| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/16/1995 | US5415129 Bronsted acid catalyst |
| 05/16/1995 | US5415126 Silicon-cyclobutane |
| 05/11/1995 | DE4338040A1 Method and device for coating spectacle (ophthalmic) lenses (eyeglasses) in a vacuum |
| 05/10/1995 | EP0652308A2 Method of and apparatus for forming single-crystalline thin film |
| 05/10/1995 | EP0652304A1 Film forming method and apparatus for carrying out the same |
| 05/10/1995 | EP0652058A1 Diamond wire die with positioned opening |
| 05/10/1995 | EP0652057A1 Multiple grained diamond wire die |
| 05/09/1995 | US5413967 Method of manufacturing semiconductor devices |
| 05/09/1995 | US5413958 Method for manufacturing a liquid crystal display substrate |
| 05/09/1995 | US5413821 Chromating a substrate by decomposition of chromium compound in plasma, forming alloys, carbides, oxides, nitrides, silicides |
| 05/09/1995 | US5413813 CVD of silicon-based ceramic materials on internal surface of a reactor |
| 05/09/1995 | US5413772 Diamond film and solid particle composite structure and methods for fabricating same |
| 05/09/1995 | US5413671 Apparatus and method for removing deposits from an APCVD system |
| 05/09/1995 | US5413670 Method for plasma etching or cleaning with diluted NF3 |
| 05/09/1995 | US5413668 Method for making mechanical and micro-electromechanical devices |
| 05/04/1995 | WO1995012013A1 Diamond film growth from fullerene precursors |
| 05/04/1995 | WO1995012009A1 Coated body, its method of production and its use |
| 05/04/1995 | WO1995011869A1 Chemical vapour infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter |
| 05/04/1995 | WO1995011868A1 Vapor phase chemical infiltration process of a material into a porous substrate at controlled surface temperature |
| 05/03/1995 | EP0651436A1 Tungsten conductors formation process for semiconductor integrated circuits |
| 05/03/1995 | EP0651432A1 Method of feeding gas into a chamber |
| 05/03/1995 | EP0651385A2 Method for producing diamond-like carbon film and tape driving apparatus |
| 05/03/1995 | EP0651245A1 Fluid delivery apparatus and method having an infrared feedline sensor |
| 05/03/1995 | EP0651070A1 Methods for removing contaminants from vacuum chamber surfaces |
| 05/03/1995 | EP0651069A1 Method for applying a friction-reducing coating |
| 05/03/1995 | EP0650772A1 Process for depositing a thin layer on a plastic substrate |
| 05/03/1995 | EP0650536A1 Deposition apparatus and methods |
| 05/03/1995 | EP0650465A1 Conversion of fullerenes to diamond |
| 05/03/1995 | EP0583374A4 Method and apparatus for plasma deposition. |
| 05/03/1995 | CN1102220A Method for applying diamond film to hard alloy tool knife-edge |
| 05/03/1995 | CN1102219A New process of chemical gas-phase deposition of diamond coating for hard alloy tool |
| 05/02/1995 | US5412274 Diffusely reflecting optical interference filters and articles including lamps reflectors and lenses |
| 05/02/1995 | US5412129 Stabilization of precursors for thin film deposition |
| 05/02/1995 | US5411769 Forming a low surface energy, wear resistant thin film on the surface of a device |
| 05/02/1995 | US5411763 Method of making a modified ceramic-ceramic composite |
| 05/02/1995 | US5411758 Vapor deposition a synthetic diamond for thermoconductivity |
| 05/02/1995 | US5411593 Apparatus for servicing vacuum chamber using non-reactive gas filled maintenance enclosure |
| 05/02/1995 | US5411592 Apparatus for deposition of thin-film, solid state batteries |
| 05/02/1995 | US5411591 Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones |
| 05/02/1995 | US5411590 Gas injectors for reaction chambers in CVD systems |
| 05/02/1995 | CA2047140C Tool insert |
| 04/29/1995 | CA2134526A1 Composite media with selectable radiation-transmission properties |
| 04/27/1995 | DE4336119A1 Method for laser-induced material deposition |
| 04/27/1995 | DE4336082A1 Process for plasma coating solid substrates by means of a gas capable of deposition |
| 04/26/1995 | EP0650158A1 Magnetic recording medium, method for producing the same and method for forming film by plasma cvd |
| 04/26/1995 | EP0649479A1 Method and apparatus for coating a glass substrate |
| 04/26/1995 | CN1102034A Microwave enhanced CVD system under magnetic field |
| 04/25/1995 | US5409762 Electric contact materials, production methods thereof and electric contacts used these |
| 04/25/1995 | US5409743 PECVD process for forming BPSG with low flow temperature |
| 04/25/1995 | US5409735 Chemical vapor deposition of metal pnictogenide films using single source precursors |
| 04/25/1995 | US5409540 Chemical vapor phase growth method and chemical vapor phase growth apparatus |
| 04/25/1995 | US5409539 Slotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector system |
| 04/20/1995 | WO1995010639A1 Vacuum seal of heating window to housing in wafer heat processing machine |
| 04/20/1995 | WO1995010638A1 Process for the preparation of silicon carbide films using single organosilicon compounds |
| 04/20/1995 | DE4335573A1 CVD coating process, and device for its implementation |
| 04/20/1995 | DE4335224A1 Process for the production of optical layers |
| 04/19/1995 | EP0649165A1 Method for reducing particulate contamination during plasma processing of semiconductor devices |
| 04/19/1995 | EP0648861A1 Semiconductor processing apparatus |
| 04/19/1995 | EP0648860A1 Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein |
| 04/19/1995 | EP0648859A1 Processes for the deposition of adherent tungsten silicide films |
| 04/19/1995 | EP0648858A1 Methods of coating plasma etch chambers and apparatus for plasma etching workpieces |
| 04/19/1995 | EP0648215A1 Process for the preparation of trialkyl compounds of group 3a metals. |
| 04/18/1995 | US5407867 Method of forming a thin film on surface of semiconductor substrate |
| 04/18/1995 | US5407710 Contacting substrate with gaseous metallic precursor compound, focusing laser beam having specified wavelength on circuit line to heat and deposit metal, moving to other circuit line to connect |
| 04/18/1995 | US5407705 Method and apparatus for producing aluminide regions on superalloy substrates, and articles produced thereby |
| 04/18/1995 | US5407704 CVD apparatus and method |
| 04/18/1995 | US5407698 Vapor depositing a smooth film using controlled flow of tungsten fluoride and hydrogen mixture, and nitrogen carrier gas |
| 04/18/1995 | US5407487 Liquid and vapor tight cavity co-extensive with mandrel for receiving heating fluid; nickel vapor deposition; uniform surface temperature |
| 04/18/1995 | US5407486 CVD apparatus |
| 04/18/1995 | US5407485 Apparatus for producing semiconductor device and method for producing semiconductor device |
| 04/18/1995 | US5407350 Heat-treatment apparatus |
| 04/18/1995 | US5407181 Vertical heat treating device |
| 04/18/1995 | CA2038292C Pcvd process for producing an approximately dome-shaped substrate provided with a dielectric and/or metallic coating system on the inside and/or outside face |
| 04/15/1995 | CA2108423A1 Method of producing wear resistant articles having super hard coat and articles made therefrom |
| 04/13/1995 | WO1995009933A1 A method for chemical vapor deposition of titanium nitride films at low temperatures |
| 04/13/1995 | DE4434302A1 Mechanical parts, and process for the production of a film thereon |
| 04/13/1995 | CA2173480A1 A method for chemical vapor deposition of titanium nitride films at low temperatures |
| 04/12/1995 | EP0647728A1 Process and apparatus for forming tungsten silicide |
| 04/12/1995 | EP0647163A1 A plasma cleaning method for removing residues in a plasma treatment chamber |
| 04/12/1995 | CN1101383A Mechanical parts and a method of forming a film on the same |
| 04/11/1995 | US5405654 Self-cleaning chemical vapor deposition apparatus and method |
| 04/11/1995 | US5405645 High growth rate plasma diamond deposition process and method of controlling same |
| 04/11/1995 | US5405492 Independently and selectively generating plasma or activated species using plurity of remote plasma generating energy sources associated with semiconductor wafer fabrication reactor without gas cycling |
| 04/11/1995 | US5405481 Gas expansion chamber equipped with gas supply for producing patterns, microcapillaries for gas discharge, optical fiber coupled to light source, means for detecting and processing light signal reflected from sample |
| 04/11/1995 | US5405448 Power source for generating amplitude-modulated alternating electromagnetic field in vacuum chamber, pump, controlled gas inlet arrangement, gas container for supplying silicon-organic compound |
| 04/11/1995 | US5405447 Plasma CVD apparatus |
| 04/11/1995 | US5405446 Apparatus for heat processing a substrate |
| 04/11/1995 | US5405445 Vacuum extraction system for chemical vapor deposition reactor vessel and trapping device incorporated therein |
| 04/11/1995 | US5405444 Process chamber purge module for semiconductor processing equipment |
| 04/11/1995 | US5404837 Method for preparing a graphite intercalation compound having a metal or metal compounds inserted between adjacent graphite layers |
| 04/06/1995 | WO1995009443A1 Process for producing luminescent elemental structures |
| 04/06/1995 | WO1995009435A1 Process for producing microcrystalline films and uses thereof |
| 04/06/1995 | DE4333416A1 Microcrystalline layers |
| 04/05/1995 | EP0646285A1 Semiconductor wafer processing method and apparatus with heat and gas flow control |
| 04/05/1995 | CN1028117C Process for depositing film mainly comprising carbon |
| 04/04/1995 | US5403657 Light reflector having surface of unanodized aluminum (or alloy) coated with a ceramic adhesive layer and reflective layer of aluminum, silver, gold, copper, and/or their alloy; lighting fixtures, radiant heaters |
| 04/04/1995 | US5403630 Vapor-phase growth method for forming S2 O2 films |
| 04/04/1995 | US5403628 Process for producing a coated hard-metal cutting body |
| 04/04/1995 | US5403621 Coating process using dense phase gas |
| 04/04/1995 | US5403620 Catalysis in organometallic CVD of thin metal films |