Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1993
01/07/1993EP0521438A1 Sealing apparatus for continuous vacuum treating equipment
01/07/1993EP0521078A1 An improved hot filament chemical vapor deposition reactor.
01/07/1993EP0417170B1 Process for plasma depositing silicon nitride and silicon dioxide films onto a substrate
01/07/1993CA2112477A1 Diamond membranes for x-ray lithography
01/07/1993CA2090325A1 Diamond-coated member and process for the preparation thereof
01/06/1993CN1067686A Apparatus and arrangement for coating truncated spheric substrate
01/05/1993US5177589 Refractory metal thin film having a particular step coverage factor and ratio of surface roughness
01/05/1993US5176938 Process for surface treatment of pulverulent material
01/05/1993US5176803 Method for making smooth substrate mandrels
01/05/1993US5176791 Method for forming carbonaceous films
01/05/1993US5176789 Light activation, vapor deposition, capacitors
01/05/1993US5175929 Method for producing articles by chemical vapor deposition
01/02/1993CA2072450A1 Plasma enhanced chemical vapor deposition of oxide film stack
12/1992
12/30/1992EP0520832A1 Plasma assisted diamond synthesis
12/30/1992EP0520519A1 Plasma processing reactor and process for plasma etching
12/30/1992CN1067457A Coated molybdenum parts and process for their production
12/29/1992US5175021 Transmission line for providing power to an electrode boat in a plasma enhanced chemical vapor deposition system
12/29/1992US5175020 Decomposing borazoles to form boron nitride
12/29/1992US5175019 Distorting generated plasma ball of reactants with dielectric plate suspended above and parallel to substrate
12/29/1992US5175017 Method of forming metal or metal silicide film
12/29/1992US5174983 Flowing together gaseous carbon and hydrogen source to form turbulent mixture which is excitied and become reactive and deposited on the substrate
12/29/1992US5174881 Apparatus for forming a thin film on surface of semiconductor substrate
12/29/1992US5174826 Laser-assisted chemical vapor deposition
12/29/1992US5174825 Uniform gas distributor to a wafer
12/29/1992CA2072455A1 Plasma assisted diamond synthesis
12/23/1992WO1992022689A1 Process for making large-area single crystal diamond films
12/23/1992EP0519784A1 Method of manufacturing of an optical structure and optical structure thus obtained
12/23/1992EP0519608A1 Substrate holder of thermally anisotropic material used for enhancing uniformity of grown epitaxial layers
12/23/1992EP0519587A1 Methods for coating adherent diamond films on cemented tungsten carbide substrates
12/23/1992EP0519215A1 Device and installation for coating dome-shaped substrates
12/22/1992US5173612 X-ray window and method of producing same
12/22/1992US5173336 Guide with upstream converging section to accelerate flow and downstream diverging section to expand flow and prevent recirculation
12/22/1992US5173328 Plasma cvd process for coating a basic metallic body with a non-conductive coating material
12/22/1992US5173327 LPCVD process for depositing titanium films for semiconductor devices
12/22/1992US5173089 Method for producing the polycrystalline diamond tool
12/16/1992EP0518800A2 Heteroepitaxial growth of germanium on silicon by UHV/CVD
12/16/1992EP0518755A1 Technique for forming a coating, essentially containing oxygen and silicium, by pyrolysis in the vapour phase
12/16/1992EP0518746A1 Charging device for supporting workpieces inside a furnace
12/16/1992EP0518631A2 Tool components
12/16/1992EP0518591A1 Method for producing articles by chemical vapor deposition and the articles produced therefrom
12/16/1992EP0518544A2 Anisotropic deposition of dielectrics
12/16/1992EP0518532A1 Boron-doped diamond
12/16/1992EP0518318A1 Method and apparatus for manufacturing an hermetically coated optical fiber
12/16/1992EP0518112A1 A process for fabricating micromachines
12/16/1992EP0518109A1 Apparatus for vacuum treatment
12/16/1992EP0517999A1 Apparatus for reactive ion beam etching and plasma-assisted CVD processing
12/15/1992US5171734 Introducing into fluidized bed reacaator coating sources in vaporized form, decomposing at specific temperature ranges
12/15/1992US5171610 Low temperature photochemical vapor deposition of alloy and mixed metal oxide films
12/13/1992CA2070959A1 Method for designing optical structures and optical structure obtained with said method
12/13/1992CA2070753A1 Method and apparatus of manufacturing hermetic coating optical fiber
12/13/1992CA2068152A1 Method for producing articles by chemical vapor deposition and the articles produced therefrom
12/12/1992CA2070841A1 Loading device for supporting workpieces inside an oven
12/11/1992CA2070750A1 Tool components
12/10/1992WO1992022085A1 Window for microwave plasma processing device
12/10/1992WO1992021789A1 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing
12/09/1992EP0517576A1 Process for storing a gas mixture in passivated metal containers to enhance the stability of gaseous hydride mixtures at low concentration in contact therewith
12/09/1992EP0517575A1 Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surfaces
12/09/1992EP0517548A2 Chemical vapor deposition method for forming silicon oxide film
12/09/1992EP0517463A1 Abrasive medium
12/09/1992EP0517042A1 Plasma-chemical vapor-phase epitaxy system
12/09/1992EP0516804A1 Method of depositing a silicon oxide film bonded to a polymer substrate.
12/09/1992EP0516714A1 Titanium nitride or tin oxide bonding to a coater surface.
12/08/1992US5170032 Radiation manufacturing apparatus and amendment
12/08/1992US5169685 Method for forming non-columnar deposits by chemical vapor deposition
12/08/1992US5169676 Control of crystallite size in diamond film chemical vapor deposition
12/08/1992US5169579 Catalyst and plasma assisted nucleation and renucleation of gas phase selective laser deposition
12/08/1992US5169549 Method of producing nickel shell molds
12/08/1992US5169508 Layer of fine globular graphite particles; metal film of iron group element or alloy thereof; graphite layer; thin batteries
12/08/1992US5169478 Apparatus for manufacturing semiconductor devices
12/08/1992US5169452 Apparatus for the synthesis of diamond-like thin films
12/07/1992CA2070504A1 Process for drying metal surfaces using gaseous hydrides to inhibit moisture adsorption and for removing adsorbed moisture from the metal surface
12/04/1992CA2070145A1 Process for passivating metal surfaces to enhance the stability of gaseous hydride mixtures at low concentration in contact therewith
12/03/1992DE4118072A1 Plasma surface coating process - with plasma components deposited on substrate using shock-waves generation by electromagnetic induction
12/02/1992EP0516344A1 Method to fill a cavity in a substrate
12/02/1992EP0516308A1 Vapor phase deposition of hydrogen silsesquioxane resin
12/02/1992EP0515377A1 Low temperature plasma technology for corrosion protection of steel.
12/02/1992EP0515373A1 Method of coating steel substrate using low temperature plasma processes and priming.
12/01/1992US5168540 Scintillating articles and method of making the same
12/01/1992US5167718 Parylene deposition chamber and method of use
12/01/1992US5167716 Method and apparatus for batch processing a semiconductor wafer
12/01/1992US5167673 Vapor deposited diamond layer on polymer support
12/01/1992CA1310823C Equipment and method for supply of organic metal compound
12/01/1992CA1310822C Surface treatment/deposit reactor
11/1992
11/29/1992CA2068353A1 Vapor phase deposition of hydrogen silsequioxane resin
11/26/1992WO1992021220A1 Apparatus for the treatment of a solid body
11/26/1992WO1992020833A1 A PROCESS FOR DEPOSITING A SIOx FILM HAVING REDUCED INTRINSIC STRESS AND/OR REDUCED HYDROGEN CONTENT
11/26/1992WO1992020464A1 Method and apparatus for plasma deposition
11/26/1992CA2443497A1 Method and apparatus for plasma deposition
11/25/1992EP0515186A2 Process for preparing densified porous billets
11/25/1992EP0514384A1 Device for treating substrates in a gas-based plasma produced by microwaves.
11/24/1992US5166101 Method for forming a boron phosphorus silicate glass composite layer on a semiconductor wafer
11/24/1992US5165960 Spray pyrolysis or vapor deposition
11/24/1992US5165955 From vaporized hydrogen silsesquioxane resin
11/19/1992EP0514032A1 Chemical vapor deposition of diamond coatings on hard substrates
11/19/1992EP0513830A1 Rotary anode for X-ray tube and method for manufacturing the same
11/19/1992EP0513662A1 Work piece coated with a hard layer and process for coating with the layer
11/19/1992EP0513634A2 High-speed film-forming processes by plasma CVD and Radical CVD under high pressure
11/19/1992EP0513518A1 Process for depositing synthetic diamond coatings on substrates
11/19/1992DE4115612A1 Improving edge stability of honing and grinding elements - by physical deposition of coating e.g. oxide(s), nitride(s), carbide(s) and/or boride(s) and/or carbon@ having a diamond structure
11/18/1992CN1066299A Low temp. deposition fine-particle diamond film by microwave method