Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1994
06/17/1994CA2103426A1 Method for determining thickness of chemical vapor deposited layers
06/16/1994DE4311693C1 Locating fibrous constructions in a gas phase infiltration plant - using solid flanges which are attached to fibrous body by feeding side walls into grooves in flanges
06/16/1994DE4242165A1 Recycling process gas from the production of diamond coatings in a plasma-CVD method - by suction removal of gas, measuring hydrocarbon content and hence determining hydrogen content and adding inert gas prior to exhausting
06/15/1994EP0601461A1 Method and apparatus for servicing silicon deposition chamber using non-reactive gas-filled maintenance enclosure
06/15/1994EP0601166A1 Methods and apparatus for depositing barrier coatings
06/15/1994EP0601151A1 Process for regulating a hot cathode glow discharge.
06/15/1994EP0298126B1 Optical cvd process
06/15/1994CN1088002A Method and apparatus for manufacturing a liquid crystal display substrate, and apparatus and method for evaluating semiconductor crystals
06/14/1994US5320982 Wafer cooling method and apparatus
06/14/1994US5320978 Selective area platinum film deposition
06/14/1994US5320880 Radio frequency vapor deposition of mixture of silicon source, titanium tetrachloride and carrier
06/14/1994US5320878 Method of chemical vapor deposition of boron nitride using polymeric cyanoborane
06/14/1994US5320877 Method for forming thin film and apparatus therefor
06/14/1994US5320875 Plasma polymerizing organosilicon monomer in presence of excess oxygen
06/14/1994US5320680 Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow
06/14/1994CA1330191C Method for forming crystal and crystal article obtained by said method
06/09/1994WO1994012682A1 Tool and process for coating a basic tool component
06/08/1994EP0600533A1 Method for applying a diamond-like carbon coating on steel, iron or alloys thereof
06/08/1994EP0600516A1 Diffusion furnace boat assembly and wafer support
06/08/1994EP0600503A1 Vapour generator for chemical vapour deposition systems
06/08/1994EP0600277A1 Abrasive tool having film-covered cubic boron nitride grits
06/08/1994EP0600115A1 Multilayer coated hard alloy cutting tool
06/08/1994EP0599991A1 Process for forming low resistivity titanium nitride films.
06/08/1994CN1087750A Laser process
06/07/1994US5319118 Stable complexes which evaporate cleanly when used in organometallic chemical vapor deposition
06/07/1994US5318928 Method for the surface passivation of sensors using an in situ sputter cleaning step prior to passivation film deposition
06/07/1994US5318809 Apparatus for depositing a material on a substrate by chemical vapor deposition
06/07/1994US5318801 Substrate temperature control apparatus and technique for CVD reactors
06/07/1994US5318634 Substrate supporting apparatus
06/07/1994US5318633 Heat treating apparatus
06/07/1994US5318632 Wafer process tube apparatus and method for vertical furnaces
06/04/1994CA2109654A1 Vertical boat and wafer support
06/01/1994EP0599730A2 Semiconductor device and method of producing the same
06/01/1994EP0599682A1 Gaseous feeding process, paricularly for diborane and silane
06/01/1994EP0599468A1 Chemical-vapor-deposition-produced silicon carbide
06/01/1994EP0598762A1 Tool with wear-resistant cutting edge made of cubic boron nitride or polycrystalline cubic boron nitride, a method of manufacturing the tool and its use.
06/01/1994DE4240016A1 Treating surfaces of objects using high pressure plasma - produced between two plasma accelerators having compression coils
06/01/1994CN1024814C Plasma thin film deposition process control
05/1994
05/31/1994US5317492 Rapid thermal heating apparatus and method
05/31/1994US5316842 Diamond/non-diamond materials with enhanced thermal conductivity
05/31/1994US5316804 Depositing a cubic boron nitride film of a single phase on the surface of a substrate
05/31/1994US5316796 Process for growing a thin metallic film
05/31/1994US5316795 Halogen-assisted chemical vapor deposition of diamond
05/31/1994US5316794 Method for servicing vacuum chamber using non-reactive gas-filled maintenance enclosure
05/31/1994US5316793 Multilayer element formed by vapor deposition of coatings by injection of precursor gas
05/31/1994US5316645 Plasma processing apparatus
05/31/1994US5316639 Dielectric material used for an ozone generator and a method of forming a film to the dielectric material
05/31/1994US5316585 Method for fabricating superconducting materials and superconductive thin films
05/31/1994US5316579 Using rotating turbibe blades
05/31/1994US5316472 Vertical boat used for heat treatment of semiconductor wafer and vertical heat treatment apparatus
05/31/1994CA1329897C Ultrathin laminated oxide coatings and methods
05/26/1994WO1994011787A1 Method of deposition
05/26/1994WO1994011548A2 Method for fabricating diamond films on nondiamond substrates and related structures
05/26/1994WO1994011545A1 Diamond-coated shaped articles and production thereof
05/26/1994WO1994011544A1 Microwave apparatus for depositing thin films
05/26/1994CA2149645A1 Method of deposition
05/25/1994EP0598491A1 Coated filaments
05/25/1994EP0598424A2 Device for removing dissolved gas from a liquid
05/25/1994EP0598394A2 Method and apparatus for manufacturing a liquid crystal display substrate, and apparatus and method for evaluating semiconductor crystals
05/25/1994EP0598361A1 Initiation and bonding of diamond and other thin films
05/25/1994EP0598128A1 Plasma processing apparatus
05/25/1994EP0584252A4 A process for depositing a sio x? film having reduced intrinsic stress and/or reduced hydrogen content
05/25/1994EP0449821B1 Chemical vapor deposition reactor and method for use thereof
05/25/1994CN1087132A Diamond film for reducing die and making method thereof
05/24/1994US5314866 Ceramic oxide films on a semiconductor substrate
05/24/1994US5314845 Vapor deposition by flowing gaseous mixture of oxygen source and tetraethylorthosilicate across wafer surface under reduced pressure, then repeating with lower pressure
05/24/1994US5314727 Chemical vapor deposition of iron, ruthenium, and osmium
05/24/1994US5314726 Process for forming a mixed layer of a plasma sprayed material and diamond
05/24/1994US5314716 Reaction of stannic chloride and primary amine, coated glass with reduced solar energy transmission
05/24/1994US5314652 Finishing substrate surface to roughness dependent on target film thickness, depositing interlayer, depositing synthetic diamond, cooling to release film from substrate
05/24/1994US5314570 Process and apparatus for the production of diamond
05/24/1994US5314540 Apparatus for forming diamond film
05/24/1994US5314538 Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device
05/24/1994US5313982 Gas supply piping device for a process apparatus
05/24/1994CA1329756C Method for forming crystalline deposited film
05/24/1994CA1329739C Multilayer ceramic coatings from silicate esters and metal oxides
05/19/1994DE4238279A1 Plastic prods with transparent, scratch resistant surface layer - have surface layer contg silicon, carbon and oxygen, with at least 3 zones of different compsn and specific photoelectron binding energies
05/18/1994EP0597526A2 Method of manufacturing a magnetic head, and magnetic head manufactured by means of said method
05/18/1994EP0597445A2 Method of making synthetic diamond film
05/18/1994EP0597103A1 Apparatus for neutralizing charged body
05/18/1994EP0596936A1 Deposition of magnesium fluoride films.
05/18/1994EP0301030B1 Hermetic coatings for optical fibers
05/17/1994US5312983 Organometallic tellurium compounds useful in chemical vapor deposition processes
05/17/1994US5312783 Process for the preparation of a high dielectric thin film using ECR plasma CVD
05/17/1994US5312778 Etching
05/17/1994US5312647 Reflective coatings
05/17/1994US5312585 Corrosion inhibition in high temperature environment
05/17/1994US5312529 Method of coating metal using low temperature plasma and electrodeposition
05/17/1994US5312519 Method of cleaning a charged beam apparatus
05/17/1994US5312509 Manufacturing system for low temperature chemical vapor deposition of high purity metals
05/17/1994US5312490 Gas seal for continuous chemical vapor deposition reactors
05/17/1994US5312489 Hollow chamber with ports which coats inside surfaces of hollow objects
05/17/1994US5311896 Method for producing a heatable and refrigerable element for a system handling small quantities of liquid, and an element manufactured by the method
05/17/1994CA1329567C Coated article and method of manufacturing the article
05/11/1994WO1994010717A1 Process for sealing high-temperature fuel cells and fuel cells sealed according to this process
05/11/1994WO1994010358A1 Process for producing a heating element
05/11/1994WO1994010084A1 Precursors and processes for making metal oxides
05/11/1994EP0596678A2 Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
05/11/1994EP0596619A1 Diamond-coated article with integral wearout indicator
05/11/1994EP0596458A1 Polyfunctional tertiary alcohols, method for their manufacture and their use as precursors in laying coatings of alkaline earth metal oxides by the chemical vapour deposition process