| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/02/1993 | EP0544437A2 Method for selectively growing aluminum-containing layers |
| 06/02/1993 | EP0372061B1 Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams |
| 06/02/1993 | EP0270656B1 Vapour deposition of monomer fluids |
| 06/02/1993 | CN1072734A Apparatus for rapid plasma treatments and method |
| 06/01/1993 | US5216329 Device for distributing a microwave energy for exciting a plasma |
| 06/01/1993 | US5216223 Plasma treatment apparatus |
| 06/01/1993 | US5215823 Interfaces of solid solution constitute metal element titanium or/and tantalum from carbides with iron from substrate alloy; adhesion, friction resistance |
| 06/01/1993 | US5215788 Burning a mixture of gases containing carbon and reducing the velocity of gas flow to stationary |
| 06/01/1993 | US5215787 Using a vapor containing an alkoxyfluorosilane; temperature |
| 06/01/1993 | US5215588 Photo-CVD system |
| 06/01/1993 | US5215242 Method for preparing superconducting joints |
| 05/27/1993 | WO1993010556A1 Apparatus for forming oxide film, heat treatment apparatus, semiconductor device, manufacturing method therefor |
| 05/27/1993 | WO1993010286A1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION |
| 05/27/1993 | WO1993010283A1 Method of coating metal using low temperature plasma and electrodeposition |
| 05/27/1993 | DE4138722A1 Low volatility material dosing and evapn. - by converting soln. to aerosol and heating, used in CVD of layers of complicated compsn. |
| 05/27/1993 | CA2123085A1 Method of coating metal using low temperature plasma and electrodeposition |
| 05/25/1993 | US5213997 Method for forming crystalline film employing localized heating of the substrate |
| 05/25/1993 | US5213851 Process for preparing ferrite films by radio-frequency generated aerosol plasma deposition in atmosphere |
| 05/25/1993 | US5213844 Volatile CVD precursors based on copper alkoxides and mixed Group IIA-copper alkoxides |
| 05/25/1993 | US5213767 Dry exhaust gas conditioning |
| 05/25/1993 | US5213670 Method for manufacturing a polycrystalline layer on a substrate |
| 05/25/1993 | US5213497 Semiconductor processing gas diffuser plate |
| 05/25/1993 | CA1318225C Resistance heater for diamond production by cvd |
| 05/25/1993 | CA1318193C Transparent electrical conductor fabrication |
| 05/19/1993 | EP0542210A1 Method of making an optical thin film waveguide of TiO2 |
| 05/19/1993 | EP0541916A1 Process for passiveting the surface of sensors |
| 05/18/1993 | US5212400 Method of depositing tungsten on silicon in a non-self-limiting CVD process and semiconductor device manufactured thereby |
| 05/18/1993 | US5212118 Air and space craft |
| 05/18/1993 | US5211995 Method of protecting an organic surface by deposition of an inorganic refractory coating thereon |
| 05/18/1993 | US5211987 Method and apparatus for forming refractory metal films |
| 05/18/1993 | US5211825 Plasma processing apparatus and the method of the same |
| 05/18/1993 | US5211796 Integrated circuits |
| 05/18/1993 | US5211759 Method for a doublesided coating of optical substrates |
| 05/18/1993 | US5211758 Chemical vapor deposition apparatus |
| 05/18/1993 | US5210959 Ambient-free processing system |
| 05/13/1993 | WO1993009261A1 Methods and apparatus for treating a work surface |
| 05/13/1993 | WO1993008927A1 Chemical vapor deposition of diamond films using water-based plasma discharges |
| 05/13/1993 | CA2122995A1 Chemical vapor deposition of diamond films using water-based plasma discharges |
| 05/12/1993 | EP0541071A1 Polycrystalline diamond cutting tool and method of manufacturing the same |
| 05/12/1993 | EP0540983A2 Process for the deposition of molybdenum- or tungsten containing layers |
| 05/12/1993 | EP0516714A4 Titanium nitride or tin oxide bonding to a coater surface |
| 05/11/1993 | US5210466 Plasma processing reactor |
| 05/11/1993 | US5210055 Method for the plasma treatment of semiconductor devices |
| 05/11/1993 | US5209952 Use of organometallic compounds to deposit thin films from the gas phase |
| 05/11/1993 | US5209916 Conversion of fullerenes to diamond |
| 05/11/1993 | US5209812 Hot filament method for growing high purity diamond |
| 05/11/1993 | US5209182 Chemical vapor deposition apparatus for forming thin film |
| 05/11/1993 | CA1317644C Large area microwave plasma apparatus |
| 05/05/1993 | EP0540366A1 Tool insert |
| 05/05/1993 | EP0540272A1 Coated ceramic fibrex system |
| 05/05/1993 | EP0540084A1 Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons |
| 05/05/1993 | EP0540082A1 LPCVD reactor for high efficiency, high uniformity deposition and a method of such deposition |
| 05/05/1993 | EP0539993A2 Ink jet print head and method of manufacturing the same |
| 05/05/1993 | EP0539948A2 Apparatus for forming metal film and process for forming metal film |
| 05/05/1993 | EP0325659B1 Complex compounds for forming thin film of oxide superconductor and process for forming thin film of oxide superconductor |
| 05/05/1993 | EP0211938B1 System and method for depositing plural thin film layers on a substrate |
| 05/05/1993 | CN1020507C Dial fabrication method by using semiconductor technology |
| 05/05/1993 | CN1020478C Apparatus for coating substate |
| 05/05/1993 | CN1020477C Carbon material containing halogen and deposition method for same |
| 05/04/1993 | US5208069 Silane precursor |
| 05/04/1993 | US5207835 High capacity epitaxial reactor |
| 05/01/1993 | CA2081631A1 Tool insert |
| 04/29/1993 | CA2077814A1 Coated ceramic fiber system |
| 04/28/1993 | EP0539050A1 Chemical vapor deposition of diamond |
| 04/28/1993 | EP0538874A1 Method and apparatus for manufacturing semiconductor devices |
| 04/27/1993 | US5206471 Microwave activated gas generator |
| 04/27/1993 | US5206083 Diamond and diamond-like films and coatings prepared by deposition on substrate that contain a dispersion of diamond particles |
| 04/27/1993 | US5206060 Pretreatment of substrate to make electroconductive; plasma vapor deposition |
| 04/27/1993 | US5205903 Gas etching, vapor deposition |
| 04/27/1993 | US5205870 Chemical reactor with laser beam and resonator for efficient photochemical activation, ionization or decomposition of reacting gases |
| 04/27/1993 | US5205188 Friction pairing and process for its production |
| 04/26/1993 | CA2077773A1 Microwave, rf, or ac/dc discharge assisted flame deposition of cvd diamond |
| 04/22/1993 | DE4132560C1 Plasma-aided deposition of film for integrated semiconductor circuit - using neutral particles, activated by microwave in separate chamber, and non-excited reaction gas, etc. |
| 04/21/1993 | EP0538092A1 Gaseous phase chemical-treatment reactor |
| 04/21/1993 | EP0537854A1 Method of manufacturing a semiconductor device whereby a layer of material is deposited on the surface of a semiconductor wafer from a process gas |
| 04/21/1993 | EP0537364A1 Apparatus and method for manufacturing semiconductor device |
| 04/20/1993 | US5204318 Alloying lanthanum, copper and barium, shaping, oxidizing to superconductive oxide; noble alloy metals precipitating out as pure metal phase |
| 04/20/1993 | US5204314 Flash vaporization of Group II beta-diketonate source material to form superconducting oxide and Group II fluorides |
| 04/20/1993 | US5204272 Disposing bias wire in microwave energized plasma, applying positive voltage during only part of intrinsic layer deposition |
| 04/20/1993 | US5204167 Diamond-coated sintered body excellent in adhesion and process for preparing the same |
| 04/20/1993 | US5204145 Apparatus for producing diamonds by chemical vapor deposition and articles produced therefrom |
| 04/20/1993 | US5204144 Method for plasma deposition on apertured substrates |
| 04/20/1993 | US5204141 Heating substrate in vacuum, adding organodisilane and oxygen, depositing film |
| 04/20/1993 | US5204140 Process for coating a substrate with tin oxide |
| 04/20/1993 | US5204138 From silane, perfluorosilane and nitrogen gases |
| 04/20/1993 | US5203981 Vacuum-treatment apparatus |
| 04/20/1993 | US5203959 Microwave plasma etching and deposition method employing first and second magnetic fields |
| 04/20/1993 | US5203956 Fluorine-based gas |
| 04/20/1993 | US5203925 Vacuum chamber with heater, ampule of organic tantalum compound, containers of carrier and oxygen-containing gases, three-way valve; constant supply, uniform quality |
| 04/20/1993 | US5203924 Two vacuum vessels, plasma generating means, mesh type electrode, voltage applying means |
| 04/20/1993 | US5203903 Method of coating glass |
| 04/15/1993 | WO1993007312A1 Method of coating substrates |
| 04/14/1993 | EP0537062A1 Treatment method for vapor deposition of a carbon layer on the surface of a metallic substrate |
| 04/14/1993 | EP0536664A1 A method for forming a thin film |
| 04/14/1993 | EP0536410A1 Method for forming vapor phase grown film and apparatus for producing semiconductor devices |
| 04/14/1993 | EP0536394A1 Method of producing polycrystalline silicon rods for semiconductors and thermal decomposition furnace therefor |
| 04/14/1993 | CN1020290C CVD apparatus |
| 04/13/1993 | US5202158 Apparatus for and method of producing high density fiber reinforced composite material |
| 04/13/1993 | US5202156 Coating mold surface with durable amorphous carbon-hydrogen release film, for hot-pressing and molding glass |
| 04/13/1993 | US5201995 Creating a vapor phase chemical equilibrium system capable of deposition and etching the material deposited |