Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/1994
02/16/1994EP0371145B1 Process for vapor-phase synthesis of diamond
02/16/1994EP0319585B1 Process for forming thin film of oxide superconductor
02/15/1994US5286927 Insulating substrate having groove, conductor pattern formed in groove containing electroconductive metal of copper, silver or gold and fine particles having thermal expansion coefficient different from the metal
02/15/1994US5286565 Carbon body with boron carbide formed by reaction with boron oxide, glass forming coating of silicon nitride and/or silicon oxynitride
02/15/1994US5286534 Exposing magnetic medium to plasma while medium is influenced by a radio frequency bias electrode to accelerate plasma
02/15/1994US5286533 Method of making hard boron nitride by a plasma CVD method employing beam irradiation
02/15/1994US5286524 Method for producing CVD diamond film substantially free of thermal stress-induced cracks
02/15/1994US5286523 Chaning positions which are disposed in the direction of gas flow in reaction vessel until optimal surface processing conditions are attained
02/15/1994US5286520 Preparation of fluorine-doped tungstic oxide
02/15/1994US5286519 Fluid dispersion head
02/15/1994US5286518 Integrated-circuit processing with progressive intermetal-dielectric deposition
02/15/1994US5286301 Chemical vapor deposition system cleaner
02/15/1994US5286297 Multi-electrode plasma processing apparatus
02/15/1994US5286296 Multi-chamber wafer process equipment having plural, physically communicating transfer means
02/10/1994DE4226229A1 Surface treatment using high energy material pulse
02/09/1994EP0582444A1 Ultra pure silicon carbide and high temperature semiconductor processing equipment made therefrom
02/09/1994EP0582397A2 CVD diamond material for radiation detector and process for making same
02/09/1994EP0386190B1 Elemental mercury source for metal-organic chemical vapor deposition
02/08/1994US5284824 Method for manufacturing an oxide superconductor thin film
02/08/1994US5284805 Rapid-switching rotating disk reactor
02/08/1994US5284730 Electrophotographic light-receiving member
02/08/1994US5284709 Diamond materials with enhanced heat conductivity
02/08/1994US5284676 Controlling coating by monitoring pressure differences between interior and exterior of bed, then adjusting velocities of addition and withdrawal of particles if necessary
02/08/1994US5284640 Making carbon-free polycrystalline silicon by ptrolysis of gaseous silicon compound
02/08/1994US5284521 Vacuum film forming apparatus
02/08/1994US5284519 For making iron disulfide from propylene sulfide, tert-butyl mercaptan
02/03/1994WO1994002659A1 Improvements in the method and apparatus of vacuum deposition
02/03/1994DE4325041A1 Adjustment of the processing rate distribution in an etching or plasma CVD installation - with an adjustment body located opposite to the surface undergoing processing
02/02/1994EP0580944A1 Method and device for manufacture of a metal plastic composite
02/01/1994US5283207 Photoconductive material and photosensor employing the photoconductive material
02/01/1994US5283109 Carbon-carbon composite substrate, thin alternate silicon carbide and group four metal carbide layers
02/01/1994US5283087 Placing substrate between electrodes, supplying etchant gas, applying electricity to excite gas to plasma, etching film while supplying bias voltage to substrate
02/01/1994US5283085 Method of manufacturing a hot-cathode element
02/01/1994US5283030 Coated cemented carbides and processes for the production of same
02/01/1994CA2099788A1 Ultra pure silicon carbide and high temperature semiconductor processing equipment made therefrom
01/1994
01/27/1994DE4324320A1 Thin film photovoltaic converter mfr. for mass production of solar cells - has flexible carrier guided into airtight coating chambers having sealing mechanism which adheres to carrier at inlet and outlet
01/26/1994EP0580158A1 Method of treating active material
01/26/1994EP0579983A1 Impurity-containing hard carbon film
01/26/1994EP0579756A1 Coated cutting tool
01/25/1994US5281302 Fluoridated carbon compounds and ozone and oxygen
01/25/1994US5281295 Semiconductor fabrication equipment
01/25/1994CA1326411C Diffusion barrier coating material
01/20/1994WO1994001597A1 Apparatus and method for treating a wafer of semiconductor material
01/20/1994WO1994001438A1 Process for the preparation of trialkyl compounds of group 3a metals
01/18/1994US5280012 Method of forming a superconducting oxide layer by MOCVD
01/18/1994US5279867 Subjecting gas medium to radiation; decomposition of compound or alloy at low temperature
01/18/1994US5279866 Using a plasma stream under vacuum
01/18/1994US5279865 High throughput interlevel dielectric gap filling process
01/18/1994US5279857 Process for forming low resistivity titanium nitride films
01/18/1994US5279671 Thermal vapor deposition apparatus
01/18/1994US5279661 Vaporized hydrogen silsesquioxane for depositing a coating
01/13/1994DE4222137A1 Fuel injection nozzle for diesel engines - with fine hole-jets in nozzle body reduced in size near outlet by convergent deposit of hard metal or ceramic
01/12/1994EP0578232A1 Diamond synthetic method
01/12/1994EP0578011A1 Multi-electrode plasma processing apparatus
01/12/1994EP0578010A1 Multi-zone plasma processing method
01/12/1994EP0577678A1 Composite body, its use and process for producing it.
01/12/1994CN2152808Y Apparatus for gas phase synthesis of film and micropowder by laser
01/12/1994CN1080667A Pyrolytic deposition in a fluidized bed
01/11/1994US5278861 Method of treating metals by deposition of materials and furnace for implementing said method
01/11/1994US5278138 Heating, evaporating the precursor compounds, oxidation
01/11/1994US5277987 High hardness fine grained beta tungsten carbide
01/11/1994US5277975 High thermal-conductivity diamond-coated fiber articles
01/11/1994US5277940 Method for treating diamonds to produce bondable diamonds for depositing same on a substrate
01/11/1994US5277939 ECR CVD method for forming BN films
01/11/1994US5277932 Reacting a metal salt with a polyborane
01/11/1994US5277751 Method and apparatus for producing low pressure planar plasma using a coil with its axis parallel to the surface of a coupling window
01/06/1994WO1994000870A2 Chemical vapor deposition from single organometallic precursors
01/06/1994WO1994000867A1 Process for regulating a hot cathode glow discharge
01/06/1994WO1994000251A1 A plasma cleaning method for removing residues in a plasma treatment chamber
01/06/1994WO1994000247A1 Methods and apparatus for externally treating a container with application of internal bias gas
01/06/1994CA2138951A1 Chemical vapor deposition from single organometallic precursors
01/05/1994EP0577447A1 Process for forming a silicon containing coating on a metallic substrate, anti-corrosion treatment process
01/05/1994EP0577086A1 Apparatus for surface treatment
01/05/1994EP0577066A1 Cutting tool employing vapor-deposited polycrystalline diamond for cutting edge and method of manufacturing the same
01/05/1994EP0576559A1 Interfacial plasma bars for photovoltaic deposition apparatus.
01/05/1994DE4222021A1 New isonitrile or organo-silyl acetyl-acetonato or ketiminato copper cpds. - used in deposition of film contg. copper@, and opt. other metal or polymer on inorganic or organic substrate, e.g. polymer, at relatively low temp.
01/05/1994DE4221659A1 Micro-composite from double metal alkoxide for high yield fine dispersion - by thermolysis decomposing and depositing involatile prods. on substrate, for mfg. catalyst or metal-ceramic composite contg. barium and tin, for aggromerated microspheres
01/04/1994US5275976 Process chamber purge module for semiconductor processing equipment
01/04/1994US5275851 Low temperature crystallization and patterning of amorphous silicon films on electrically insulating substrates
01/04/1994US5275850 Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias
01/04/1994US5275844 Process for forming a crack-free boron nitride coating on a carbon structure
01/04/1994US5275840 Manufacturing method for electroluminescent thin film
01/04/1994US5275798 Vapor deposition a diamond film on a substrate
01/04/1994US5275692 Method for fabricating integrated circuits
01/04/1994US5275686 Radial epitaxial reactor for multiple wafer growth
01/04/1994US5275665 Method and apparatus for causing plasma reaction under atmospheric pressure
01/04/1994US5275629 Infrared light transmission window in walls between susceptor and pyrometer
01/04/1994CA1325793C Plasma deposited coatings and low temperature, plasma method of making same
12/1993
12/29/1993EP0575650A1 Method of reforming an insulating film in a semiconductor device and apparatus therefor
12/29/1993EP0383859B1 Single-notch rugate filters and a controlled method of manufacture thereof
12/29/1993CN1023329C Microwave enhanced CVD method for coating prastic articles with carbon films and its products
12/28/1993US5274149 Continuous process by contacting an olefin, arsine and a Bronsted acid catalyst; vapor phase
12/28/1993US5273911 Depositing a semiconductor layer on an induction-heated flaky graphite substrate hardened by rolling at 1000 degrees C.
12/28/1993US5273851 Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C
12/28/1993US5273825 Article comprising regions of high thermal conductivity diamond on substrates
12/28/1993US5273791 Method of improving the corrosion resistance of a metal
12/28/1993US5273790 Method for consolidating diamond particles to form high thermal conductivity article
12/28/1993US5273783 Decomposition of precursor in presence of a Lewis Base
12/28/1993US5273778 Simultaneously decomposing a graphite source and a metal halide or organometal for chemical vapor deposition onto a substrate
12/28/1993US5273775 Process for selectively depositing copper aluminum alloy onto a substrate