| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/13/1993 | US5201990 Process for treating aluminum surfaces in a vacuum apparatus |
| 04/13/1993 | US5201986 Using direct current discharges on mixture of hydrocarbon and hydrogen; controlling concentration |
| 04/13/1993 | US5201956 Vapor deposition |
| 04/13/1993 | CA1315918C Hard outer coatings deposited on titanium or titanium alloys |
| 04/08/1993 | DE4210508C1 Mixed diamond - silicon carbide coating with good adhesion - consists of intimate mixt. of diamond phase and cubic beta silicon carbide phase, which can vary across coating thickness |
| 04/08/1993 | DE4132562A1 In-situ determn. of thin electrically conductive films resistance - includes elimination of distorting plasma effects |
| 04/08/1993 | DE4132559A1 Plasma etching in-situ cleaning process for vacuum deposition chambers - with separate plasma discharge excitation of etch gas and admission of activated etch gas to chamber |
| 04/07/1993 | EP0535810A1 Blood collection tube assembly |
| 04/07/1993 | EP0535308A1 Device for introducing reagents into an organometallic vapour phase deposition apparatus |
| 04/06/1993 | USH1170 Volatile divalent double metal alkoxides |
| 04/06/1993 | US5200388 Metalorganic chemical vapor deposition of superconducting films |
| 04/06/1993 | US5200373 High strength composite ceramic structure and process for producing the same |
| 04/06/1993 | US5200232 Maintaining the line of sight surface of plasma shield and surrounding area at a constant temperature |
| 04/06/1993 | US5200231 Vapor deposition; varying power of microwave energy |
| 04/06/1993 | US5200021 Method and apparatus for vapor deposition |
| 04/06/1993 | US5199993 Methods of and apparatus for coating optical fibers |
| 04/06/1993 | US5199603 Delivery system for organometallic compounds |
| 04/06/1993 | CA1315648C Polysilicon thin film process and product |
| 04/06/1993 | CA1315616C Method for forming deposited film |
| 04/06/1993 | CA1315615C Method for forming a deposited film |
| 04/06/1993 | CA1315614C Method for forming deposited film |
| 04/06/1993 | CA1315497C Plated steel sheet for cans |
| 04/01/1993 | WO1993006619A1 Apparatus for introducing gas, and apparatus and method for epitaxial growth |
| 04/01/1993 | WO1993006258A1 Apparatus for rapid plasma treatments and method |
| 03/31/1993 | EP0534729A2 Method for obtaining thick, adherent diamond coatings |
| 03/31/1993 | EP0533678A1 Ellipsometric control of material growth |
| 03/31/1993 | CN1070535A Process and apparatus for ignition of CVD plasmas |
| 03/30/1993 | US5198411 Chemical vapor phase method for forming thin films of high temperature oxide superconductors |
| 03/30/1993 | US5198387 Vapor deposition dopes on substrates from silane gas mixture |
| 03/30/1993 | US5198285 Hard and lubricant thin film of iron base metallic material coated with amorphous carbon-hydrogen-silicon |
| 03/30/1993 | US5198263 High rate chemical vapor deposition of carbon films using fluorinated gases |
| 03/30/1993 | US5198158 Forming a layer on magnesium oxide supported on saphire or gadolinium gallium garnet and etching the magnesium oxide with acid |
| 03/30/1993 | US5198071 Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer |
| 03/30/1993 | US5198070 Joining diamond bodies |
| 03/30/1993 | US5198034 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
| 03/30/1993 | US5198029 Phosphors |
| 03/30/1993 | US5197993 Lightweight battery electrode and method of making it |
| 03/28/1993 | CA2076086A1 Method for obtaining thick, adherent diamond coatings using metal interface screens |
| 03/25/1993 | DE4131307A1 Application of adhesive aluminium oxide coatings to sintered hard metal items - by CVD using two different vapour phase compsns. |
| 03/24/1993 | EP0533606A1 Method and apparatus for coating a metallurgical substrate with polymeric layers and product so obtained |
| 03/24/1993 | EP0533438A2 Cleaning of cvd reactor used in the production of polycrystalline silicon |
| 03/24/1993 | EP0533201A1 Liquid vaporization valve |
| 03/24/1993 | EP0533129A2 Deposition of silicon dioxide films at temperatures as low as 100 C by LPCVD using organodisilane sources |
| 03/24/1993 | EP0533074A1 Optical waveguide having an essentially planar substrate and method for its manufacture |
| 03/24/1993 | EP0533070A2 Volatile precursors for copper CVD |
| 03/24/1993 | EP0533044A1 Process and apparatus for the protective coating of substrates |
| 03/24/1993 | EP0532758A1 Cvd semiconductor manufacturing equipment |
| 03/23/1993 | US5196398 Heat treatment |
| 03/23/1993 | US5196372 Process for forming metal deposited film containing aluminum as main component by use of alkyl hydride |
| 03/18/1993 | WO1993005630A1 Harmonic and subharmonic isolator for plasma discharge |
| 03/18/1993 | WO1993005207A1 Method of nucleating diamond and article produced thereby |
| 03/17/1993 | EP0532184A1 Polycrystalline diamond substrate coated with non-hydrogenated amorphous diamond-like carbon thin films as durable optical element |
| 03/17/1993 | EP0365645B1 A method of manufacturing perovskite lead scandium tantalate |
| 03/16/1993 | US5194642 Metallo-organic precursors to titanium nitride |
| 03/16/1993 | US5194401 Thermally processing semiconductor wafers at non-ambient pressures |
| 03/16/1993 | US5194398 Semiconductor film and process for its production |
| 03/16/1993 | US5194330 Carbon with an oxidant protective coating |
| 03/16/1993 | US5194291 Corona discharge treatment |
| 03/11/1993 | DE4214401C1 Plasma-aided CVD of coating inside hollow body - by introducing atmos. contg. cpd. vapour into cavity at below atmos. pressure and passing microwaves into cavity |
| 03/10/1993 | EP0531085A2 Isotopic diamond coated products and their production |
| 03/10/1993 | EP0531029A2 Carbon fluoride compositions |
| 03/10/1993 | EP0530779A2 Improved titanium carbonitride coated stratified substrate and cutting inserts made from the same |
| 03/10/1993 | EP0530297A1 A process and an apparatus for the surface treatment of powder particles. |
| 03/10/1993 | CN1069778A Carbon-fluoride comppositions |
| 03/10/1993 | CN1020045C Multi-chamber deposition system |
| 03/09/1993 | US5192610 Corrosion-resistant protective coating on aluminum substrate and method of forming same |
| 03/09/1993 | US5192589 Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity |
| 03/09/1993 | US5192523 Method for forming diamondlike carbon coating |
| 03/09/1993 | US5192409 Method of sputtering a mixture of hexagonal boron nitride and stainless steel onto a steel vessel and heating the film so as to precipitate the boron nitride onto the film surface |
| 03/09/1993 | US5192393 Crystallization of silicon by neutralization and activation |
| 03/09/1993 | US5192371 Substrate supporting apparatus for a CVD apparatus |
| 03/09/1993 | US5192370 Method and apparatus for forming thin film |
| 03/04/1993 | WO1993004214A1 Process for forming low resistivity titanium nitride films |
| 03/04/1993 | WO1993004213A1 Manufacture of a tool with wear-resistant diamond cutting edge |
| 03/04/1993 | WO1993004212A1 Preparation of group iii element-group vi element compound films |
| 03/04/1993 | WO1993004210A1 Method for forming oxide film |
| 03/04/1993 | WO1993004072A1 METAL β-DIKETONATES |
| 03/04/1993 | WO1993004015A1 Tool with wear-resistant cutting edge made of cubic boron nitride or polycrystalline cubic boron nitride, a method of manufacturing the tool and its use |
| 03/04/1993 | WO1992019790A3 Primary flow cvd apparatus and method |
| 03/04/1993 | DE4129102A1 Uniformly depositing finely crystalline stoichiometric silicon carbide - using flowing gas mixt. comprising silicon source, carbon source and diluent gas at moderate temp. and pressure useful for fibre bundles |
| 03/04/1993 | CA2114716A1 Process for forming low resistivity titanium nitride films |
| 03/04/1993 | CA2113715A1 Metal .beta.-diketonates |
| 03/04/1993 | CA2076087A1 Isotopic diamond coated products and their production |
| 03/03/1993 | EP0529982A1 Exhaust apparatus for epitaxial growth system. |
| 03/03/1993 | EP0529593A1 A glass carbon coated graphite chuck for use in producing polycrystalline silicon |
| 03/03/1993 | EP0529334A2 Liquid delivery and vaporization system |
| 03/03/1993 | EP0528986A1 Materials for chemical vapor deposition processes. |
| 03/03/1993 | EP0528795A1 Apparatus for low temperature cvd of metals |
| 03/03/1993 | EP0450016A4 Method for preparing vaporized reactants for chemical vapor deposition |
| 03/02/1993 | US5191099 Chemical vapor deposition of aluminum films using dimethylethylamine alane |
| 03/02/1993 | US5190913 Chemical vapor deposition |
| 03/02/1993 | US5190824 Electrostatic-erasing abrasion-proof coating |
| 03/02/1993 | US5190823 Method for improving adhesion of synthetic diamond coatings to substrates |
| 03/02/1993 | US5190807 Polysiloxane coating, diamond-like carbon, lenses |
| 03/02/1993 | US5190792 High-throughput, low-temperature process for depositing oxides |
| 03/02/1993 | US5190703 Plasma reactor chamber |
| 03/01/1993 | CA2072384A1 Carbon fluoride compositions |
| 02/24/1993 | EP0528778A1 Method for microwave plasma assisted CVD diamond coating |
| 02/24/1993 | EP0528592A1 Method for selective CVD diamond deposition |
| 02/24/1993 | EP0528540A2 Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes |