Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1988
01/05/1988US4717443 Mass transport of indium phosphide
01/05/1988US4716852 Apparatus for thin film formation using photo-induced chemical reaction
12/1987
12/30/1987WO1987007848A1 Flash evaporation of monomer fluids
12/29/1987US4716071 Vapor deposition of thin titanium layer, then oxidation to titanium at interface
12/29/1987US4716064 Vapor deposition of exterior coating of titanium or silicon carbide, nitride or boride
12/29/1987US4716050 Chemical vapor deposition of aluminum on an activated surface
12/29/1987US4715940 Metallic strips with connecting bridges
12/29/1987US4715927 Amorphous semiconductors; microwave-generated plasma
12/29/1987US4715319 Device for coating a substrate by means of plasma-CVD or cathode sputtering
12/29/1987US4715318 For processing an element
12/29/1987US4715317 Method for producing of polycrystalline silicon and apparatus thereof
12/22/1987US4714660 Hard coatings with multiphase microstructures
12/22/1987US4714632 Method of producing silicon diffusion coatings on metal articles
12/22/1987US4714627 Vaporization under high vacuum
12/22/1987US4714589 Reactive vapor deposition, reflection of radiated heat
12/22/1987US4714047 Method and device for forming ultrafine particle film of compound
12/16/1987EP0249508A2 A masking member
12/16/1987EP0248883A1 Selective deposition process.
12/16/1987CN87104657A Method and system for manufacturing semiconductor device
12/16/1987CN87104656A Process and system for manufacture of semiconductor device
12/16/1987CN87102726A Method and apparatus for vapor deposition
12/15/1987US4713260 Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines
12/15/1987US4713259 Method for the glow-discharge-activated reactive deposition of electrically conductive material from a gaseous phase
12/15/1987US4713258 Method of forming ultrafine patterns
12/15/1987US4713123 Method of producing extra-low iron loss grain oriented silicon steel sheets
12/10/1987DE3718789A1 Transparenter leitender film und verfahren zu seiner herstellung Transparent conductive film and process for its preparation
12/09/1987EP0248274A2 Plasma surface treatment method and apparatus
12/08/1987US4711807 With argon content
12/08/1987US4711790 Optical CVD method with a strong optical intensity used during an initial period and device therefor
12/08/1987US4711197 For educting gas away from semiconductor wafers
12/03/1987WO1987007310A1 Deposition apparatus
12/03/1987WO1987007309A1 Deposition apparatus with automatic cleaning means and method of use
12/02/1987EP0247783A2 Method of refractory metal deposition
12/02/1987EP0247714A2 Method and apparatus for forming a film on a substrate
12/02/1987EP0247680A1 Process for producing a semiconductor device including the vapour phase deposition of layers on a substrate
12/01/1987US4710428 Sintered silicon carbide porous body impregnated with metallic silicon
12/01/1987US4710346 Method for manufacturing powder material and shaped products utilizing the conditions in outer space
12/01/1987US4709656 Layer forming apparatus
12/01/1987US4709655 Chemical vapor deposition apparatus
11/1987
11/26/1987DE3617428A1 Process and apparatus for preparing electrically conductive refractory building materials and use of these building materials
11/24/1987US4708884 Low temperature deposition of silicon oxides for device fabrication
11/24/1987US4708768 Semiconductor device fabrication process
11/19/1987EP0246211A2 Sintered body for chip forming machining
11/19/1987EP0245934A2 Low pressure chemical vapor deposition of metal silicide
11/19/1987EP0245764A1 An electrically conductive and oxidation-stable graphite electrode coated with silicon, and process for its production
11/19/1987EP0245716A1 Method and apparatus for forming doped optical preforms
11/19/1987EP0245600A2 Process for the plasma synthesis of hydride compounds and apparatus for carrying out said process
11/17/1987US4707586 Electro conductive film system for aircraft windows
11/17/1987US4707384 Method for making a composite body coated with one or more layers of inorganic materials including CVD diamond
11/17/1987US4707210 Plasma CVD apparatus
11/17/1987CA1229290A1 Manufacture of cadmium mercury telluride
11/12/1987DE3721254A1 Verfahren zur "in-situ" erfassung des thermochemischen randschichtwaermebehandlungszustandes waehrend des behandlungsvorganges metallischer werkstoffe Method for "in-situ" gathering of the thermochemical randschichtwaermebehandlungszustandes during the treatment process of metallic materials
11/11/1987EP0244968A2 Method for the thermal treatment of sintered metal permanent magnets
11/11/1987EP0244874A2 Luminescent material, process for producing it and luminescent semiconductor device using it
11/11/1987EP0244842A2 Apparatus for forming thin film
11/10/1987US4705913 Amorphous silicon devices and method of producing
11/10/1987US4705701 Conductive tin oxide methods
11/10/1987US4705700 Chemical vapor deposition method for the thin film of semiconductor
11/10/1987US4705659 Film formed on carbon layer, carbon then removed by oxidation
11/10/1987US4704988 Process and apparatus for obtaining a gaseous stream containing a compound in the vapor state, more particularly usable for introducing this compound into an epitaxy reactor
11/05/1987WO1987006762A1 Production of semiconductor devices
11/03/1987US4704339 Infra-red transparent optical components
11/03/1987US4704306 Method and mask for forming thin film
11/03/1987US4704300 Plasma chemical vapor deposition
11/03/1987US4703718 Vapor deposition apparatus and method of using same
10/1987
10/28/1987EP0243074A2 Process for forming deposited film
10/28/1987EP0242898A1 Apparatus comprising a plane susceptor rotating in parallel to a reference plane and arround an axis perpendicular to this plane
10/27/1987US4702960 Surface treatment for carbon and product
10/27/1987US4702936 Reacting silane with oxygen-containing gas to form silicon oxide, nitride or oxynitride film
10/27/1987US4702791 Vapor phase reaction of bismuth, or alkylated bismuth with metal compound
10/22/1987WO1987006275A1 Method for depositing materials containing tellurium
10/22/1987WO1987006273A2 Coating to protect against wear and fretting corrosion of, in particular, metal mechanical components held together by frictional adherence
10/21/1987EP0242207A2 Process for forming deposited film
10/21/1987EP0242182A2 Process for forming deposited film
10/21/1987EP0242100A2 Coated article and method of producing same
10/21/1987EP0241873A2 Fabrication of semiconductor devices utilizing patterned metal layers
10/20/1987US4701381 Manganese alloys, metal coatings
10/20/1987US4701379 Plasma discharge of a boron hydride; uniformity; smoothness
10/20/1987US4701347 Method for growing patterned metal layers
10/20/1987US4701344 Film forming process
10/20/1987US4701343 Method of depositing thin films using microwave energy
10/20/1987US4701317 Thermal decomposition of a diethynylbenzene in an inert carrier gas; graphitization
10/20/1987CA1228268A1 Vacuum deposition system with improved mass flow control
10/14/1987EP0241317A2 Process for forming deposited film
10/14/1987EP0241316A2 Method for forming crystalline deposited film
10/14/1987EP0241311A2 Process for forming deposited film
10/14/1987EP0241204A2 Method for forming crystalline deposited film
10/14/1987EP0241190A2 Method and apparatus for photodeposition of films on surfaces
10/13/1987US4699825 Low pressure vapor deposition; reacting a silane gas and ammonia
10/13/1987US4699805 In u-shaped injector tube coupled to vacuum pump
10/13/1987US4699800 Process for the production of superconducting fiber bundles
10/13/1987US4699799 Method for forming a deposition film
10/13/1987US4699082 Apparatus for chemical vapor deposition
10/08/1987WO1987005831A1 Hermetic coatings for optical fibers
10/07/1987EP0240314A1 Method for forming deposited film
10/07/1987EP0240309A2 Method for forming crystal and crystal article obtained by said method
10/07/1987EP0240306A1 Method for forming deposited film
10/07/1987EP0240305A2 Method for forming a deposited film
10/07/1987EP0239664A1 Process for producing layers containing silicon and oxide
10/07/1987CN86102741A Deposition of materials