Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/1989
07/25/1989US4851295 Low resistivity tungsten silicon composite film
07/25/1989US4851262 Method of making carbide, nitride and boride powders
07/25/1989US4851256 Coaxial cylindrical electrodes; uniform films; vapor deposition
07/25/1989US4851254 Method and device for forming diamond film
07/19/1989EP0324538A1 Vapor-phase method for synthesis of diamond
07/19/1989EP0324523A2 Process for the plasma-activated reactive deposition of a multi-component conductive material from a gas phase
07/19/1989EP0324504A2 Method for forming uniformly large-diameter polycrystalline rods by the pyrolysis of silane and a reactor system therefor
07/18/1989US4849290 Alumina coated with diamond
07/18/1989US4849288 Composite superconducting fiber
07/18/1989US4849260 Method for selectively depositing metal on a substrate
07/18/1989US4849259 Method of forming silicon and oxygen containing layers
07/18/1989US4849249 Deposited film forming process and deposited film forming device
07/18/1989US4849199 Vaporization, photolysis
07/18/1989US4849146 Vapor phase reaction boron halide and ammonia; uniform structure
07/18/1989US4848272 Apparatus for forming thin films
07/13/1989WO1989006437A1 Device for forming thin film
07/11/1989US4847469 Controlled flow vaporizer
07/11/1989US4847215 Method for forming silicon carbide semiconductor film
07/11/1989US4846102 Reaction chambers for CVD systems
07/11/1989US4846101 Apparatus for plasma treatment of small diameter tubes
07/11/1989CA1257403A1 Chemical vapour deposition method to produce an electronic device having a multi-layer structure
07/05/1989EP0323434A1 Wear part and process for the production thereof
07/05/1989EP0323190A2 Superconductive metal oxide material
07/05/1989EP0323145A1 Equipment and method for supply of organic metal compound
07/05/1989EP0322812A2 Hard outer coatings deposited on titanium or titanium alloys
07/05/1989EP0322655A2 Plated steel sheet for cans
07/05/1989EP0322619A1 Superconductor and process for its production
07/05/1989EP0322466A1 PECVD (plasma enhanced chemical vapor deposition) method for deposition of tungsten or layers containing tungsten by in situ formation of tungsten fluorides
07/04/1989US4845054 Low temperature chemical vapor deposition of silicon dioxide films
07/04/1989US4845043 Method for fabricating photovoltaic device having improved short wavelength photoresponse
07/04/1989US4844986 Method for preparing lubricated surfaces and product
07/04/1989US4844951 Wean resistant coating deposited on a cemented carbide or hard ceramic substrate
07/04/1989US4844950 Oxidation of transition metal compound with fluorine
07/04/1989US4844949 Method of surface treatment and apparatus used therefor
07/04/1989US4844945 Patterned metal electrode
07/04/1989US4844785 Bombarding carbon coating with accelerated particles of inert gas
07/04/1989US4844774 Phototreating method and apparatus therefor
07/04/1989US4844719 Vinyl ether sulfonic acid fluorocopolymer
07/04/1989US4844006 Apparatus to provide a vaporized reactant for chemical-vapor deposition
07/04/1989CA1256755A1 Gas-sensitive composite material comprising metal and dielectric and process for producing same
07/04/1989CA1256754A1 Method of depositing silicon films with reduced structural defects
06/1989
06/29/1989WO1989006045A1 Polysilicon thin film process and product
06/29/1989WO1989005872A1 Vacuum deposition process
06/29/1989WO1989005871A1 Deposition apparatus
06/29/1989WO1989005696A1 Chemical vapor deposition of mixed oxide films
06/28/1989EP0321734A1 Process for the production of strongly adhering metallic structures on fluoropolymers and thermoplastic materials
06/27/1989US4843039 Sintered body for chip forming machining
06/27/1989US4843030 Semiconductor processing by a combination of photolytic, pyrolytic and catalytic processes
06/27/1989US4842945 Stainless steel coated with thin film of carbon containing specified amount in a state of diamond and having an adjustable black transparent color tone
06/27/1989US4842937 Method of depositing a wear-protective layer on a cutting tool and wear protective layer produced by the method
06/27/1989US4842897 Oxidation of starting material on substrate using gaseous halogen oxidizer
06/27/1989US4842892 Vapor deposition
06/27/1989US4842891 Method of forming a copper film by chemical vapor deposition
06/27/1989US4842827 Semiconductors
06/27/1989US4842686 Wafer processing apparatus and method
06/27/1989US4841908 Multi-chamber deposition system
06/27/1989CA1256593A1 Optical chemical vapor deposition method to produce an electronic device having a multi-layer structure
06/27/1989CA1256330A1 Methods of and apparatus for vapor delivery control in optical preform manufacture
06/22/1989DE3742525A1 Metallalkyl, verfahren zu dessen herstellung und seine verwendung Metal alkyl, process for its preparation and its use
06/22/1989DE3741708A1 Device for depositing material from the gas phase
06/22/1989DE3741706A1 Method for producing spiral thin-film flat coils
06/21/1989EP0320724A2 Process and apparatus for the surface treatment of substrates
06/21/1989EP0320657A1 Improved diamond growth process
06/20/1989US4840139 Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process
06/20/1989CA1255976A1 Ion-blocking coating on glass
06/15/1989WO1989005303A1 Process for producing metallic alkyl compounds
06/15/1989DE3741292A1 Process for producing hard multi-ply layers
06/14/1989EP0319926A2 A Method for the preparation of a diamond-clad machining tool
06/14/1989EP0319585A1 Process for forming thin film of oxide superconductor
06/13/1989US4839196 Photochemical film-forming method
06/13/1989US4839195 Coating blade for microtome and method for the preparation thereof
06/13/1989US4839145 Substrates mounted on rotatable susceptor; semiconductors
06/13/1989US4838990 Using gas mixture of fluorine source, fluorosilane, bromine source, weak oxygen source
06/13/1989US4838983 Advancing semiconductor substrate along circular path
06/13/1989CA1255547A1 Coating process for making non-iridescent glass structure
06/13/1989CA1255546A1 Multilayer coating and method
06/08/1989DE3840042A1 Vorrichtung zum chemischen bedampfen mittels laser unter verwendung von lichtleitfasern Chemical vapor deposition apparatus using a laser using optical fibers
06/08/1989DE3827069A1 Method for producing a superconductor
06/07/1989EP0319021A2 Apparatus for laser chemical vapour deposition
06/07/1989EP0318486A1 Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating.
06/06/1989US4837185 Pulsed dual radio frequency CVD process
06/06/1989US4837113 Method for depositing compound from group II-VI
06/06/1989US4837048 Vapor deposition using gaseous silicon compound and gaseous halogen oxidizing agent
06/06/1989US4836233 Method and apparatus for venting vacuum processing equipment
06/06/1989US4836140 Photo-CVD apparatus
06/06/1989US4836138 Heating system for reaction chamber of chemical vapor deposition equipment
06/06/1989US4836136 Developer supplying member
06/01/1989WO1989004881A1 Ic processed piezoelectric microphone
05/1989
05/31/1989EP0318395A2 An apparatus for metal organic chemical vapor deposition and a method using the same
05/31/1989EP0318008A2 High purity doping alloys
05/30/1989US4835114 Method for LPCVD of semiconductors using oil free vacuum pumps
05/30/1989US4835040 Continuous vapor deposition method for producing a coated glass article
05/30/1989US4835005 Silicon halide, silane, amorphous silicon, semiconductors, electrography
05/30/1989US4834023 Apparatus for forming deposited film
05/30/1989US4834022 CVD reactor and gas injection system
05/30/1989US4834020 Atmospheric pressure chemical vapor deposition apparatus
05/30/1989EP0270656A4 Vapour deposition of monomer fluids.
05/24/1989EP0317134A2 Coated article and method of manufacturing the article
05/24/1989EP0317019A2 Process for glow-discharge-activated reactive deposition of metal from the gas phase
05/24/1989EP0316598A1 Method and apparatus for controlling and/or monitoring a metal-plating process