Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/1993
07/07/1993EP0549801A1 Diamond-covered member and production thereof
07/07/1993EP0549585A1 Binder enriched cvd and pvd coated cutting tool
07/07/1993EP0549584A1 Cvd and pvd coated cutting tools
07/06/1993USH1210 Surface hardening of reprographic machine components by coating or treatment processes
07/06/1993US5226067 Coating for preventing corrosion to beryllium x-ray windows and method of preparing
07/06/1993US5225926 Durable optical elements fabricated from free standing polycrystalline diamond and non-hydrogenated amorphous diamond like carbon (dlc) thin films
07/06/1993US5225659 Method and apparatus for surface treating an axially symmetric substrate at atmosphere pressure
07/06/1993US5225561 Source reagent compounds for MOCVD of refractory films containing group IIA elements
07/06/1993US5225396 Method for forming an oxide superconducting film
07/06/1993US5225378 Preheating second process gas before reacting with the first process gas
07/06/1993US5225375 Plasma enhanced chemical vapor processing of semiconductor substrates
07/06/1993US5225275 Method of producing diamond films
07/06/1993US5225251 Method for forming layers by UV radiation of aluminum nitride
07/06/1993US5225245 Chemical vapor deposition method for forming thin film
07/06/1993US5224999 Heat treatment apparatus
07/06/1993US5224513 Device for introducing reagents into an organometallic vapor phase deposition apparatus
07/06/1993US5224441 Apparatus for rapid plasma treatments and method
07/03/1993CA2086402A1 Method for manufacturing inorganic membranes by organometallic chemical vapor deposition
07/03/1993CA2086388A1 Method for manufacturing inorganic membranes by organometallic chemical vapor infiltration
07/03/1993CA2085660A1 Method of producing prestressed diamond composite films by chemical vapor deposition and articles produced therefrom
07/01/1993CA2082794A1 Method of preparing uv absorbant and abrasion-resistant transparent plastic articles
06/1993
06/30/1993EP0549207A1 Diamond films
06/30/1993EP0549187A1 Diamond films
06/30/1993EP0549186A1 Diamond films
06/30/1993EP0549034A1 Cathode and method of manufacture
06/30/1993EP0548990A2 Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method
06/30/1993EP0548944A1 Chemical vapor deposition method and apparatus making use of liquid starting material
06/30/1993EP0548926A1 Apparatus for vaporizing liquid raw material and apparatus for forming thin film
06/30/1993EP0548429A1 Method of fabricating lightweight honeycomb type structure
06/30/1993EP0548407A1 Tungsten chemical vapor deposition method
06/30/1993EP0484449A4 Process and apparatus for coating small solids
06/29/1993US5224202 Apparatus for the evaporation of liquids
06/29/1993US5223337 Durable cutting tool coated by plasma-activated chemical vapor deposition with carbides, nitrides or carbonitrides of titanium or zirconium with finite chlorine content
06/29/1993US5223308 Low temperature plasma enhanced CVD process within tubular members
06/29/1993US5223305 Forming dielectric film on semiconductor substrate; applicable to electroluminesce device
06/29/1993US5223039 Illuminating apparatus and photo-excited process apparatus using same
06/29/1993CA1319587C Metalorganic chemical vapor depositing growth of group ii-vi semiconductor materials having improved compositional uniformity
06/29/1993CA1319586C Recovery of lower-boiling silanes in a cvd process
06/29/1993CA1319497C Surface-coated cemented carbide and a process for the production of the same
06/27/1993WO1993013393A1 Coating composition for glass
06/27/1993CA2104592A1 Method for coating glass substrates
06/24/1993WO1993012632A1 Method of monitoring atmospheric pressure glow discharge plasma
06/24/1993WO1993012546A1 Semiconductor device and microwave process for its manufacture
06/24/1993WO1993012538A1 Process for fabricating layered superlattice materials
06/24/1993WO1993012470A1 Particles suitable for use as carrier particles in electrophotography
06/24/1993WO1993012266A1 Apparatus and method for delivery of involatile reagents
06/24/1993DE4142261A1 Coating and infiltration of substrates in a short time - by heating substrate using body which matches the component contour at gas outflow side and opt. gas entry side
06/24/1993DE4142202A1 Magnetic recording head with wear resistant head - has surface coated with protective layer having crystalline diamond islands covered by carbon@ layer.
06/24/1993CA2125657A1 Apparatus and method for delivery of involatile reagents
06/24/1993CA2125479A1 Particles suitable for use as carrier particles in electrophotography
06/23/1993EP0547868A1 Apparatus and method for controlling plasma size and position in plasma-activated chemical vapor deposition processes
06/22/1993US5222074 Thermal decomposition cell
06/22/1993US5221643 Enables deposition of uniform layers at low temperature
06/22/1993US5221561 Process for the photochemical treatment of a material using a flash tube light source
06/22/1993US5221556 Gas injectors for reaction chambers in CVD systems
06/22/1993US5221501 Transparent diamond laminates
06/22/1993US5221414 Process and system for stabilizing layer deposition and etch rates while simultaneously maintaining cleanliness in a water processing reaction chamber
06/22/1993US5221403 Support table for plate-like body and processing apparatus using the table
06/22/1993US5221356 Apparatus for manufacturing semiconductor wafers
06/22/1993US5221355 Silicon carbide film forming apparatus
06/22/1993US5221354 Apparatus and method for gas phase coating of hollow articles
06/22/1993US5221353 Improved tensile strength
06/17/1993DE4241932A1 CVD to deliver reaction gas to form film of given compsn. - in which reaction zone is insulated from ambient air and reaction zone is linked to outlet channel
06/17/1993DE4140900A1 Als carrier fuer die elektrophotographie geeignete teilchen As a carrier for the electromagnetic photograph suitable particles
06/16/1993EP0546921A1 Gas photonanograph for fabrication and optical analysis of nanometer scale patterns
06/16/1993EP0546754A1 Method for producing CVD diamond film
06/16/1993EP0546752A1 CVD diamond growth on hydride-forming metal substrates
06/16/1993EP0546670A1 Metal nitride films
06/16/1993EP0546669A1 Preparation of fluorine-doped tungstic oxide and glass coating process
06/16/1993EP0546452A1 Coating process using dense phase gas
06/16/1993EP0546012A1 Transition metal aluminum/aluminide coatings and method for making them
06/16/1993EP0408753B1 Process for forming superconducting thin film
06/15/1993US5220044 Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films
06/14/1993CA2085025A1 Preparation of fluorine-doped tungstic oxide
06/14/1993CA2082729A1 Method for producing cvd diamond film substantially free of thermal stress-induced cracks
06/14/1993CA2082728A1 Method for producing flat cvd diamond film
06/14/1993CA2082711A1 Cvd diamond growth on hydride-forming metal substrates
06/13/1993CA2079629A1 Coating process using dense phase gas
06/10/1993WO1993011276A1 Deposition apparatus and methods
06/10/1993WO1993011275A1 Process and device for coating substrate bodies with hard substances
06/10/1993WO1993011274A1 Process for treating sintered tungsten carbide parts and parts obtained such as cutting tools and wear parts
06/10/1993WO1993011273A1 Diamond coated products and method of preparation
06/10/1993WO1993011068A1 Conversion of fullerenes to diamond
06/10/1993CA2124215A1 Deposition apparatus and methods
06/09/1993EP0545748A1 Device for supplying a voltage to a substrate holder
06/09/1993EP0545661A2 Substrate stabilization of diffusion aluminide coated nickel-based superalloys
06/09/1993EP0545542A1 Apparatus for depositing a material on a substrate by chemical vapour deposition
06/09/1993EP0545460A2 CVD process for coating extensive substrates
06/09/1993DE4140158A1 Verfahren und vorrichtung zur hartstoffbeschichtung von substratkoerpern Method and device for hard material coating of substratkoerpern
06/08/1993US5218232 Semiconductor device having two-level wiring
06/08/1993US5217817 Steel tool provided with a boron layer
06/08/1993US5217761 Sheet plasma CVD apparatus
06/08/1993US5217756 Selective chemical vapor deposition of aluminum, aluminum CVD materials and process for preparing the same
06/08/1993US5217755 Injecting gas flow into enclosure containing porous substrate
06/08/1993US5217700 Process and apparatus for producing diamond film
06/08/1993US5217501 Vertical wafer heat treatment apparatus having dual load lock chambers
06/08/1993US5217340 Wafer transfer mechanism in vertical CVD diffusion apparatus
06/04/1993CA2084268A1 Metal nitride films
06/03/1993DE4138926A1 Prodn. of indium-tin oxide targets in CVD reactor - by depositing thermally decomposable tin and indium cpds. with addn. of oxygen@ onto substrate
06/02/1993EP0544438A2 Method for selectively growing gallium-containing layers