Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1991
01/22/1991US4987002 Process for forming a crystalline diamond film
01/22/1991US4986215 Susceptor for vapor-phase growth system
01/22/1991US4986214 Thin film forming apparatus
01/22/1991CA1279411C Method and apparatus for forming thin film
01/16/1991EP0408535A1 Multi-oxide coated carbide body and method of producing the same
01/16/1991EP0408435A1 Perfection of tools for vapour phase infiltration of a material into the core of fibrous preforms relevant to the making of composites
01/16/1991CN1048571A Kind of moisturizing method for vaccumatic aluminizing paper and its equipment
01/16/1991CN1048568A Process for continuously forming large area functional deposited film by microwave pcvd method and apparatus suitable for practicing same
01/15/1991US4985281 Vaporizing mercury; depositing mercury-cadmium-tellurium semiconductor
01/15/1991US4985227 Method for synthesis or diamond
01/15/1991US4985117 Method of manufacturing josephson junctions
01/15/1991US4985109 Apparatus for plasma processing
01/15/1991US4984534 Method for synthesis of diamond
01/10/1991WO1991000613A1 A method and arrangement for treating silicon plates
01/10/1991DE3922539A1 Carbon fibre-reinforced carbon heating element prodn. - involves chemical gas phase infiltration with pyrolytic carbon
01/09/1991EP0407312A1 Apparatus for obtaining materials made of a substrate and a planar shaped coating of purified titanium
01/09/1991EP0407088A1 Amorphous semiconductor film and process for its production
01/09/1991EP0406995A1 TiN Thin film formation method
01/09/1991EP0406691A2 Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same
01/09/1991EP0406690A2 Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same
01/08/1991US4982693 Semiconductor wafer
01/08/1991CA1278727C Coated blade for microtome and method for the preparation thereof
01/02/1991EP0405875A1 Method for deposition of zinc sulfide films
01/02/1991EP0405634A2 Volatile organic barium, strontium and calcium compounds and method for the preparation of layered materials with barium, strontium or calcium oxides or fluorides from these compounds
01/02/1991EP0405451A1 Method for producing a polycrystalline silicon layer with definite grain size and texture on a substrat
01/02/1991EP0150204B1 Non-iridescent glass structure and coating process for making same
01/01/1991US4982068 Fluid permeable porous electric heating element
01/01/1991US4981818 Supported on silicon carbide interlayer
01/01/1991US4981724 Oxidation, semiconductors
01/01/1991US4981723 Chemical vapor deposition of tungsten silicide using silicon sub-fluorides
01/01/1991US4981722 Apparatus for the gas-phase processing of disk-shaped workpieces
01/01/1991US4981717 Diamond like coating and method of forming
01/01/1991US4981713 Plasma polymerization
01/01/1991US4981712 Method of producing thin-film electroluminescent device using CVD process to form phosphor layer
01/01/1991US4981671 Method for preparing diamond or diamond-like carbon by combustion flame
01/01/1991US4981222 Wafer boat
01/01/1991US4981103 Apparatus for forming a metal thin film utilizing temperature controlling means
01/01/1991US4981102 Chemical vapor deposition reactor and process
01/01/1991US4981071 Amorphous carbon-silicon alloy
12/1990
12/27/1990EP0404101A1 Method for depositing silicon dioxide film and product
12/27/1990EP0403986A1 Method for manufacturing substrates for depositing diamond thin films
12/27/1990EP0403915A1 Vinylidene fluoride polymers and vinylidene fluoride/trifluoroethylene copolymers
12/27/1990CA1278274C Coated blade for microtome and method for the preparation thereof
12/27/1990CA1278173C Process for adhering an oxide coating on a cobalt- enriched zone, and articles made from said process
12/25/1990US4980204 Semiconductor substrate rotated around its axis,
12/25/1990US4980203 Metal layer and metal oxide layer; corrosion resistance
12/25/1990US4980202 Chemical vapor deposition; noble gas induces formation of carbon interlayer between fibers and silicon carbide
12/25/1990US4980201 Method of forming tungsten carbide by chemical vapor deposition
12/25/1990US4980198 Laser CVD and plasma CVD of CrO2 films and cobalt doped CrO2 films using organometallic precursors
12/25/1990US4980196 Method of coating steel substrate using low temperature plasma processes and priming
12/25/1990US4980021 Exposure to hydrogen and hydrocarbon plasma to deposit carbonaceous coating and then etching by hydrogen plasma; improved incisiveness
12/25/1990US4979643 Chemical refill system
12/25/1990US4979545 Bubbler container automatic refill system
12/25/1990US4979467 Thin film formation apparatus
12/25/1990US4979466 Controlled heating; vapor deposition
12/25/1990US4979465 Apparatus for producing semiconductors
12/19/1990EP0403461A1 Coated cutting insert
12/19/1990EP0403418A2 High density plasma deposition and etching apparatus
12/19/1990EP0403005A2 Method for producing of oxide materials containing alkaline earth metals and coils produced therewith
12/19/1990EP0402798A2 Coating device
12/19/1990EP0402738A2 Nickel foam
12/19/1990EP0402675A1 Method and apparatus for forming non-columnar deposits by chemical vapor deposition
12/19/1990EP0402671A1 Tools employing a large or irregularly shaped diamond abrasive
12/19/1990EP0402568A2 Method of manufacturing a titanium magnetic disk substrate
12/19/1990EP0402368A1 Cvd process for depositing a layer on an electrically conductive thin-layer structure.
12/19/1990CN2067711U Gas seperating device for continuous processing equipment with multi-chamber
12/18/1990US4978600 Electrode and a method for the production of the same
12/18/1990US4978577 Infrared optical element of zinc selenide roughened with hydrogen sulfide before vapor deposition of zinc sulfide
12/18/1990US4978567 Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
12/18/1990US4977855 Apparatus for forming film with surface reaction
12/16/1990CA2010355A1 Method of manufacturing a titanium magnetic disk substrate
12/15/1990CA2012821A1 Tools employing a large or irregularly shaped diamond abrasive layer
12/13/1990WO1990015018A1 Coated dielectric material for an ozone generator
12/13/1990WO1990013687A3 Apparatus and method for treating flat substrates under reduced pressure
12/12/1990EP0402128A2 Method of forming an oxide superconductor/semiconductor junction
12/12/1990EP0402039A1 Method of depositing diamond and diamond light emitting device
12/12/1990EP0401602A1 Method and apparatus for forming coatings of finegrated and/or equiaxed grain structure and articles resulting therefrom.
12/12/1990EP0378543A4 Gas injector apparatus for chemical vapor deposition reactors
12/11/1990US4976996 Chemical vapor deposition reactor and method of use thereof
12/11/1990US4976930 Vapor deposition of chromium film into a glass substrate by using solid state ND-Yag laser
12/11/1990US4976610 Purge cantilevered wafer loading system for LP CVD processes
12/11/1990US4976216 For growing a semiconductor film in a substrate vapor-phase growth
12/08/1990CA2018464A1 Process for the production of thin oxide coatings
12/06/1990DE4012901A1 Titanium nitride layer prodn. - on semiconductor wafer in cold wall CVD chamber
12/05/1990EP0401141A1 Titanium nitride-coated particles and conductive compositions comprising such titanium nitride coated particles
12/05/1990EP0401035A2 Film forming apparatus and film forming method
12/05/1990EP0400947A1 Diamond growth
12/05/1990EP0400938A1 Carbon coating of optical fibres
12/05/1990EP0400560A1 Method of producing high density fiber reinforced composite material
12/04/1990US4975561 Heating system for substrates
12/04/1990US4975340 Process for making a thin molybdenum sulfide film and article
12/04/1990US4975324 Used in magnetic/optical recording media, computer, video tapes
12/04/1990US4975299 Vapor deposition process for depositing an organo-metallic compound layer on a substrate
12/04/1990US4975252 Semiconductor crystal growth apparatus
12/04/1990US4975147 Method of pretreating metallic works
12/04/1990US4974544 Vapor deposition apparatus
12/04/1990US4974543 Apparatus for amorphous silicon film
12/04/1990US4974542 Photochemical vapor reaction apparatus
12/04/1990CA1277442C Gas scavenger
11/1990
11/29/1990WO1990014158A1 Reaction chamber with controlled radiant energy heating and distributed reactant flow