| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/28/1993 | US5273774 Method of making zinc sulfide electroluminescent phosphor particles |
| 12/28/1993 | US5273731 Transparent and polycrystalline |
| 12/28/1993 | US5273618 Cover of a combustion flame having an edge forming a gap with the base to allow for another flame to prevent oxygen from mingling with the combustion flame |
| 12/28/1993 | US5273609 Controlling plasma discharges on a wafer and activating to generate energy at more than two discrete levels |
| 12/28/1993 | US5273588 Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means |
| 12/28/1993 | US5273587 Body of microwave transparent material designed so the inside gas pressure body is higher than that in the processing chamber |
| 12/28/1993 | US5273586 Low pressure chemical vapor deposition apparatus, with removal system for remaining ionized gas components |
| 12/28/1993 | US5273423 Heat treatment apparatus |
| 12/28/1993 | US5272880 Liquid vaporizer-feeder |
| 12/23/1993 | WO1993026038A1 Semiconductor wafer processing method and apparatus with heat and gas flow control |
| 12/23/1993 | WO1993025725A1 Process for depositing smooth polycrystalline layers |
| 12/23/1993 | WO1993025724A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus |
| 12/23/1993 | WO1993025723A1 Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten cvd |
| 12/23/1993 | WO1993025722A1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates |
| 12/23/1993 | WO1993025721A1 Method of nucleating tungsten on titanium nitride by cvd without silane |
| 12/23/1993 | WO1993025304A1 Pyrolytic deposition in a fluidized bed |
| 12/23/1993 | DE4220158A1 Selective precipitation of aluminium structures from the gas phase - using locally applied thin aluminium@ layers as catalysts in the pptn. process |
| 12/23/1993 | CA2137567A1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates |
| 12/23/1993 | CA2136863A1 Semiconductor wafer processing method and apparatus with heat and gas flow control |
| 12/23/1993 | CA2136862A1 Method of nucleating tungsten on titanium nitride by cvd without silane |
| 12/23/1993 | CA2136861A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus |
| 12/22/1993 | EP0575126A1 Plasma reactor head and electrode assembly |
| 12/22/1993 | EP0574935A1 Apparatus made of silica for semiconductor device fabrication |
| 12/22/1993 | EP0574809A1 Organic chlorides, showing a reduced effect upon the destruction of the ozone layer, for use during silicon thermal oxidation and furnace tube cleaning |
| 12/22/1993 | EP0574807A1 Chemical vapor deposition of metal oxide films |
| 12/22/1993 | EP0574806A1 Chemical vapor deposition of metal oxide films from reaction product precursors |
| 12/22/1993 | EP0362275B1 Fabrication of a semiconductor base material |
| 12/22/1993 | CN1023239C Apparatus for producing deposited of large area by using multiple kinds of active gases prepared individually |
| 12/22/1993 | CN1023209C Chemical vapor deposition of tin oxide on float glass in the tin bath |
| 12/21/1993 | US5272412 Method for the production of extraction grids for ion generation and grids produced according to said method |
| 12/21/1993 | US5272360 Thin film transistor having enhance stability in electrical characteristics |
| 12/21/1993 | US5272112 Low-temperature low-stress blanket tungsten film |
| 12/21/1993 | US5272014 Wear-resistant coating for substrate and method for applying |
| 12/21/1993 | US5271972 Method for depositing ozone/TEOS silicon oxide films of reduced surface sensitivity |
| 12/21/1993 | US5271971 Microwave plasma CVD method for coating a substrate with high thermal-conductivity diamond material |
| 12/21/1993 | US5271963 Elimination of low temperature ammonia salt in TiCl4 NH3 CVD reaction |
| 12/21/1993 | US5271957 Chemical vapor deposition of niobium and tantalum oxide films |
| 12/21/1993 | US5271696 Tool bit for machining materials |
| 12/21/1993 | CA2027171C Chemical vapor deposition process to replicate the finish and figure of preshaped structures |
| 12/18/1993 | CA2098436A1 Deposition process of a silicon containing product on a metallic substrate surface, anti-corrosion treatment, and metallized polymer substrate |
| 12/16/1993 | DE4219436A1 Verfahren zur Abscheidung glatter polykristalliner Schichten Process for the deposition of smooth polycrystalline layers |
| 12/15/1993 | EP0574263A1 CVD diamond films |
| 12/15/1993 | EP0574178A2 Dry process coating method and apparatus therefor |
| 12/15/1993 | EP0574100A2 Plasma CVD method and apparatus therefor |
| 12/15/1993 | EP0574075A1 Method of manufacturing a semiconductor device by means of a chemical vapour deposition |
| 12/15/1993 | EP0573911A2 Method for depositing silicon oxide films of improved properties |
| 12/15/1993 | EP0573707A2 Apparatus for gas source molecular beam epitaxy |
| 12/15/1993 | EP0573645A1 Method for coating a surface with a resistant facing by chemical-vapor deposition |
| 12/15/1993 | EP0573640A1 Coated glass article |
| 12/15/1993 | EP0573639A1 Coating composition for glass |
| 12/15/1993 | EP0573424A1 Coreless refractory fibres. |
| 12/14/1993 | US5270125 Boron nutride membrane in wafer structure |
| 12/14/1993 | US5270114 High thermal conductivity diamond/non-diamond composite materials |
| 12/14/1993 | US5270112 Refractory metal core, Al-O-N coating, SiC coating |
| 12/14/1993 | US5270082 Organic vapor deposition process for corrosion protection of metal substrates |
| 12/14/1993 | US5270077 Method for producing flat CVD diamond film |
| 12/14/1993 | US5270029 Cyclotron resonance chemical vapor deposition |
| 12/14/1993 | US5270028 Diamond and its preparation by chemical vapor deposition method |
| 12/14/1993 | US5269881 Plasma processing apparatus and plasma cleaning method |
| 12/14/1993 | US5269848 Silicon or germanium-containing amorphous film |
| 12/14/1993 | US5269847 Variable rate distribution gas flow reaction chamber |
| 12/14/1993 | CA2019923C Semiconductor film and process for its production |
| 12/14/1993 | CA1325160C Apparatus for producing compound semiconductor |
| 12/09/1993 | WO1993024676A1 Diamond film deposition |
| 12/09/1993 | WO1993024675A1 Organic group v compounds containing boron |
| 12/09/1993 | WO1993024243A1 Methods and apparatus for depositing barrier coatings |
| 12/09/1993 | DE4318310A1 Transition metals and oxide(s) esp. rhenium and osmium - obtd. by thermal, photochemical or plasma-induced decomposition of corresp. organo-metal oxide(s) e.g. methyl-rhenium tri:oxide |
| 12/09/1993 | DE4223403C1 Structured doped regions prodn. on solid bodies - by applying amorphous layer onto body, implanting doping material, melting regions of amorphous layer, and etching |
| 12/08/1993 | EP0573348A1 Process for deposition of copper on a substrate and device for carrying out the process |
| 12/08/1993 | EP0573325A1 Window provided with a functional coating |
| 12/08/1993 | EP0573033A1 Method of forming p-type silicon carbide |
| 12/08/1993 | EP0572810A1 Enhanced membrane-electrode interface |
| 12/07/1993 | USH1264 Method of in situ stoiciometric and geometrical photo induced modifications to compound thin films during epitaxial growth and applications thereof |
| 12/07/1993 | US5268217 Optically transparent substrate; composite layer vapor deposited, bonded to substrate |
| 12/07/1993 | US5268208 Plasma enhanced chemical vapor deposition of oxide film stack |
| 12/07/1993 | US5268202 Using halogen promoter and metal catalyst |
| 12/07/1993 | US5268201 Heating methane using tantalum filament |
| 12/07/1993 | US5268062 Pyrolytically dissociate gas; infiltrate pores and condensing on surface |
| 12/07/1993 | US5268034 Fluid dispersion head for CVD appratus |
| 12/07/1993 | US5268033 Table top parylene deposition chamber |
| 12/07/1993 | US5267390 Organic vapor deposition process for corrosion protection of prestamped metal substrates |
| 12/07/1993 | CA1324979C Method of treating surfaces of substrates with the aid of a plasma and a reactor for carrying out the method |
| 12/02/1993 | DE4221360C1 Verfahren zur Regelung einer Glühkatodenglimmentladung Method for controlling a Glühkatodenglimmentladung |
| 12/02/1993 | DE4217735A1 Borhaltige organische Gruppe-V-Verbindungen Boron-containing organic group-V compounds |
| 12/01/1993 | EP0572150A2 Chemical vapour-deposition of aluminide coatings |
| 12/01/1993 | EP0571915A1 Apparatus for the production of hermetically coated optical fiber |
| 12/01/1993 | EP0571713A2 Gold thin film vapor growing method |
| 11/30/1993 | US5266421 Thermoelectrical systems |
| 11/30/1993 | US5266409 Hard film for magnetic recording media |
| 11/30/1993 | US5266398 Wear resistance, hardness |
| 11/30/1993 | US5266364 Method and apparatus for controlling plasma processing |
| 11/30/1993 | US5266363 Plasma processing method utilizing a microwave and a magnetic field at high pressure |
| 11/30/1993 | US5266355 Chemical vapor deposition of metal oxide films |
| 11/30/1993 | US5266153 Gas distribution head for plasma deposition and etch systems |
| 11/30/1993 | US5266116 Arranged to support back surface of belt shaped substrate while rotating rolls; solar cells |
| 11/30/1993 | CA2028438C Selective area chemical vapor deposition |
| 11/25/1993 | WO1993023978A1 Process apparatus |
| 11/25/1993 | WO1993023874A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window |
| 11/25/1993 | WO1993023587A1 Process and device for applying pulses on the surface of a solid body |
| 11/25/1993 | WO1993023204A1 Diamond compact |