| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/11/1991 | US5023109 Deposition of synthetic diamonds |
| 06/11/1991 | US5023056 Plasma generator utilizing dielectric member for carrying microwave energy |
| 06/11/1991 | US5022905 Method and apparatus for coating glass |
| 06/11/1991 | US5022801 CVD diamond coated twist drills |
| 06/06/1991 | DE4035951C1 CVD process for coating plastics - by depositing substrate from silane and oxygen enriched with ozone |
| 06/05/1991 | EP0430303A2 Improved process for selective deposition of tungsten on semiconductor wafer |
| 06/05/1991 | EP0430079A2 Chemical vapor deposition apparatus of in-line type |
| 06/05/1991 | EP0429885A2 Method of in-situ doping of deposited silicon |
| 06/05/1991 | EP0429553A1 Process for coating a metallic basic body with a non-conductive coating material. |
| 06/05/1991 | EP0349633A4 Polysilicon thin film process and product |
| 06/05/1991 | EP0298080B1 Method and apparatus for monitoring surface layer growth |
| 06/05/1991 | CN1051899A Method for preparing vaporized reactants for chemical vapor deposition |
| 06/05/1991 | CN1012775B Semiconductor bottom material |
| 06/04/1991 | US5021401 Reacting nickel powder with carbon monoxide, separating nickel carbonyl, coolign, decanting and coating the surface of a wire |
| 06/04/1991 | US5021399 Heating substrate, spraying with solution of bismuth, strontium, calcium and copper, heating to melt film, cooling |
| 06/04/1991 | US5021138 Side source center sink plasma reactor |
| 06/04/1991 | US5021114 Apparatus for treating material by using plasma |
| 06/04/1991 | US5021103 Method of forming microcrystalline silicon-containing silicon carbide film |
| 06/04/1991 | US5020476 Distributed source assembly |
| 06/04/1991 | US5020474 Apparatus for vapor phase epitaxial growth |
| 06/02/1991 | CA2023684A1 Chemical vapor deposition apparatus for forming thin film |
| 05/30/1991 | WO1991007520A1 Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal |
| 05/30/1991 | WO1991007446A1 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists |
| 05/30/1991 | WO1991007236A1 Method and apparatus for the rapid deposition by chemical vapor deposition with low vapor pressure reactants |
| 05/29/1991 | EP0429270A2 Continuous etching method and apparatus therefor |
| 05/29/1991 | EP0429070A2 Synchrotron radiation processing of a surface to be metallised |
| 05/29/1991 | EP0428839A1 Method for depositing high quality silicon dioxide by plasma-enhanced chemical vapour deposition (PECVD) |
| 05/29/1991 | EP0428740A1 Electric contact material, method of producing said material, and electric contact produced therefrom |
| 05/29/1991 | EP0428733A1 Device for forming tungsten film |
| 05/29/1991 | EP0318486B1 Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating |
| 05/29/1991 | EP0125318B1 Method of forming amorphous silicon film |
| 05/28/1991 | US5019531 Process for selectively growing thin metallic film of copper or gold |
| 05/28/1991 | US5019423 Cylindrical vessels; porous partition semiconductors |
| 05/28/1991 | US5019415 Glow Discharge |
| 05/28/1991 | US5019117 Plasma apparatus |
| 05/28/1991 | US5018479 Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer |
| 05/26/1991 | CA2030486A1 Process for synthesizing diamond and diamond synthesis apparatus |
| 05/23/1991 | DE4029483C1 Optimising deposition of material on substrate by gas stream - combining jet geometry and position and gas pressure factors for laser or particle beam induced deposition |
| 05/23/1991 | DE4029470C1 Local gas atmos. generator for vacuum receptacle - has application jet with ID tapering to outlet tip smaller than 100 microns |
| 05/22/1991 | EP0428161A2 Dry process system |
| 05/22/1991 | EP0417202A4 Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate |
| 05/21/1991 | US5017404 Plasma CVD process using a plurality of overlapping plasma columns |
| 05/21/1991 | US5017403 Process for forming planarized films |
| 05/21/1991 | US5017317 Gas phase selective beam deposition |
| 05/21/1991 | US5017308 Microcrystalline grains interspersed in amorphous phase dopes |
| 05/21/1991 | US5016567 Apparatus for treatment using gas |
| 05/21/1991 | US5016565 Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge |
| 05/21/1991 | US5016564 Plasma apparatus |
| 05/21/1991 | US5016562 Semiconductors |
| 05/21/1991 | CA2019669A1 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists |
| 05/16/1991 | WO1991006688A1 Vapor depostion process for depositing an organo-metallic compound layer on a substrate |
| 05/16/1991 | WO1991006507A1 Core wire connecting bridge for polycrystalline silicon manufacturing apparatuses |
| 05/15/1991 | EP0427332A1 Method of applying a boron layer to a steel substrate and a tool provided with a boron layer |
| 05/15/1991 | EP0427294A1 Silicon carbide member |
| 05/15/1991 | EP0427194A2 Multiple torch type plasma generation device and method of generating plasma using the same |
| 05/14/1991 | US5015747 Thin films formed by vapor deposition of organometallic compounds for production of electronics or semiconductors |
| 05/14/1991 | US5015503 Apparatus for producing compound semiconductor thin films |
| 05/14/1991 | US5015502 Gas turbine engine airfoils with ceramic on an alloy |
| 05/14/1991 | US5015494 Microwave enhanced CVD method for depositing diamond |
| 05/14/1991 | US5015330 Film forming method and film forming device |
| 05/14/1991 | US5015323 Multi-tipped field-emission tool for nanostructure fabrication |
| 05/14/1991 | US5014646 Method and apparatus for writing oxide film |
| 05/08/1991 | EP0426494A1 Vapor deposition apparatus |
| 05/08/1991 | EP0426218A2 Multilayered structure and plasma-activated reactive chemical vapour deposition of a multicomponent material |
| 05/08/1991 | EP0426105A1 Chemical vapor growth apparatus |
| 05/07/1991 | US5014217 Apparatus and method for automatically identifying chemical species within a plasma reactor environment |
| 05/07/1991 | US5013691 Anisotropic deposition of silicon dioxide |
| 05/07/1991 | US5013581 Method of making a polymer-metal compound having a predetermined electrical conductivity by depositing on a substrate from a glow discharge zone |
| 05/07/1991 | US5013579 Microwave enhanced CVD method for coating mechanical parts for improved wear resistance |
| 05/07/1991 | US5013526 Superconducting alloys comprising tungsten, molybdenum, silicon and oxygen |
| 05/07/1991 | US5013274 Process for restoring locally damaged parts, particularly anticathodes |
| 05/02/1991 | WO1991005887A1 Vacuum vessel |
| 05/02/1991 | WO1991005743A1 Method for preparing vaporized reactants for chemical vapor deposition |
| 05/02/1991 | EP0425471A1 Cold work tool steel with high compression strength and use of these steels |
| 05/02/1991 | EP0425419A2 Methods and apparatus for contamination control in plasma processing |
| 05/02/1991 | EP0425307A1 Method and apparatus for controlled-profile coating of containers |
| 05/02/1991 | EP0425196A1 A chemical vapor deposition process to replicate the finish and/or figure of preshaped structures |
| 05/02/1991 | EP0425116A1 Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process |
| 05/02/1991 | EP0425090A1 Film deposition method and apparatus |
| 05/02/1991 | EP0425084A1 Process for forming deposited film by use of alkyl aluminum hydride |
| 05/02/1991 | EP0425056A1 Process for depositing microcrystalline particles from the gas phase by chemical vapour deposition |
| 05/02/1991 | EP0424620A2 Process and apparatus for chemically coating opposing faces of a workpiece |
| 05/02/1991 | EP0301067B1 Apparatus for coating glass |
| 05/02/1991 | DE3936016A1 Coating substrates with optical layers using plasma induced CVD - inside glass tube in which flow of active gas is controlled by shape of substrate holder or ancillary cylindrical sections |
| 05/01/1991 | CN1012494B Multi-layered ceramic coating using estersil and metalic oxide |
| 04/30/1991 | US5012158 Plasma CVD apparatus |
| 04/30/1991 | US5011732 Glass ceramic substrate having electrically conductive film |
| 04/30/1991 | US5011706 Method of forming coatings containing amorphous silicon carbide |
| 04/30/1991 | US5011705 Plasma processing method |
| 04/30/1991 | US5010842 Apparatus for forming thin film |
| 04/24/1991 | EP0424256A1 Device for chemical treatment assisted by a diffusion plasma |
| 04/24/1991 | EP0424183A1 Infrared window |
| 04/24/1991 | EP0424036A2 B-N-Cx hybrid coatings for inorganic fiber reinforcement materials |
| 04/24/1991 | EP0424012A1 Methods of and apparatus for coating optical fibers |
| 04/24/1991 | EP0423884A1 Method for deposition of silicon nitride layers on glass substrates |
| 04/24/1991 | EP0423498A2 Method of and apparatus for synthesizing hard material |
| 04/24/1991 | CA2024637A1 Methods and apparatus for contamination control in plasma processing |
| 04/24/1991 | CA2022932A1 Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process |
| 04/23/1991 | US5009966 Ceramic, hard metal or metal compound or carbon on non-reactive noble metal interlayer |
| 04/23/1991 | US5009930 Method for forming a deposited layer on a skirted substrate |