| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/19/1993 | WO1993016213A1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions |
| 08/18/1993 | EP0555891A2 Vacuum processing system |
| 08/18/1993 | EP0555890A2 Vacuum processing system |
| 08/18/1993 | EP0555614A1 Metal-organic gas supply for MOVPE and MOMBE |
| 08/18/1993 | EP0555546A1 Plasma CVD apparatus and processes |
| 08/18/1993 | EP0371086B1 Deposition apparatus |
| 08/17/1993 | US5237152 Apparatus for thin-coating processes for treating substrates of great surface area |
| 08/17/1993 | US5236868 Formation of titanium nitride on semiconductor wafer by reaction of titanium with nitrogen-bearing gas in an integrated processing system |
| 08/17/1993 | US5236747 Dissociating metal carabonyl in post-discharge plasma |
| 08/17/1993 | US5236740 Etching with Murakami's reagent |
| 08/17/1993 | US5236511 Plasma CVD process for coating a dome-shaped substrate |
| 08/17/1993 | US5236510 Method and apparatus for forming a deposited layer on a skirted substrate |
| 08/11/1993 | EP0402368B1 Cvd process for depositing a layer on an electrically conductive thin-layer structure |
| 08/11/1993 | CN1075173A Process of making nanometer silicon film |
| 08/10/1993 | US5235078 For producing thin films on substrates by vapor deposition |
| 08/10/1993 | US5234869 Low pressure vapor deposition in heated tube using mixtures of momo-, di-, tri- or tetrakis/dimethylamino/silanes with nitrogen or ammonia |
| 08/10/1993 | US5234862 Vacuum deposition at controlled temperature and pressure |
| 08/10/1993 | US5234769 Wear resistant transparent dielectric coatings |
| 08/10/1993 | US5234724 Forming ion beam from ionized dopant, impacting on surface of growing diamond |
| 08/10/1993 | US5234716 For gas phase deposition of thin films |
| 08/10/1993 | US5234609 X-ray permeable membrane for X-ray lithographic mask |
| 08/10/1993 | US5234527 Liquid level detecting device and a processing apparatus |
| 08/10/1993 | US5234526 Window for microwave plasma processing device |
| 08/10/1993 | US5234502 Microwave plasma chemical vapor deposition apparatus comprising an inclined rotating substrate holder |
| 08/10/1993 | US5234484 Controlled rapid heating in preheated oven while shielding parts of substrate |
| 08/08/1993 | CA2087765A1 Method for producing uniform cylindrical tubes of cvd diamond |
| 08/05/1993 | WO1993015087A1 Metallo-organic precursors |
| 08/05/1993 | DE4212501C1 Deposition of silicon nitride polymer layer on substrate - using linear or cyclic silazane in gas, giving good quality and high coating ratio |
| 08/05/1993 | DE4202889A1 Vapour deposition of metal-contg. films on substrates - by decompsn. of aluminium or transition metal 1,3-di:imine complexes |
| 08/05/1993 | DE4202734A1 Radiation source esp. for radiation-induced etching and CVD installations - comprises adjustable spectrum obtd. by system parameter variation |
| 08/04/1993 | EP0554047A1 SiC single crystal growth |
| 08/04/1993 | EP0554039A1 Method and apparatus for generating plasma, and semiconductor processing methods |
| 08/04/1993 | EP0553691A1 Passive shield for CVD wafer processing which prevents frontside edge and backside deposition |
| 08/04/1993 | EP0553518A1 Elastomers and method for stabilization and lubrification |
| 08/04/1993 | EP0553469A2 Plasma-etching process for the rapid and damage-free cleaning of reaction chambers and principally in the deposition or etching of layers on silicon substrats |
| 08/04/1993 | EP0553161A1 Abrasion wear resistant polymeric substrate product |
| 08/04/1993 | EP0413834B1 Diamond-covered member and process for producing the same |
| 08/04/1993 | CN2139581Y DC arc sputtering deposit diamond device |
| 08/04/1993 | CN1074891A Coating composition for glass |
| 08/04/1993 | CN1074890A Method for coating glass substrates |
| 08/04/1993 | CN1074889A Coated article |
| 08/03/1993 | US5233163 Graphite columnar heating body for semiconductor wafer heating |
| 08/03/1993 | US5232869 Vapor deposition |
| 08/03/1993 | US5232791 Magnetic recording medium having a carbon rich coating |
| 08/03/1993 | US5232509 Apparatus for producing low resistivity tungsten thin film comprising reaction temperature measuring thermocouples |
| 08/03/1993 | US5232508 Gaseous phase chemical treatment reactor |
| 08/03/1993 | US5232507 Apparatus for forming deposited films with microwave plasma CVD method |
| 08/03/1993 | US5232318 Coated cutting tools |
| 07/28/1993 | EP0552951A1 Microwave apparatus for fiber coating |
| 07/28/1993 | EP0552547A1 Diamond films |
| 07/28/1993 | EP0552491A1 Plasma etch process |
| 07/28/1993 | EP0552490A1 Process for etching an oxide layer over a nitride |
| 07/28/1993 | EP0552375A1 Chemical vapor deposition apparatus, method of semiconductor film formation, and method of producing thin film semiconductor device |
| 07/28/1993 | EP0552249A1 Flame or plasma synthesis of diamond under turbulent and transition flow conditions |
| 07/27/1993 | US5231263 Liquid crystal mask type laser marking system |
| 07/27/1993 | US5231259 Radiation manufacturing apparatus |
| 07/27/1993 | US5231058 Process for forming cvd film and semiconductor device |
| 07/27/1993 | US5231057 Method of depositing insulating layer on underlying layer using plasma-assisted cvd process using pulse-modulated plasma |
| 07/27/1993 | US5230931 Plasma-assisted cvd of carbonaceous films by using a bias voltage |
| 07/27/1993 | US5230929 Thin film |
| 07/27/1993 | US5230925 Silica |
| 07/27/1993 | US5230847 Silane reducing agent, vapor deposition |
| 07/27/1993 | US5230741 Vapor deposition on wafers |
| 07/27/1993 | US5230740 Apparatus for controlling plasma size and position in plasma-activated chemical vapor deposition processes comprising rotating dielectric |
| 07/27/1993 | US5230721 Apparatus for supplying ultrahigh purity gas |
| 07/25/1993 | CA2087549A1 Metallo-organic precursors to titanium nitride |
| 07/21/1993 | EP0551737A1 Vapor deposition process for coating articles of manufacture |
| 07/21/1993 | EP0551730A1 Method for producing flat CVD diamond film |
| 07/20/1993 | US5229576 Heating apparatus |
| 07/20/1993 | US5229319 Method for producing compound semiconductors and apparatus therefor |
| 07/20/1993 | US5229193 Substrate of silicon carbide containing free silicon coated with silicon carbide having inner layer with free silicon and outer layer with none |
| 07/20/1993 | US5229081 Apparatus for semiconductor process including photo-excitation process |
| 07/20/1993 | CA2034650C Ellipsometric control of material growth |
| 07/14/1993 | EP0550859A1 Tube apparatus for manufacturing semiconductor device |
| 07/14/1993 | EP0550630A1 Abrasion wear resistant coated substrate product |
| 07/13/1993 | US5227340 Chemical vapor deposition by passing carrier gas through diffuser and finely divided solid reactant source to heated substrate |
| 07/13/1993 | US5227202 Applying electrical potential difference between spaced electrode pair to generate plasma discharge, positioning workpiece between electrodes and causing it to be at free floating electrical potential with respect to electrodes |
| 07/13/1993 | US5227196 Method of forming a carbon film on a substrate made of an oxide material |
| 07/13/1993 | US5227195 Forming coating of metal carbide, metal oxide and/or metal nitride; intermediate is reacted with reactant containing carbon, oxygen or nitrogen |
| 07/13/1993 | US5227191 Filling hole by metal vapor deposition |
| 07/13/1993 | US5227006 Method for selectively growing gallium-containing layers |
| 07/13/1993 | US5226967 Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
| 07/13/1993 | US5226383 Gas foil rotating substrate holder |
| 07/13/1993 | CA1320102C Method for forming a deposited film |
| 07/08/1993 | WO1993013552A1 Semiconductor fabricating unit |
| 07/08/1993 | WO1993013244A1 Surface reaction film formation apparatus |
| 07/08/1993 | WO1993013243A1 Method and means for coating a surface with a resistant facing by chemical-vapor deposition |
| 07/08/1993 | WO1993013242A1 Nucleation enhancement for chemical vapor deposition of diamond |
| 07/08/1993 | WO1993013241A1 Purge gas in wafer coating area selection |
| 07/08/1993 | WO1993013015A1 Composite diamond grains and process for their production |
| 07/08/1993 | WO1993012934A1 Coated glass article |
| 07/08/1993 | WO1993012892A1 Method for coating glass substrates |
| 07/08/1993 | WO1993012874A1 Method of feeding ultrahigh-purity gas and feed system thereof |
| 07/08/1993 | CA2125873A1 Nucleation enhancement for chemical vapor deposition of diamond |
| 07/08/1993 | CA2104589A1 Method and means for coating a surface with a resistant facing by chemical-vapor deposition |
| 07/07/1993 | EP0550202A1 Method of producing prestressed diamond composite films |
| 07/07/1993 | EP0550071A1 Method for manufacturing inorganic membranes by organometallic chemical vapor deposition |
| 07/07/1993 | EP0550070A1 Method for manufacturing inorganic membranes by organometallic chemical vapor infiltration |
| 07/07/1993 | EP0550058A2 A programmable multizone gas injector for single-wafer semiconductor processing equipment |
| 07/07/1993 | EP0550049A1 Method for manufacturing ultrathin inorganic membranes |