Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/1993
02/24/1993EP0528405A2 Ambient-free processing system
02/24/1993CN1069294A Hard coating, workpiece coated by such hard coating and method of coating such workpiece by such hard coating
02/23/1993US5188862 Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
02/23/1993US5188776 Catalytic pyrolysis of carbon fibers by hydrocarbon feed, coating a ceramic forming material, oxidation and vaporating all the carbon
02/23/1993US5188672 Reduction of particulate contaminants in chemical-vapor-deposition apparatus
02/23/1993US5188058 Uniform gas flow CVD apparatus
02/23/1993CA1313762C Hard sintered compact for a tool
02/18/1993WO1993003590A1 Plasma processing apparatus
02/18/1993WO1993003196A1 Method for deposition of a metal
02/18/1993WO1993002981A1 Deposition of magnesium fluoride films
02/18/1993WO1993002846A1 Catalyst and plasma assisted nucleation and renucleation of gas phase selective laser deposition
02/18/1993WO1993002806A1 Low energy ion doping of growing materials
02/18/1993DE4126852A1 Werkzeug mit verschleissfester diamantschneide, verfahren zu dessen herstellung sowie dessen verwendung Tool with wear-resistant diamond cutting edge, process for its preparation and its use
02/18/1993DE4126851A1 Werkzeug mit verschleissfester schneide aus kubischem bornitrid oder polykristallinem kubischem bornitrid, verfahren zu dessen herstellung sowie dessen verwendung Tool with wear-resistant cutting edge of cubic boron nitride or polycrystalline cubic boron nitride, process for its preparation and its use
02/18/1993DE4126759A1 Thin, silicon-contg. organic layers prodn. - by irradiation of organo-silane(s)-alkoxy:silane(s) or -siloxane(s) with pulsed laser light of specified wavelength, pulse length, frequency and energy
02/18/1993CA2113992A1 Deposition of magnesium fluoride films
02/17/1993EP0527661A1 Metal beta-diketonates
02/17/1993EP0527290A1 Device for implementing a thin film process for the treatment of large area substrates
02/17/1993EP0527133A1 Plasma reaction chamber having conductive diamond-coated surfaces.
02/17/1993EP0489862A4 Chemical vapor deposition system cleaner
02/16/1993US5187771 Heat processing apparatus utilizing a plurality of stacked heater holders
02/16/1993US5187300 Volatile precursors for copper CVD
02/16/1993US5187115 Method of forming semiconducting materials and barriers using a dual enclosure apparatus
02/16/1993US5186973 Heating substrate in a reactor, passing a gaseous mixture of a hydrocarbon and hydrogen, under pressure, over substrate to vapor deposit diamond layer and recovering substrate with smooth coating
02/16/1993US5186756 MOCVD method and apparatus
02/16/1993US5186120 Mixture thin film forming apparatus
02/10/1993EP0526843A1 Holder for a sample insertable in an apparatus using a transfer mechanism
02/10/1993EP0526779A1 Pulsed gas plasma-enhanced chemical vapor deposition of silicon
02/10/1993EP0526749A1 A cermet electrode and a method of manufacturing the same
02/10/1993EP0526657A1 Microwave plasma cvd device, and method for synthesizing diamond by device thereof
02/10/1993EP0526644A1 Semiconductor manufacturing equipment
02/10/1993EP0526491A1 Gaseous radical producing apparatus
02/10/1993EP0526468A1 Diamond-on-a-substrate for electronic applications
02/09/1993US5185317 Method of forming superconducting Tl-Ba-Ca-Cu-O films
02/09/1993US5185181 Process for preparing an electroluminescent thin film
02/09/1993US5185179 Plasma processing method and products thereof
02/09/1993US5185067 Process for manufacturing diamond-like thin film
02/09/1993US5184399 Method of manufacturing circuit board
02/09/1993US5184398 In-situ real-time sheet resistance measurement method
02/09/1993CA2072326A1 Method for selective cvd diamond deposition
02/04/1993WO1993002468A1 Chemical vapor deposition apparatus, method of semiconductor film formation, and method of producing thin film semiconductor device
02/04/1993WO1993002467A1 Apparatus for neutralizing charged body
02/03/1993EP0526420A1 Method for the production of extraction grids for ion generation and grids produced according to said method
02/03/1993EP0526344A1 Process for forming a coating containing silica on the surface of a glass object
02/03/1993EP0525202A1 Semiconductor manufacturing equipment
02/03/1993EP0417202B1 Process for thermally depositing silicon nitride and silicon dioxide films onto a substrate
02/02/1993US5183985 Contactless heating frequency heating of thin filaments
02/02/1993US5183689 Predetermining the curves of interface between substrate and deposites, heating and vapor deposition
02/02/1993US5183685 Inputting electromagnetic power to decompose carbon compound in presence of nickel halide, nickel hydride or/and manganese halide
02/02/1993US5183529 Fabrication of polycrystalline free-standing diamond films
02/02/1993US5183511 Photo CVD apparatus with a glow discharge system
02/02/1993US5183510 Apparatus and process for chemical vapor deposition
01/1993
01/28/1993DE4124699A1 Deposition of copper@-contg. layer on substrate - carried out by decomposition of new substd. cyclopentadienyl copper alkyl- or aryl-isonitrile cpd.
01/27/1993EP0330679B1 Sialon cutting tool composition
01/26/1993US5182495 Plasma processing method and apparatus using electron cyclotron resonance
01/26/1993US5182149 Boron nitride boat and process for producing it
01/26/1993US5182132 Magnetic recording medium and method for making it
01/26/1993US5182093 Diamond deposition cell
01/26/1993US5182000 Method of coating metal using low temperature plasma and electrodeposition
01/26/1993US5181986 Plasma generator, microwaves, resonance
01/26/1993US5181964 Single ended ultra-high vacuum chemical vapor deposition (uhv/cvd) reactor
01/26/1993CA1313071C Isotopic fiberoptics
01/23/1993CA2074331A1 Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cycle siloxanes
01/21/1993WO1993001328A1 Rapid-switching rotating disk reactor
01/20/1993EP0524073A1 Apparatus for injecting a product into a chamber such as a reactor for microelectronics
01/20/1993EP0523968A1 Process for an improved laminate of ZnSe and ZnS
01/20/1993EP0523877A1 Plasma enhanced chemical vapor deposition of oxide film stack
01/20/1993EP0523609A2 Method for forming a film with plasma CVD process
01/20/1993EP0523525A1 Process for purification of gaseous organometallic compounds
01/20/1993EP0523314A1 Apparatus for evaporation of liquid
01/19/1993US5180692 Method for the manufacture of boron-containing films by CVD or epitaxial techniques using boron trifluoride
01/19/1993US5180687 Electroconductive
01/19/1993US5180571 Process for the preparation of diamond
01/19/1993US5180468 Doping a silicon substrate and heat treatment
01/19/1993US5180436 Microwave plasma film deposition system
01/19/1993US5180435 Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer
01/19/1993US5180434 Interfacial plasma bars for photovoltaic deposition apparatus
01/19/1993US5180432 Microelectronics, silicides
01/13/1993EP0523021A1 Method of manufacturing an alumina coated sintered body
01/13/1993EP0522986A1 Apparatus and process for diamond deposition by micro wave assisted CVD
01/13/1993EP0522979A1 Substrate coated with a thin amorphous silicon doped carbon layer, its preparation and use
01/13/1993EP0522872A1 Substoichiometric zirconium nitride coating
01/13/1993EP0522842A1 Method and apparatus for synthesizing diamond in vapor phase
01/13/1993EP0522799A2 Dielectric deposition
01/13/1993EP0522281A1 CVD plasma igniting procedure and device
01/13/1993CN1067930A Process and apparatus for plasma cvd coating or handle substrates
01/13/1993CA2073645A1 Apparatus and process for dcpv diamond deposit assisted by microwave plasma
01/12/1993US5179677 Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity
01/12/1993US5179042 Vapor deposition
01/12/1993US5178911 Process for chemical vapor deposition of main group metal nitrides
01/12/1993US5178905 Multilayer film on a substrate
01/12/1993US5178904 Process for forming deposited film from a group II through group VI metal hydrocarbon compound
01/12/1993US5178683 Microwave plasma cvd apparatus
01/12/1993US5178645 Lasers
01/12/1993US5177878 Apparatus and method for treating flat substrate under reduced pressure in the manufacture of electronic devices
01/09/1993CA2070436A1 Isotopically-pure carbon-12 or carbon-13 polycrystalline diamond possessing enhanced thermal conductivity
01/07/1993WO1993000685A1 Diamond membranes for x-ray lithography
01/07/1993WO1993000455A1 Chemically active isolation passageway for deposition chambers
01/07/1993WO1993000454A1 Diamond-covered member and production thereof
01/07/1993EP0521615A2 Method and apparatus for forming thin film and multilayer film