Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1995
06/21/1995EP0658560A1 Process for removing impurities in organometallic compounds
06/21/1995EP0658219A1 Fluidized bed reactor arrangement and method for forming a metal carbide coating on a substrate containing graphite or carbon
06/21/1995EP0599869B1 Manufacture of a tool with wear-resistant diamond cutting edge
06/21/1995CN1103900A Synthesis of diamond film with double cathode glow discharge
06/21/1995CN1029016C Liquid coating composition and chemical vapor deposition method
06/21/1995CA2132885A1 Method and apparatus for vaporization of liquid reactants
06/20/1995US5426202 Alkyl tin compounds, their synthesis and electrically conductive and IR-reflecting layers
06/20/1995US5425966 Sublimation at reduced pressure; contacting a substrate maintained at an elevated temperature
06/20/1995US5425965 Process for deposition of ultra-fine grained polycrystalline diamond films
06/20/1995US5425922 Apparatus for manufacturing microcrystal particles and manufacturing method for the microcrystal particles
06/20/1995US5425842 Cleaning cycles containing fluorine and oxygen gas
06/20/1995US5425812 Reaction chamber for a chemical vapor deposition apparatus and a chemical vapor deposition apparatus using such a reaction chamber
06/20/1995US5425810 Removable gas injectors for use in chemical vapor deposition of aluminium oxide
06/20/1995US5425803 Device for removing dissolved gas from a liquid
06/20/1995CA1335950C Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes
06/20/1995CA1335949C Method of securing adherent coatings by cvd from metal carbonyls, and articles thus obtained
06/20/1995CA1335948C Sialon cutting tool composition
06/14/1995DE4342463A1 Vacuum coating of optical substrates
06/14/1995DE4341876A1 Electric field-assisted carbon soot deposition
06/13/1995US5424131 Protecting surfaces against erosion by oxygen atom; applying coatings by glow discharge deposition
06/13/1995US5424103 Method for making a semiconductor using corona discharge
06/13/1995US5424096 HF-CVD method for forming diamond
06/13/1995US5424095 Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors
06/13/1995US5423971 Arrangement for coating substrates
06/13/1995US5423945 Using a fluorocarbon gas as etchant, and scavenger
06/13/1995US5423918 Method for reducing particulate contamination during plasma processing of semiconductor devices
06/13/1995US5423915 Plasma CVD apparatus including rotating magnetic field generation means
06/13/1995US5423475 Diffusion bonding with interlayer of silicon
06/13/1995US5423285 Applying metal carboxylate precursor in solvent of xylenes, methoxyethanol or butyl acetate to integrated circuit wafer, heating to form layer of metal compound
06/08/1995WO1995015571A1 Stacked-type component and method for the manufacture of same
06/08/1995WO1995015570A1 Method for the manufacture of a capacitor and capacitor obtained
06/08/1995WO1995015258A1 Diamond-coated tools and process for making
06/08/1995DE4340956A1 Working integrated circuits with high energy beam
06/08/1995CA2177987A1 Method for the manufacture of a capacitor and capacitor obtained
06/08/1995CA2177986A1 Stacked-type component and method for the manufacture of same
06/07/1995EP0656431A2 Metal-organic chemical vapor-phase deposition process
06/07/1995CN1028772C Method for vapor deposition of diamond
06/06/1995US5422488 Reactor apparatus
06/06/1995US5422185 Ethylene or alpha olefin and diene copolymer, silicon dioxide coating
06/06/1995US5422139 Vapor deposition with one in-feed opening and one draw-off opening
06/06/1995US5422081 Trap device for vapor phase reaction apparatus
06/06/1995US5421957 Applying reactive gas comprising nitrogen trifluoride, chlorine trifluoride, sulfur hexafluoride, or carbon tetrafluoride to evacuated chamber
06/06/1995US5421914 Surface modification of high temperature iron alloys
06/06/1995US5421902 Using fluorine and nitrogen trifluoride to remove laminar deposits of silicon
06/06/1995US5421895 Apparatus for vaporizing liquid raw material and apparatus for forming thin film
06/06/1995US5421893 Susceptor drive and wafer displacement mechanism
06/06/1995US5421892 Vertical heat treating apparatus
06/06/1995US5421891 High density plasma deposition and etching apparatus
06/06/1995US5421889 Method and apparatus for inverting samples in a process
06/06/1995US5421888 Low pressure CVD apparatus comprising gas distribution collimator
06/06/1995US5421401 Compound clamp ring for semiconductor wafers
06/06/1995US5421288 Process for growing silicon epitaxial layer
06/01/1995WO1995014698A1 Volatile organic lanthanide compounds and methods for the preparation of lanthanide-containing layered materials from these compounds
06/01/1995WO1995014645A1 Method for densifying a porous structure using boron nitride, and porous structure densified with boron nitride
05/1995
05/31/1995EP0655780A1 Method for forming an aluminum contact
05/31/1995EP0655774A2 Method of forming polycrystalline silicon layer and surface treatment apparatus therefor
05/31/1995EP0655516A1 Method of coating or surface treatment of solid particles by use of plasma and fluidized bed
05/31/1995EP0655285A1 Optically improved diamond wire-drawing-die
05/31/1995CN1028666C Fixture and method for bonding friction material
05/30/1995US5420443 Microelectronic structure having an array of diamond structures on a nondiamond substrate and associated fabrication methods
05/30/1995US5420437 Method and apparatus for generation and implantation of ions
05/30/1995US5420044 Method for producing non-monocrystalline semiconductor device
05/30/1995US5419924 Chemical vapor deposition method and apparatus therefore
05/26/1995WO1995014115A1 Process and device for producing three-dimensional structures by the optically stimulated separation of material from a fluid compound
05/26/1995WO1995013891A1 Making quantum dot particles of uniform size
05/26/1995CA2176569A1 Making quantum dot particles of uniform size
05/24/1995EP0654545A1 Semiconductor device thin film formation method
05/24/1995EP0654544A2 Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials
05/24/1995EP0489862B1 Chemical vapor deposition system cleaner
05/24/1995EP0336979B1 Apparatus for thin film formation by plasma cvd
05/24/1995DE4339326A1 Dressing roller for grinding discs
05/23/1995US5418885 Three-zone rapid thermal processing system utilizing wafer edge heating means
05/23/1995US5418063 Carbon-carbon composite and method of making
05/23/1995US5418062 Zinc sulfide
05/23/1995US5418019 Method for low temperature plasma enhanced chemical vapor deposition (PECVD) of an oxide and nitride antireflection coating on silicon
05/23/1995US5418018 Chemical vapor deposition of diamond films using water-based plasma discharges
05/23/1995US5417953 Apparatus and method for synthesizing diamond in supercritical water
05/23/1995US5417934 Dry exhaust gas conditioning
05/23/1995US5417823 Metal-nitrides prepared by photolytic/pyrolytic decomposition of metal-amides
05/23/1995US5417803 Method for making Si/SiC composite material
05/23/1995US5417770 Photovoltaic device and a forming method thereof
05/23/1995US5417767 Wafer carrier
05/23/1995US5417735 Interdiffused chromium/nickel corrosion-resistant coating for fiberglass spinner bores
05/18/1995WO1995013282A1 F-series metal and metal amides for use in mocvd
05/18/1995WO1995013189A1 Abrasion wear resistant coated substrate product
05/18/1995WO1995013144A1 Process and apparatus for water-based plasma cvd of diamond films
05/18/1995CA2172829A1 Abrasion wear resistant coated substrate product
05/17/1995EP0653787A1 Method for preparation of silicon nitride gallium diffusion barrier for use in molecular beam epitaxial growth of gallium arsenide
05/17/1995EP0653783A2 Method for forming insulating film
05/17/1995EP0653782A2 Method for reforming insulating film
05/17/1995EP0653779A1 Thermal treatment device for semiconductor substrates
05/17/1995EP0653501A1 Plasma-CVD method and apparatus
05/17/1995EP0653500A1 CVD reactor for improved film thickness uniformity deposition
05/17/1995EP0653499A1 Coated cutting tool and method for producing the same
05/17/1995EP0653394A1 Surface treatment of carbon material to ensure the adhesion of a diamond coating and diamond coated articles prepared therefrom
05/17/1995EP0652828A1 Abrasion wear resistant coated substrate product
05/17/1995EP0431160B1 Process for producing thin-film oxide superconductor
05/16/1995US5415891 Forming an oxide coating on ceramic supports by oxidation of vapor deposited coating
05/16/1995US5415674 Cemented carbide substrate having a diamond layer of high adhesive strength
05/16/1995US5415585 Decompression apparatus