| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/29/1988 | US4734339 Diamond coating |
| 03/24/1988 | DE3727542A1 Device for forming a functional deposition layer by means of a microwave plasma deposition method |
| 03/23/1988 | EP0260718A2 An X-ray-transparent membrane and its production method |
| 03/23/1988 | EP0260534A1 Metallorganic compounds |
| 03/23/1988 | CN87106283A Cvd apparatus |
| 03/23/1988 | CN86106364A Method and device for the preparation of protective layer by plasma deposition |
| 03/22/1988 | US4732793 Method and apparatus for laser-induced CVD |
| 03/22/1988 | US4732761 Applying high frequency bias voltage to gas mixture-perpendicular impingement onto substrate |
| 03/22/1988 | US4732110 Inverted positive vertical flow chemical vapor deposition reactor chamber |
| 03/16/1988 | EP0260097A1 CVD method and apparatus |
| 03/16/1988 | EP0259825A2 Process and apparatus for edge-hardening work pieces |
| 03/16/1988 | EP0259792A1 Process for the production of thermally stressed structural elements with a protective layer |
| 03/16/1988 | EP0259791A1 Process for the production of work pieces with a surface layer of carbon |
| 03/16/1988 | EP0259759A2 Method for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers |
| 03/16/1988 | EP0259418A1 Methods for applying simultaneously on a plurality of integrated circuit boards a film having a uniform thickness and consisting of arsenic or germanium selenide glass sensitized by a silver salt |
| 03/16/1988 | EP0259414A1 Apparatus for thermal treatments of thin parts such as silicon wafers. |
| 03/16/1988 | EP0259311A1 Deposition of materials |
| 03/15/1988 | US4731462 Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating |
| 03/15/1988 | US4731302 Hard coatings for mechanically and corrosively stressed elements |
| 03/15/1988 | US4731296 Diamond-coated tungsten carbide-base sintered hard alloy material for insert of a cutting tool |
| 03/15/1988 | US4731255 Gas-phase growth process and an apparatus for the same |
| 03/09/1988 | EP0258966A2 Multi-chamber deposition system |
| 03/08/1988 | US4729341 Method and apparatus for making electrophotographic devices |
| 03/03/1988 | DE3726775A1 Abscheidung duenner schichten Deposition of thin layers |
| 03/02/1988 | EP0258052A2 Chemical vapor deposition reactor and method of chemical vapor deposition |
| 03/02/1988 | EP0257620A2 Method and device for forming a layer by a chemical plasma process |
| 03/02/1988 | EP0257439A1 Alumina coated with diamond |
| 03/02/1988 | EP0257302A2 Method of producing amorphous layers |
| 03/01/1988 | US4728869 Pulsewidth modulated pressure control system for chemical vapor deposition apparatus |
| 03/01/1988 | US4728863 Apparatus and method for plasma treatment of substrates |
| 03/01/1988 | US4728529 Plasma of hydrocarbon gas and hydrogen |
| 03/01/1988 | US4728528 Irradiation of active species |
| 03/01/1988 | US4728353 With metal oxide, temperature control |
| 02/24/1988 | EP0256337A1 Low pressure chemical vapor deposition method fpr forming tungsten silicide |
| 02/24/1988 | EP0256073A1 Plant for the chemical infiltration in vapor phase of a refractory material other than carbon. |
| 02/24/1988 | EP0256035A1 Process for forming an environmentally stable optical coating and structures formed thereby. |
| 02/23/1988 | US4726983 Alternating layers of metal and a compound of the same metal with a reactive gas |
| 02/23/1988 | US4726963 Process for forming deposited film |
| 02/23/1988 | US4726961 Controlling gas flow in semiconductor fabrication; first gas adjusts pressure, second gas is then introduced |
| 02/23/1988 | US4726320 Laser CVD device |
| 02/23/1988 | US4726319 Apparatus and method for coating optical fibers |
| 02/17/1988 | CN87104355A Milti-chamber deposition system |
| 02/16/1988 | US4725456 Method for preparing mixture to be used for production of composite material |
| 02/16/1988 | US4725204 Vacuum manifold pumping system |
| 02/16/1988 | CA1232864A1 Poly(arylene sulfide) printed circuit boards |
| 02/11/1988 | WO1988000985A1 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates |
| 02/11/1988 | WO1987006273A3 Coating to protect against wear and fretting corrosion of, in particular, metal mechanical components held together by frictional adherence |
| 02/09/1988 | US4724171 Process for protecting polished silicon surfaces |
| 02/09/1988 | US4724160 Process for the production of semiconductor materials |
| 02/09/1988 | US4724159 Conductive layer deposition method with a microwave enhanced CVD system |
| 02/09/1988 | US4724156 Method of manufacturing magnetic recording medium |
| 02/09/1988 | US4723508 Plasma CVD apparatus |
| 02/09/1988 | US4723507 Isolation passageway including annular region |
| 02/09/1988 | US4723363 Injection of organic halosilane |
| 02/09/1988 | CA1232569A1 Manufacture of optical fibre preforms |
| 02/04/1988 | DE3701691A1 Process for producing a furnace component |
| 02/03/1988 | EP0255454A2 Apparatus for chemical vapor deposition |
| 02/02/1988 | US4723062 Hydrogen containing silicon nitride film over area to be cut with a laser beam |
| 02/02/1988 | US4722911 Vapor phase epitaxy using complex premixing system |
| 02/02/1988 | US4722770 Method for making continuous and closed hollow bodies, hollow bodies so obtained and apparatus for making the hollow spheres |
| 02/02/1988 | CA1232230A1 Process and device for producing metallic coatings |
| 01/28/1988 | WO1988000588A1 Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating |
| 01/27/1988 | EP0254654A1 Method of chemical vapor deposition |
| 01/27/1988 | EP0254651A1 Method and apparatus for chemical vapor deposition |
| 01/27/1988 | EP0254589A2 Process for preparation of semiconductor device |
| 01/27/1988 | EP0254205A2 Process for preparing transparent protective silicon coatings |
| 01/27/1988 | CN87104933A Apparatus for forming film |
| 01/27/1988 | CN87104781A Method of surface treatment and apparatus used therefor |
| 01/26/1988 | US4721877 Bubbles within metal oxide coating |
| 01/26/1988 | US4721664 Silicon film deposition from mixture of silanes |
| 01/26/1988 | US4721631 Method of manufacturing thin-film electroluminescent display panel |
| 01/26/1988 | US4721518 Having a cermet base, intermediate metal carbide, nitride or oxide layer, group eight metal alloy mold surface |
| 01/20/1988 | EP0253361A1 Thin film forming device |
| 01/19/1988 | US4720560 Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition |
| 01/19/1988 | US4720437 Surface-coated cemented carbide article or part |
| 01/19/1988 | US4720395 Low temperature silicon nitride CVD process |
| 01/19/1988 | US4720300 Process for producing niobium metal of an ultrahigh purity |
| 01/19/1988 | US4719873 Film forming apparatus |
| 01/14/1988 | WO1988000097A1 Radiation curable temporary solder mask |
| 01/13/1988 | EP0252870A2 Abrasion-resistant plasma coatings |
| 01/13/1988 | EP0252755A1 Chemical vapour deposition |
| 01/13/1988 | EP0252667A2 Chemical vapour deposition methods |
| 01/13/1988 | EP0252548A1 Process for the production of electrically conductive moulded articles by the plasma-activated chemical gas phase precipitation |
| 01/13/1988 | EP0252480A2 Method of surface treatment and apparatus used therefor |
| 01/12/1988 | US4719122 Chemical vapor deposition, flat and scattered light |
| 01/12/1988 | US4718976 Etching, vapor deposition |
| 01/07/1988 | EP0251825A1 Gas treatment apparatus and method |
| 01/07/1988 | EP0251764A2 Chemical vapour deposition methods and apparatus |
| 01/07/1988 | EP0251677A2 Graphite intercalation compound electrodes for rechargeable batteries and a method for the manufacture of the same |
| 01/07/1988 | EP0251650A1 Process for the formation of phosphosilicate glass coating |
| 01/07/1988 | EP0251555A1 Gallium Hydride/trialkylamine adducts, and their use in deposition of III-V compound films |
| 01/07/1988 | EP0251264A1 Diamond-coated Tungsten carbide base sintered hard alloy material for insert of a cutting tool |
| 01/07/1988 | EP0250865A1 Cutting tool |
| 01/05/1988 | US4717631 Low temperature vapor deposition |
| 01/05/1988 | US4717602 Reacting silicon fluoride and ammonia or hydrazine |
| 01/05/1988 | US4717597 Using a gas-impervious tube and an oxygen-exposed permeable tube vapor deposition of an active or dielectric layer respectively |
| 01/05/1988 | US4717596 Method for vacuum vapor deposition with improved mass flow control |
| 01/05/1988 | US4717587 Disintegration of metallo-organic composition ina glow discharge zone of a plasma reactor |
| 01/05/1988 | US4717586 Decomposition, silicon-halogen compound, germanium compound, active materials |
| 01/05/1988 | US4717585 Process for forming deposited film |