| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 02/07/1990 | EP0264448B1 Method of treating the surface of iron alloy materials |
| 02/07/1990 | EP0240526B1 Method and device for chemical treatment, particularly thermochemical treatment and chemical deposition in a large volume homogeneous plasma |
| 02/07/1990 | CN1039449A Process for forming functional zinc oxide films using alkyl zinc compound and oxygen-containing gas |
| 02/06/1990 | US4898778 Multilayer; core with silicon carbide bulk exterior |
| 02/06/1990 | US4898748 Method for enhancing chemical reactivity in thermal plasma processes |
| 02/06/1990 | US4898118 Apparatus for forming functional deposited film by microwave plasma CVD process |
| 01/31/1990 | EP0353060A2 Multi ceramic layer-coated metal plate and process for manufacturing same |
| 01/31/1990 | EP0352607A2 Arsine, antimony and phosphine substitutes |
| 01/31/1990 | EP0352545A2 PVD coating and method for depositing it |
| 01/30/1990 | US4897360 Annealing a chemically vapor-deposited film to control tensile strain |
| 01/30/1990 | US4897316 Surface roughness |
| 01/30/1990 | US4897285 Method and apparatus for PCVD internal coating a metallic pipe by means of a microwave plasma |
| 01/30/1990 | US4897284 Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method |
| 01/30/1990 | US4897281 Process for the formation of a functional deposited film by way of microwave plasma CVD method |
| 01/30/1990 | CA1264924A1 Cutting tool with high hardness coating |
| 01/25/1990 | WO1990000633A1 Gas supply pipeline system for process equipment |
| 01/24/1990 | EP0351905A2 Solid bodies production process |
| 01/24/1990 | EP0238666B1 Surface treating method and apparatus |
| 01/24/1990 | EP0204724B1 Method for deposition of gallium arsenide from vapor phase gallium-arsenic complexes |
| 01/23/1990 | US4895770 Process for the manufacture of multi-layered, coated hardmetal parts |
| 01/23/1990 | US4895737 Metal-organic chemical vapor deposition |
| 01/23/1990 | US4895735 Thermal energy, vapor deposition |
| 01/23/1990 | US4895734 Vapor deposition |
| 01/23/1990 | US4895576 Method of doping interconnections for electrochemical cells |
| 01/23/1990 | US4895108 CVD apparatus and process for the preparation of fiber-reinforced ceramic composites |
| 01/23/1990 | US4895107 Photo chemical reaction apparatus |
| 01/16/1990 | US4894446 Volatile lanthanum complexes and their uses |
| 01/16/1990 | US4894352 Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride |
| 01/16/1990 | US4894257 Vapor deposition, impregnation with barium, strontium aluminum oxide |
| 01/16/1990 | US4894256 Vapor deposition, plasma resistance |
| 01/16/1990 | US4894079 Method and apparatus for supplying glass forming raw material |
| 01/16/1990 | US4893584 Large area microwave plasma apparatus |
| 01/11/1990 | DE3922270A1 Verfahren zur herstellung von silicium-germanium-legierungen A process for the production of silicon-germanium alloys |
| 01/11/1990 | DE3827506C1 Device and method for epitaxial deposition of especially semiconductor material onto silicon wafers from the gaseous state |
| 01/10/1990 | EP0349695A1 Method of depositing metal on a silicon substrate |
| 01/10/1990 | EP0349633A1 Polysilicon thin film process |
| 01/10/1990 | CN1038673A Microwave plasma treating apparatus |
| 01/09/1990 | US4892843 Reduction of tungsten hexafluoride to form two tungsten layer, reduction with silane and hydrogen |
| 01/09/1990 | US4892791 Body coated with cubic boron nitride & method for manufacturing the same |
| 01/09/1990 | US4892759 Method for surface treatment |
| 01/09/1990 | US4892753 Plasma enhanced chemical vapor deposition, decomposition of tetraethyl silicate |
| 01/09/1990 | US4892751 Method of and apparatus for forming a thin film |
| 01/09/1990 | US4892615 Evacuation and purging with a gas |
| 01/04/1990 | DE3821815A1 Device for coating an elongate interior of a hollow body with a diamond-like hard carbon coating by means of a plasma-assisted CVD process |
| 01/03/1990 | EP0349414A1 Method for restoring locally detiorated articles, particularly anti cathodes |
| 01/03/1990 | EP0349044A2 Process for the production of a protective film on a magnesium-based substrate, application to the protection of magnesium alloys, substrates thus obtained |
| 01/03/1990 | EP0348690A2 Apparatus and method for plasma treatment of small diameter tubes |
| 01/03/1990 | EP0348496A1 Chemical vapor deposition of mixed oxide films. |
| 01/03/1990 | EP0348477A1 Vacuum deposition process. |
| 01/03/1990 | EP0348476A1 Process for producing metallic alkyl compounds |
| 01/03/1990 | EP0250465B1 Continuous vapor deposition method for producing a coated glass article |
| 01/03/1990 | CN1038469A Process for formation of functional deposited film containing groups ii and vi atoms as main constituent atoms by microwave plasma chemical vapor deposition process |
| 01/02/1990 | US4891247 Process for borosilicate glass films for multilevel metallization structures in semiconductor devices |
| 01/02/1990 | US4891118 Plasma processing apparatus |
| 01/02/1990 | US4891074 Mixing band gap adjustment elements |
| 01/02/1990 | US4890575 Thin film forming device |
| 01/02/1990 | US4890574 Internal reactor for chemical vapor deposition |
| 12/28/1989 | WO1989012907A1 Wafer handling system with bernoulli pick-up |
| 12/28/1989 | WO1989012703A1 Gas injector apparatus for chemical vapor deposition reactors |
| 12/28/1989 | WO1989012507A1 Process for plasma depositing silicon nitride and silicon dioxide films onto a substrate |
| 12/28/1989 | EP0331718A4 Multiple electrode plasma reactor power distribution system. |
| 12/27/1989 | CN1038260A Haze-free infrared-reflecting coated glass |
| 12/21/1989 | DE3919307A1 Wear-resistant article |
| 12/21/1989 | DE3910246A1 Process for coating rotationally symmetric, especially cylindrical, substrates with hard material |
| 12/20/1989 | EP0347399A1 A diffusion barrier coating material |
| 12/20/1989 | EP0346738A1 Method and apparatus for the interior coating of metal tubes by PCVD using a microwave plasma |
| 12/19/1989 | US4888204 Photodissociating organic gold compound with ultraviolet light |
| 12/19/1989 | US4888203 Forming a protective, metal oxide film upon a surface of a substrate. |
| 12/19/1989 | US4888199 Process control by detecting characteristics of radiation emission, comparing, adjusting to predetermined value automatically |
| 12/19/1989 | US4888142 Firing amorphous form in nonoxidizing atmosphere |
| 12/19/1989 | US4887548 Thin film manufacturing system |
| 12/19/1989 | CA1263928A1 Coated article and method of manufacturing the article |
| 12/14/1989 | WO1989012238A1 Single-notch rugate filters and a controlled method of manufacture thereof |
| 12/14/1989 | WO1989011920A1 Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate |
| 12/14/1989 | WO1989011915A1 Plasma enhanced chemical vapor deposition wafer holding fixture |
| 12/14/1989 | WO1989011905A1 Dry exhaust gas conditioning |
| 12/14/1989 | WO1989011897A1 Silicon dioxide films on diamond |
| 12/13/1989 | EP0346168A1 Plasma reactor |
| 12/13/1989 | EP0346088A1 Electrode and method for its production |
| 12/13/1989 | EP0346055A2 Method for causing plasma reaction under atmospheric pressure |
| 12/13/1989 | EP0346018A2 Venting vacuum processing equipment |
| 12/13/1989 | CN1037931A Process for formation of functional deposited film containing groups iii and v atoms as main constituent atoms by microwave plasma chemical vapor deposition process |
| 12/12/1989 | US4887005 Multiple electrode plasma reactor power distribution system |
| 12/12/1989 | US4886683 Low temperature metalorganic chemical vapor depostion growth of group II-VI semiconductor materials |
| 12/12/1989 | US4886571 For semiconductors; efficient use of activated gas particles for deposition,etching, doping, oxidation, nitriding |
| 12/12/1989 | US4886570 Processing apparatus and method |
| 12/06/1989 | EP0345107A1 Multilayer protective coating for a substrate, process for protecting a substrate by the plasma deposition of such a coating, coatings obtained and their uses |
| 12/05/1989 | US4885067 Dissociation of organic compound into free radicals, forming organometallics, decomposition, and deposition of solid source |
| 12/05/1989 | US4884476 Vapor deposition of thin film of diamond; brazing to bond |
| 12/05/1989 | CA1263731A1 Boron doped semiconductor materials and method for producing same |
| 11/30/1989 | WO1989011770A1 Contactless heating of thin filaments |
| 11/30/1989 | WO1989011556A1 Process for vapor-phase synthesis of diamond |
| 11/30/1989 | WO1989011553A1 Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams |
| 11/29/1989 | EP0343846A2 Process for the preparation of polycrystalline diamond |
| 11/29/1989 | EP0343602A2 Microwave plasma treating apparatus |
| 11/29/1989 | EP0343502A2 Method and system for clamping semiconductor wafers |
| 11/29/1989 | EP0343355A1 Method of creating a high flux of activated species for reaction with a remotely located substrate |
| 11/29/1989 | CN1037551A Film-forming apparatus and method of forming film of amorphous silicon compound using it |
| 11/28/1989 | US4883686 Energy transferring gas collides with deposition gas |
| 11/28/1989 | US4883362 Device for enriching a carrier gas with the vapor of a sparingly volatile substance |