| 05/10/2013 | WO2013065601A1 Copper foil for graphene production and production method therefor, and graphene production method |
| 05/10/2013 | WO2013065315A1 N-type semiconductor comprising amorphous silicon carbide doped with nitrogen, and process for producing n-type semiconductor element |
| 05/10/2013 | WO2013064737A2 Apparatus and method for processing substrate |
| 05/10/2013 | WO2013064613A2 Cvd-reactor and substrate holder for a cvd reactor |
| 05/10/2013 | WO2013063838A1 Method for preparing superfine line |
| 05/10/2013 | WO2013039866A3 Activated silicon precursors for low temperature deposition |
| 05/10/2013 | WO2013037998A3 Sulfur containing alpha-alumina coated cutting tool |
| 05/10/2013 | WO2012174207A3 Chemical vapor infiltration apparatus and process |
| 05/10/2013 | WO2012127738A9 COMPOUND GaN SUBSTRATE AND METHOD FOR PRODUCING SAME, AND GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME |
| 05/09/2013 | US20130116682 Non-Stick Conductive Coating for Biomedical Applications |
| 05/09/2013 | US20130115780 Plasma processing apparatus and plasma processing method |
| 05/09/2013 | US20130115426 Method of manufacturing flexible electronic device |
| 05/09/2013 | US20130115383 Deposition of metal films using alane-based precursors |
| 05/09/2013 | US20130115373 Rotating type thin film deposition apparatus and thin film deposition method used by the same |
| 05/09/2013 | US20130115372 High emissivity distribution plate in vapor deposition apparatus and processes |
| 05/09/2013 | US20130115097 Corrosion-resistant diffusion coatings |
| 05/09/2013 | US20130115018 Coated Cutting Tool, Cutting Member or Wear Part |
| 05/09/2013 | US20130112990 Gallium Nitride Devices with Compositionally-Graded Transition Layer |
| 05/09/2013 | US20130112352 Plasma processing apparatus |
| 05/09/2013 | US20130112347 Plasma surface activation method and resulting object |
| 05/09/2013 | CA2794071A1 Non-stick conductive coating for biomedical applications |
| 05/08/2013 | EP2589680A1 Apparatus for the deposition of diamondlike carbon as protective coating on an inner surface of a shaped object |
| 05/08/2013 | EP2589679A1 Method for synthesising a graphene sheet on a platinum silicide, structures obtained by said method and uses thereof |
| 05/08/2013 | EP2589071A2 Thin films and methods of making them using cyclohexasilane |
| 05/08/2013 | EP2589068A2 System and method of semiconductor manufacturing with energy recovery |
| 05/08/2013 | EP2588650A1 Selective epitaxy of si-containing materials and substitutionally doped crystalline si-containing materials |
| 05/08/2013 | DE102011085789A1 Plant, useful for continuous vacuum coating of substrates, comprises vacuum chamber, and transport device that is arranged in chamber, is configured for transporting substrate along transport path by chamber and comprises transport rollers |
| 05/08/2013 | DE102011055061A1 CVD-Reaktor bzw. Substrathalter für einen CVD-Reaktor CVD reactor or substrate holder for a CVD reactor |
| 05/08/2013 | DE102007037527B4 Verfahren zum Beschichten von Gegenständen mit Wechselschichten Method for coating objects with alternating layers |
| 05/08/2013 | CN202925096U Electrode gap-adjustable modularized PECVD (Plasma Enhanced Chemical Vapor Deposition) reaction inner cavity |
| 05/08/2013 | CN202925095U Tube locating and processing device for tube furnace |
| 05/08/2013 | CN202925094U Quantitative evaporation device |
| 05/08/2013 | CN103098559A High-frequency power supply device, plasma processing device and method for producing thin film |
| 05/08/2013 | CN103098558A System and method for voltage-based plasma excursion detection |
| 05/08/2013 | CN103098173A Polycrystalline silicon production |
| 05/08/2013 | CN103097575A Gas distribution device for vacuum processing equipment |
| 05/08/2013 | CN103097574A Sliding ring with improved run-in properties |
| 05/08/2013 | CN103097394A Molybdenum (IV) amide precursors and use thereof in atomic layer deposition? |
| 05/08/2013 | CN103094403A Serial-type equipment for manufacture of double-faced heterojunction solar cell in plasma enhanced chemical vapor deposition (PECVD) method and process |
| 05/08/2013 | CN103094402A Cluster-type equipment for manufacture of double-faced heterojunction solar cell in plasma enhanced chemical vapor deposition (PECVD) method and process |
| 05/08/2013 | CN103094366A Solar cell passivation antireflection film and preparation technology and method thereof |
| 05/08/2013 | CN103094314A New iii-nitride growth method on silicon substrate |
| 05/08/2013 | CN103094161A Tray for adapting to thermal gradient appears in processing period |
| 05/08/2013 | CN103094075A Method for forming long seamless filling amorphous silicon groove |
| 05/08/2013 | CN103094047A Inductively coupled plasma processing apparatus |
| 05/08/2013 | CN103094046A Plasma processing apparatus and top panel for the same |
| 05/08/2013 | CN103088320A Tubular PECVD device |
| 05/08/2013 | CN103088319A Film deposition apparatus, and film deposition method |
| 05/08/2013 | CN103088318A Gas mixing and isolating device for inlet gases of MOCVD (Metallo Organic Chemical Vapor Deposition) device reaction chamber |
| 05/08/2013 | CN103088317A Deposition apparatus and deposition method |
| 05/08/2013 | CN103088316A Feeding and drainage system for semiconductor thin film deposition equipment for cleaning chemical solution |
| 05/08/2013 | CN103088315A Chemical vapor deposition device |
| 05/08/2013 | CN103088314A Film forming apparatus and method for operating the same |
| 05/08/2013 | CN103088313A Film forming apparatus and method for operating the same |
| 05/08/2013 | CN103088312A Preparation method of doped graphene |
| 05/08/2013 | CN103088311A Method of forming seed layer and method of forming silicon-containing thin film |
| 05/08/2013 | CN103088310A Method for preparing medical porous tantalum with three-dimensional reticular graphite foam or reticular vitreous carbon |