Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1991
10/17/1991WO1991015611A1 Process for depositing hard coating in a nozzle orifice
10/17/1991WO1991009995A3 Process for the deposition of thin films on solids
10/17/1991DE4110539A1 Titanium nitride or carbonitride coated copper component - used esp. in resistance or arc welding or in electrical switches
10/17/1991DE4011529A1 Laser-induced CVD process - using frequency tuned, grazing incidence laser beam, esp. for refractory metal deposition
10/16/1991EP0452199A1 Method of strengthening preforms for the fabrication of heat resistant composite material parts, in particular parts in the shape of sails or panels
10/16/1991EP0452051A1 A method for growing diamond crystallite structures
10/16/1991EP0452006A2 A composite film and method of manufacturing the same
10/16/1991EP0451618A1 Method for producing multilayer optical interference coatings
10/16/1991EP0451351A1 Method for direct heating of a substrate holder
10/15/1991US5057244 Carbides
10/10/1991CA2038401A1 Hot filament method for growing high purity diamond
10/09/1991EP0450760A1 Process for the manufacture of ceramic fibres
10/09/1991EP0450165A2 Process and apparatus for coating upper surface reflecting mirrors
10/09/1991EP0450125A1 Process of making microcrystalline cubic boron nitride coatings
10/09/1991EP0450106A1 Process and apparatus for forming a titanium nitride layer by chemical vapour depositing for highly integrated circuits
10/09/1991EP0450016A1 Method for preparing vaporized reactants for chemical vapor deposition.
10/09/1991EP0449821A1 Chemical vapor deposition reactor and method for use thereof.
10/08/1991US5055421 Method for the plasma deposition of hydrogenated, amorphous carbon using predetermined retention times of gaseous hydrocarbons
10/08/1991US5055246 Method of forming high purity metal silicides targets for sputtering
10/08/1991US5054421 Substrate cleaning device
10/08/1991US5054420 Use of a particulate packed bed at the inlet of a vertical tube MOCVD reactor to achieve desired gas flow characteristics
10/03/1991WO1991014798A1 An improved hot filament chemical vapor deposition reactor
10/03/1991WO1991014572A1 Diamond-on-a-substrate for electronic applications
10/02/1991EP0449571A1 Polycrystalline diamond tool and method for producing the polycrystalline diamond tool
10/02/1991EP0449081A2 Microwave plasma CVD apparatus
10/02/1991EP0449025A1 Industrial diamond coating and method of manufacturing
10/02/1991EP0448700A1 Vacuum vessel
10/02/1991EP0448660A1 Conversion of organic/organometallic gaseous or vaporizable compounds into inert solids
10/02/1991CN1055015A Pcvd process for producing approximately dome-shaped substrate provided with dielectric and/or metallic coating system on inside and/or outside face
10/02/1991CN1055014A Technology of silicon dioxide, silicon nitride film by low-temp. photochemical vapor deposition
10/01/1991US5053255 Chemical vapor deposition (CVD) process for the thermally depositing silicon carbide films onto a substrate
10/01/1991US5053247 Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby
10/01/1991US5053244 Reacting a silicon containing gas with oxygen or oxygen containing gas using microwaves to provide a magnetic field
10/01/1991US5053243 Plasma polymerization of hydrocarbon monomer on non-permeable substrate in presence of a non-polymerizing fluid
10/01/1991US5052339 Radio frequency plasma enhanced chemical vapor deposition process and reactor
09/1991
09/25/1991EP0448346A1 Vapor-phase deposition apparatus and vapor-phase deposition method
09/25/1991EP0448302A2 Carbon-clad inorganic oxide particles and the same with a polymer coating thereon
09/25/1991EP0448227A1 Composite materials and a process for producing the same
09/25/1991EP0448223A2 Process for forming metal deposited film containing aluminium as main component by use of alkyl aluminum hydride
09/25/1991EP0447556A1 Surface-coated hard member having excellent abrasion resistance
09/25/1991CN1014082B Glow discharge decomposing device
09/24/1991US5051380 Process for producing semiconductor device
09/24/1991US5051308 Abrasion-resistant plastic articles
09/24/1991US5050534 Mobile injector system
09/24/1991US5050416 Sealing element for feeding through at least one elongated object such as wire and a vacuum apparatus provided with one or more of sealing elements
09/24/1991CA1289512C Depositing an electrical insulator with unidirectional gas flow in series of chambers
09/24/1991CA1289357C Automated adaptive installation for fast thermochemical treatment
09/19/1991WO1991013679A1 Bulk gas sorption composition and apparatus
09/18/1991EP0447317A1 Method of forming a fold or separation line during the fabrication of a composite material part
09/18/1991EP0447031A1 Composite susceptor
09/18/1991EP0446988A1 Silicon carbide coatings
09/18/1991EP0446772A1 Fluorinated beta-ketoiminato metal complexes
09/18/1991EP0446596A2 PCVD process for the production of approximately dome-shaped substrates provided on the inside and/or outside with dielectric and/or metallic coating systems
09/18/1991EP0325651B1 Cyclic or bicyclic aluminium, gallium or indium organic compounds and their use for vapour deposition of metals on substrates
09/18/1991CN1013965B Selective growth of diamond membrane in vapor phase
09/17/1991US5049523 Method of forming semiconducting materials and barriers
09/17/1991US5049409 Method for metal or metal compounds inserted between adjacent graphite layers
09/17/1991US5049406 Method of manufacturing solid bodies
09/17/1991US5048807 Clamping tool for carrying out a chemical vapor infiltration of a material within a fibrous preform during the manufacture of composite parts
09/17/1991US5048800 Furnaces; insulated multilayer tubes
09/13/1991CA2037538A1 Fluorinated beta-ketoiminato metal complexes
09/11/1991EP0445754A1 Method for growing a diamond or c-BN thin film
09/11/1991EP0445596A2 Double-dome reactor for semiconductor processing
09/11/1991EP0445533A2 Apparatus for producing compound semiconductor thin films
09/11/1991EP0445319A1 Process for fabricating silicon carbide films with a predetermined stress
09/11/1991EP0445305A1 Vapor deposited diamond synthesizing method on electrochemically treated substrate
09/10/1991US5047565 Mononuclear and multinuclear phosphido, arsenido, and stibido complexes of aluminum, gallium and indium
09/10/1991US5047388 Superconductor and method for its production
09/10/1991US5047115 Inorganic fluorine, oxidizing, and inert gas mixture
09/10/1991US5046849 Device having an exchangeable substrate sleeve for measuring layer thickness
09/06/1991CA2034765A1 Susceptor for use in chemical vapor deposition apparatus and its method of use
09/05/1991WO1991013185A2 Device for producing films of mixed metal oxides
09/05/1991WO1991013184A1 Titanium nitride or tin oxide bonding to a coater surface
09/05/1991DE4006489A1 Vorrichtung zum herstellen duenner schichten aus metallmischoxiden aus organischen metallverbindungen auf einem substrat Apparatus for producing thin films of mixed metal oxides from organic metal compounds on a substrate
09/05/1991CA2075995A1 Titanium nitride or tin oxide bonding to a coater surface
09/04/1991EP0444618A2 Plasma treatment device
09/04/1991EP0444205A1 Substrate support device for cvd apparatus
09/03/1991US5045496 Semi-insulating cobalt doped indium phosphide grown by MOCVD
09/03/1991US5045355 Carbon chalcogenide macromolecular composition and process for preparation thereof
09/03/1991US5045348 Thin film deposition process
09/03/1991US5045346 Method of depositing fluorinated silicon nitride
09/03/1991US5044943 Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus
09/03/1991US5044311 Plasma chemical vapor deposition apparatus
08/1991
08/28/1991EP0443815A1 Vapor deposition of arsenic-containing films
08/28/1991EP0443659A1 A process for applying a coating on powdery particles and a process for the production of metallic objects by using these particles
08/28/1991EP0443277A1 Metallized ceramic body and method to make the same
08/27/1991US5043299 Process for selective deposition of tungsten on semiconductor wafer
08/23/1991CA2034624A1 Chemical vapor deposition with diarsines and polyarsines
08/22/1991WO1991012353A1 Device for treating substrates in a gas-based plasma produced by microwaves
08/22/1991WO1991012092A1 Method of coating steel substrate using low temperature plasma processes and priming
08/22/1991WO1991012091A1 Low temperature plasma technology for corrosion protection of steel
08/21/1991EP0442490A1 Method for producing single crystal boron nitride film
08/21/1991EP0442304A2 Polycrystalline CVD diamond substrate for single crystal epitaxial growth of semiconductors
08/21/1991EP0442303A1 CVD Diamond workpieces and their fabrication
08/21/1991EP0442163A1 Method for production of ultrafine particles and their use
08/21/1991EP0441826A1 Thin film chemiresistive sensors
08/21/1991CA2036541A1 Metallized ceramic body and method to make the same
08/20/1991US5041757 Sputtered scandate coatings for dispenser cathodes and methods for making same
08/20/1991US5041311 Chemical vapor deposition method using a plasma self-cleaning
08/20/1991US5041305 Process for depositing a silicon carbide coating on a filament