Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1989
01/03/1989US4795880 Low pressure chemical vapor deposition furnace plasma clean apparatus
01/03/1989US4795529 Plasma treating method and apparatus therefor
01/03/1989CA1248210A1 Upstream cathode assembly
01/03/1989CA1248047A1 Method of making amorphous semiconductor alloys and devices using microwave energy
12/1988
12/29/1988WO1988010499A1 Process for forming thin film of oxide superconductor
12/29/1988WO1988010420A2 Process for determining the edge layer condition of objects
12/29/1988WO1988010324A1 Improved reaction chambers and methods for cvd
12/29/1988WO1988010323A1 Complex compounds for forming thin film of oxide superconductor and process for forming thin film of oxide superconductor
12/29/1988WO1988010322A1 Heating system for reaction chamber of chemical vapor deposition equipment
12/28/1988EP0297072A2 Diamond tools for rock drilling and machining
12/28/1988EP0296891A2 Process for self-cleaning of a reactor chamber
12/28/1988EP0296720A2 Plasma extraction reactor and its use for vapor extraction from gases
12/28/1988EP0296702A2 Method of forming semiconducting amorphous silicon films from the thermal decompositon of fluorohydridodisilanes
12/28/1988EP0296680A1 Device for measuring layer thicknesses
12/28/1988EP0296409A1 Process for the preparation of reflective pyrolytic graphite
12/28/1988EP0296235A1 Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
12/28/1988CA1247504A Modular v-cvd diffusion furnace
12/28/1988CA1247468A Method of treating the surface of iron alloy materials
12/27/1988US4794220 Rotary barrel type induction vapor-phase growing apparatus
12/27/1988US4794217 Induction system for rapid heat treatment of semiconductor wafers
12/27/1988US4794019 Refractory metal deposition process
12/27/1988US4793283 Apparatus for chemical vapor deposition with clean effluent and improved product yield
12/27/1988US4793282 Distributor beam for chemical vapor deposition on glass
12/21/1988EP0295829A2 Volatile lanthanum complexes and their uses
12/21/1988EP0295752A1 Apparatus suitable for plasma surface treating and process for preparing membrane layers
12/21/1988EP0295272A1 Production of silicon carbide
12/20/1988US4792467 Using gallane
12/20/1988US4792463 Method of producing ferroelectric thin film
12/20/1988US4792460 Exposure of mixture of silane (or germane) in carrier inert gas to electric discharges
12/20/1988US4792378 Pressure balancing plate with holes gives uniform layers; semiconductors
12/20/1988CA1247256A1 Mask for patterning electrode structures in thin film el devices
12/20/1988CA1247045A1 Continuous deposition of activated process gases
12/20/1988CA1247042A1 Steel article having a disordered silicon oxide coating thereon and method of preparing the coating
12/20/1988CA1246967A1 Growth of semi-conductors and apparatus for use therein
12/15/1988WO1988009830A1 Process for etching with gaseous plasma
12/14/1988EP0294572A1 Method and apparatus for coating a substrate
12/13/1988US4791012 Vacuum storage bags of aluminum foil coated with thin nonporous fluoropolymer films
12/13/1988US4790750 Automated flexible installation for a rapid thermochemical treatment
12/13/1988US4790625 Method of applying hermetic coating on optical fiber
12/13/1988CA1246756A1 Stress relieved intermediate insulating layer for multilayer metalization
12/07/1988EP0294047A1 Minimizing carbon content of semiconductor materials
12/07/1988EP0293879A1 Surface treatment method and apparatus
12/07/1988EP0293719A1 Preparation of thin molybdenum films by glow discharge
12/06/1988US4789596 For batch or continuous crystallization by pulling to obtain single crystals for uniformly doped silicon wafers
12/06/1988US4789560 Diffusion stop method for forming silicon oxide during the fabrication of IC devices
12/01/1988WO1988009394A1 Distributor beam for chemical vapor deposition on glass
12/01/1988WO1988009315A1 Sialon cutting tool composition
11/1988
11/30/1988EP0293021A2 Induction heating system for an epitaxial reactor
11/30/1988EP0191855B1 Barrel reactor and method for photochemical vapor deposition
11/29/1988US4788082 Transportation of condensible gas by jet stream, impinging onto substrate
11/29/1988US4788079 Method of making haze-free tin oxide coatings
11/23/1988EP0291702A1 Process for the production of protection layers against wear or surfaces of construction units of titanium or titanium-base alloys
11/22/1988US4786887 Thin-film strain gauge system and method of manufacturing same
11/22/1988US4786526 Surface treating method and apparatus
11/22/1988US4786477 Vapor deposition
11/22/1988US4786352 Apparatus for in-situ chamber cleaning
11/22/1988US4785763 Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process
11/22/1988CA1245183A1 Method and apparatus for making electrophotographic devices
11/22/1988CA1245109A1 Method of forming amorphous polymeric halosilane films and products produced therefrom
11/17/1988EP0291444A1 Production of polymer-metal compounds by precipitation in glow discharge areas
11/17/1988EP0291273A2 Reflector apparatus for chemical vapor deposition reactors
11/17/1988EP0291181A2 Plasma reactor for CVD
11/17/1988EP0214978B1 Method for making coatings of boron carbides and coatings obtained thereby
11/15/1988US4784963 Method for light-induced photolytic deposition simultaneously independently controlling at least two different frequency radiations during the process
11/15/1988US4784923 Wear resistant carbides and nitrides
11/15/1988CA1244964A1 Microwave method of making semiconductor members
11/09/1988EP0290036A2 Plasma treatment apparatus
11/09/1988EP0289963A1 Apparatus for, and methods of, obtaining the movement of a substance to a substrate
11/09/1988EP0289858A1 Fine particle collector trap for vacuum evacuating system
11/09/1988EP0289661A2 Procedure for reproduceable formation of layers of material and/or for the handling of semiconductor material-layers
11/08/1988US4783374 Chemical vapor deposited reaction product of silane, alkene, and oxygen
11/08/1988US4783369 Heat-generating resistor and heat-generating resistance element using same
11/08/1988US4783361 Wear resistance, ultraviolet filter-hydrocarbon protective coating
11/08/1988US4783343 Method for supplying metal organic gas and an apparatus for realizing same
11/08/1988US4782787 Apparatus for laser-induced chemical vapor deposition
11/03/1988WO1988008659A1 Method and apparatus for processing with plasma
11/03/1988WO1988008439A1 PROTECTIVE COATING OF THE TYPE SiCxNyOzHt, OBTAINED BY PLASMA TREATMENT
11/02/1988EP0289402A1 Protective coating of the SiCxNyOzHt-type obtained by plasma treatment
11/02/1988EP0288754A2 High rate tungsten CVD process for stress-free films
11/02/1988EP0288526A1 Process for depositing layers of diamond
11/01/1988US4781945 Process for the formation of phosphosilicate glass coating
10/1988
10/26/1988EP0288108A1 Electronic device manufacture
10/26/1988EP0288065A2 Method for synthesis of diamond
10/26/1988EP0172876B1 Deposition technique
10/26/1988CN88101737A Method and apparatus for vapor deposition of diamond
10/25/1988US4780334 Method and composition for depositing silicon dioxide layers
10/18/1988US4778721 Method of forming abrasion-resistant plasma coatings and resulting articles
10/18/1988US4778693 Photolithographic mask repair system
10/18/1988US4778532 Continuous process of cleaning semiconductors with fluid, removal by rinsing, then drying; automatic, safe
10/18/1988CA1243426A1 Glow discharge deposition apparatus having confined plasma region
10/18/1988CA1243250A1 Liquid replenishing apparatus
10/12/1988EP0286306A1 Method and apparatus for vapor deposition of diamond
10/12/1988EP0286289A1 A method of preparing a superconducting oxide and superconducting oxide metal composites
10/12/1988EP0286182A1 Method of manufacturing a semiconductor device comprising a titanium disilicide layer
10/12/1988EP0286158A1 Gas system for precision injection of low vapour pressure materials into low pressure or vacuum systems
10/12/1988EP0285846A1 Vacuum chamber for the treatment of surfaces, especially of substrates or the like, with ionized gases
10/11/1988US4777090 Abrasion resistant protective coating of carbon and-or silicon dioxide
10/11/1988US4777061 Pretreatment with argon plasma
10/11/1988US4777023 Preparation of silicon and germanium hydrides containing two different group 4A atoms
10/11/1988US4777022 Envelope supporting heater core and semiconductor; buffer for uniform heat distribution
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