Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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05/11/1994 | EP0596455A1 Fabrication method for micromechanical element |
05/11/1994 | EP0596092A1 Process and device for applying pulses on the surface of a solid body |
05/11/1994 | EP0497907B1 Vapor depostion process for depositing an organo-metallic compound layer on a substrate |
05/11/1994 | EP0417067B1 Energy intensive surface reactions using a cluster beam |
05/11/1994 | CA2145878A1 Precursors and processes for making metal oxides |
05/10/1994 | US5311103 Apparatus for the coating of material on a substrate using a microwave or UHF plasma |
05/10/1994 | US5310607 Hard coating; a workpiece coated by such hard coating and a method of coating such workpiece by such hard coating |
05/10/1994 | US5310596 Multilayer diamond structure of carbon with crystal structure containing columns |
05/10/1994 | US5310583 Oxidation to high purity silica; by-product inhibition; dielectrics |
05/10/1994 | US5310512 Method for producing synthetic diamond structures |
05/10/1994 | US5310426 High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure and an apparatus therefor |
05/05/1994 | DE4237017A1 Verfahren zur Herstellung eines Heizelements A method for manufacturing a heating element |
05/05/1994 | DE4236441A1 Sealing gas spaces in a height temperature fuel cell - treating spaces with at least two gases in succession, first containing oxidisable compound, others being acidic |
05/04/1994 | EP0595300A1 Apparatus for manufacturing semiconductor device |
05/04/1994 | EP0595175A1 Device for the supply of CVD-deposition-equipment |
05/04/1994 | EP0595159A1 Process and apparatus for interior coating of strongly curved, essentially dome-shaped substrates by CVD |
05/04/1994 | EP0595054A1 Method for processing semiconductor wafers at temperatures exceeding 400 degrees C. |
05/04/1994 | EP0594676A1 method for producing DIAMOND MEMBRANES FOR X-RAY LITHOGRAPHY |
05/04/1994 | CA2102159A1 Diamond-coated article with integral wearout indicator |
05/03/1994 | US5309071 Zinc sulfide electroluminescent phosphor particles and electroluminescent lamp made therefrom |
05/03/1994 | US5308955 Vertical heat treatment apparatus with vented heat insulation cover means |
05/03/1994 | US5308950 Method of removing material from a surface in a vacuum chamber |
05/03/1994 | US5308707 Treatment process for depositing a layer of carbon in vapour phase on the surface of a metal article and article thus obtained |
05/03/1994 | US5308661 Heating carbon coated substrate while treating with a methane/ hydrogen gas mixture in the presence of a plasma and depositing a continuous diamond layer |
05/03/1994 | US5308655 Processing for forming low resistivity titanium nitride films |
05/03/1994 | US5308651 Pulsation lasers for decomposition, radiation |
05/03/1994 | US5308650 Vapor deposition and cladding with microwave pulsation |
05/03/1994 | US5308649 Forming barrier coatings on exterior of polymeric substrates |
05/03/1994 | US5308433 Deposition of thin films |
05/03/1994 | US5308367 Titanium-nitride and titanium-carbide coated grinding tools and method therefor |
05/03/1994 | US5308241 Surface shaping and finshing apparatus and method |
05/03/1994 | US5307568 Duct between piping unit and reduced-pressure vessel composed of austenitic steel contains molybdenum; eliminates microcontamination from particles of heavy metal ions |
05/03/1994 | CA1329166C Plasma thin film deposition process control |
05/03/1994 | CA1329067C Method for depositing composite coatings |
04/28/1994 | WO1994009179A1 High density plasma deposition and etching apparatus |
04/28/1994 | WO1994009178A1 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride |
04/28/1994 | CA2130335A1 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride |
04/27/1994 | EP0594453A2 Process for forming deposited film for light-receiving member , light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus |
04/27/1994 | EP0594171A1 Process and apparatus for the modification of the surface activity of a silicate glass substrate |
04/27/1994 | EP0594032A1 Deposition of layers at high specific electric conductivity |
04/27/1994 | EP0593579A1 Rapid-switching rotating disk reactor |
04/26/1994 | US5306928 Diamond semiconductor device having a non-doped diamond layer formed between a BN substrate and an active diamond layer |
04/26/1994 | US5306895 Corrosion-resistant member for chemical apparatus using halogen series corrosive gas |
04/26/1994 | US5306836 Volatile CVD precursors based on copper alkoxides and mixed group IIA-copper alkoxides |
04/26/1994 | US5306660 Technique for doping mercury cadmium telluride MOCVD grown crystalline materials using free radical transport of elemental indium and apparatus therefor |
04/26/1994 | US5306530 Using high energy photons or radiation |
04/26/1994 | US5306447 Method and apparatus for direct use of low pressure vapor from liquid or solid precursors for selected area laser deposition |
04/26/1994 | US5306348 Metal growth accelerator shell for the chemical vaporization deposition of diamond |
04/26/1994 | US5306345 Deposition chamber for deposition of particles on semiconductor wafers |
04/26/1994 | CA1328796C Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers |
04/26/1994 | CA1328757C Optical fiber and apparatus for producing same |
04/21/1994 | DE4235015A1 Chemical vapour deposition of diamond film on ferrous substrate - with deposition of silicon carbide barrier film or composite film of continuously varying compsn. to assist seed formation and increase adhesion |
04/21/1994 | DE4234998A1 New cyclic silicon and germanium amide cpds. - used in deposition of element which can be vaporised in vacuum or inert gas stream without decomposition, useful in semiconductor film prod |
04/20/1994 | CN1024271C Process for coating glass |
04/19/1994 | US5304461 Process for the selective deposition of thin diamond film by gas phase synthesis |
04/19/1994 | US5304424 High thermal conductivity diamond/non-diamond composite materials |
04/19/1994 | US5304407 Method for depositing a film |
04/19/1994 | US5304398 Chemical vapor deposition of silicon dioxide using hexamethyldisilazane |
04/19/1994 | US5304397 Oxidation resistant carbon and method for making same |
04/19/1994 | US5304394 Technique for forming, by pyrolysis in a gaseous process, a coating based essentially upon oxygen and silicon |
04/19/1994 | US5304279 Radio frequency induction/multipole plasma processing tool |
04/19/1994 | US5304277 Plasma processing apparatus using plasma produced by microwaves |
04/19/1994 | US5304255 Photovoltaic cell with photoluminescent plasma polymerized film |
04/19/1994 | US5304250 Plasma system comprising hollow mesh plate electrode |
04/19/1994 | US5304249 Suscepter device for the preparation of a diamond film-coated body |
04/19/1994 | US5304248 Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions |
04/19/1994 | US5304031 High temperature, oxidation and creep resistance |
04/19/1994 | US5303671 System for continuously washing and film-forming a semiconductor wafer |
04/19/1994 | US5303558 Thermal trap for gaseous materials |
04/19/1994 | CA1328580C Composite coatings |
04/14/1994 | WO1994008076A1 Heteroepitaxially deposited diamond |
04/14/1994 | WO1994008068A1 Pretreatment of plastic components for electrostatic enameling |
04/14/1994 | WO1994007810A1 Wear-resistant carbon surfaces |
04/14/1994 | WO1994007613A2 Method for synthesizing solids such as diamond and products produced thereby |
04/14/1994 | CA2146111A1 A method for synthesizing solids such as diamond and products produced thereby |
04/13/1994 | EP0592239A2 Method and apparatus for densification of porous billets |
04/13/1994 | EP0592227A2 Fabrication of a thin film transistor and production of a liquid crystal display apparatus |
04/13/1994 | EP0592017A2 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
04/13/1994 | EP0591496A1 Use of organo-metallic compounds for precipitating metals on substrates |
04/13/1994 | EP0391901B1 Process for depositing superconducting oxide ceramic coatings on a substrate |
04/13/1994 | CN1024236C Method for obtaining heterojunction semiconductor and super crystal lattice materials and equipment thereof |
04/12/1994 | US5302555 Mixing silane plasma gases with oxygen, reduced pressure |
04/12/1994 | US5302424 Method for forming a film with plasma CVD process |
04/12/1994 | US5302422 Deposition process of a ceramic coating on a metallic substrate |
04/12/1994 | US5302237 Localized plasma processing |
04/12/1994 | US5302231 CVD diamond by alternating chemical reactions |
04/12/1994 | US5302230 Heat treatment by light irradiation |
04/12/1994 | US5302209 Apparatus for manufacturing semiconductor device |
04/07/1994 | DE4233085A1 Heteroepitaktisch abgeschiedenes Diamant Heteroepitaxial diamond deposited |
04/07/1994 | DE4233000A1 Vorbehandlung von Kunststoffteilen für die elektrostatische Lackierung Pretreatment of plastic parts for electrostatic painting |
04/06/1994 | EP0591086A2 Low temperature chemical vapor deposition and method for depositing a tungsten silicide film with improved uniformity and reduced fluorine concentration |
04/06/1994 | EP0591082A2 System and method for directional low pressure chemical vapor deposition |
04/06/1994 | EP0590486A2 Polymerization catalysts and process for producing polymers |
04/06/1994 | EP0590467A1 Process for forming scratch-resistant silicon oxide layers on plastics by plasma-coating |
04/06/1994 | EP0590148A1 Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal |
04/06/1994 | EP0589869A1 Gas phase selective beam deposition |
04/05/1994 | US5300951 Carbonizing support surface; forming silicon nitride layer from plasma atmosphere; firm adhesion |
04/05/1994 | US5300460 UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers |
04/05/1994 | US5300322 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride |
04/05/1994 | US5300321 Process for depositing titanium nitride film by CVD |