Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1991
04/23/1991US5009928 Vapor deposition of first and second metal oxide film on textured substrate; electrode for solar cell; good trans-mission, orientation and low specific resistance
04/23/1991US5009920 Vapor deposition
04/23/1991US5009485 Multiple-notch rugate filters and a controlled method of manufacture thereof
04/23/1991CA1283282C Mask assembly having mask stress relieving feature
04/23/1991CA1283281C Apparatus and method for registration of shadow masked thin film patterns
04/20/1991CA2027883A1 Diffusion-plasma-assisted chemical treatment apparatus
04/20/1991CA2011037A1 Composite material of boron nitride and method for the preparation thereof
04/18/1991WO1991005074A1 Surface-coated hard member having excellent abrasion resistance
04/18/1991CA2027761A1 Method for preparing vaporized reactants for chemical vapor deposition
04/17/1991EP0422815A2 Reflectors for lamps
04/17/1991EP0422243A1 Method of forming polycrystalline film by chemical vapor deposition
04/16/1991US5008415 Volatile fluorinated β-ketoimines and associated metal complexes
04/16/1991US5008160 Method of securing adherent coatings by CVD from metal carbonyls, and articles thus obtained
04/16/1991US5008002 Hard carbon film formation by ionization plating of hydrocarbon
04/16/1991US5007689 Vapor-deposited boron phosphide
04/16/1991US5007374 Apparatus for forming thin films in quantity
04/16/1991US5007373 Plasma assisted deposition of diamond films
04/16/1991CA1283006C Method of making a device comprising a patterned aluminum layer
04/13/1991CA2027285A1 Method of forming a thin copper film by low temperature cvd
04/10/1991EP0421834A1 Process for depositing an amorphous, inorganic, protective coating on an organic polymer substrate
04/10/1991EP0421397A1 Diamond semiconductor device and method of manufacture
04/10/1991EP0421348A1 Film forming apparatus
04/10/1991EP0421276A2 Process and apparatus for coating parts with cubic bornitride or diamond
04/10/1991EP0421203A1 An integrated circuit structure with a boron phosphorus silicate glass composite layer on semiconductor wafer and improved method for forming same
04/10/1991EP0421075A1 Low pressure, low-temperature process for depositing silicondioxide
04/10/1991EP0228394B1 An apparatus for coating substrates by plasma discharge
04/10/1991EP0198842B1 Reactor apparatus for semiconductor wafer processing
04/09/1991US5006371 Depositing layer of tungsten, then layer of tungsten and tungsten carbide, repeating alternating layers
04/09/1991US5006363 Plasma assited MO-CVD of perooskite dalectric films
04/09/1991US5006203 Nucleating diamond film on polysilicon substrate by ion beam deposition or hydrocarbon pyrolysis, etching to remove graphitically bonded materials
04/09/1991US5005519 Reaction chamber having non-clouded window
04/09/1991CA1282732C Treatment of reaction gases by radio frequency plasma
04/04/1991WO1991004572A1 Substrate support device for cvd apparatus
04/04/1991WO1991004353A1 Vapor deposited diamond synthesizing method on electrochemically treated substrate
04/03/1991EP0420596A1 Gas feeding device and deposition film forming apparatus employing the same
04/03/1991EP0420595A2 Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride
04/03/1991EP0420117A2 Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
04/03/1991EP0419939A1 Apparatus for vaporizing and supplying organometal compounds
04/03/1991EP0419930A2 Particulate contamination prevention scheme
04/03/1991EP0419507A1 Dry exhaust gas conditioning
04/03/1991EP0419461A1 Wafer handling system with bernoulli pick-up
04/02/1991US5004708 Pyrolytic boron nitride with columnar crystalline morphology
04/02/1991CA1282367C Glow discharge metal deposition on non-conductor from organometallic compound
04/02/1991CA1282234C Apparatus for forming deposited film
03/1991
03/28/1991DE3931189A1 Gas flow contg. vapour of low volatility powder for CVD - obtd. using device where process can be continuous and containers having little residual powder can be refilled without disturbing gas flow
03/27/1991EP0419090A1 Carbon electrode
03/27/1991EP0419087A1 A process for the production of abrasives
03/27/1991EP0419053A1 Dielectric film deposition method and apparatus
03/27/1991EP0418837A1 Diamond synthesizing apparatus
03/27/1991EP0418592A1 Cleaning process for removal of deposits from the susceptor of a chemical vapor deposition apparatus
03/27/1991EP0418554A2 Chemical vapor deposition apparatus
03/27/1991EP0418468A1 Method for producing an ultra-thin dielectric for microelectronics applications
03/27/1991CA2026175A1 Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
03/26/1991US5003152 Microwave transforming method and plasma processing
03/26/1991US5003092 Forming complexes which are precursors for semiconductors
03/26/1991US5002804 Carbon black coating
03/26/1991US5002796 Process for forming functional zinc oxide films using alkyl zinc compound and oxygen-containing gas
03/26/1991US5002793 Vapor deposition, decomposition, microwaving; semiconductors
03/26/1991US5002011 Vapor deposition apparatus
03/26/1991US5002010 Vacuum vessel
03/21/1991WO1991003323A1 Plasma deposition of superconducting thick films
03/20/1991EP0418091A2 Preparation of high-purity thin film
03/20/1991EP0417997A1 Process for forming metal deposited film containing aluminum as main component by use of alkyl aluminum hydride
03/20/1991EP0417924A1 Synthetic diamond articles and their method of manufacture
03/20/1991EP0417512A1 Transparent diamond films and method for making
03/20/1991EP0417434A1 Apparatus for synthetic diamond deposition including curved filaments and substrate cooling means
03/20/1991EP0417306A1 Method of producing thin film
03/20/1991EP0417253A1 Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
03/20/1991EP0417202A1 Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate.
03/20/1991EP0417190A1 Silicon dioxide films on diamond
03/20/1991EP0417067A1 Energy intensive surface reactions using a cluster beam.
03/19/1991US5000831 Method of production of amorphous hydrogenated carbon layer
03/19/1991US5000113 Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
03/19/1991CA1281541C Installation for the chemical vapor infiltration of a refractory material other than carbon
03/16/1991WO1991004104A1 Converting organic/organometallic gaseous or vaporizable compounds to inert solids
03/16/1991CA2040436A1 Converting organic/organometallic gaseous or vaporizable compounds to inert solids
03/15/1991CA2021113A1 Transparent diamond films and method for making
03/13/1991EP0416887A2 Ceramic-coated metal sheet
03/13/1991EP0416824A2 Ceramics coated cemented carbide tool with high fracture resistance
03/13/1991EP0416813A2 Method to prevent backside growth on substrates in a vapor deposition system
03/13/1991EP0416400A1 Cleaning method for semiconductor wafer processing apparatus
03/13/1991EP0416251A2 Controlled method of manufacture of multiple-notch rugate filters
03/13/1991CN1049870A Process for continuously forming large area functional deposited film by microwave pcvd method and apparatus suitable for practicing same
03/12/1991US4999458 Electrical current lead-in device at a vacuum chamber
03/12/1991US4999223 Chemical vapor deposition and chemicals with diarsines and polyarsines
03/12/1991US4998979 Method for washing deposition film-forming device
03/12/1991US4998968 Plasma CVD apparatus
03/12/1991US4998503 Apparatus for forming functional deposited film by microwave plasma CVD process
03/07/1991WO1991003075A1 Gas substrate processing module
03/06/1991EP0415716A1 Synthetic resin window for automotive vehicles or the like
03/06/1991EP0415253A2 Thin film forming apparatus
03/06/1991EP0415217A1 Thermal land bound machine comprising a heat resistant member, a heat resistant composite structure and a method of producing the heat resistant composite structure.
03/06/1991EP0415191A1 System for controlling epitaxial grow rate in vertical provided with a frustum pyramid susceptor
03/06/1991EP0415122A2 Method and apparatus for film formation by high pressure microwave plasma chemical vapour deposition
03/06/1991EP0414842A1 Improved diamond deposition cell.
03/06/1991EP0414841A1 Diamond synthesis
03/06/1991EP0414797A1 Contactless heating of thin filaments.
03/06/1991EP0259414B1 Apparatus for thermal treatments of thin parts such as silicon wafers
03/05/1991US4997678 Trichloromethylsilane, oxidation, graphitization, carbiding
03/05/1991US4997677 Intermetallics