Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/1994
05/11/1994EP0596455A1 Fabrication method for micromechanical element
05/11/1994EP0596092A1 Process and device for applying pulses on the surface of a solid body
05/11/1994EP0497907B1 Vapor depostion process for depositing an organo-metallic compound layer on a substrate
05/11/1994EP0417067B1 Energy intensive surface reactions using a cluster beam
05/11/1994CA2145878A1 Precursors and processes for making metal oxides
05/10/1994US5311103 Apparatus for the coating of material on a substrate using a microwave or UHF plasma
05/10/1994US5310607 Hard coating; a workpiece coated by such hard coating and a method of coating such workpiece by such hard coating
05/10/1994US5310596 Multilayer diamond structure of carbon with crystal structure containing columns
05/10/1994US5310583 Oxidation to high purity silica; by-product inhibition; dielectrics
05/10/1994US5310512 Method for producing synthetic diamond structures
05/10/1994US5310426 High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure and an apparatus therefor
05/05/1994DE4237017A1 Verfahren zur Herstellung eines Heizelements A method for manufacturing a heating element
05/05/1994DE4236441A1 Sealing gas spaces in a height temperature fuel cell - treating spaces with at least two gases in succession, first containing oxidisable compound, others being acidic
05/04/1994EP0595300A1 Apparatus for manufacturing semiconductor device
05/04/1994EP0595175A1 Device for the supply of CVD-deposition-equipment
05/04/1994EP0595159A1 Process and apparatus for interior coating of strongly curved, essentially dome-shaped substrates by CVD
05/04/1994EP0595054A1 Method for processing semiconductor wafers at temperatures exceeding 400 degrees C.
05/04/1994EP0594676A1 method for producing DIAMOND MEMBRANES FOR X-RAY LITHOGRAPHY
05/04/1994CA2102159A1 Diamond-coated article with integral wearout indicator
05/03/1994US5309071 Zinc sulfide electroluminescent phosphor particles and electroluminescent lamp made therefrom
05/03/1994US5308955 Vertical heat treatment apparatus with vented heat insulation cover means
05/03/1994US5308950 Method of removing material from a surface in a vacuum chamber
05/03/1994US5308707 Treatment process for depositing a layer of carbon in vapour phase on the surface of a metal article and article thus obtained
05/03/1994US5308661 Heating carbon coated substrate while treating with a methane/ hydrogen gas mixture in the presence of a plasma and depositing a continuous diamond layer
05/03/1994US5308655 Processing for forming low resistivity titanium nitride films
05/03/1994US5308651 Pulsation lasers for decomposition, radiation
05/03/1994US5308650 Vapor deposition and cladding with microwave pulsation
05/03/1994US5308649 Forming barrier coatings on exterior of polymeric substrates
05/03/1994US5308433 Deposition of thin films
05/03/1994US5308367 Titanium-nitride and titanium-carbide coated grinding tools and method therefor
05/03/1994US5308241 Surface shaping and finshing apparatus and method
05/03/1994US5307568 Duct between piping unit and reduced-pressure vessel composed of austenitic steel contains molybdenum; eliminates microcontamination from particles of heavy metal ions
05/03/1994CA1329166C Plasma thin film deposition process control
05/03/1994CA1329067C Method for depositing composite coatings
04/1994
04/28/1994WO1994009179A1 High density plasma deposition and etching apparatus
04/28/1994WO1994009178A1 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
04/28/1994CA2130335A1 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
04/27/1994EP0594453A2 Process for forming deposited film for light-receiving member , light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus
04/27/1994EP0594171A1 Process and apparatus for the modification of the surface activity of a silicate glass substrate
04/27/1994EP0594032A1 Deposition of layers at high specific electric conductivity
04/27/1994EP0593579A1 Rapid-switching rotating disk reactor
04/26/1994US5306928 Diamond semiconductor device having a non-doped diamond layer formed between a BN substrate and an active diamond layer
04/26/1994US5306895 Corrosion-resistant member for chemical apparatus using halogen series corrosive gas
04/26/1994US5306836 Volatile CVD precursors based on copper alkoxides and mixed group IIA-copper alkoxides
04/26/1994US5306660 Technique for doping mercury cadmium telluride MOCVD grown crystalline materials using free radical transport of elemental indium and apparatus therefor
04/26/1994US5306530 Using high energy photons or radiation
04/26/1994US5306447 Method and apparatus for direct use of low pressure vapor from liquid or solid precursors for selected area laser deposition
04/26/1994US5306348 Metal growth accelerator shell for the chemical vaporization deposition of diamond
04/26/1994US5306345 Deposition chamber for deposition of particles on semiconductor wafers
04/26/1994CA1328796C Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers
04/26/1994CA1328757C Optical fiber and apparatus for producing same
04/21/1994DE4235015A1 Chemical vapour deposition of diamond film on ferrous substrate - with deposition of silicon carbide barrier film or composite film of continuously varying compsn. to assist seed formation and increase adhesion
04/21/1994DE4234998A1 New cyclic silicon and germanium amide cpds. - used in deposition of element which can be vaporised in vacuum or inert gas stream without decomposition, useful in semiconductor film prod
04/20/1994CN1024271C Process for coating glass
04/19/1994US5304461 Process for the selective deposition of thin diamond film by gas phase synthesis
04/19/1994US5304424 High thermal conductivity diamond/non-diamond composite materials
04/19/1994US5304407 Method for depositing a film
04/19/1994US5304398 Chemical vapor deposition of silicon dioxide using hexamethyldisilazane
04/19/1994US5304397 Oxidation resistant carbon and method for making same
04/19/1994US5304394 Technique for forming, by pyrolysis in a gaseous process, a coating based essentially upon oxygen and silicon
04/19/1994US5304279 Radio frequency induction/multipole plasma processing tool
04/19/1994US5304277 Plasma processing apparatus using plasma produced by microwaves
04/19/1994US5304255 Photovoltaic cell with photoluminescent plasma polymerized film
04/19/1994US5304250 Plasma system comprising hollow mesh plate electrode
04/19/1994US5304249 Suscepter device for the preparation of a diamond film-coated body
04/19/1994US5304248 Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
04/19/1994US5304031 High temperature, oxidation and creep resistance
04/19/1994US5303671 System for continuously washing and film-forming a semiconductor wafer
04/19/1994US5303558 Thermal trap for gaseous materials
04/19/1994CA1328580C Composite coatings
04/14/1994WO1994008076A1 Heteroepitaxially deposited diamond
04/14/1994WO1994008068A1 Pretreatment of plastic components for electrostatic enameling
04/14/1994WO1994007810A1 Wear-resistant carbon surfaces
04/14/1994WO1994007613A2 Method for synthesizing solids such as diamond and products produced thereby
04/14/1994CA2146111A1 A method for synthesizing solids such as diamond and products produced thereby
04/13/1994EP0592239A2 Method and apparatus for densification of porous billets
04/13/1994EP0592227A2 Fabrication of a thin film transistor and production of a liquid crystal display apparatus
04/13/1994EP0592017A2 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
04/13/1994EP0591496A1 Use of organo-metallic compounds for precipitating metals on substrates
04/13/1994EP0391901B1 Process for depositing superconducting oxide ceramic coatings on a substrate
04/13/1994CN1024236C Method for obtaining heterojunction semiconductor and super crystal lattice materials and equipment thereof
04/12/1994US5302555 Mixing silane plasma gases with oxygen, reduced pressure
04/12/1994US5302424 Method for forming a film with plasma CVD process
04/12/1994US5302422 Deposition process of a ceramic coating on a metallic substrate
04/12/1994US5302237 Localized plasma processing
04/12/1994US5302231 CVD diamond by alternating chemical reactions
04/12/1994US5302230 Heat treatment by light irradiation
04/12/1994US5302209 Apparatus for manufacturing semiconductor device
04/07/1994DE4233085A1 Heteroepitaktisch abgeschiedenes Diamant Heteroepitaxial diamond deposited
04/07/1994DE4233000A1 Vorbehandlung von Kunststoffteilen für die elektrostatische Lackierung Pretreatment of plastic parts for electrostatic painting
04/06/1994EP0591086A2 Low temperature chemical vapor deposition and method for depositing a tungsten silicide film with improved uniformity and reduced fluorine concentration
04/06/1994EP0591082A2 System and method for directional low pressure chemical vapor deposition
04/06/1994EP0590486A2 Polymerization catalysts and process for producing polymers
04/06/1994EP0590467A1 Process for forming scratch-resistant silicon oxide layers on plastics by plasma-coating
04/06/1994EP0590148A1 Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus, signal processor, and method of producing molten crystal
04/06/1994EP0589869A1 Gas phase selective beam deposition
04/05/1994US5300951 Carbonizing support surface; forming silicon nitride layer from plasma atmosphere; firm adhesion
04/05/1994US5300460 UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers
04/05/1994US5300322 Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
04/05/1994US5300321 Process for depositing titanium nitride film by CVD