Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/1991
08/20/1991US5041303 Process for modifying large polymeric surfaces
08/20/1991US5041201 Plasma processing method and apparatus
08/20/1991US5041150 Process for coating glass
08/15/1991CA2035990A1 Low temperature plasma technology for corrosion protection of steel
08/14/1991DE4003904A1 Vorrichtung zum behandeln von substraten in einem durch mikrowellen erzeugten, gasgestuetzten plasma Device for treatment of substrates in a microwave-generated, plasma gasgestuetzten
08/14/1991DE4003882A1 Laser-induced photolytic reactive CVD - by multi-photon dissociation of monomolecular films on substrate surfaces
08/14/1991CA2034440A1 Cvd diamond workpieces and their fabrication
08/14/1991CA2034361A1 Polycrystalline cvd diamond substrate for single crystal epitaxial growth of semiconductors
08/13/1991US5040046 Layers of silicon dioxde or silicon nitride from diethylsilane
08/13/1991US5039836 Radiation manufacturing apparatus and method
08/13/1991US5039548 Plasma chemical vapor reaction method employing cyclotron resonance
08/13/1991US5039388 Plasma forming electrode and method of using the same
08/13/1991US5038840 Bubbler container automatic refill system
08/13/1991US5038713 Microwave plasma treating apparatus
08/13/1991US5038712 Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process
08/13/1991CA1287485C Apparatus for coating glass
08/07/1991EP0440384A1 Method of bonding a diamond film to a substrate
08/07/1991EP0440157A1 Process for producing a surface-coated blade member for cutting tools
08/07/1991EP0440154A1 Two step process for forming an oxide layer over a stepped surface of a semiconductor wafer
08/06/1991US5037775 Reacting vapor phase reducible compound with reducing agent
08/06/1991US5037704 Surface treatment with carbides, nitrides, carbonitrides
08/06/1991US5037666 High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure
08/06/1991US5037514 Introducing a silicon halide and oxygen into a chamber to form a silicon oxide layer containing halogen which neutralizes alkali ions
08/06/1991US5036794 CVD apparatus
07/1991
07/31/1991EP0391996A4 Temperature controlled distributor beam for chemical vapor deposition
07/31/1991CN1053511A Method for obtaining heterojunction semiconductor and super crystal lattice materials and equipments thereof
07/30/1991US5036373 Electric device with grains and an insulating layer
07/30/1991US5035923 Gradients
07/30/1991US5035917 Method of preparing layers of vinylidene fluoride polymers and vinylidene fluoride/trifluoroethylene copolymers on a substrate
07/25/1991WO1991010873A1 Heating apparatus for semiconductor wafers or substrates
07/25/1991DE4040035A1 Hard metallic carbon structure - with higher bulk modulus and hardness and lower density than diamond
07/24/1991EP0437890A1 Method for production of multicomponent materials
07/24/1991EP0437854A1 Atomized thin film forming apparatus
07/24/1991EP0437830A1 CVD diamond coated annulus components and method of their fabrication
07/24/1991EP0437704A2 Process for synthesizing diamond and diamond synthesis apparatus
07/23/1991US5034372 Plasma based method for production of superconductive oxide layers
07/23/1991US5034208 Process for preparing amorphous silicon
07/23/1991US5034086 Vacuum, microwave, magnetic field
07/23/1991US5033407 Low pressure vapor phase growth apparatus
07/23/1991CA1286550C Glass coating method and resulting article
07/23/1991CA1286494C Bubbler cylinder device
07/18/1991DE4000885A1 Sub-microscopic particles made of at least core material and coating - are produced by feeding core particles in carrier gas to coating zone
07/17/1991EP0437355A1 Process and apparatus for preparing a thin film electroluminescent device
07/17/1991EP0437196A1 Liquid source container device
07/17/1991EP0437110A2 Tungsten deposition process for low contact resistivity to silicon
07/17/1991CN1053137A Dial fabrication method by using semiconductor technology
07/17/1991CN1013208B Method and apparatus for surface treatment
07/17/1991CA2031098A1 Cvd diamond coated annulus components and method of their fabrication
07/16/1991US5032568 Deposition of superconducting thick films by spray inductively coupled plasma method
07/16/1991US5032435 UV absorption control of thin film growth
07/16/1991US5032366 Boron nitride boat and process for producing it
07/13/1991CA2033138A1 Superhard carbon metal
07/11/1991WO1991009995A2 Process for the deposition of thin films on solids
07/10/1991EP0436185A1 Process for forming SiO2 film with polysiloxane/ozone reaction
07/10/1991EP0436070A1 Chemical vapour deposition apparatus and method for forming thin film
07/10/1991CN1013124B Method of surface treatment and apparatus used therefor
07/09/1991US5030741 Cyclic organometallic compounds
07/09/1991US5030529 Layer containgin group VIII metal; lithium batteries
07/09/1991US5030476 Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition
07/09/1991US5030475 Plasma-enhanced CVD coating process
07/09/1991US5029598 Process for the uniform introduction of a fluid, and apparatus for carrying out the process
07/03/1991EP0435477A2 Method of integrated circuit manufacturing using deposited oxide
07/03/1991EP0435312A1 Hard and lubricant thin film of amorphous carbon-hydrogen-silicon, iron base metallic material coated therewith, and the process for producing the same
07/03/1991EP0435272A1 Diamond-coated bodies and process for preparation thereof
07/03/1991EP0435161A1 Process for producing a CVD-SiO2 film according to a TEOS-O3 reaction
07/03/1991EP0435088A1 Chemical vapor deposition method and apparatus therefor
07/03/1991EP0434966A1 Method for delivering a reactant to a glass soot deposition system.
07/03/1991CN1052707A Method of pretreating metallic works
07/02/1991US5028565 Process for CVD deposition of tungsten layer on semiconductor wafer
07/02/1991US5028452 Closed loop system and process for conversion of gaseous or vaporizable organic and/or organo-metallic compounds to inert solid matrix resistant to solvent extraction
07/02/1991US5028451 Method of producing sintered hard metal with diamond film
06/1991
06/27/1991WO1991009150A1 Method of and device for plasma treatment
06/27/1991WO1991009149A1 Gas phase selective beam deposition
06/27/1991WO1991009148A1 Device for vacuum treatment and device for and method of film formation using said device
06/27/1991DE4041901A1 Pyrolytic prodn. of poly:silicon rod - on starter filament held by protectively coated graphite holder
06/27/1991DE3942472A1 Beschichtungsverfahren Coating process
06/27/1991DE3942325A1 Protective coating for analysis cell - esp. for gas analysis by non-dispersive IR spectroscopy
06/26/1991EP0434299A1 Multi-layer coatings for reinforcements in high temperature composites
06/26/1991EP0434227A1 Selective area chemical vapour deposition
06/26/1991CN1013004B Electrophotographic photosensitive member, process and apparatus for preparation thereof
06/25/1991US5026661 Method of manufacturing zinc chalcogenide semiconductor devices using LP-MOCVD
06/25/1991US5026575 Growth of polycrystalline CaF2 via low temperature OMCVD
06/25/1991US5026574 Chemical vapor deposition process for depositing large-grain polysilicon films
06/25/1991US5025751 Solid film growth apparatus
06/23/1991WO1991009984A1 Coating process
06/23/1991CA2048669A1 Coating process
06/21/1991CA2031903A1 Multi-layer coatings for reinforcements in high temperature composites
06/19/1991EP0432794A1 Silicon carbide composite structure in use for cooking in a microwave oven
06/19/1991EP0432574A2 Heterocyclic organometal compounds
06/19/1991EP0432536A2 Magnetic recording medium and method for making it
06/18/1991US5024901 Method for depositing highly erosive and abrasive wear resistant composite coating system on a substrate
06/18/1991US5024889 Surface treatment for silicon carbide filaments and product
06/18/1991US5024716 Plasma processing apparatus for etching, ashing and film-formation
06/18/1991US5024182 Thin film forming apparatus having a gas flow settling device
06/13/1991WO1991008329A1 Apparatus for vapor-phase diamond synthesis and method for vapor-phase diamond synthesis
06/13/1991WO1991008323A1 Cvd deposition tunnel for a continuous cycle epitaxial reactor
06/13/1991WO1991008322A1 Process for chemical vapor deposition of transition metal nitrides
06/13/1991DE4039007A1 IR temp. measuring appts. - produces IR image for conversion into IR temp. distribution data
06/13/1991DE4009394A1 Heterocyclic organo-metal cpds. of aluminium, gallium or indium
06/12/1991EP0431160A1 Process for producing thin-film oxide superconductor