| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/12/1988 | US4756927 Introducing gas mixture of tungsten, molybdenum, or titanium compound and silicon or germanium compound into chamber, subjecting to laser irradiation to form refractory metal pattern on semiconductor substrate |
| 07/12/1988 | US4756272 Multiple gas injection apparatus for LPCVD equipment |
| 07/12/1988 | CA1239230A1 High temperature furnace for integrated circuit manufacture |
| 07/06/1988 | EP0273741A2 Plasma apparatus |
| 07/06/1988 | EP0273573A2 Method and apparatus for circulating bed coater |
| 07/06/1988 | EP0273562A2 A method for the production of a carbon electrode |
| 07/06/1988 | EP0273470A2 Method for decontamination of a chamber used in vacuum processes for deposition, etching and/or growth of high purity films, particularly applicable to semiconductor technology |
| 07/05/1988 | US4755654 Semiconductor wafer heating chamber |
| 07/05/1988 | CA1238822A1 Method for the manufacture of metal silicide layers by means of reduced pressure gas phase deposition |
| 06/29/1988 | EP0272418A2 Apparatus and process to condensate diamond |
| 06/28/1988 | US4753856 Multilayer ceramic coatings from silicate esters and metal oxides |
| 06/28/1988 | US4753818 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates |
| 06/28/1988 | CA1238558A1 Method of forming a nitride layer |
| 06/27/1988 | EP0173715A4 Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby. |
| 06/22/1988 | EP0272140A2 TEOS based plasma enhanced chemical vapor deposition process for deposition of silicon dioxide films. |
| 06/21/1988 | CA1238292A1 Producing aircraft windows with electroplated masked strike coat |
| 06/16/1988 | WO1988004333A1 Production of silicon carbide |
| 06/15/1988 | EP0270991A2 Apparatus for forming thin film |
| 06/15/1988 | EP0270656A1 Vapour deposition of monomer fluids. |
| 06/14/1988 | US4751372 Vacuum chamber heater apparatus |
| 06/14/1988 | US4751149 Using organozinc compound and water |
| 06/14/1988 | US4751109 A process for depositing a composite ceramic coating on a hard ceramic substrate |
| 06/14/1988 | US4751101 Alternating plasma deposition of amorphous silicon with exposure to tungsten hexafluorode; thickness |
| 06/14/1988 | US4751099 Method of producing a functionally gradient material |
| 06/07/1988 | US4749630 Cobalt-tungsten carbide core; borating, vapor deposition of nitrides, oxides; a cutting bit |
| 06/07/1988 | US4749629 Ultrathin laminated oxide coatings and methods |
| 06/07/1988 | US4749597 Thin layer deposition, annealing, thick layer application; reduction of alteral encroachment and silicon consumption |
| 06/07/1988 | US4749588 High speed film forming by glow discharge of a disilane depending on rate of gas flow |
| 06/07/1988 | US4749587 Low voltage electric arc chemical vapor deposition |
| 06/01/1988 | DE3739450A1 Verfahren zum ausbilden einer dotierten verbindungshalbleitereinkristallschicht A method of forming a doped compound semiconductor single crystal layer |
| 05/31/1988 | US4748135 Method of manufacturing a semiconductor device by vapor phase deposition using multiple inlet flow control |
| 05/31/1988 | US4748045 Method and apparatus for photodeposition of films on surfaces |
| 05/31/1988 | US4747368 Chemical vapor deposition apparatus with manifold enveloped by cooling means |
| 05/31/1988 | US4747367 Method and apparatus for producing a constant flow, constant pressure chemical vapor deposition |
| 05/25/1988 | EP0268230A2 Silicon carbide capillaries |
| 05/25/1988 | CN87107779A Microware enhanced cvd method and apparatus |
| 05/24/1988 | US4746563 Titanium nitrides, carbides and oxides |
| 05/24/1988 | US4746549 Selective vapor deposition |
| 05/24/1988 | US4746548 Thin-film display panels |
| 05/24/1988 | US4746547 Rapid transportation to prevent agglomeration of small particles |
| 05/24/1988 | US4746538 Process for depositing a thin layer of a material on the wall of a hollow body |
| 05/24/1988 | CA1237047A1 Gas supplying apparatus |
| 05/24/1988 | CA1236970A2 Chemical vapor deposition apparatus |
| 05/18/1988 | EP0267679A1 Coated article and method of manufacturing the article |
| 05/18/1988 | EP0267513A2 Microwave enhanced CVD method and apparatus |
| 05/17/1988 | US4745088 Vapor phase growth on semiconductor wafers |
| 05/17/1988 | US4745035 Article having a wear resisting precious metal coating |
| 05/17/1988 | US4745010 Multilayer wear resistant coatings |
| 05/17/1988 | US4745007 Multilayer tantalum carbide on tantalum for semiconductors |
| 05/17/1988 | US4745000 Method of fabricating electrostatic drums using microwave energy |
| 05/11/1988 | CN87104911A Fluoride-bearing organic compound of tin used to form stannic oxide with fu |
| 05/10/1988 | CA1236352A1 Method of making an electrode |
| 05/04/1988 | EP0266288A2 Vacuum processing method and apparatus |
| 05/03/1988 | US4741928 Infrared barriers |
| 05/03/1988 | US4741925 One step |
| 05/03/1988 | US4741919 Process for preparation of semiconductor device |
| 05/03/1988 | US4741801 Hydrogenated amorphous silicon coating on electrroconductive substrate |
| 04/27/1988 | EP0265246A2 Magnetic iron oxide film and production thereof |
| 04/27/1988 | EP0264913A2 Plasma processing apparatus |
| 04/27/1988 | EP0264722A2 Process for preparing amorphous silicon |
| 04/27/1988 | EP0264505A1 Method for forming a deposited film |
| 04/27/1988 | EP0264448A1 Method of treating the surface of iron alloy materials. |
| 04/26/1988 | US4740606 Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films |
| 04/26/1988 | US4740442 Vapor deposition of hydrogenated germanium carbide; bias voltage, glow discharge plasma |
| 04/26/1988 | US4740429 Metal-ceramic joined articles |
| 04/26/1988 | US4740267 Energy intensive surface reactions using a cluster beam |
| 04/26/1988 | US4740263 Vapor deposition, electron bombardment |
| 04/26/1988 | CA1235630A1 Etching techniques |
| 04/21/1988 | WO1988002792A1 Process for depositing layers of diamond |
| 04/20/1988 | EP0264227A2 Rubber member in windshield wiper |
| 04/20/1988 | EP0264177A2 Gas scavenger |
| 04/20/1988 | EP0264024A1 Coated oxidation resistant porous abrasive compact and method for making same |
| 04/19/1988 | US4738689 Polycrystalline self-boned diamond particles with metal coating |
| 04/19/1988 | US4738272 Vessel and system for treating wafers with fluids |
| 04/14/1988 | DE3733499A1 Verfahren und vorrichtung fuer die ablagerung aus der dampfphase Method and apparatus for the deposition from the vapor phase |
| 04/13/1988 | EP0263788A1 Process and apparatus for depositing hydrogenated amorphous silicon on a substrate in a plasma environment |
| 04/13/1988 | EP0263747A1 Surface coated tungsten carbide-base sintered hard alloy material for inserts of cutting tools |
| 04/13/1988 | EP0263141A1 Method for depositing materials containing tellurium. |
| 04/12/1988 | US4737388 Non-iridescent, haze-free infrared reflecting coated glass structures |
| 04/12/1988 | US4737379 Plasma deposited coatings, and low temperature plasma method of making same |
| 04/12/1988 | US4736705 Gas injection via slotted hollow rods surrounded by stacked channeled plates |
| 04/12/1988 | CA1235234A1 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
| 04/12/1988 | CA1234972A1 Chemical vapor deposition wafer boat |
| 04/06/1988 | EP0262980A2 Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes |
| 04/06/1988 | EP0262323A2 Process for the interior coating of electrically non-conducting hollow bodies |
| 04/05/1988 | US4736304 Method and apparatus for operating one or more deposition systems |
| 04/05/1988 | US4735856 Sealing with ceramics |
| 04/05/1988 | US4735822 Method for producing an electronic device having a multi-layer structure |
| 04/05/1988 | US4735821 Method for depositing material on depressions |
| 04/05/1988 | US4735699 Methods of depositing germanium carbide |
| 04/05/1988 | US4735633 Method and system for vapor extraction from gases |
| 04/05/1988 | US4734999 Cylinder for metal organic chemical vapor deposition |
| 04/05/1988 | CA1234822A1 Volatile metal complexes |
| 03/31/1988 | DE3730086A1 Microwave-plasma CVD appts. - with multi-element microwave inlet window having cavity resonance structure |
| 03/30/1988 | EP0261973A1 Device and process for treating fine particles |
| 03/30/1988 | EP0261922A2 Electrode assembly and apparatus |
| 03/30/1988 | EP0261741A2 Process for the preparation of pyrolitic graphite |
| 03/30/1988 | EP0107556B1 Process for manufacturing an electrical resistor having a polycrystalline semiconductor material, and integrated circuit device comprising this resistor |
| 03/29/1988 | US4734514 Hydrocarbon-substituted analogs of phosphine and arsine, particularly for metal organic chemical vapor deposition |
| 03/29/1988 | US4734340 Dielectric thin film |