C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1994
11/30/1994	EP0616729A4 Semiconductor device and microwave process for its manufacture.
11/30/1994	EP0331718B1 Multiple electrode plasma reactor power distribution system
11/30/1994	CN1095769A Method and apparatus for preparing crystalline thin-films for solid-state lasers
11/29/1994	US5369722 Multilayer elements of substrates and polymers
11/29/1994	US5368939 Waterproof titanium compound multilayer coatings and amorphous coatings of carbon
11/29/1994	US5368938 Oxidation resistant carbon and method for making same
11/29/1994	US5368937 Improved carbon containing thin film formed by increasing bias voltage during a plasma CVD process
11/29/1994	US5368897 Method for arc discharge plasma vapor deposition of diamond
11/29/1994	US5368888 Apparatus and method for gas phase coating of hollow articles
11/29/1994	US5368710 Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
11/29/1994	US5368648 Sealing apparatus
11/29/1994	US5368647 Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface
11/29/1994	US5368646 Reaction chamber design to minimize particle generation in chemical vapor deposition reactors
11/29/1994	US5368062 Gas supplying system and gas supplying apparatus
11/24/1994	WO1994027323A1 Preparation of nucleated silicon surfaces
11/24/1994	WO1994026953A1 Method for fabricating oriented diamond films
11/24/1994	WO1994026952A1 Apparatus and method for depositing diamond and refractory materials
11/24/1994	WO1994026951A1 Substrate temperature control apparatus and technique for cvd reactors
11/24/1994	WO1994026425A1 Laser absorption wave deposition process
11/24/1994	WO1994026424A1 Solar-induced chemical vapor deposition of diamond-type carbon films
11/24/1994	DE4417626A1 Device for semiconductor production and method for semiconductor production
11/24/1994	DE4417235A1 Plasma polymer layer sequence as hard material layer having adhesion behaviour which can be set in a defined way
11/24/1994	DE4417205A1 Production instrument for semiconductor devices and cleaning method for the instrument
11/23/1994	EP0625589A1 CVD reactor
11/23/1994	EP0625588A1 Plasmapolymer layer-set as hard material coat of defenitely adjustable adhesion behaviour
11/23/1994	EP0625218A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions.
11/22/1994	US5367139 Methods and apparatus for contamination control in plasma processing
11/22/1994	US5366770 Coating nickel substrate with zirconium, calcium and yttrium compounds using ultrasonic waves; radio frequency radiation; vaporization
11/22/1994	US5366766 Method of manufacturing thin film and thin film device
11/22/1994	US5366713 Vapor deposition using silane, hydrogen, trimethylborane, and either diborane/6/ or boron trifluoride gases; carbiding
11/22/1994	US5366587 Process for fabricating micromachines
11/22/1994	US5366585 Method and apparatus for protection of conductive surfaces in a plasma processing reactor
11/22/1994	US5366579 Forming coating on a substrate, treating for enhanncing adhesion, bonding to required surface, removing substrate; cuttin/grinding tools
11/22/1994	US5366555 Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means
11/22/1994	US5366554 Device for forming a deposited film
11/22/1994	US5366522 Multilayer cutters with brazing layers
11/22/1994	US5365877 Method of growing semiconductor in vapor phase
11/22/1994	CA1333139C Highly erosive and abrasive wear resistant composite coating system
11/17/1994	EP0624901A1 Semiconductor device with a passivation layer
11/17/1994	EP0624869A2 Magnetic recording medium
11/17/1994	EP0624660A1 Plasma Enhanced Chemical Vapour Deposition (PECVD) Process for forming Borophosphosilicate Glass (BPSG) with low flow temperature
11/17/1994	EP0447556B1 Surface-coated hard member having excellent abrasion resistance
11/17/1994	DE4316349A1 Method for internal coating of hollow bodies with organic top coats by plasma polymerisation and device for carrying out the method
11/16/1994	CN1026599C Method for formation of crystall film
11/15/1994	US5365345 Diamond layer, adhesive layer comprising germanium carbide, zinc salt layer
11/15/1994	US5364667 Photo-assisted chemical vapor deposition method
11/15/1994	US5364666 Process for barrier coating of plastic objects
11/15/1994	US5364665 Coating substrates with thin films as vapor barriers, glow discharge plasma from organosilicon, oxygen and inert gases
11/15/1994	US5364664 Vapor depositing aluminum from alkylaluminum hydride and hydrogen gas; wiring semiconductors and integrated circuits
11/15/1994	US5364660 Continuous atmospheric pressure CVD coating of fibers
11/15/1994	US5364562 Rare earth metal barium copper oxide formed from solutions treated with ultrasound
11/15/1994	US5364481 Apparatus for manufacturing a thin-film photovoltaic conversion device
11/15/1994	US5364423 Method for making diamond grit and abrasive media
11/15/1994	US5364209 Nitrides over refractory carbides or carbonitrides for inner layer adjuscent to substrate in order to minimize formation of eta phase at cemented carbide based substrate peripheral boundries; improved rupture strength
11/15/1994	US5363556 Water jet mixing tubes used in water jet cutting devices and method of preparation thereof
11/15/1994	CA1333041C Process for forming deposited film
11/15/1994	CA1333040C Process for forming deposited film
11/10/1994	WO1994025638A1 Method and apparatus for producing nickel shell molds
11/10/1994	DE4412915A1 Plasma treatment plant and method of its operation
11/10/1994	DE4412902A1 Method for increasing the deposition rate, method for reducing the dust density in a plasma discharge chamber, and plasma chamber
11/09/1994	EP0623690A1 Tool with high load work surfaces
11/09/1994	EP0623688A1 Decomposable masking member
11/09/1994	EP0623381A1 Mixed gas supply system
11/09/1994	CN2182178Y Equipment for covering titanium nitride on mirror board
11/08/1994	US5363400 Physical vapor deposition method
11/08/1994	US5362686 Vapor deposition of dielectric film using pressurized gaseous mixture containing organic silane and nitriding gas yields strong moisture resistant coating
11/08/1994	US5362654 Self-contained quantitative assay
11/08/1994	US5362580 Compressing mat of dense graphite fibers, heating to nickel carbonyl decomposition temperature, exposing mat to nickel carbonyl gas at a temperature between vaporization and decomposition so that nickel deposits on fibers and bonds them
11/08/1994	US5362526 Plasma-enhanced CVD process using TEOS for depositing silicon oxide
11/08/1994	US5362328 Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem
11/08/1994	US5362228 Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus
11/08/1994	US5361800 Liquid pump and vaporizer
11/08/1994	US5361621 Multiple grained diamond wire die
11/02/1994	EP0622647A2 Optical waveguide having an essentially planar substrate and its application
11/02/1994	EP0622475A1 Method and apparatus for degassing semiconductor processing liquids
11/02/1994	EP0622474A1 Continuous process for making a silica coating on a solid substrate
11/02/1994	EP0622473A1 Method for making a diamond coated structure
11/02/1994	EP0622472A1 Method for growing a diamond or c-BN thin film on a diamond or c-BN substrate
11/02/1994	EP0622111A1 Plasma polymerization and surface modification inside hollow micro-substrates
11/02/1994	EP0478777B1 Coated dielectric material for an ozone generator
11/02/1994	CN1094455A Diamond infrared penetration-increasing protective film and preparing technology
11/01/1994	US5360766 Semiconductors
11/01/1994	US5360646 Chemical vapor deposition method of silicon dioxide film
11/01/1994	US5360635 Depositing a conductive mixed oxide layer onto a porous substrate
11/01/1994	US5360485 Apparatus for diamond deposition by microwave plasma-assisted CVPD
11/01/1994	US5360484 Forming an amorphous semiconductor film on a substrate
11/01/1994	US5360483 Plasma CVD apparatus and method therefor
11/01/1994	US5360479 Vapor depositing carbon-12 or carbon-13; thermoconductivity
11/01/1994	US5359787 High purity bulk chemical delivery system
10/1994
10/30/1994	CA2120175A1 Method for making a diamond coated structure
10/27/1994	WO1994024332A1 Magnetic roller gas gate employing transonic sweep gas flow
10/27/1994	WO1994024331A1 Method and apparatus for coating a glass substrate
10/27/1994	DE4404110A1 Substrathalter für MOCVD und MOCVD-Vorrichtung Substrate holder for MOCVD and MOCVD apparatus
10/27/1994	DE4338478C1 Method for electron-induced material depositing
10/27/1994	CA2136639A1 Method and apparatus for coating a glass substrate
10/26/1994	EP0463000B1 Multilayer coated cemented carbide cutting insert
10/25/1994	US5359148 Heat-treating apparatus
10/25/1994	US5359101 Acrylate polymers with strong electron withdrawing groups
10/25/1994	US5358755 Uniformity, stability
10/25/1994	US5358754 Method for forming diamond films by vapor phase synthesis

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