| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/05/1994 | US5300320 Chemical vapor deposition from single organometallic precursors |
| 04/05/1994 | US5300313 Monitoring thickness fo perforation formed on substrate |
| 04/05/1994 | US5300189 Depositing carbon form hydrocarbon gas; having grounded and hollow counterelectrodes |
| 04/05/1994 | US5300185 Method of manufacturing III-V group compound semiconductor |
| 03/31/1994 | WO1994006950A1 Apparatus for chemical vapour phase deposition activated by a microwave plasma |
| 03/31/1994 | WO1994006571A1 Film uniformity by selective pressure gradient control |
| 03/31/1994 | DE4232265A1 Coating electrically insulated substrate, esp. ceramic - by thermally depositing with solid crystalline carbon in gas phase |
| 03/31/1994 | CA2143435A1 Device for chemical deposition in active vapor phase using a microwave plasma |
| 03/30/1994 | EP0589679A2 Method of preventing fuel thermal degradation deposits |
| 03/30/1994 | EP0589641A2 Method of producing wear resistant articles |
| 03/30/1994 | EP0423327B1 Apparatus and method for treating flat substrates under reduced pressure |
| 03/30/1994 | EP0386225B1 Photochemical deposition of high purity gold films |
| 03/29/1994 | US5298759 For placement between a source cell and growth chamber for growth of semiconductor layears |
| 03/29/1994 | US5298720 Method and apparatus for contamination control in processing apparatus containing voltage driven electrode |
| 03/29/1994 | US5298587 Protective film for articles and method |
| 03/29/1994 | US5298458 Method of forming tungsten film |
| 03/29/1994 | US5298452 Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers |
| 03/29/1994 | US5298296 Process for the elaboration of powders uniformly coated with ultrafine silicon-base particles using chemical vapor decomposition in the presence of core powders |
| 03/29/1994 | US5298295 Titanium complex as single source of titanium disulfide films |
| 03/29/1994 | US5298290 Protective coating on substrates |
| 03/29/1994 | US5298287 Method of making CVD Si3 N4 |
| 03/29/1994 | US5298286 Method for fabricating diamond films on nondiamond substrates and related structures |
| 03/29/1994 | US5298285 Vapor deposition of diamond bonded to carbide substrate |
| 03/29/1994 | US5298278 Chemical vapor phase growth method and chemical vapor phase growth apparatus |
| 03/29/1994 | US5298107 Processing method for growing thick films |
| 03/29/1994 | US5298075 Furnace tube cleaning process |
| 03/29/1994 | US5298073 Two sensor for determining spacing between surfaces |
| 03/29/1994 | CA2008926C Plasma reactor apparatus and method for treating a substrate |
| 03/24/1994 | DE4332890A1 Raw material for vaporising dielectric thin layers - comprises organic metal cpd. dissolved in THF |
| 03/23/1994 | EP0588479A1 Highly polishable, highly thermally conductive silicon carbide, method of preparation and applications thereof |
| 03/23/1994 | EP0588080A1 Selective, low-temperature chemical vapor deposition of gold |
| 03/23/1994 | EP0588044A1 Reactor apparatus |
| 03/23/1994 | CA2105188A1 Coated article for hot hydrocarbon fluid and method of preventing fuel thermal degradation deposits |
| 03/22/1994 | US5296460 CVD method for forming Bi -containing oxide superconducting films |
| 03/22/1994 | US5296455 Process for preparing superconductor of compound oxide of Bi-Sr-Ca-Cu system |
| 03/22/1994 | US5296412 Method of heat treating semiconductor wafers by varying the pressure and temperature |
| 03/22/1994 | US5296258 Method of forming silicon carbide |
| 03/22/1994 | US5296255 In-situ monitoring, and growth of thin films by means of selected area CVD |
| 03/22/1994 | US5296037 Plasma CVD system comprising plural upper electrodes |
| 03/22/1994 | US5296036 Apparatus for continuously forming a large area functional deposit film including microwave transmissive member transfer mean |
| 03/22/1994 | US5296011 Gaseous reaction for vapor deposition of coating |
| 03/17/1994 | WO1994005825A1 Igniter for microwave energized plasma processing apparatus |
| 03/17/1994 | EP0528986A4 Materials for chemical vapor deposition processes. |
| 03/17/1994 | DE4330266A1 Reaction chamber for chemical vapour deposition - comprises wafer heating appts., gas supply head, reaction chamber element, waste gas outlet |
| 03/17/1994 | DE4302747C1 Phthalocyanine type gas sensor for trace gas determination - has passivation layer to prevent contamination of sensitive layer |
| 03/17/1994 | DE4230290A1 Appts. for producing plasma using cathode sputtering - comprises plasma chamber, target connected to electrode, magnetron, and microwave emitter |
| 03/16/1994 | EP0586758A1 Hybrid reinforcements for high temperature composites and composites made therefrom |
| 03/16/1994 | EP0586651A1 Treatment chamber |
| 03/16/1994 | EP0586579A1 Window for microwave plasma processing device |
| 03/15/1994 | US5295220 Process for the production of a thin film optical waveguide of TiO2 |
| 03/15/1994 | US5294778 CVD platen heater system utilizing concentric electric heating elements |
| 03/15/1994 | US5294465 Desorbing passivating atoms on a substrate by applying voltage from a probe; absorbing gas molecules on activated surface; bonding |
| 03/15/1994 | US5294464 Vacuum coating a plastic substrate, generation of a plasma and applying a reflective coating |
| 03/15/1994 | US5294286 Alternating supply of dichlorosilane and evacuating; counting cycles; semiconductors |
| 03/15/1994 | US5294280 Gas measuring device and processing apparatus provided with the gas measuring device |
| 03/15/1994 | US5294262 Method of cleaning a process tube with ClF3 gas and controlling the temperature of process |
| 03/15/1994 | CA1327772C Method for synthesis of diamond |
| 03/10/1994 | DE4228999A1 Prodn. of temp.-dependent electrical element - comprises depositing electrically active layer in gas phase onto substrate |
| 03/09/1994 | EP0586301A1 Process for the pretreatment of the reaction chamber and/or the substrate for the selective deposition of tungsten |
| 03/09/1994 | EP0585848A1 Method and apparatus for thin film formation by CVD |
| 03/09/1994 | EP0585583A1 Hard multilayer film and method for production thereof |
| 03/09/1994 | EP0585343A1 Primary flow cvd apparatus and method |
| 03/08/1994 | US5292594 Transition metal aluminum/aluminide coatings |
| 03/08/1994 | US5292554 Deposition apparatus using a perforated pumping plate |
| 03/08/1994 | US5292396 Plasma processing chamber |
| 03/08/1994 | US5292371 Chemical vapor deposition |
| 03/03/1994 | WO1994006529A1 Liquid gasification apparatus |
| 03/03/1994 | WO1994005035A1 Hollow-anode glow discharge apparatus |
| 03/03/1994 | WO1994004316A1 Titanium-nitride and titanium-carbide coated grinding tools and method therefor |
| 03/03/1994 | WO1994000870A3 Chemical vapor deposition from single organometallic precursors |
| 03/02/1994 | EP0584833A1 Diamond wire drawing die and the process for manufacturing the diamond wire drawing die |
| 03/02/1994 | EP0584252A1 A PROCESS FOR DEPOSITING A SIOx FILM HAVING REDUCED INTRINSIC STRESS AND/OR REDUCED HYDROGEN CONTENT |
| 03/02/1994 | EP0407457B1 Precursors for metal fluoride deposition and use thereof |
| 03/01/1994 | US5290993 Microwave plasma processing device |
| 03/01/1994 | US5290736 Method of forming interlayer-insulating film using ozone and organic silanes at a pressure above atmospheric |
| 03/01/1994 | US5290610 Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons |
| 03/01/1994 | US5290609 Method of forming dielectric film for semiconductor devices |
| 03/01/1994 | US5290358 System for controlling thickness profile of deposited thin film layers over three-dimensional topography: gaseous reactant beam provision, beam collimation, specific angle of incidence of beam, reaction probability of beam with surface |
| 03/01/1994 | US5290183 Lamp holding fixture for chemical vapor deposition |
| 03/01/1994 | CA1327338C Process for producing devices containing silicon nitride films |
| 03/01/1994 | CA1327277C Multilayer coated cemented carbide cutting insert |
| 02/24/1994 | DE4235073C1 Insulating metal-ceramic composite body esp. for liq. metal handling - is diffusion welded together using iron@-chromium@ alloy bond layers |
| 02/23/1994 | EP0583853A2 A process for the production of a surface-coated cemented carbide |
| 02/23/1994 | EP0583374A1 Method and apparatus for plasma deposition |
| 02/23/1994 | CN1082623A Process for passivating metal surfaces to enhance the stability of gaseous hydride mixtures at low concentration in contact therewith |
| 02/23/1994 | CN1082622A Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surfaces |
| 02/22/1994 | US5288684 Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction |
| 02/22/1994 | US5288662 Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning |
| 02/22/1994 | US5288648 Visual detection of analyte on reactive filler; semi-quantitative |
| 02/22/1994 | US5288556 Machines; vehicles |
| 02/22/1994 | US5288543 Multilaye of plasma polymer and diamond life film, used in audio and video tapes |
| 02/22/1994 | US5288527 Chemical vapor deposition of silicon nitride film from plasma mixture of silane and nitrogen and ammonia |
| 02/22/1994 | US5288518 Feeding the gas flow of alkoxysilane and fluoroalkoxysilane into a reactor, decomposition to form noncracked thick film |
| 02/22/1994 | US5288515 Vapor deposition method and apparatus for producing an EL thin film of uniform thickness |
| 02/22/1994 | US5288329 Chemical vapor deposition apparatus of in-line type |
| 02/22/1994 | US5288327 Deflected flow in chemical vapor deposition cell |
| 02/22/1994 | US5288326 Apparatus for continuous growth of SiC single crystal from SiC synthesized in a vapor phase without using graphite crucible |
| 02/22/1994 | US5288325 Chemical vapor deposition apparatus |
| 02/17/1994 | WO1994003331A1 Abrasion wear resistant coated substrate product |
| 02/16/1994 | EP0582691A1 Method for coating glass substrates |