Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1990
10/02/1990US4960073 Microwave plasma treatment apparatus
10/02/1990US4960071 Thin film forming apparatus
09/1990
09/26/1990EP0388957A2 Process for depositing tantalum oxide film and chemical vapor deposition system used therefore
09/26/1990EP0388861A2 Method for making diamond and apparatus therefor
09/26/1990EP0388800A2 Plasma reactor apparatus and method for treating a substrate
09/26/1990EP0388754A1 Method for obtaining superconducting oxide ceramic coatings on a substrate by means of a CVD-process
09/26/1990EP0388749A1 Titanium nitride removal method
09/26/1990EP0348496A4 Chemical vapor deposition of mixed oxide films
09/25/1990US4959345 Method of adding oxygen into oxide superconducting materials by ion injection
09/25/1990US4959245 Method of modifying a surface of a body using electromagnetic radiation
09/25/1990US4959244 Vapor deposition
09/25/1990US4958592 Resistance heater for diamond production by CVD
09/25/1990US4958591 Apparatus for forming a functional deposited film by means of plasma chemical vapor deposition
09/25/1990US4958590 Microwave traveling-wave diamond production device and method
09/20/1990WO1990010728A1 Method of producing thin film
09/20/1990WO1990010727A1 Metallo-organic adduct compounds
09/20/1990DE3908418A1 Process for the internal coating of plastic tanks, and device for the coating
09/19/1990EP0387943A1 Process and apparatus for the metered addition of a vapor phase substance in a reactor
09/19/1990EP0387656A1 Chemical vapor deposition method
09/19/1990EP0387456A2 Method for vapor-phase growth of an oxide thin film
09/19/1990EP0387403A1 Deposition of silicon oxide films using alkylsilane liquid sources
09/19/1990EP0387299A1 Ic processed piezoelectric microphone
09/18/1990US4957781 Thermal treatment of semiconductor wafers
09/18/1990US4957780 In situ generation of source gases
09/18/1990US4957777 Very low pressure chemical vapor deposition process for deposition of titanium silicide films
09/18/1990US4957775 Tungsten, molybdenum or titanium from halides; silicon or germanium compound, lasers, pyrolysis
09/18/1990US4957773 Deposition of boron-containing films from decaborane
09/18/1990US4957772 Semiconductors
09/18/1990US4957591 Method for preparing needle-like, fibrous or porous diamond, or an aggregate thereof
09/18/1990US4957543 Nickel carbonyl decomposition on open-cell decomposable foam structure, sintering
09/18/1990US4957062 Apparatus for plasma surface treating and preparation of membrane layers
09/18/1990CA1274214A1 Substrates coated with metal, simi-metal or carbon by plasma vapor
09/12/1990EP0387113A1 Process for the deposition of a ceramic coating on a metal substrate, and article coated by this process
09/12/1990EP0386658A2 Wear resistant coating for sharp-edged tools and the like
09/12/1990EP0386337A2 Multistep planarized chemical vapor deposition process
09/12/1990EP0386311A2 Method of producing corrosion-, heat- and wear-resistant member, and the member produced
09/12/1990EP0386225A1 Photochemical deposition of high purity gold films.
09/12/1990EP0256073B1 Plant for the chemical infiltration in vapor phase of a refractory material other than carbon
09/12/1990EP0172916B1 Film forming method
09/11/1990WO1990010725A1 Diamond-covered member and process for producing the same
09/11/1990USRE33326 Semiconductor vapor phase growing apparatus
09/11/1990US4956204 Process of forming a film by low pressure chemical vapor deposition
09/11/1990US4956201 Method of creating pasageways in niobium by CVD of niobium over sintered vanadium which is thereafter leached
09/11/1990US4956196 Method for producing a corrosion-resistant coating on the surface of lacquered workpieces
09/11/1990US4956000 Gradient lens fabrication
09/11/1990CA2029873A1 Diamond-coated member and process for the preparation thereof
09/07/1990WO1990010307A1 Novel glass deposition viscoelastic flow process
09/07/1990WO1990010098A1 A method and an apparatus for disposing epitaxial silicon and silicides
09/07/1990WO1990010093A1 A high capacity epitaxial reactor
09/07/1990WO1990010092A1 A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition
09/07/1990WO1990004320A3 Vapor deposition patterning method and products thereof
09/07/1990CA2011202A1 Wear resistant coating for sharp-edged tools and the like
09/05/1990EP0385772A2 Pyrolytic boron nitride
09/05/1990EP0385283A2 Process for coating hard metal substrates, and hard metal tool produced by the process
09/05/1990EP0330679A4 Sialon cutting tool composition
09/04/1990US4954371 Flash evaporation of monomer fluids
09/04/1990US4954367 Vapor deposition of bis-tributyltin oxide
09/04/1990US4953499 Apparatus for synthetic diamond deposition including curved filaments and substrate cooling means
09/04/1990US4953498 Microwave plasma CVD apparatus having substrate shielding member
09/04/1990US4953321 Fishhook and producing method of the same
08/1990
08/29/1990EP0384772A1 Diamond like coating and a method of forming the same
08/29/1990EP0384754A2 Localized vacuum apparatus and method
08/29/1990EP0384011A1 Diamond-coated sintered body excellent in adhesion and process for preparing the same
08/28/1990US4952425 Vapor deposition by passing gaseous hydride or halide through fluidized bed of high purity silicon
08/28/1990US4952423 Forming doped tin oxide layer
08/28/1990US4952420 Masking
08/28/1990US4952294 Apparatus and method for in-situ generation of dangerous polyatomic gases, including polyatomic radicals
08/28/1990US4951603 Apparatus for producing semiconductors
08/28/1990US4951602 Microwave plasma chemical vapor deposition apparatus for continuously preparing semiconductor devices
08/24/1990CA2009582A1 Diamond like coating and method of forming
08/23/1990WO1990009466A1 Modular continuous vapor deposition system
08/23/1990WO1990009465A1 Diamond synthesis
08/23/1990WO1990009463A1 Method for the deposition of at least one thickness of at least one decorative material to an object, and decorative object obtained by such method
08/23/1990DE3905417A1 Deposition of niobium and niobium-oxide layers - by plasma decomposition of organic niobium-cpds. in inert or reactive gas-ambient at low temps.
08/23/1990DE3905297A1 Process for producing polycrystalline semiconductor material layers by plasma-excited vapour phase deposition
08/22/1990EP0383665A1 Process of depositing a coating of a metallic nitride or carbonitride from the vapour phase under low temperature
08/22/1990EP0383550A2 Plasma forming electrode and method of using the same
08/22/1990EP0383491A2 A low pressure vapour phase growth apparatus
08/22/1990EP0382988A1 CVD apparatus
08/22/1990EP0382987A1 Gas supplying apparatus
08/22/1990EP0382985A1 Gas purge system
08/22/1990EP0225342B1 Method of producing transparent, haze-free tin oxide coatings
08/22/1990EP0216810B1 A process for manufacturing seal disk members having a low friction coefficient
08/21/1990US4950956 Plasma processing apparatus
08/21/1990US4950790 Chemical vapor deposition on films; electronics
08/21/1990US4950642 Method for fabricating superconducting oxide thin films by activated reactive evaporation
08/21/1990US4950624 Method of depositing films using photo-CVD with chamber plasma cleaning
08/21/1990US4950558 Oxidation resistant high temperature thermal cycling resistant coatings on silicon-based substrates and process for the production thereof
08/21/1990US4950543 Process for making a structural element subjected to thermal stress with a protective coating
08/21/1990US4950376 Method of gas reaction process control
08/21/1990US4949669 Gas flow systems in CCVD reactors
08/16/1990EP0382609A2 Method of manufacturing Josephson Junctions
08/16/1990EP0382341A1 Deposition of diamond films
08/16/1990EP0382065A2 Apparatus for plasma processing
08/16/1990EP0381819A1 Tool for processing elastomeres
08/16/1990EP0221184B1 Mask repairing apparatus
08/16/1990CA2010120A1 Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type
08/16/1990CA2010119A1 Deposition process of a coating of the ceramic type on a metallic substrate and element comprising a coating obtained by this procedure
08/14/1990US4948750 Method and apparatus for producing semiconductor layers composed of amorphous silicon-germanium alloys through glow discharge technique, particularly for solar cells
08/14/1990US4948629 Chemical vapor deposition using aliphatic acid or aromatic anhydride and high powered pulsed laser