Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/1994
08/02/1994US5334263 Substrate stabilization of diffusion aluminide coated nickel-based superalloys
08/02/1994US5334250 Vapor deposition apparatus for using solid starting materials
07/1994
07/28/1994DE4319387C1 Appts. for vaporising liq.
07/27/1994EP0608162A1 SiO2 electret and its manufacturing process
07/27/1994EP0608081A1 Coated articles and method for the prevention of fuel thermal degradation deposits
07/27/1994EP0607987A2 Method of making diamond film and use of same
07/27/1994EP0607797A1 An apparatus and method for enhanced inductive coupling to plasmas with reduced sputter contamination
07/27/1994EP0607787A2 Device for coating or etching of substrates
07/27/1994EP0607786A2 Apparatus for coating substrates
07/27/1994EP0607651A1 Prevention of fuel thermal degradation deposits
07/27/1994EP0607415A1 Hollow-anode glow discharge apparatus
07/26/1994US5332880 Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field
07/26/1994US5332597 Separation of oxygen from mixtures
07/26/1994US5332555 Ozone beam generation apparatus and method for generating an ozone beam
07/26/1994US5332443 Lift fingers for substrate processing apparatus
07/26/1994US5332442 Surface processing apparatus
07/21/1994WO1994016458A1 Enhanced thin film dc plasma processing system
07/21/1994WO1994016275A1 Method and apparatus for delivering gas
07/21/1994WO1994016125A1 Process for vapor-phase diamond synthesis
07/21/1994WO1994016117A1 Device for the vacuum-plasma treatment of articles
07/21/1994WO1994015707A2 Device for simultaneously letting in at least one process gas into a plurality of reaction chambers
07/21/1994WO1994011548A3 Method for fabricating diamond films on nondiamond substrates and related structures
07/20/1994EP0606751A1 Method for depositing polysilicon films having improved uniformity and apparatus therefor
07/20/1994EP0606737A1 Process and apparatus for growing a silicon epitaxial layer, with a control of the mass flows of the reactive gases
07/19/1994US5331454 Low reset voltage process for DMD
07/19/1994US5330802 Plasma CVD of carbonaceous films on substrate having reduced metal on its surface
07/19/1994US5330793 Metallo-organic precursors to titanium nitride
07/19/1994US5330633 Semiconductors
07/19/1994US5330611 Wear resistant semiconductor
07/19/1994US5330578 Plasma treatment apparatus
07/19/1994US5330577 Semiconductor fabrication equipment
07/19/1994CA1330803C Volatile fluorinated beta-ketoimines and associated metal complexes
07/16/1994CA2107430A1 Coated articles and method for the prevention of fuel thermal degradation deposits
07/14/1994DE4400208A1 Vorrichtung und Verfahren zum Bilden einer Beschichtung durch Pyrolyse Apparatus and method for forming a coating by pyrolysis
07/13/1994EP0606158A1 Photoluminescent plasma polymerized films
07/13/1994EP0605992A1 Powertrain component with adherent film having a graded composition
07/13/1994EP0605980A2 Method for depositing silicon nitride and silicon oxynitride films
07/13/1994EP0605814A1 Diamond-like carbon films from a hydrocarbon helium plasma
07/13/1994EP0605791A1 Apparatus for forming a film
07/13/1994EP0605725A1 Apparatus for introducing gas, and apparatus and method for epitaxial growth
07/13/1994EP0605703A1 Methods and apparatus for externally treating a container with application of internal bias gas
07/13/1994EP0605534A1 Apparatus for rapid plasma treatments and method.
07/12/1994US5329095 Thermal treatment apparatus utilizing heated lid
07/12/1994US5328873 Process for forming deposited film by use of alkyl aluminum hydride
07/12/1994US5328872 Method of integrated circuit manufacturing using deposited oxide
07/12/1994US5328761 Diamond-coated hard material, throwaway insert and a process for the production thereof
07/12/1994US5328737 Method of forming film by plasma CVD
07/12/1994US5328722 Depositing a barrier layer on a surface then engaging the shadow ring to control gas flow and depositing a coating of material
07/12/1994US5328720 Coating-fluidizing gas supply system and method for flat bottom coater
07/12/1994US5328715 Process for making metallized vias in diamond substrates
07/12/1994US5328713 Precise regulation of fluidized bed weight in pyrolytically coating substrates
07/12/1994US5328676 Vapor deposition fullerenes and energizing to form ions then coating and growing
07/12/1994US5328556 Wafer fabrication
07/12/1994US5328515 Chemical treatment plasma apparatus for forming a ribbon-like plasma
07/12/1994US5328514 Device for forming film by photo-chemical vapor deposition
07/12/1994US5328513 Apparatus for producing dies for extruding ceramic honeycomb bodies
07/12/1994US5327624 Method for forming a thin film on a semiconductor device using an apparatus having a load lock
07/12/1994CA2113029A1 A device and method for forming a pyrolytic coating
07/12/1994CA2113028A1 A device and method for forming a coating by pyrolysis
07/09/1994CA2110563A1 Powertrain component with adherent film having a graded composition
07/07/1994WO1994014998A1 Protective film for articles and method
07/07/1994WO1994014530A1 Method of manufacturing fine ceramic particles and apparatus therefor
07/06/1994EP0605205A1 Chemical vapor deposition apparatus
07/06/1994EP0604775A1 Apparatus for forming a film
07/06/1994EP0558485B1 Process for obtaining a coated cemented carbide cutting tool
07/06/1994CN1025353C Plasma processing method and apparatus
07/06/1994CN1025322C Method for preparing vaporized reactants for chemical vapor deposition
07/05/1994US5327454 Bridge for connecting cores in a manufacturing equipment of polycrystal silicon
07/05/1994US5326725 Clamping ring and susceptor therefor
07/05/1994US5326723 Cleaning, removal of wafer and purging with silane and argon
07/05/1994US5326652 Flexible battery package with polymer base and inorganic layer with seal of silicon nitride, aluminum nitride and aluminum oxide
07/05/1994US5326425 Preparation of tertiarybutyldimethylantimony and use thereof
07/05/1994US5326404 Plasma processing apparatus
07/05/1994US5325747 Method of machining using coated cutting tools
07/05/1994CA1330601C Apparatus for semiconductor process including photo-excitation process
06/1994
06/29/1994EP0603477A1 Method of forming a dielectric layer
06/29/1994EP0603464A1 Process for coating substrates
06/29/1994EP0603422A1 Wear component and method of making same
06/28/1994US5324690 Semiconductor device having a ternary boron nitride film and a method for forming the same
06/28/1994US5324553 Increasing surface mobility of species in plasma by coupling a low frequency alternating electrical field and magnetic energy; no intentional addition of thermal energy
06/28/1994US5324540 System and method for supporting and rotating substrates in a process chamber
06/28/1994US5324539 Method for forming CVD thin glass films
06/28/1994US5324537 Exposing at an elevated temperature to a stream of gaseous fluorocarbon
06/28/1994US5324362 Apparatus for treating substrates in a microwave-generated gas-supported plasma
06/28/1994US5324361 Apparatus for coating cap-shaped substrates
06/28/1994US5324360 Method for producing non-monocrystalline semiconductor device and apparatus therefor
06/23/1994WO1994014303A1 Method and apparatus for atmospheric pressure glow discharge plasma treatment
06/23/1994WO1994013852A1 Superhard film-coated material and method of producing the same
06/23/1994WO1994013598A1 Boron carbide coating
06/23/1994WO1994007613A3 Method for synthesizing solids such as diamond and products produced thereby
06/22/1994EP0603144A1 Oxide coated cutting tool
06/22/1994EP0602595A1 Vaporizing reactant liquids for CVD
06/22/1994EP0348477B1 Vacuum deposition process
06/21/1994US5322818 Method for forming an oxide superconducting material
06/21/1994US5322712 Process for improved quality of CVD copper films
06/21/1994US5322711 Continuous method of covering inorganic fibrous material with particulates
06/21/1994US5322710 Pumping vapor generated in reservoir through gas line to vapor deposition chamber; controlling vapor flow
06/21/1994US5322568 Multiple tubular structure to introduce two or more gaseous starting materials and a halogenic oxidizing agent; forms plural number of precursors in excited state
06/21/1994US5322567 Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus
06/21/1994CA1330249C High hardness fine grained tungsten-carbon alloys and process for making same