Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1995
04/04/1995US5403619 Reaction and polishing takes place at the interface between oxygene superionic conductor and dimond or carbonitride film to form volatile carbon mono or dioxide, resulting in their removal
04/04/1995US5403461 Solid electrolyte-electrode system for an electrochemical cell
04/04/1995US5403436 Plasma treating method using hydrogen gas
04/04/1995US5403401 Substrate carrier
04/04/1995US5403399 Method and apparatus for vapor deposition of diamond
03/1995
03/30/1995WO1995008657A1 Method for obtaining diamond and diamond-like films
03/29/1995EP0645472A1 Coated article for hot hydrocarbon fluid and method of preventing fuel thermal degradation deposits
03/29/1995EP0645471A1 Stacked thin film assembly and method of forming same
03/29/1995EP0644954A1 Semiconductor wafer processing cvd reactor cleaning method and apparatus.
03/29/1995EP0644953A1 Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten cvd
03/29/1995EP0644952A1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates.
03/29/1995EP0644951A1 Method of nucleating tungsten on titanium nitride by cvd without silane.
03/29/1995EP0445305B1 Vapor deposited diamond synthesizing method on electrochemically treated substrate
03/28/1995US5401356 Method and equipment for plasma processing
03/28/1995US5401316 Method and apparatus for hydrophobic treatment
03/28/1995US5401305 Silicon oxide and tin oxide
03/28/1995CA1334910C Apparatus for coating a substrate
03/24/1995CA2132179A1 Coated article for hot hydrocarbon fluid and method of preventing fuel thermal degradation deposits
03/23/1995WO1995008185A1 Film forming device
03/23/1995DE4433523A1 Shape-simulation method, which allows simulation of a prepared shape during steps for producing a semiconductor device in a short time period
03/23/1995DE4433514A1 Self-regenerable coating material and process for its preparation
03/23/1995DE4331701A1 Process for producing polycrystalline diamond layers
03/22/1995EP0644266A1 Working electrode for electrochemical-enzymatical sensor systems
03/22/1995EP0643619A1 Pyrolytic deposition in a fluidized bed.
03/21/1995US5400209 System for measuring output signals
03/21/1995US5399388 Irradiating vapor pulses with microwaves
03/21/1995US5399387 Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates
03/21/1995US5399379 Low-pressure chemical vapor deposition process for depositing high-density, highly-conformal titanium nitride films of low bulk resistivity
03/21/1995US5399254 Apparatus for plasma treatment
03/21/1995US5399200 Module in an integrated delivery system for chemical vapors from liquid sources
03/21/1995US5399199 Apparatus for gas source molecular beam epitaxy
03/21/1995US5398712 Purgeable connection for gas cylinders
03/16/1995WO1995007368A1 Device with miniaturized photoionic head for the treatment of a material
03/16/1995WO1995004839A3 Method of pretreating metal for polymer coating
03/16/1995DE4428992A1 Thin-film forming apparatus
03/15/1995EP0643385A2 Magnetic recording medium, magnetic head and magnetic recording apparatus
03/15/1995EP0643152A2 Cutting tool
03/15/1995EP0642600A1 Device for producing a plasma polymer protection layer on workpieces, in particular headlamp reflectors.
03/15/1995EP0642599A1 Diamond film deposition
03/15/1995CN1100034A Metall-ceramic product and application thereof
03/14/1995US5397962 Source and method for generating high-density plasma with inductive power coupling
03/14/1995US5397737 Deposition of device quality low H content, amorphous silicon films
03/14/1995US5397596 Filling and exhaustion of gas, isolation, backfilling with reactive gas for deposition
03/14/1995US5397595 Method of densifying porous billets
03/14/1995US5397448 Device for generating a plasma by means of cathode sputtering and microwave-irradiation
03/14/1995US5397428 Nucleation enhancement for chemical vapor deposition of diamond
03/14/1995US5397396 Apparatus for chemical vapor deposition of diamond including thermal spreader
03/14/1995US5397395 Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same
03/09/1995DE4326697A1 Device for admitting at least one gas
03/08/1995EP0577678B1 Composite body, its use and process for producing it
03/08/1995EP0429553B1 Process for coating a metallic basic body with a non-conductive coating material
03/07/1995US5396184 Method for the in situ identification of the sheet resistivity or, respectively, of process parameters of thin, electrically conductive layers manufactured under the influence of a plasma
03/07/1995US5395680 Coated cutting tools
03/07/1995US5395662 Improvements in high reflective aluminum sheeting and methods for making same
03/07/1995US5395650 Vacuum deposition of gold from complexes
03/07/1995US5395642 Process for depositing layers having high specific electrical conductivity
03/07/1995US5395453 Apparatus and method for controlling oscillation output of magnetron
03/07/1995US5395452 Apparatus made of silica for semiconductor device fabrication
03/02/1995WO1995006143A1 Device for depositing diamond-like carbon films on a substrate
03/02/1995DE4430120A1 Method for producing a dielectric and system for carrying it out
03/01/1995EP0641150A1 Process apparatus
03/01/1995EP0640610A2 Liquid indium source
03/01/1995EP0640244A1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window.
03/01/1995EP0630424A4 Ferroelectric thin films made by metalorganic chemical vapor deposition.
03/01/1995EP0559787A4 Defect-induced control of the structure of boron nitride
02/1995
02/28/1995US5394061 High frequency plasma power source and impedance matching device for supplying power to a semiconductor processing apparatus
02/28/1995US5393699 Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride
02/28/1995US5393647 Etching, carbiding or nitriding with organic or ammonia vapor
02/28/1995US5393577 Decomposing organometallic gas to produce metal vapors on substrate; laser etching semiconductor device
02/28/1995US5393565 Method for deposition of a refractory metal nitride and method for formation of a conductive film containing a refractory metal nitride
02/28/1995US5393564 High efficiency method for performing a chemical vapor deposition utilizing a nonvolatile precursor
02/28/1995US5393563 Formation of tin oxide films on glass substrates
02/28/1995US5393557 Controlling coating apparatus by transmitting electromagnetic energy from antenna of transceiver proximate coated area, receiving reflected energy, transmitting signal to controller, maintaining property in response
02/28/1995US5393349 Semiconductor wafer processing apparatus
02/28/1995CA1334569C Oxidation resistant carbon and method for making same
02/23/1995WO1995005495A1 Method of producing layers of silicon carbide and an associated product
02/23/1995WO1995005493A1 Method of producing coated particles
02/22/1995EP0639661A2 Method of forming crystalline silicon carbide coatings at low temperatures
02/21/1995US5391422 Diamond- or Diamond-like carbon-coated hard materials
02/21/1995US5391409 Low temperature method for synthesizing diamond with high quality by vapor phase deposition
02/21/1995US5391394 Forming optically opaque refractory metal layer on exposed silicon regions of wafer, heating in chemical vapor deposition chamber while supplying reducing and metal-containing gases to form barrier layer, annealing to form silicide at interface
02/21/1995US5391233 Apparatus for depositing hard coating in a nozzle orifice
02/21/1995US5391232 Plurality of coaxially aligned conduits for transporting gaseous starting materials
02/21/1995US5391231 Holding arrangement for a planar workpiece and at least one such holding arrangement
02/21/1995US5391229 Apparatus for chemical vapor deposition of diamond including graphite substrate holders
02/21/1995US5390626 Low pressure chemical vapor deposition method using a hot-wall
02/21/1995CA1334498C Coating glass
02/16/1995WO1995004845A1 Crystalline multilayer structure and manufacturing method thereof
02/16/1995WO1995004841A1 Method of rapidly densifying a porous structure
02/16/1995WO1995004839A2 Method of pretreating metal for polymer coating
02/16/1995WO1995004609A1 Hydrophilic films by plasma polymerisation
02/16/1995DE4342649C1 Magnetic centrifugal pump for corrosive media
02/16/1995CA2167699A1 Method of rapidly densifying a porous structure
02/16/1995CA2166991A1 Hydrophilic films by plasma polymerisation
02/16/1995CA2144633A1 Method of pretreating metals for polymer coating
02/15/1995EP0638923A2 Low temperature etching in cold-wall CVD systems
02/15/1995EP0638660A2 Dry cleaning of semiconductor processing chambers
02/15/1995EP0638527A1 Process for the deposition of a metallic nitride layer on a transparent substrate
02/14/1995US5389606 Process for producing thin films of inorganic oxides of controlled stoichiometry
02/14/1995US5389570 Thermal deposition of higher order silane gas and diborane gas