Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1990
11/28/1990EP0399671A2 Processing semi-conductor wafers and other substrates
11/28/1990EP0399616A1 High throughput multi station processor for multiple single wafers
11/28/1990EP0399470A2 Method for growing thin film by beam deposition
11/28/1990EP0399190A1 Organometallic compounds of aluminium, gallium and indium for the manufacture of semiconductors and their use
11/28/1990EP0399021A1 Organoaluminium, organogallium and organoindium compounds and their use for the gas-phase deposition of metal on substrates
11/28/1990EP0224563A4 High speed digital frequency counter
11/28/1990CN1047349A Method for forming crystalline film
11/27/1990US4973498 Volatile lanthanum complexes for use in chemical vapor deposition
11/27/1990US4973494 Microwave enhanced CVD method for depositing a boron nitride and carbon
11/27/1990US4972799 Microwave plasma chemical vapor deposition apparatus for mass-producing functional deposited films
11/22/1990EP0398589A2 Perimeter wafer seal and method of using the same
11/22/1990EP0398480A2 Reactant gas injection for IC processing
11/22/1990EP0398366A2 Semiconductor processing apparatus and method
11/22/1990EP0397902A1 Method and apparatus for supplying glass forming raw material
11/20/1990US4971853 Laser directed chemical vapor deposition of transparent metal films
11/20/1990US4971839 High-temperature shielding coating and method for producing it
11/20/1990US4971832 Vapor deposition, electroconductive or insulating substrate, silicon films, hydrogen gas
11/20/1990US4971667 Plasma processing method and apparatus
11/20/1990US4971100 System for supplying ultrahigh purity gas
11/20/1990US4970986 Apparatus for synthetic diamond deposition including spring-tensioned filaments
11/20/1990CA1276512C Method and apparatus for low pressure chemical vapor deposition
11/15/1990WO1990013687A2 Apparatus and method for treating flat substrates under reduced pressure
11/15/1990WO1990013685A1 Electric contact material, method of producing said material, and electric contact produced therefrom
11/14/1990EP0396919A2 Plasma Reactor and method for semiconductor processing
11/14/1990EP0396703A1 A method for the production of thin film perovskite phase lead scandium tantalate
11/14/1990CN1010418B Automated flexible installation for rapid thermochemical treatment
11/13/1990US4970093 Chemical deposition methods using supercritical fluid solutions
11/13/1990US4969416 Gas treatment apparatus and method
11/13/1990US4969415 PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides
11/13/1990CA1276160C Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating
11/13/1990CA1276072C Process for producing niobium metal of an ultrahigh purity
11/07/1990EP0396333A1 Process for depositing a silicon carbide coating on a filament
11/07/1990EP0396332A1 Process for depositing a ceramic coating on a filament
11/07/1990EP0396239A2 Apparatus for producing semiconductors by vapour phase deposition
11/06/1990US4968918 Apparatus for plasma treatment
11/06/1990US4968527 Method for the manufacture of pyrolytic graphite with high crystallinity and electrodes with the same for rechargeable batteries
11/06/1990CA1275876C Chemical vapor deposition of a reflective film on the botton surface of a float glass ribbon
11/01/1990WO1990012900A1 Method for providing a proportioned vapour flow and also apparatus for carrying it out
11/01/1990WO1990012641A1 Process gas supply apparatus
11/01/1990CA2015770A1 Titanium nitride-coated particles
10/1990
10/31/1990EP0395198A2 Hydrogenated carbon compositions
10/31/1990EP0394735A2 Process for forming diamond coatings using a silent discharge plasma jet process
10/31/1990EP0394692A2 Process and apparatus for coating a substrate in a plasma
10/31/1990DE4013143A1 Selective CVD on silicon surface - esp. for forming titanium silicide layer
10/30/1990US4966869 Reducing tungsten hexafluoride with mixture of dichlorosilane and disilane
10/30/1990US4966789 Process of manufacturing seal members having a low friction coefficient
10/30/1990US4966668 Method for the treatment of metal objects
10/30/1990US4966614 Method of and device for manufacturing optical fibers
10/30/1990US4966501 Coated cemented carbide tool
10/30/1990CA1275741C Flowing gas seal enclosure for processing workpiece surface with controlled gasenvironment and intense laser irradiation
10/28/1990CA2013282A1 Hydrogenated carbon compositions
10/24/1990EP0394054A1 Method of manufacturing siliconboron nitride film having excellent step coverage characteristic
10/24/1990EP0393985A2 Method for forming semiconductor thin film
10/24/1990EP0393897A1 Process for the manufacture of electronic and optical devices
10/24/1990EP0393869A1 Process for forming deposition film
10/24/1990EP0393845A1 Fixture and method for bonding friction material
10/24/1990EP0393809A2 Pressure resistant thermal reactor system for semiconductor processing
10/24/1990EP0393520A1 Process for the uniform introduction of a fluid and device for carrying out this process
10/23/1990US4965247 Metal oxide solenoid
10/23/1990US4965222 Method of manufacturing an epitaxial indium phosphide layer on a substrate surface
10/23/1990US4965164 Method for producing electrophotographic photoreceptor
10/23/1990US4965140 Composite coatings on refractory substrates
10/23/1990US4965093 Chemical vapor deposition of bismuth oxide
10/23/1990US4965090 Production of plasma between an inner and an outer electrode, one electrode serves as a substrate
10/23/1990US4964940 Laser microbeam machine for acting on thin film objects, in particular for chemically etching or depositing substance in the presence of a reactive gas
10/23/1990US4964934 Laminating flow process
10/23/1990US4964694 Optical fiber and apparatus for producing same
10/21/1990CA2015007A1 Process for the uniform introduction of a fluid, and apparatus for carrying out the process
10/20/1990CA2014367A1 Process for forming diamond coating using a silent discharge plasma jet process
10/18/1990WO1990012418A1 Device for forming tungsten film
10/18/1990WO1990012126A1 Method of forming polycrystalline film by chemical vapor deposition
10/18/1990WO1990011858A1 Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates
10/18/1990CA2014540A1 Method for forming semiconductor thin film
10/17/1990EP0392703A2 Method of forming coatings containing amorphous silicon carbide
10/17/1990EP0392461A2 Thermistor made of diamond
10/17/1990EP0392134A2 Process for treatment of backside of semiconductor wafer
10/17/1990EP0392125A1 Edged medical tool and method for preparation thereof
10/17/1990EP0391996A1 Temperature controlled distributor beam for chemical vapor deposition
10/17/1990EP0391907A1 Multiple, parallel packed column vaporizer
10/17/1990CN1046212A Fixture and method for bonding friction material
10/16/1990US4963423 Method for forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling means
10/16/1990US4963393 Bonding a flexible, hollow graphite body to a substrate; pressing and sealing open end of hollow body; removal of hollow body
10/16/1990US4962727 Thin film-forming apparatus
10/16/1990US4962726 Chemical vapor deposition reaction apparatus having isolated reaction and buffer chambers
10/11/1990WO1990012350A1 Method for producing a heatable and refrigerable element for a system handling small quantities of liquid, and an element manufactured by the method
10/10/1990EP0391553A2 Process of producing nickel suboxide insulation on a superconductor
10/09/1990US4962461 Method for the reproducable formation of material layers and/or the treatment of semiconductor materials layers
10/09/1990US4962063 Multistep planarized chemical vapor deposition process with the use of low melting inorganic material for flowing while depositing
10/09/1990US4962049 Controlled spacing of surface from cathode; confined plasma forms protective oxide coating
10/04/1990WO1990011387A1 Process for chemical vapor deposition of aluminum
10/04/1990WO1990011247A1 Zinc oxyfluoride transparent conductor
10/04/1990WO1990011246A1 Apparatus, process, and composition for in-situ generation of polyhydridic compounds of group iv-vi elements
10/04/1990WO1990011156A1 Multilayer coated cemented carbide cutting insert
10/03/1990EP0390150A1 Method for forming a metal oxide film
10/03/1990EP0390127A2 Method for vaporizing and supplying organometal compounds and apparatus for carrying out the method
10/03/1990CN1045816A Metal-surface strengthening technique by ceramic film
10/03/1990CN1045815A Selective growth of diamond membrane in vapor phase
10/02/1990US4960916 Organometallic antimony compounds useful in chemical vapor deposition processes
10/02/1990US4960640 Two meatl carbide layers with different thermal expansion coefficients
10/02/1990US4960488 Two step continuous etch sequence is used in which the first step uses high pressure, etching with fluorocarbon gas and the second step uses lower pressure, etching with fluorinated gas
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