C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1993
11/23/1993	US5265046 Chemical labeling of the surfaces of solids on an atomic scale, and the storage of information units in the atomic range
11/23/1993	US5264634 Volatile alkaline earth metal complex and its use
11/23/1993	US5264283 Diamond tools for rock drilling, metal cutting and wear part applications
11/23/1993	US5264245 CVD method for forming uniform coatings
11/23/1993	US5264071 Separation from substrate by controlled cooling, intermediate release layer, polishing support
11/23/1993	US5264040 Rapid-switching rotating disk reactor
11/23/1993	US5264039 Vapor deposition apparatus
11/23/1993	US5264038 Chemical vapor deposition system
11/18/1993	EP0569771A1 Metal thin film type magnetic recording medium
11/18/1993	EP0569660A1 Apparatus for holding substrates
11/16/1993	US5262396 Plasma-enhanced CVD of oxide superconducting films by utilizing a magnetic field
11/16/1993	US5262356 Method of treating a substrate wherein the flow rates of the treatment gases are equal
11/16/1993	US5262235 Sacrificial overcoating which debonds to absorb thermal shock, structural composites
11/16/1993	US5262202 Heat treated chemically vapor deposited products and treatment method
11/16/1993	US5262199 Heating organoaluminum and titanium compounds in vacuum to form corresponding oxides, reheating oxides to form aluminotitinate layer
11/16/1993	US5262198 Method of producing a carbon coated ceramic membrane and associated product
11/16/1993	US5262029 Method and system for clamping semiconductor wafers
11/16/1993	US5261963 CVD apparatus comprising exhaust gas condensation means
11/16/1993	US5261962 Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
11/16/1993	US5261961 Device for forming deposited film
11/16/1993	CA2096274A1 Device for holding substrates
11/13/1993	CA2094413A1 Enhanced membrane-electrode interface
11/11/1993	WO1993022482A1 Growth of diamond crystals
11/11/1993	WO1993022473A1 Use of metal-organic compounds for depositing the element on substrates
11/11/1993	WO1993022472A1 Use of organo-metallic compounds for precipitating metals on substrates
11/11/1993	WO1993022070A1 Method and apparatus for the formation of fluorine doped metal oxide films
11/10/1993	EP0569296A1 Device for chemical treatment by plasma and method using the same
11/10/1993	EP0569117A2 Producing articles by chemical vapor deposition
11/10/1993	EP0568696A1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION.
11/10/1993	CN1078327A Chemical gas phase quick sedimentation process for producing metallic oxide superconductive film
11/09/1993	US5260600 Silicon oxynitride film
11/09/1993	US5260236 Resting wafer on electrode while second electrode disperses gases, applying radio frequency so gas mixture reacts to form passivation layer
11/09/1993	US5260141 Diamond coated products
11/09/1993	US5260134 Organic composite
11/09/1993	US5260107 Plasma chemical vapor deposition process for producing a hard multilayer coated product
11/09/1993	US5260106 Method for forming diamond films by plasma jet CVD
11/09/1993	US5260105 Aerosol-plasma deposition of films for electrochemical cells
11/09/1993	US5259918 Heteroepitaxial growth of germanium on silicon by UHV/CVD
11/09/1993	US5259915 Organometallic compounds
11/09/1993	US5259883 Method of thermally processing semiconductor wafers and an apparatus therefor
11/04/1993	DE4214224A1 Verwendung von elementorganischen verbindungen zur abscheidung des elementes auf substraten Use of element-organic compounds for the deposition of the element on substrates
11/03/1993	EP0568049A1 Apparatus and method for coating the inside of a hollow object by microwave-assisted plasma CVD
11/03/1993	EP0567985A2 Process for thin film formation
11/03/1993	CN1022609C Binder enriched CVD and PVD coated cutting tool
11/02/1993	USH1249 To avoid corrosion of thermal ink jets heaters
11/02/1993	US5259015 Rotary anode for X-ray tube and method for manufacturing the same
11/02/1993	US5258206 Vapor deposition
11/02/1993	US5258204 Chemical vapor deposition of metal oxide films from reaction product precursors
11/02/1993	US5258075 Process for producing photoconductive member and apparatus for producing the same
11/02/1993	CA1323803C Glass coating method and resulting article
10/1993
10/28/1993	WO1993021358A1 Coating porous materials with metal oxides and other ceramics by mocvd
10/28/1993	DE4213292A1 Verwendung von metallorganischen Verbindungen zur Abscheidung des Metalls auf Substraten Use of organometallic compounds for the deposition of the metal on substrates
10/26/1993	US5256594 Masking technique for depositing gallium arsenide on silicon
10/26/1993	US5256483 Glow discharges
10/26/1993	US5256479 Ferromagnetic ultrafine particles, method of making, and recording medium using the same
10/26/1993	US5256455 Method of forming film of tantalum oxide by plasma chemical vapor deposition
10/26/1993	US5256449 Forming dies, vapor deposition of wear resistant material onto dies
10/26/1993	US5256244 Pulsation of hydrolyzable metal chloride and water under pressure
10/26/1993	US5256206 Used to form continuous uniform film without any motion of the drill due to "throwing power" of reactor
10/26/1993	US5256205 High speed; low temperature; high quality
10/26/1993	US5256060 Reducing gas recirculation in thermal processing furnace
10/26/1993	US5255445 Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surfaces
10/26/1993	CA1323528C Method for preparation of multi-layer structure film
10/21/1993	DE4311761A1 Silicon nitride anti-reflection film prodn. for use in photolithographic steps of semiconductor device mfr. - by selecting optical characteristic of film, by determining values of real and imaginary parts of specified relationship
10/20/1993	EP0566271A2 Wear-resistant transparent dielectric coatings
10/20/1993	EP0566053A1 Olefin resin-based articles having gas barrier properties
10/20/1993	EP0566040A2 Process for selectively depositing copper aluminum alloy onto a substrate
10/19/1993	US5254832 Method of manufacturing ultrafine particles and their application
10/19/1993	US5254505 Process of forming capacitive insulating film
10/19/1993	US5254374 Producing reinforced ceramic composite by heating porous preform with microwaves to establish temperature gradient, providing gaseous reactants which form ceramic when heated
10/19/1993	US5254370 Method for forming a silicon carbide film
10/19/1993	US5254369 Method of forming a silicon diffusion and/or overlay coating on the surface of a metallic substrate by chemical vapor deposition
10/19/1993	US5254210 Method and apparatus for growing semiconductor heterostructures
10/19/1993	US5254176 Method of cleaning a process tube
10/19/1993	US5254171 Bias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling means
10/19/1993	US5254141 Industrial diamond coating and method of manufacturing the same
10/19/1993	CA1323291C Method for producing high silicon steel strip in a continuously treating line
10/14/1993	WO1993020257A1 Composite body and its use
10/14/1993	WO1993019856A1 Microwave energy-assisted chemical vapor infiltration
10/14/1993	DE4212231A1 Doping with amorphous silicon@ - by gas discharge with addn. of tri:methyl-phosphine to gas, used in prodn. of electrophotographic recording material
10/14/1993	DE4211962A1 Plasma coating plastics article in vacuum - comprises using vacuum vessel contg. inlets and outlets for material flow control which forms process atmos., esp. from gaseous hydrocarbon
10/14/1993	DE4211746A1 Method for coating substrates with homogeneous uniform coatings - includes overlapping stream cones of plasma-activated gas and moving substrate carrier
10/13/1993	EP0564789A1 Process for treatment of workpieces in a vacuum processing apparatus
10/12/1993	US5252807 Heated plate rapid thermal processor
10/12/1993	US5252800 Apparatus for preparing superconducting joints
10/12/1993	US5252733 Volatile crown ligand β-diketonate alkaline earth metal complexes
10/12/1993	US5252547 Vapor depositing a halogen-free protective coatings consisting of an oxides, a carbides or a nitrides
10/12/1993	US5252366 Chemical vapor deposition method using an actively cooled effuser to coat a substrate having a heated surface layer
10/12/1993	US5252365 Depositing metal to form carbide, depositing second metal to lubricate
10/12/1993	US5252361 Oxidizing, heating the ceramics with oxygen in presence of a boron or boron compound
10/12/1993	US5252359 CVD process for the manufacture of ceramic fibers
10/12/1993	US5252178 Multi-zone plasma processing method and apparatus
10/12/1993	US5252174 Method for manufacturing substrates for depositing diamond thin films
10/12/1993	US5252135 Sealing apparatus for continuous vacuum treating equipment
10/12/1993	US5252134 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing
10/12/1993	US5252133 Vertically oriented CVD apparatus including gas inlet tube having gas injection holes
10/12/1993	US5252132 Apparatus for producing semiconductor film
10/12/1993	US5252131 Apparatus for gas source molecular beam epitaxy
10/12/1993	CA2002861C Nitride removal method
10/07/1993	DE4310286A1 Plasma chemical vapour deposition - by passing reactive gas through plasma in form of thin strip to react with working gas

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