Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
---|
10/17/1991 | WO1991015611A1 Process for depositing hard coating in a nozzle orifice |
10/17/1991 | WO1991009995A3 Process for the deposition of thin films on solids |
10/17/1991 | DE4110539A1 Titanium nitride or carbonitride coated copper component - used esp. in resistance or arc welding or in electrical switches |
10/17/1991 | DE4011529A1 Laser-induced CVD process - using frequency tuned, grazing incidence laser beam, esp. for refractory metal deposition |
10/16/1991 | EP0452199A1 Method of strengthening preforms for the fabrication of heat resistant composite material parts, in particular parts in the shape of sails or panels |
10/16/1991 | EP0452051A1 A method for growing diamond crystallite structures |
10/16/1991 | EP0452006A2 A composite film and method of manufacturing the same |
10/16/1991 | EP0451618A1 Method for producing multilayer optical interference coatings |
10/16/1991 | EP0451351A1 Method for direct heating of a substrate holder |
10/15/1991 | US5057244 Carbides |
10/10/1991 | CA2038401A1 Hot filament method for growing high purity diamond |
10/09/1991 | EP0450760A1 Process for the manufacture of ceramic fibres |
10/09/1991 | EP0450165A2 Process and apparatus for coating upper surface reflecting mirrors |
10/09/1991 | EP0450125A1 Process of making microcrystalline cubic boron nitride coatings |
10/09/1991 | EP0450106A1 Process and apparatus for forming a titanium nitride layer by chemical vapour depositing for highly integrated circuits |
10/09/1991 | EP0450016A1 Method for preparing vaporized reactants for chemical vapor deposition. |
10/09/1991 | EP0449821A1 Chemical vapor deposition reactor and method for use thereof. |
10/08/1991 | US5055421 Method for the plasma deposition of hydrogenated, amorphous carbon using predetermined retention times of gaseous hydrocarbons |
10/08/1991 | US5055246 Method of forming high purity metal silicides targets for sputtering |
10/08/1991 | US5054421 Substrate cleaning device |
10/08/1991 | US5054420 Use of a particulate packed bed at the inlet of a vertical tube MOCVD reactor to achieve desired gas flow characteristics |
10/03/1991 | WO1991014798A1 An improved hot filament chemical vapor deposition reactor |
10/03/1991 | WO1991014572A1 Diamond-on-a-substrate for electronic applications |
10/02/1991 | EP0449571A1 Polycrystalline diamond tool and method for producing the polycrystalline diamond tool |
10/02/1991 | EP0449081A2 Microwave plasma CVD apparatus |
10/02/1991 | EP0449025A1 Industrial diamond coating and method of manufacturing |
10/02/1991 | EP0448700A1 Vacuum vessel |
10/02/1991 | EP0448660A1 Conversion of organic/organometallic gaseous or vaporizable compounds into inert solids |
10/02/1991 | CN1055015A Pcvd process for producing approximately dome-shaped substrate provided with dielectric and/or metallic coating system on inside and/or outside face |
10/02/1991 | CN1055014A Technology of silicon dioxide, silicon nitride film by low-temp. photochemical vapor deposition |
10/01/1991 | US5053255 Chemical vapor deposition (CVD) process for the thermally depositing silicon carbide films onto a substrate |
10/01/1991 | US5053247 Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby |
10/01/1991 | US5053244 Reacting a silicon containing gas with oxygen or oxygen containing gas using microwaves to provide a magnetic field |
10/01/1991 | US5053243 Plasma polymerization of hydrocarbon monomer on non-permeable substrate in presence of a non-polymerizing fluid |
10/01/1991 | US5052339 Radio frequency plasma enhanced chemical vapor deposition process and reactor |
09/25/1991 | EP0448346A1 Vapor-phase deposition apparatus and vapor-phase deposition method |
09/25/1991 | EP0448302A2 Carbon-clad inorganic oxide particles and the same with a polymer coating thereon |
09/25/1991 | EP0448227A1 Composite materials and a process for producing the same |
09/25/1991 | EP0448223A2 Process for forming metal deposited film containing aluminium as main component by use of alkyl aluminum hydride |
09/25/1991 | EP0447556A1 Surface-coated hard member having excellent abrasion resistance |
09/25/1991 | CN1014082B Glow discharge decomposing device |
09/24/1991 | US5051380 Process for producing semiconductor device |
09/24/1991 | US5051308 Abrasion-resistant plastic articles |
09/24/1991 | US5050534 Mobile injector system |
09/24/1991 | US5050416 Sealing element for feeding through at least one elongated object such as wire and a vacuum apparatus provided with one or more of sealing elements |
09/24/1991 | CA1289512C Depositing an electrical insulator with unidirectional gas flow in series of chambers |
09/24/1991 | CA1289357C Automated adaptive installation for fast thermochemical treatment |
09/19/1991 | WO1991013679A1 Bulk gas sorption composition and apparatus |
09/18/1991 | EP0447317A1 Method of forming a fold or separation line during the fabrication of a composite material part |
09/18/1991 | EP0447031A1 Composite susceptor |
09/18/1991 | EP0446988A1 Silicon carbide coatings |
09/18/1991 | EP0446772A1 Fluorinated beta-ketoiminato metal complexes |
09/18/1991 | EP0446596A2 PCVD process for the production of approximately dome-shaped substrates provided on the inside and/or outside with dielectric and/or metallic coating systems |
09/18/1991 | EP0325651B1 Cyclic or bicyclic aluminium, gallium or indium organic compounds and their use for vapour deposition of metals on substrates |
09/18/1991 | CN1013965B Selective growth of diamond membrane in vapor phase |
09/17/1991 | US5049523 Method of forming semiconducting materials and barriers |
09/17/1991 | US5049409 Method for metal or metal compounds inserted between adjacent graphite layers |
09/17/1991 | US5049406 Method of manufacturing solid bodies |
09/17/1991 | US5048807 Clamping tool for carrying out a chemical vapor infiltration of a material within a fibrous preform during the manufacture of composite parts |
09/17/1991 | US5048800 Furnaces; insulated multilayer tubes |
09/13/1991 | CA2037538A1 Fluorinated beta-ketoiminato metal complexes |
09/11/1991 | EP0445754A1 Method for growing a diamond or c-BN thin film |
09/11/1991 | EP0445596A2 Double-dome reactor for semiconductor processing |
09/11/1991 | EP0445533A2 Apparatus for producing compound semiconductor thin films |
09/11/1991 | EP0445319A1 Process for fabricating silicon carbide films with a predetermined stress |
09/11/1991 | EP0445305A1 Vapor deposited diamond synthesizing method on electrochemically treated substrate |
09/10/1991 | US5047565 Mononuclear and multinuclear phosphido, arsenido, and stibido complexes of aluminum, gallium and indium |
09/10/1991 | US5047388 Superconductor and method for its production |
09/10/1991 | US5047115 Inorganic fluorine, oxidizing, and inert gas mixture |
09/10/1991 | US5046849 Device having an exchangeable substrate sleeve for measuring layer thickness |
09/06/1991 | CA2034765A1 Susceptor for use in chemical vapor deposition apparatus and its method of use |
09/05/1991 | WO1991013185A2 Device for producing films of mixed metal oxides |
09/05/1991 | WO1991013184A1 Titanium nitride or tin oxide bonding to a coater surface |
09/05/1991 | DE4006489A1 Vorrichtung zum herstellen duenner schichten aus metallmischoxiden aus organischen metallverbindungen auf einem substrat Apparatus for producing thin films of mixed metal oxides from organic metal compounds on a substrate |
09/05/1991 | CA2075995A1 Titanium nitride or tin oxide bonding to a coater surface |
09/04/1991 | EP0444618A2 Plasma treatment device |
09/04/1991 | EP0444205A1 Substrate support device for cvd apparatus |
09/03/1991 | US5045496 Semi-insulating cobalt doped indium phosphide grown by MOCVD |
09/03/1991 | US5045355 Carbon chalcogenide macromolecular composition and process for preparation thereof |
09/03/1991 | US5045348 Thin film deposition process |
09/03/1991 | US5045346 Method of depositing fluorinated silicon nitride |
09/03/1991 | US5044943 Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus |
09/03/1991 | US5044311 Plasma chemical vapor deposition apparatus |
08/28/1991 | EP0443815A1 Vapor deposition of arsenic-containing films |
08/28/1991 | EP0443659A1 A process for applying a coating on powdery particles and a process for the production of metallic objects by using these particles |
08/28/1991 | EP0443277A1 Metallized ceramic body and method to make the same |
08/27/1991 | US5043299 Process for selective deposition of tungsten on semiconductor wafer |
08/23/1991 | CA2034624A1 Chemical vapor deposition with diarsines and polyarsines |
08/22/1991 | WO1991012353A1 Device for treating substrates in a gas-based plasma produced by microwaves |
08/22/1991 | WO1991012092A1 Method of coating steel substrate using low temperature plasma processes and priming |
08/22/1991 | WO1991012091A1 Low temperature plasma technology for corrosion protection of steel |
08/21/1991 | EP0442490A1 Method for producing single crystal boron nitride film |
08/21/1991 | EP0442304A2 Polycrystalline CVD diamond substrate for single crystal epitaxial growth of semiconductors |
08/21/1991 | EP0442303A1 CVD Diamond workpieces and their fabrication |
08/21/1991 | EP0442163A1 Method for production of ultrafine particles and their use |
08/21/1991 | EP0441826A1 Thin film chemiresistive sensors |
08/21/1991 | CA2036541A1 Metallized ceramic body and method to make the same |
08/20/1991 | US5041757 Sputtered scandate coatings for dispenser cathodes and methods for making same |
08/20/1991 | US5041311 Chemical vapor deposition method using a plasma self-cleaning |
08/20/1991 | US5041305 Process for depositing a silicon carbide coating on a filament |