| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/24/1989 | EP0316409A1 Distributor beam for chemical vapor deposition on glass |
| 05/24/1989 | DE3837584A1 Method and appliance for vertical vapour deposition growth |
| 05/23/1989 | US4833034 Carbonaceous film coating |
| 05/23/1989 | US4832986 Process for metal nitride deposition |
| 05/23/1989 | US4832981 Vapor deposition, cleaning |
| 05/23/1989 | US4831965 Fabrication of solid oxide fuel cell by electrochemical vapor deposition |
| 05/23/1989 | US4831963 Plasma processing apparatus |
| 05/17/1989 | EP0316243A1 Method of depositing refractory metal silicide on silicon areas |
| 05/16/1989 | US4831230 Surface shaping and finishing apparatus and method |
| 05/16/1989 | US4830891 Method for selective deposition of metal thin film |
| 05/16/1989 | US4830890 Method for forming a deposited film from a gaseous silane compound heated on a substrate and introducing an active species therewith |
| 05/16/1989 | US4830886 Process for making cutting insert with titanium carbide coating |
| 05/16/1989 | US4830873 Polysiloxanes |
| 05/16/1989 | US4830702 Hollow cathode plasma assisted apparatus and method of diamond synthesis |
| 05/16/1989 | EP0313580A4 Radiation curable temporary solder mask. |
| 05/09/1989 | US4829215 Discharge reaction apparatus utilizing dynamic magnetic field |
| 05/09/1989 | US4829189 Apparatus for low-temperature plasma treatment of sheet material |
| 05/09/1989 | US4828938 Vapor deposition, semiconductor thin films |
| 05/09/1989 | US4828933 Scratch resistant platinum article |
| 05/09/1989 | US4828874 Laser surface treatment method and apparatus for practicing same |
| 05/09/1989 | US4828728 Diamond-like carbon |
| 05/09/1989 | US4828224 Chemical vapor deposition system |
| 05/09/1989 | US4827870 Apparatus for applying multilayer optical interference coating on complex curved substrates |
| 05/03/1989 | EP0313580A1 Radiation curable temporary solder mask. |
| 05/02/1989 | US4826711 Replacement of surface hydrogen with fluorine |
| 05/02/1989 | US4826705 Radiation curable temporary solder mask |
| 05/02/1989 | US4826585 Plasma processing apparatus |
| 05/02/1989 | US4825809 Chemical vapor deposition apparatus having an ejecting head for ejecting a laminated reaction gas flow |
| 05/02/1989 | US4825808 Substrate processing apparatus |
| 05/02/1989 | US4825806 Film forming apparatus |
| 04/26/1989 | EP0313452A1 Process of depositing a refractory metal-silicide for integrated circuits manufacturing |
| 04/26/1989 | CN1032534A Coating glass |
| 04/25/1989 | US4824711 Woven fiber and binder |
| 04/25/1989 | US4824698 High temperature annealing to improve SIMOX characteristics |
| 04/25/1989 | US4824697 Method for forming a multi-layer deposited film |
| 04/25/1989 | US4824690 Pulsed plasma process for treating a substrate |
| 04/25/1989 | US4823735 Reflector apparatus for chemical vapor deposition reactors |
| 04/25/1989 | US4823734 Installation for the chemical vapor infiltration of a refractory material other than carbon |
| 04/25/1989 | CA1253263A1 Back sealing of silicon wafers |
| 04/20/1989 | WO1989003594A1 Process for depositing superconducting oxide ceramic coatings on a substrate |
| 04/20/1989 | WO1989003587A1 Method and apparatus for thin film formation by plasma cvd |
| 04/20/1989 | WO1989003493A1 Chemical vapor deposition system |
| 04/20/1989 | DE3734069A1 Verfahren zur abscheidung von schichten aus einem oxidkeramischen supraleitermaterial auf einem substrat A method of depositing layers of an oxide-ceramic superconductor material on a substrate |
| 04/19/1989 | EP0312447A1 Process and element for the production, using plasma, of thin films for electronic and/or optoelectronic applications |
| 04/19/1989 | EP0312383A1 Luminescing member, process for preparation thereof, and electroluminescent device employing same |
| 04/19/1989 | EP0312152A2 A method of modifying a surface of a body using electromagnetic radiation |
| 04/19/1989 | EP0311696A1 Method and apparatus for processing with plasma |
| 04/19/1989 | EP0129588B1 Damped chemical vapor deposition of smooth doped films |
| 04/19/1989 | CN1032434A Chemical vapor deposition of tin oxide on float glass in the tin bath |
| 04/18/1989 | US4823291 Radiometric measurement of wafer temperatures during deposition |
| 04/18/1989 | US4822641 Method of manufacturing a contact construction material structure |
| 04/18/1989 | US4822636 Reaction between gaseous starting materials and halogenic oxidizers yields thin film for semiconductors, transistors |
| 04/18/1989 | US4822450 Processing apparatus and method |
| 04/18/1989 | US4821674 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
| 04/18/1989 | CA1252695A1 Deposition technique |
| 04/12/1989 | EP0311446A2 Apparatus for producing compound semiconductor |
| 04/12/1989 | EP0311401A2 Process for chemical vapor deposition |
| 04/11/1989 | US4820546 Method for production of X-ray-transparent membrane |
| 04/11/1989 | US4820377 Method for cleanup processing chamber and vacuum process module |
| 04/11/1989 | US4819579 Coating of semiconductor wafers and apparatus therefor |
| 04/11/1989 | CA1252369A1 Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate |
| 04/05/1989 | EP0310347A1 Thin film forming apparatus |
| 04/05/1989 | EP0310043A2 Oxidation resistant, high temperature thermal cycling resistant coating on silicon-based substrates and process for the production thereof |
| 04/05/1989 | EP0309902A2 Chemical vapor deposition of tin oxide on float glass in the tin bath |
| 04/05/1989 | EP0309648A1 Apparatus for coating or etching by means of a plasma |
| 04/05/1989 | CN1032111A Multiple parallel fitting columnar vaporizer |
| 04/04/1989 | US4818607 Small hollow particles with conductive coating |
| 04/04/1989 | US4818564 Method for forming deposited film |
| 04/04/1989 | US4818563 Process for forming deposited film |
| 04/04/1989 | US4818560 Method for preparation of multi-layer structure film |
| 04/04/1989 | US4817558 Thin-film depositing apparatus |
| 04/04/1989 | US4817557 Process and apparatus for low pressure chemical vapor deposition of refractory metal |
| 03/30/1989 | DE3730324A1 Pressure-proof reaction vessel for gas-phase epitaxy |
| 03/29/1989 | EP0309171A1 A method for the production of a carbon electrode |
| 03/29/1989 | EP0308695A2 A component for producing semi-conductor devices and process of producing it |
| 03/28/1989 | US4816294 Etching, antideposit agents |
| 03/28/1989 | US4816125 Transducers, integrated circuits, zinc oxide films |
| 03/28/1989 | US4816113 Method of eliminating undesirable carbon product deposited on the inside of a reaction chamber |
| 03/28/1989 | US4816046 Fine particle collector trap for vacuum evacuating system |
| 03/28/1989 | CA1251804A1 Hybrid organometallic compounds, particularly for metal organic chemical vapor deposition |
| 03/23/1989 | WO1989002695A1 Multiple electrode plasma reactor power distribution system |
| 03/23/1989 | DE3830963A1 Process for metallising non-metallic carriers |
| 03/22/1989 | EP0308266A2 Method and apparatus for forming superconducting materials |
| 03/22/1989 | EP0307995A2 Process and device for gas delivery to an epitaxy apparatus |
| 03/22/1989 | EP0307444A1 Thin film deposition process |
| 03/22/1989 | EP0187826B1 Fabrication of devices with a silicon oxide region |
| 03/21/1989 | US4814294 Cobalt carbonyls, silicon compounds |
| 03/21/1989 | US4814232 Method for depositing laser mirror coatings |
| 03/21/1989 | US4814203 Vapor deposition of arsenic |
| 03/21/1989 | CA1251362A1 Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates |
| 03/15/1989 | EP0306954A2 Process for the deposition of microstructures having a given structure using laser light |
| 03/15/1989 | CN1031722A Carbon material containing halogen and deposition method for same |
| 03/14/1989 | US4812712 Plasma processing apparatus |
| 03/14/1989 | US4812370 Surface coated tungsten carbide-base sintered hard alloy material for inserts of cutting tools |
| 03/14/1989 | US4812331 Vapor deposition |
| 03/14/1989 | US4812328 Method for forming deposited film |
| 03/14/1989 | US4811684 Photo CVD apparatus, with deposition prevention in light source chamber |
| 03/14/1989 | CA1251100A1 Chemical vapor deposition |
| 03/09/1989 | WO1989001988A1 In-situ generation of volatile compounds for chemical vapor deposition |
| 03/09/1989 | WO1989001957A1 Abrasion-resistant plastic articles and method for making them |