Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/1991
03/05/1991US4996942 Rotatable substrate supporting susceptor with temperature sensors
03/05/1991CA1281082C Apparatus for producing a plasma and for the treatment of substrates therein
03/01/1991WO1991003328A1 Chemical vapor deposition system cleaner
03/01/1991CA2065329A1 Chemical vapor deposition system cleaner
02/1991
02/28/1991DE3927726A1 Epitaxial layer deposition - using reactor in room partitioned by wall from clean room for loading-unloading
02/27/1991EP0414562A2 A method of monitoring a process of growing a film of silicon dioxide doped with phosphorus
02/27/1991EP0414270A2 Fuel cell utilizing solidous electrolyte
02/27/1991EP0414267A2 Process for deposition of a tungsten layer on a semiconductor wafer
02/27/1991EP0414038A2 Process and apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer
02/27/1991EP0413974A1 Method of making a single crystal CVD diamond
02/27/1991EP0413834A1 Diamond-covered member and process for producing the same
02/27/1991CN1049530A Method and apparatus for continuously forming functional deposited films with large area by microwave plasma cvd method
02/26/1991US4996079 Method of depositing thin films consisting mainly of carbon
02/26/1991US4996077 Electron cyclotron resonance apparatus; multiple energy/ excitation source; intergrated circuits
02/26/1991US4995341 Microwave plasma CVD apparatus for the formation of a large-area functional deposited film
02/26/1991US4995340 Glass coating apparatus
02/26/1991CA2023221A1 Synthetic diamond articles and their method of manufacture
02/21/1991WO1991002107A1 Method for laser induced chemical vapor deposition on a substrate
02/21/1991WO1991002105A1 Device for depositing a material on a heat-conducting substrate
02/21/1991WO1991002104A1 Process for making cages for the vapour-deposition of thin films
02/21/1991WO1991001623A1 Process and apparatus for coating small solids
02/21/1991DE3927135A1 Chemical vapour depositing microcrystalline solid particles - by sucking plasma gas through opening or pores of substrate to concentrate energy supply and increase pptn. field
02/21/1991DE3927132A1 Free-standing thin film prodn. - by gas phase precipitating onto loose particulate ancillary substrate
02/20/1991EP0413617A1 Method for depositing thin layers
02/20/1991EP0413394A1 Method for obtaining polycrystallinic diamond layers
02/20/1991EP0413389A1 Process for the deposition of microcrystalline solid particles from the gas phase by chemical vapour deposition
02/20/1991EP0413282A2 Method and apparatus for producing magnetically-coupled planar plasma
02/20/1991EP0413023A1 A method and an apparatus for disposing epitaxial silicon and silicides
02/20/1991CN2071649U Apparatus for descaling and coating organic film for rb-fe-b products
02/19/1991US4994301 ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate
02/19/1991US4994221 Method for the production of a carbon electrode
02/19/1991US4994141 Method of manufacturing a mask support of SiC for radiation lithography masks
02/19/1991US4993361 Chemical vapor deposition
02/19/1991US4993360 Vapor growth apparatus having a diffuser section containing a flow regulating member
02/19/1991US4993358 Chemical vapor deposition reactor and method of operation
02/19/1991US4993355 Susceptor with temperature sensing device
02/13/1991EP0412644A2 Low temperature low pressure thermal CVD process for forming conformal group III and/or group V-doped silicate glass coating of uniform thickness on integrated structure
02/13/1991EP0412301A1 Boron nitride membrane in wafer structure
02/12/1991US4992306 Heating in a source of oxygen; low temperature process
02/12/1991US4992305 Decomposign organometallic compound by contact with heated substrate
02/12/1991US4992299 Low pressure chemical vapor deposition
02/12/1991US4992082 Method of toughening diamond coated tools
02/12/1991US4991822 Valve having ceramic valve bodies with low friction coatings
02/12/1991US4991542 Method of forming a thin film by plasma CVD and apapratus for forming a thin film
02/12/1991US4991541 Device and process for treating fine particles
02/12/1991US4991540 Quartz-glass reactor for MOCVD systems
02/12/1991CA1280055C Vapor deposition apparatus
02/06/1991EP0411910A2 Lightweight structures and methods for the fabrication thereof
02/06/1991EP0411875A1 Method of producing finely divided particles or powder, vapour or fine droplets, and apparatus therefor
02/06/1991EP0411795A1 Anisotropic deposition of silicon dioxide
02/06/1991EP0411646A1 High erosion/wear resistant multi-layered coating system
02/06/1991EP0411435A1 Apparatus for synthesizing diamondlike thin film
02/06/1991EP0411424A1 Apparatus for synthetic diamond deposition including spring tensioned filaments
02/06/1991EP0411317A2 Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD
02/06/1991EP0411298A1 Method for improving adhesion of synthetic diamond coatings to substrates
02/06/1991EP0411079A1 Method for the deposition of at least one thickness of at least one decorative material to an object, and decorative object obtained by such method.
02/05/1991US4990403 Diamond coated sintered body
02/05/1991US4990374 Selective area chemical vapor deposition
02/05/1991US4990372 Vapor deposition of tungsten, then tungsten carbide
02/05/1991US4990371 Process for coating small solids
02/05/1991US4990365 Vapor depositing in alternating electromagnetic field
02/05/1991US4990363 Method of producing very adhesive metallic structures on fluorine polymers and thermoplastic synthetic materials
02/05/1991US4990362 Removing surface layer titanium plate; forming a nonmagnetic transition metal film
02/05/1991US4990286 Zinc oxyfluoride transparent conductor
02/05/1991US4990229 High density plasma deposition and etching apparatus
02/05/1991US4989544 Apparatus for forming functional deposited films by way of hybrid excitation
02/05/1991US4989543 Process and means for producing films for use in electronics and/or optoelectronics using plasma
02/05/1991US4989542 Apparatus for synthesizing diamond
02/05/1991US4989541 Thin film forming apparatus
02/05/1991US4989540 Apparatus for reaction treatment
02/03/1991CA2022065A1 High erosion/wear resistant multi-layered coating system
02/03/1991CA2019697A1 Lightweight structures and methods for the fabrication thereof
02/03/1991CA2015513A1 Apparatus for synthetic diamond deposition including spring-tensioned filaments and substrate cooling means
02/03/1991CA2014922A1 Apparatus for synthetic diamond deposition including curved filaments and substrate cooling means
01/1991
01/31/1991DE3923968A1 Sepn. layer contg. metalloid and transition metal cpds. - for protecting dental alloys against temp. corrosion of oxygen and nitrogen
01/31/1991CA2014913A1 Method for improving adhesion of synthetic diamond coatings to substrates
01/30/1991EP0410781A1 Process for preparing carbon material
01/30/1991EP0410706A2 Low-temperature plasma processor
01/30/1991EP0410442A1 Chemical vapor deposition reactor and method of operation
01/30/1991EP0410401A1 Method for coating a surface of a substrate
01/30/1991EP0156857B1 Method and apparatus for coating a substrate
01/29/1991US4988642 Supporting a substrate, vapor deposition, transportation, microwaves and magnetism, electrical discharging
01/29/1991US4988640 Method of doping and implanting using arsine, antimony, and phosphine substitutes
01/29/1991US4988573 Medium related members
01/29/1991US4988564 Metal carbide, nitride, or carbonitride whiskers coated with metal carbides, nitrides, carbonitrides, or oxides
01/29/1991US4988533 Method for deposition of silicon oxide on a wafer
01/29/1991US4988421 Vapor deposition, diamond particles, adhesion, binders, sputtering
01/29/1991US4988415 Method of producing an anti-wear coating including a chromium layer on a surface of a structural part of titanium or titanium-based alloy
01/29/1991US4987856 High throughput multi station processor for multiple single wafers
01/29/1991US4987855 Reactor for laser-assisted chemical vapor deposition
01/23/1991EP0409733A1 Carbonaceous material protected against oxidation by boron carbonitrides
01/23/1991EP0409693A1 Method of obtaining an insulating coating of chromium oxide between the pellets and the cladding of a nuclear fuel element and nuclear fuel element having such an insulating coating
01/23/1991EP0409603A1 Process and apparatus for chemical vapour deposition
01/23/1991EP0408753A1 Process for forming superconducting thin film
01/23/1991EP0182889B1 Method for producing diamond-like carbon layers
01/23/1991CN2070037U Photochemical vapour deposition equipment
01/22/1991US4987016 Component for producing semiconductor devices and process of producing it
01/22/1991US4987010 Method for manufacturing a film resistor
01/22/1991US4987005 Chemical vapor processing method for deposition or etching on a plurality of substrates
01/22/1991US4987004 Sputtering hard carbon films