Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1989
11/23/1989EP0342806A1 Process for producing patterns in dielectric layers formed by plasma enhanced chemical vapor deposition (PECVD)
11/23/1989EP0342444A2 Cyclical organic-metal compounds
11/23/1989DE3831404C1 Process for the deposition of tin on substrate surfaces
11/21/1989US4882299 Deposition of polysilicon using a remote plasma and in situ generation of UV light.
11/21/1989US4882238 Die for use in forming lens
11/21/1989US4882224 Magnetic particles, method for making and electromagnetic clutch using same
11/21/1989US4882206 Decomposition of group iiib cyclopentadienyl compounds
11/21/1989US4882138 Method for preparation of diamond ceramics
11/21/1989US4881952 Method and apparatus for disposing dust produced during amorphous silicon film-forming process
11/16/1989WO1989011206A1 Plasma reactor
11/16/1989WO1989010983A1 Reaction vessel
11/16/1989DE3909161A1 Vorrichtung zur gaszufuehrung und -ableitung fuer die gasphasenbearbeitung von werkstuecken Apparatus for gaszufuehrung and outlet for the gas-phase processing of workpieces
11/15/1989EP0342113A1 Thin film formation apparatus
11/15/1989EP0342063A2 Process for preparing an electroluminescent film
11/15/1989EP0342009A2 Process for forming a superconducting film
11/15/1989EP0341589A2 Method of and apparatus for manufacturing a crystalline diamond film for use as an acoustic diaphragm
11/15/1989EP0341451A1 Filter device for waste gas stream at the gas phase deposition in semiconductor technic
11/15/1989EP0341365A1 A method of bonding a conductive layer on an electrode structure
11/14/1989US4880755 Silicon, aluminum, oxynitrides
11/14/1989US4880698 Tin oxide applied in chamber to improve optical qualities
11/14/1989US4880670 Copper deposition by complex decomposition
11/14/1989US4880664 Method of depositing textured tin oxide
11/14/1989US4880614 Ceramic thermal barrier coating with alumina interlayer
11/14/1989US4880492 Organometallic compounds
11/14/1989US4880163 Gas feeding nozzle for a chemical vapor deposition apparatus
11/14/1989US4879970 Coating hood for applying coating compound on containers
11/09/1989DE3814389A1 Method for diminishing residual gas in high-vacuum systems by getter layers and for generating these, and correspondingly coated high-vacuum systems
11/07/1989US4879140 Method for making pigment flakes
11/07/1989US4878989 Atomic hydrogen to scavenge carbon residues in semiconductors
11/07/1989US4878934 Pyrolysis
11/02/1989WO1989010335A1 A method of manufacturing perovskite lead scandium tantalate
11/02/1989EP0339992A1 Bonding diamond to diamond
11/02/1989EP0339845A2 System for automated real-time control of film deposition
11/02/1989EP0339526A1 Low-pressure plants operating with volatile toxic compounds
11/02/1989EP0339279A2 Method for making a wafer holder for use in rapid thermal processing equipment
10/1989
10/31/1989US4877753 In situ doped polysilicon using tertiary butyl phosphine
10/31/1989US4877651 Reacting di-tert-butylsilane with oxygen or ammonia
10/31/1989US4877650 Method for forming deposited film
10/31/1989US4877642 Microwave cavity resonator as reaction space
10/31/1989US4877641 Process for plasma depositing silicon nitride and silicon dioxide films onto a substrate
10/31/1989US4877509 Semiconductor wafer treating apparatus utilizing a plasma
10/31/1989US4877482 Removing nitride coatings from metal surfaces using a gaseous plasma containing a reactive fluorine species
10/31/1989US4876983 Plasma operation apparatus
10/25/1989EP0338417A2 Haze-free infrared-reflecting coated glass
10/25/1989EP0338206A1 Process for depositing conformal layers of tungsten onto semi-conductor substrates, for the production of integrated circuits
10/24/1989US4876178 Electroconductive film system for aircraft windows
10/24/1989US4876112 Decomposing metal carbonyl with ion beam
10/18/1989EP0337696A1 A surface-coated cemented carbide
10/18/1989EP0337036A1 A method for bonding a conductive layer on an electrode structure
10/18/1989EP0336979A1 Apparatus for thin film formation by plasma cvd
10/17/1989US4874930 Electroconductive film system for aircraft windows
10/17/1989US4874642 Method for depositing a hard, fine-grained, non-columnar alloy of tungsten and carbon on a substrate
10/17/1989US4874634 Passing gas stream of volatile tellurium compound over substrate in mercury vapor, switching on and off supply of cadmium compound, varying intensity of electromagnetic radiation applied
10/17/1989US4874631 Advancing web through series of deposition chambers within large evacuated chamber to apply different coatings without contamination
10/17/1989US4874222 Hermetic coatings for non-silica based optical fibers
10/17/1989US4873942 Plasma enhanced chemical vapor deposition wafer holding fixture
10/12/1989DE3809836A1 Modification of mould materials for pressing glass
10/11/1989EP0336672A2 Epitaxial deposition of thin films
10/11/1989EP0336623A2 Protective coatings for alloys
10/11/1989EP0336621A1 Metal oxide material
10/11/1989EP0221156B1 Method of making a device comprising a patterned aluminum layer
10/11/1989EP0191054B1 Methods of and apparatus for vapor delivery control in optical preform manufacture
10/11/1989CN1036233A Microwave plasma chemical vapour deposition apparatus
10/10/1989US4873152 Heat treated chemically vapor deposited products
10/10/1989US4873125 Method for forming deposited film
10/10/1989US4873119 Catalytic deposition of semiconductors
10/10/1989US4873118 Oxygen glow treating of ZnO electrode for thin film silicon solar cell
10/10/1989US4873115 Method of sythesizing carbon film and carbon particles in a vapor phase
10/10/1989US4872947 CVD of silicon oxide using TEOS decomposition and in-situ planarization process
10/10/1989CA1262294A1 Method of manufacturing a semiconductor device by vapour phase deposition using multiple inlet flow control
10/05/1989WO1989009294A1 Precursors for metal fluoride deposition and use thereof
10/04/1989EP0335769A2 Electroconducting glass and method of making the same
10/04/1989EP0335675A2 Large area microwave plasma apparatus
10/04/1989EP0335310A2 Formation of superconducting metal oxide film by pyrolysis
10/03/1989US4871691 Vapor phase reaction of silane and metal haoogenide; heat treatment
10/03/1989US4871581 Carbon deposition by ECR CVD using a catalytic gas
10/03/1989US4871580 Method of treating surfaces of substrates with the aid of a plasma
10/03/1989US4870923 Apparatus for treating the surfaces of wafers
10/03/1989CA1262086A1 Method of manufacturing semiconductor devices, in which material is deposited from a reaction gas, and apparatus for carrying out such a method
09/1989
09/28/1989DE3809010A1 Process for producing microcrystalline n- or p-conductivity type silicon layers according to the glow-discharge plasma technique, suitable for solar cells
09/27/1989EP0334791A1 Process for the preparation of silicon nitride
09/27/1989EP0334664A2 Recovery of lower-boiling silanes in A CVD process
09/27/1989EP0334638A1 Improvements relating to the formation of thin films
09/27/1989EP0334501A1 Process for producing graphite electrodes
09/27/1989EP0334374A2 Process of forming a superconductive wiring strip in low temperature ambient
09/27/1989EP0334109A1 Process and apparatus for the production of semiconducting layers made of silicium-germanium alloys by flow discharge technics and particularly of solar cells
09/27/1989EP0334000A2 Microwave plasma chemical deposition process for the production of a film containing mainly silicon and/or other group IV elements
09/27/1989CN1035855A Process for depositing film mainly comprising carbon
09/26/1989US4870388 Amorphous halogen, carbon matrix
09/26/1989US4870030 Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer
09/26/1989US4869976 High frequency glow discharges
09/26/1989US4869931 Vapor deposition, halogenic oxidizer
09/26/1989US4869930 Printed circuits
09/26/1989US4869927 Thermal decomposition of organometallic compound in high boiling solvent
09/26/1989US4869924 Microwaves from plurality of directions
09/26/1989US4869923 Chemical vapor deposition
09/26/1989US4869922 Method of coating with polyfluorocarbons
09/26/1989CA1261686A1 Chemical vapor deposition method of producing fluorine-doped tin oxide coatings
09/26/1989CA1261632A1 Method and apparatus for on-line coating of drawn optical fibres
09/26/1989CA1260776A1 Process and apparatus for pyrolytically coating glass
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