| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/11/1990 | EP0362952A1 Method of manufacturing an epitaxial indium phosphide layer on a substrate surface |
| 04/11/1990 | EP0362275A1 Fabrication of a semiconductor base material. |
| 04/11/1990 | EP0362207A1 Process and installation for the chemical deposition of ultrahard coatings at moderate temperature. |
| 04/11/1990 | CN1041189A Plasma processing method and apparatus |
| 04/11/1990 | CN1041188A Article coated with ceramic film |
| 04/11/1990 | CN1041187A Chemical gaseous deposition process of thin diamond film by means of arc discharge |
| 04/11/1990 | CN1007565B Method and system for manufacturing semiconductor device |
| 04/10/1990 | US4916507 Heavy doping with electroconductiv ions; doping resistance zones with inert gases |
| 04/10/1990 | US4916091 Plasma and plasma UV deposition of SiO2 |
| 04/10/1990 | US4916089 Process for the epitaxial production of semiconductor stock material |
| 04/10/1990 | US4916002 Forming aperture in dielectric on silicon substrate; anisotropic etching |
| 04/10/1990 | US4915988 Chemical vapor deposition of group IIA metals and precursors therefor |
| 04/10/1990 | US4915978 Listing 3 electrodes arranged in an evacuatable reaction chamber |
| 04/10/1990 | US4915777 Method for etching tungsten |
| 04/10/1990 | US4915728 Iron/cobalt alloy filaments |
| 04/10/1990 | US4915476 Single-notch rugate filters and a controlled method of manufacture thereof |
| 04/10/1990 | US4915057 Apparatus and method for registration of shadow masked thin-film patterns |
| 04/10/1990 | CA1267529A1 Masking member |
| 04/06/1990 | CA2000275A1 Process for the production of thin molybdenum sulfide films |
| 04/05/1990 | WO1990003453A1 Process for forming superconducting thin film |
| 04/05/1990 | WO1990003452A1 Chemical vapor deposition of silicon carbide |
| 04/04/1990 | EP0361542A1 Composite articles and process for their production |
| 04/04/1990 | EP0361206A1 An article coated with a ceramic film |
| 04/04/1990 | EP0361171A1 Process and apparatus for evaporating monomers liquid at room temperature |
| 04/03/1990 | US4914052 Process for the formation of a functional deposited film containing groups III and V atoms by microwave plasma chemical vapor deposition process |
| 04/03/1990 | US4913995 Amorphous silicon electrophotographic photoreceptor with an intermediate gradient layer and its method of preparation |
| 04/03/1990 | US4913993 Plasma-polymerized layer which is resistance to corona discharge, acids, moisture, and stiffness |
| 04/03/1990 | US4913936 Method of surface alloying sialon articles |
| 04/03/1990 | US4913929 In situ growth and deposition of layers on wafer |
| 04/03/1990 | US4913928 Electrical thin films; stabilization; window deposit prevention; reduced frequency |
| 04/03/1990 | US4913790 Temperature control in metal deposition |
| 04/03/1990 | US4913652 Pyrolytic boron nitride crucible and method for producing the same |
| 04/03/1990 | US4913090 Chemical vapor deposition apparatus having cooling heads adjacent to gas dispersing heads in a single chamber |
| 03/28/1990 | EP0360534A2 Microwave plasma treatment apparatus |
| 03/28/1990 | EP0360305A2 Process for producing particles of a composite material, and their use |
| 03/28/1990 | EP0359777A1 Process for etching with gaseous plasma. |
| 03/28/1990 | CN1007385B Electric insulation thin layer |
| 03/27/1990 | US4911989 Carbides, nitrides and carbonitrides in binder; hardness |
| 03/27/1990 | US4911805 Apparatus and process for producing a stable beam of fine particles |
| 03/27/1990 | US4911103 Wafers |
| 03/27/1990 | US4911102 Process of vapor growth of gallium nitride and its apparatus |
| 03/27/1990 | US4911101 Metal organic molecular beam epitaxy (MOMBE) apparatus |
| 03/22/1990 | WO1990002827A1 Photochemical deposition of high purity gold films |
| 03/22/1990 | WO1990002826A1 Temperature controlled distributor beam for chemical vapor deposition |
| 03/21/1990 | EP0359567A2 Plasma processing method and apparatus |
| 03/21/1990 | EP0359264A2 Hydrogenated amorphous materials and thin films thereof |
| 03/20/1990 | US4910436 Wide area VUV lamp with grids and purging jets |
| 03/20/1990 | US4910091 Mixture of tungsten and tungsten carbide on substrate |
| 03/20/1990 | US4910044 Ultraviolet light emitting device and application thereof |
| 03/20/1990 | US4910042 Thermal decomposition of a gas |
| 03/20/1990 | US4910041 Generated arced plasma; applying a magnetic field |
| 03/20/1990 | US4909914 Reaction apparatus which introduces one reacting substance within a convergent-divergent nozzle |
| 03/20/1990 | US4909184 Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process |
| 03/20/1990 | US4909183 Apparatus for plasma CVD |
| 03/14/1990 | EP0358545A2 Improvement in a process for producing thallium type superconducting thin film |
| 03/14/1990 | EP0357918A1 Process for depositing adherent silver films |
| 03/14/1990 | CN1040397A Liquid coating composition and chemical vapor deposition method |
| 03/13/1990 | US4908495 For use with semiconductor reactors |
| 03/13/1990 | US4908330 Hydrogen atoms in excited state are formed from hydrogen gas by means of microwave plasma generated in plasma generation chamber disposed in cavity in resonator integrated with impedance matching circuits |
| 03/13/1990 | US4908329 Microwave plasma generated in plasma generation chamber in cavity resonator integrated with impedance circuits for film formation |
| 03/13/1990 | US4908292 Placing substrate in reaction chamber, introducing reacting gas, irradiating with ultraviolet light |
| 03/13/1990 | US4908243 Apparatus to provide a vaporized reactant for chemical-vapor deposition |
| 03/13/1990 | US4908226 Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams |
| 03/13/1990 | US4907534 Gas distributor for OMVPE Growth |
| 03/08/1990 | WO1990002217A1 Elemental mercury source for metal-organic chemical vapor deposition |
| 03/07/1990 | EP0357263A1 Liquid coating composition and method for forming a fluorine-doped tin oxide coating on glass |
| 03/01/1990 | DE3928765A1 Chemische dampfabscheidung unter verwendung von disilan Chemical vapor deposition using disilane |
| 02/28/1990 | EP0355998A1 Glass ceramic substrate having electrically conductive film |
| 02/28/1990 | EP0355657A1 Method of depositing a tungsten film |
| 02/28/1990 | EP0355366A2 Process for manufacturing silicon boron nitride layers for integrated semiconductor circuits |
| 02/28/1990 | EP0355296A2 Tungsten-halophosphine complexes suitable for CVD, and process for their production |
| 02/28/1990 | CN1040122A Large area microwave plasma apparatus |
| 02/28/1990 | CN1040063A Apparatus for producing deposited of large area by using multiple kinds of active gases prepared individually |
| 02/27/1990 | US4904620 Vapor deposition of alternating layers, heat treatment, homogenizing |
| 02/27/1990 | US4904616 Method of depositing arsine, antimony and phosphine substitutes |
| 02/27/1990 | US4904419 Process and apparatus for vapor transfer of very high purity liquids at high dilution |
| 02/27/1990 | US4904337 Photo-enhanced pyrolytic MOCVD growth of group II-VI materials |
| 02/20/1990 | US4902535 Thin interlayer of non-reactive nobel metal and hard outer coating |
| 02/20/1990 | US4902533 Method for selectively depositing tungsten on a substrate by using a spin-on metal oxide |
| 02/20/1990 | US4902531 Vacuum processing method and apparatus |
| 02/20/1990 | US4901904 Method of producing brazing metals |
| 02/20/1990 | US4901670 Elemental mercury source for metal-organic chemical vapor deposition |
| 02/20/1990 | US4901669 Method and apparatus for forming thin film |
| 02/20/1990 | US4901668 Photo-chemical vapor deposition apparatus |
| 02/20/1990 | US4901667 Surface treatment apparatus |
| 02/14/1990 | EP0354853A2 Amorphous silicon photodiode and method of producing the same |
| 02/14/1990 | CN1039680A Process for forming functional deposited film |
| 02/14/1990 | CN1039625A Chemical vapor deposition of bismuth oxide |
| 02/13/1990 | US4901338 Graphite substrate with high melting metal focal track coating heat resistance, high voltage |
| 02/13/1990 | US4900591 Pyrolysis, vapor deposition; semiconductor dielectrics |
| 02/13/1990 | US4900588 Vapor deposition to coat from hydrocarbon gas |
| 02/13/1990 | US4900526 Polycrystalline rhombohedral boron nitride and method of producing the same |
| 02/13/1990 | US4900518 Gaseous organic/inorganic thermal cracker for vacuum chemical epitaxy |
| 02/13/1990 | US4900411 Method of preparing a high-purity polycrystalline silicon using a microwave heating system in a fluidized bed reactor |
| 02/13/1990 | US4900238 Scroll type compressor with releasably secured hermetic housing |
| 02/13/1990 | US4900110 Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon |
| 02/07/1990 | EP0353934A1 Optical fiber and apparatus for producing same |
| 02/07/1990 | EP0353818A1 Process for depositing organosilanes on substrates of silicon or silicon oxide for devices of EOS or CHEMFET type |
| 02/07/1990 | EP0353461A1 Chemical vapor deposition of bismuth oxide |
| 02/07/1990 | EP0353380A2 Refractory composite material and method of making such material |