| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/08/1989 | EP0306140A1 Ultralightweight high operating temperature structures |
| 03/08/1989 | EP0306077A2 Process for the production of multilayer coated hard metal parts |
| 03/08/1989 | EP0306069A2 A method of forming an oxide layer on a substrate |
| 03/08/1989 | EP0305928A2 Method of depositing textured tin oxide |
| 03/08/1989 | EP0305917A2 High hardness fine grained tungsten-carbon alloys and process for making same |
| 03/08/1989 | EP0305903A1 Method for synthesis of diamond and apparatus therefor |
| 03/08/1989 | EP0305790A1 Production of graphite intercalation compound and doped carbon films |
| 03/08/1989 | EP0305573A1 Continuous composite coating apparatus for coating strip |
| 03/08/1989 | CN1031570A Method and apparatus for surface treatment |
| 03/07/1989 | US4810673 Integrated circuits |
| 03/07/1989 | US4810530 Method of coating metal carbide nitride, and carbonitride whiskers with metal carbides, nitrides, carbonitrides, or oxides |
| 03/07/1989 | US4810526 Method of coating a recrystallized silicon carbide body with a compact silicon carbide coating |
| 03/01/1989 | EP0305195A2 Continuous chemical vapor deposition growth of strain layer superlattices using conventional CVD reactors |
| 03/01/1989 | EP0305102A2 Coating flat glass by chemical vapor deposition |
| 02/28/1989 | US4808554 Glow discharge chemical vapor deposition in vacuum |
| 02/28/1989 | US4808553 Semiconductor device manufacturing method |
| 02/28/1989 | US4808258 High frequency voltage, semiconductor manufacture |
| 02/28/1989 | US4807562 Reactor for heating semiconductor substrates |
| 02/23/1989 | WO1989001479A1 Cyclic or bicyclic aluminium, gallium or indium organic compounds and their use for vapour deposition of metals on substrates |
| 02/23/1989 | DE3726568A1 Arrangement for manufacturing tubes consisting of semiconductor material |
| 02/22/1989 | EP0304220A1 Thin film carbon material and method of depositing the same |
| 02/22/1989 | EP0303911A1 Multiple, parallel packed column vaporizer |
| 02/22/1989 | CN1031298A Semiconductor bottom material |
| 02/21/1989 | US4806386 Method for forming deposited film |
| 02/21/1989 | US4806321 Use of infrared radiation and an ellipsoidal reflection mirror |
| 02/21/1989 | US4805556 Reactor system and method for forming uniformly large-diameter polycrystalline rods by the pyrolysis of silane |
| 02/21/1989 | CA1250309A1 Organogold complexes and a method of gold deposition |
| 02/15/1989 | EP0303508A2 Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films |
| 02/15/1989 | EP0303191A2 Method and apparatus for surface treatment |
| 02/15/1989 | EP0303030A1 Processing apparatus and method |
| 02/15/1989 | EP0302984A1 Coated hard metal body |
| 02/14/1989 | US4804605 Electrophotographic superlattice photoreceptor |
| 02/14/1989 | US4804560 Method of selectively depositing tungsten upon a semiconductor substrate |
| 02/14/1989 | US4804558 Depositing on substrate zinc compounds, organic selenium or sulfur compounds, oxidizing using halogen gases |
| 02/14/1989 | US4803948 Heat processing apparatus for semiconductor manufacturing |
| 02/14/1989 | US4803947 Apparatus for forming deposited film |
| 02/13/1989 | EP0301030A4 Hermetic coatings for optical fibers. |
| 02/09/1989 | WO1989001237A1 Semiconductor base material |
| 02/09/1989 | WO1989001055A1 Multiple, parallel packed column vaporizer |
| 02/09/1989 | WO1989001054A1 Surface deposition or surface treatment reactor |
| 02/08/1989 | EP0302552A2 Rotating anode for X-ray tubes |
| 02/08/1989 | EP0302506A2 Method and apparatus for fabricating superconductive thin films |
| 02/08/1989 | CN1030946A Apparatus for coating substate |
| 02/07/1989 | US4803139 Electrophotographic photoreceptor |
| 02/07/1989 | US4803127 Low temperature carbiding and nitriding, tools |
| 02/07/1989 | US4803095 Chemical vapor reaction process by virtue of uniform irradiation |
| 02/07/1989 | US4803093 Process for preparing a functional deposited film |
| 02/07/1989 | US4802441 Double wall fast cool-down furnace |
| 02/01/1989 | EP0301604A2 Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus |
| 02/01/1989 | EP0301567A2 Apparatus and method for the surface treatment of materials |
| 02/01/1989 | EP0301296A1 Plasma coating vessel with a shortened cycling time and facilitated cleaning |
| 02/01/1989 | EP0301030A1 Hermetic coatings for optical fibers. |
| 01/31/1989 | US4801474 Method for forming thin film multi-layer structure member |
| 01/31/1989 | US4801468 Active materials, decomposition, germanium-halogen compound, discharging |
| 01/31/1989 | US4801352 Processing of semiconductor wafer in the manufacture of integrated circuits |
| 01/26/1989 | WO1989000549A1 Apparatus for coating a substrate |
| 01/25/1989 | EP0300447A2 Method and apparatus for treating material by using plasma |
| 01/25/1989 | EP0300217A2 Processing apparatus and method |
| 01/25/1989 | CN1030616A Method of plasma enhanced silicon oxide deposition |
| 01/25/1989 | CN1030615A Plasma thin film deposition process control |
| 01/24/1989 | US4800174 Method for producing an amorphous silicon semiconductor device using a multichamber PECVD apparatus |
| 01/24/1989 | US4800173 Process for preparing Si or Ge epitaxial film using fluorine oxidant |
| 01/24/1989 | US4800105 Uniformity |
| 01/24/1989 | US4799451 Chemical vapor processing apparatus |
| 01/24/1989 | CA1249305A1 Method for synthesizing mgo-a1.sub.2o.sub.3- sio.sub.2 glasses and ceramics |
| 01/18/1989 | EP0299879A2 A superconducting thin film and a method for preparing the same |
| 01/18/1989 | EP0299754A2 Method of plasma enhanced silicon oxide deposition |
| 01/18/1989 | EP0299753A2 Controlled flow vaporizer |
| 01/18/1989 | EP0299752A2 Plasma thin film deposition process control |
| 01/18/1989 | EP0299249A1 Processing apparatus and method |
| 01/18/1989 | EP0299248A1 Processing apparatus and method |
| 01/18/1989 | EP0299247A1 Processing apparatus and method |
| 01/18/1989 | EP0299246A1 Processing apparatus and method |
| 01/18/1989 | EP0299245A1 Processing apparatus and method |
| 01/18/1989 | EP0299244A1 Processing apparatus and method |
| 01/18/1989 | EP0299243A1 Processing apparatus and method |
| 01/17/1989 | US4798739 Plasma-assisted method for thin film fabrication |
| 01/17/1989 | US4798166 Apparatus for continuously preparing a light receiving element for use in photoelectromotive force member or image-reading photosensor |
| 01/17/1989 | US4798165 Apparatus for chemical vapor deposition using an axially symmetric gas flow |
| 01/12/1989 | WO1989000335A1 Material-saving process for producing crystalline solid solutions |
| 01/12/1989 | WO1989000212A1 Quartz glass reactor for mocvd installations |
| 01/12/1989 | WO1989000148A1 Process for metal nitride deposition |
| 01/12/1989 | WO1989000080A1 Gas inlet for a plurality of various reaction gases in reaction vessels |
| 01/12/1989 | WO1988010420A3 Process for determining the edge layer condition of objects |
| 01/12/1989 | DE3721638A1 Materialsparendes verfahren zur herstellung von mischkristallen Material-saving process for preparing a mixed crystal |
| 01/12/1989 | DE3721637A1 Gaseinlass fuer eine mehrzahl verschiedener reaktionsgase in reaktionsgefaesse Gas inlet for a plurality of different reactive gases in reaktionsgefaesse |
| 01/11/1989 | EP0298866A2 A superconducting thin film and a method for preparing the same |
| 01/11/1989 | EP0298729A1 Cutting tool |
| 01/11/1989 | EP0298461A1 A superconducting coil and method for producing the same |
| 01/11/1989 | EP0298420A2 Apparatus for plasma treatment |
| 01/11/1989 | EP0298345A2 Method for preparing substrates for subsequent electroless metallization |
| 01/11/1989 | EP0298155A2 Method of forming refractory metal film |
| 01/11/1989 | EP0298126A1 Optical cvd process |
| 01/11/1989 | CN1030192A Method and system for vapor extraction from gases |
| 01/10/1989 | US4796562 Rapid thermal cvd apparatus |
| 01/04/1989 | EP0297845A2 Plasma assisted apparatus and method of diamond synthesis |
| 01/04/1989 | EP0297637A1 Method of treating surfaces of substrates with the aid of a plasma and a reactor for carrying out the method |
| 01/04/1989 | EP0297348A1 Method for chemical vapor deposition of copper, silver, and gold using a cyclopentadienyl metal complex |
| 01/04/1989 | CN2030203U Integrated fixture for crystal coating |
| 01/03/1989 | USH566 Apparatus and process for deposition of hard carbon films |