Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1988
10/11/1988US4776918 Plasma processing apparatus
10/11/1988US4776863 Zirconium nitride overcoating
10/11/1988US4776298 Apparatus for performing a plasma enhanced chemical vapor deposition on an edge of a polycarbonate sheet
10/11/1988CA1242992A1 Cathode assembly with localized profiling capabilities
10/11/1988CA1242888A1 Method of and device for manufacturing optical fibres
10/06/1988WO1988007759A1 Thin film deposition process
10/06/1988WO1988007599A1 Composite diamond particles
10/06/1988WO1988007596A1 Process and installation for the chemical deposition of ultrahard coatings at moderate temperature
10/06/1988WO1988007487A1 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
10/05/1988EP0284693A2 Low temperature, plasma method of making plasma deposited coatings
10/05/1988CN88101708A Preparation of superconducting oxides and oxide-metal composites
10/05/1988CN88101465A Method of eliminating undesirable carbon product deposited on inside of reaction chamber for cvd
10/05/1988CN88100841A Microwave enhanced cvd method for coating prastic articles with carbon films and its products
10/04/1988US4775549 Method of producing a substrate structure for a large size display panel and an apparatus for producing the substrate structure
10/04/1988US4775203 Optical scattering free metal oxide films and methods of making the same
10/04/1988CA1242816A1 Vertical apparatus for continuous deposition of semiconductor alloys
10/04/1988CA1242810A1 Surface mounted circuits including hybrid circuits, having cvd interconnects, and method of preparing the circuits
10/04/1988CA1242616A1 Plasma chemical vapor depositions sio.sub.2 coated articles and plasma assisted chemical vapor deposition method of applying the coating
09/1988
09/28/1988EP0284436A2 Substrate-treating apparatus
09/28/1988EP0284190A2 Enhanced CVD method for deposition of carbon
09/28/1988EP0283874A1 Device for the production of a gas mixture by means of the saturation process
09/28/1988EP0211938A4 System and method for depositing plural thin film layers on a substrate.
09/28/1988EP0148898B1 Apparatus for plasma treatment of plate-shaped substrats
09/27/1988US4774129 Gas-sensitive composite material comprising metal and dielectric
09/27/1988US4773852 Multi-walled
09/27/1988US4773244 Apparatus for producing a substrate for a photoconductive members
09/22/1988DE3708171A1 Gems and method of producing them
09/21/1988EP0283311A2 Thin film forming method and thin film forming apparatus
09/21/1988EP0283007A2 Chemical vapour deposition apparatus having a perforated head
09/20/1988US4772570 Improved interface characteristics
09/20/1988US4772498 Silicon carbide capillaries
09/20/1988US4772486 Process for forming a deposited film
09/20/1988US4772485 Process control system of semiconductor vapor phase growing apparatus
09/20/1988US4772356 Gas treatment apparatus and method
09/20/1988US4772304 Transparent BN-type ceramic material and method of producing the same
09/13/1988US4771015 Vapor deposition of a band gap controlling semiconductor
09/13/1988US4770940 Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
09/13/1988US4770901 Process for formation of tin oxide film
09/13/1988US4770682 Device for manufacturing optical fiber preforms
09/13/1988US4770121 Semiconductor vapor phase growing apparatus
09/13/1988CA1241876A1 Apparatus and method for depositing coating onto porous substrate
09/13/1988CA1241875A1 Method for producing an aerosol stream
09/07/1988CN88101061A Microwave enhanced cvd method for depositing carbon
09/06/1988US4768464 Chemical vapor reaction apparatus
09/06/1988CA1241617A1 Method of making a photoconductive member and improved photoconductive members made thereby
09/06/1988CA1241571A1 Glass-surface microcarrier for anchorage-dependent cell cultivation
08/1988
08/31/1988EP0280539A1 A method of removing undesired carbon deposits from the inside of a CVD reaction chamber
08/31/1988EP0279898A1 Process for applying a protection layer against wear and tear and product manufactured accordingly
08/31/1988EP0279895A2 Device for producing a plasma and for treating substrates in said plasma
08/31/1988CN87105971A Low radiation film produced at high temp
08/30/1988US4767641 High frequency discharge between two electrodes
08/30/1988US4767608 Gas discharges, hydrogen, hydrocarbons, inert gases, decomposition, carbon sources, adiabatic expansion
08/25/1988WO1988006194A1 Energy intensive surface reactions using a cluster beam
08/24/1988EP0279406A2 Device for forming silicon oxide film
08/24/1988CN87105801A Cleaning technique for steel product before film-plating
08/23/1988US4766091 Vapor deposition of group 4 compound with halogenic oxidizing agent
08/23/1988US4766007 Applying thermal, electrical, or optical energy to silicon and hydrogen containing materials, while cooling electrode and inner wall of chamber
08/23/1988US4766006 Low temperature
08/23/1988US4765847 Method of treating the surface of iron alloy materials
08/17/1988EP0278836A2 Manufacture of a transparent electrical conductor
08/17/1988EP0278480A2 Microwave enhanced cvd method for coating plastic articles with carbon film
08/17/1988CN87107417A Multilayer ceramic coatings from silicate esters and metal oxides
08/16/1988US4764434 Diamond tools for rock drilling and machining
08/16/1988US4764421 Masking member
08/16/1988US4764398 Injection mixture of chemicals with carrier gas while controlling temperature
08/16/1988US4763602 Thin film deposition apparatus including a vacuum transport mechanism
08/16/1988US4763601 Continuous composite coating apparatus for coating strip
08/11/1988WO1988005697A1 Apparatus for coating glass
08/10/1988EP0277766A2 Process for producing devices containing silicon nitride films
08/10/1988EP0277680A1 Apparatus for enriching a carrier gas with the vapour of a less volatile substance
08/09/1988US4762808 Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes
08/09/1988US4762756 Thermochemical surface treatments of materials in a reactive gas plasma
08/09/1988US4762730 Method for producing transparent protective coatings from silicon compounds
08/09/1988US4762675 Boron, nuclear fuel rods
08/09/1988CA1240219A1 Light diffusive coating, a method of forming the coating, and a lamp having the coating
08/09/1988CA1240215A1 Fabrication of devices with a silicon oxide region
08/03/1988EP0276796A2 Gas feeding nozzle for a chemical vapor deposition apparatus
08/02/1988US4761308 Vapor deposition on fabrics or felts
08/02/1988US4761301 Electrical insulator for a plasma enhanced chemical vapor processor
08/02/1988US4761269 Apparatus for depositing material on a substrate
08/02/1988US4761171 Gas distributor beam with plenum and distribution slot surrounded by v-shaped cooling fluid chamber
07/1988
07/27/1988EP0276061A1 Rapid thermal chemical vapour deposition apparatus
07/27/1988EP0275978A2 A method for depositing composite coatings
07/27/1988EP0275977A2 Composite coatings
07/27/1988EP0275975A2 Ultrathin laminated oxide coatings
07/27/1988EP0275965A2 Plasma operation apparatus
07/27/1988EP0275474A1 Low emissivity film for high temperature processing
07/27/1988EP0275267A1 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates.
07/26/1988US4760008 Exciting a reactive gas, exposing drum to excited gas to be coated
07/26/1988US4760005 Amorphous silicon imaging members with barrier layers
07/26/1988US4759993 Plasma chemical vapor deposition SiO2-x coated articles and plasma assisted chemical vapor deposition method of applying the coating
07/26/1988US4759950 Discharging formed nickel carbonyl gas for flow into metallized zone to decompose, deposit decomposed nickel to the filament
07/26/1988US4759947 Method for forming deposition film using Si compound and active species from carbon and halogen compound
07/21/1988DE3743132A1 Verfahren zur herstellung von halbleitermaterial der gruppen ii und vi des periodischen systems durch chemische dampfablagerung metallorganischer verbindungen Process for the preparation of semiconductor material of the groups II and VI of the periodic table by chemical vapor deposition of organometallic compounds
07/19/1988US4758451 Process for producing coated molded bodies
07/14/1988WO1988005211A1 Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
07/14/1988WO1988005087A1 Optical cvd process
07/13/1988EP0274274A2 Multilayer ceramic coatings from silicate esters and metal oxides
07/13/1988EP0274239A1 Scratch resistant platinum article
07/12/1988US4756964 Barrier films having an amorphous carbon coating and methods of making