| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 09/20/1994 | US5348587 Cold wall with metallic liner insert; reduced cleaning and deposits |
| 09/20/1994 | CA1332036C Method for chemical vapor deposition of copper, silver and gold using a cyclopentadienyl metal complex |
| 09/15/1994 | WO1994020997A1 Solid electrolyte-electrode system for an electrochemical cell |
| 09/15/1994 | WO1994020980A1 Cold wall reactor for heating of silicon wafers by microwave energy |
| 09/15/1994 | DE4334818A1 Process for producing high-purity, stress-free inter-fractional metal coatings or shaped articles |
| 09/14/1994 | EP0614999A1 Diamond film coating for mating parts |
| 09/14/1994 | EP0614998A1 Diamond covered member and process for producing the same |
| 09/14/1994 | EP0614991A1 A diluted solution of a hydride in liquid nitrogen |
| 09/14/1994 | EP0614497A1 Apparatus and method for treating a wafer of semiconductor material. |
| 09/14/1994 | EP0614496A1 Diamond coated products and method of preparation |
| 09/14/1994 | CN1092045A Coating apparatus, method of coating glass, compounds and compositions for coating glass and coated glass substrates |
| 09/13/1994 | US5346852 Low temperature process for producing indium-containing semiconductor materials |
| 09/13/1994 | US5346730 Process for depositing a copper containing layer I |
| 09/13/1994 | US5346729 Solar-induced chemical vapor deposition of diamond-type carbon films |
| 09/13/1994 | US5346728 Method for reforming surface |
| 09/13/1994 | US5346719 Vapordeposition of thin coating of refractory metal, heating to form metal-carbon bonding and continuing deposition |
| 09/13/1994 | US5346555 Device for thermal treatment and film forming process |
| 09/08/1994 | DE4325648C1 Alkyltin compounds, their preparation and compositions containing these for the formation of electrically conductive and IR-reflecting layers on surfaces made of glass, glass ceramics or enamel |
| 09/07/1994 | EP0614216A1 Apparatus for forming oxide film, heat treatment apparatus, semiconductor device, manufacturing method therefor |
| 09/07/1994 | EP0614212A1 A substrate carrier |
| 09/07/1994 | EP0613963A1 Production of crack-free CVD diamond articles |
| 09/07/1994 | EP0462135B1 Metallo-organic adduct compounds |
| 09/07/1994 | CN1091683A Oxide coated cutting tool |
| 09/07/1994 | CN1025846C Coaling glass |
| 09/06/1994 | US5344948 Complexes for coating |
| 09/06/1994 | US5344796 Forming microcrystalline silicon seed layer over glass substrate, chemical vapor deposition of hydrogen-containing amorphous silicon layer over seed layer, heat treating upper layer; polycrystalline silicon seed layer may also be used |
| 09/06/1994 | US5344792 Pulsed plasma enhanced CVD of metal silicide conductive films such as TiSi2 |
| 09/06/1994 | US5344551 Filling voids with metallic binder |
| 09/06/1994 | US5344536 Method of and apparatus for processing a workpiece in plasma |
| 09/06/1994 | US5344500 Silicon film on graphite substrate, concave-convex surface |
| 09/06/1994 | US5344492 Vapor growth apparatus for semiconductor devices |
| 09/06/1994 | CA1331867C Low emissivity film for high temperature processing |
| 09/01/1994 | WO1994019509A1 Film forming method and film forming apparatus |
| 09/01/1994 | WO1994019201A1 Safety document and process for producing the same |
| 09/01/1994 | WO1994015707A3 Device for simultaneously letting in at least one process gas into a plurality of reaction chambers |
| 09/01/1994 | DE4306106A1 Method for preparing silylgermanes |
| 08/31/1994 | EP0613173A1 Thermal reaction chamber for semiconductor wafer processing operations |
| 08/31/1994 | EP0612862A1 Measuring wafer temperatures |
| 08/31/1994 | EP0612861A1 Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition |
| 08/30/1994 | US5343353 Forming dielectric film by heating and decomposing an organometallic complex |
| 08/30/1994 | US5343012 Differentially pumped temperature controller for low pressure thin film fabrication process |
| 08/30/1994 | US5342660 Method for plasma jet deposition |
| 08/30/1994 | US5342652 Method of nucleating tungsten on titanium nitride by CVD without silane |
| 08/30/1994 | US5342471 Plasma processing apparatus including condensation preventing means |
| 08/25/1994 | DE4404128A1 Security document and method for its manufacture |
| 08/24/1994 | EP0612085A2 Encapsulated contact material and process for producing the same |
| 08/24/1994 | EP0611733A2 Coating apparatus, method of coating glass, compounds and compositions for coating glass and coated glass substrates |
| 08/24/1994 | EP0611331A1 Chemical vapor deposition of diamond films using water-based plasma discharges. |
| 08/23/1994 | US5340621 Plasma CVD method |
| 08/23/1994 | US5340604 Method for manufacturing a composite vapor deposition film |
| 08/23/1994 | US5340553 Deoxygenation and dehydration by the heated silicon |
| 08/23/1994 | US5340401 Heater, temperature and pressure controllers, means for accurately positioning substrate from surface of heater |
| 08/23/1994 | US5339584 Synthetic resin window for automotive vehicles or the like |
| 08/23/1994 | CA2013478C Method of forming coatings containing amorphous silicon carbide |
| 08/18/1994 | WO1994018544A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces |
| 08/18/1994 | WO1994018358A1 Vacuum film forming method and apparatus therefor |
| 08/18/1994 | WO1994018357A1 Device and process for depositing solid materials, in particular very fine-grained materials, and use of said process |
| 08/18/1994 | WO1994018356A1 Method of manufacturing a glass substrate for a thin film |
| 08/18/1994 | WO1994018355A1 Method for thin film deposition on a substrate using remote cold nitrogen plasma |
| 08/18/1994 | WO1994018353A1 METHOD OF MAKING CVD Si3N¿4? |
| 08/18/1994 | WO1994017943A1 Cemented carbide with binder phase enriched surface zone and enhanced edge toughness behaviour |
| 08/18/1994 | CA2155659A1 Process for depositing a thin layer on a substrate using a remote cold nitrogen plasma |
| 08/18/1994 | CA2155513A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces |
| 08/17/1994 | EP0611091A1 Process for making metallized vias in diamond substrates |
| 08/17/1994 | EP0610728A1 Process for the formation of metallic or metalloid coatings by micro-wave assisted plasma CVD |
| 08/17/1994 | EP0610392A1 Methods and apparatus for treating a work surface. |
| 08/17/1994 | CN1090889A Plasma processing method and apparatus |
| 08/16/1994 | US5338580 Method of preparation of functional deposited film by microwave plasma chemical vapor deposition |
| 08/16/1994 | US5338364 Process and apparatus for producing diamond film |
| 08/16/1994 | US5338363 Chemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus therefor |
| 08/16/1994 | US5338362 Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments |
| 08/16/1994 | US5338328 Apparatus of manufacturing hermetic coating optical fiber |
| 08/16/1994 | US5337651 Apparatus and method for protection of pumps used for delivery of air- or moisture-sensitive liquids |
| 08/10/1994 | EP0609886A1 Method and apparatus for preparing crystalline thin-films for solid-state lasers |
| 08/10/1994 | EP0609621A1 Method for determining thickness of chemical vapor deposited layers |
| 08/10/1994 | EP0609512A1 Apparatus for forming a film |
| 08/10/1994 | EP0609237A1 Harmonic and subharmonic isolator for plasma discharge |
| 08/09/1994 | US5336640 Method of manufacturing a semiconductor device having an insulating layer composed of a BPSG film and a plasma-CVD silicon nitride film |
| 08/09/1994 | US5336368 Method for depositing conductive metal traces on diamond |
| 08/09/1994 | US5336327 CVD reactor with uniform layer depositing ability |
| 08/09/1994 | US5336326 Method of and apparatus for a direct voltage arc discharge enhanced reactive treatment of objects |
| 08/09/1994 | US5336324 Apparatus for depositing a coating on a substrate |
| 08/04/1994 | WO1994017447A1 Chemical functionalization of surfaces |
| 08/04/1994 | WO1994017353A1 A rapid thermal processing apparatus for processing semiconductor wafers |
| 08/04/1994 | WO1994017078A1 Rare earth compounds and their preparation |
| 08/04/1994 | WO1994016825A1 Microwave energized process for the preparation of high quality semiconductor material |
| 08/04/1994 | CA2154456A1 Rare earth compounds and their preparation |
| 08/04/1994 | CA2154444A1 Chemical functionalization of surfaces |
| 08/03/1994 | EP0609028A1 Dry exhaust gas conditioning |
| 08/03/1994 | EP0608633A2 Method for multilayer CVD processing in a single chamber |
| 08/03/1994 | EP0608620A1 Vacuum Processing apparatus having improved throughput |
| 08/03/1994 | EP0414842B1 Improved diamond deposition cell |
| 08/03/1994 | CN1090428A Production method for ferroelectric film of bismuth titanate |
| 08/03/1994 | CN1090344A Vertical boat and wafer support |
| 08/02/1994 | US5334555 Controlling flow rate of silane gas and level of high frequency electricity yields film which gives preferred ultra violet absorption and transmission rates |
| 08/02/1994 | US5334454 Articles by plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes |
| 08/02/1994 | US5334453 Diamond-coated bodies and process for preparation thereof |
| 08/02/1994 | US5334438 Composite material with a refractory fibrous reinforcement and its production process |
| 08/02/1994 | US5334423 Controlled glow discharge deposition |
| 08/02/1994 | US5334342 Etching substrate to form cavities, nucleating and growing polycrystalline diamond film on surface to fill cavities, then bonding optical material to film and removing it from substrate to expose patterns |