Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/1995
08/22/1995US5443687 Method for manufacturing an ink jet head having an improved discharging port surface
08/22/1995US5443686 Plasma CVD apparatus and processes
08/22/1995US5443662 Iron nitride free surface
08/22/1995US5443649 Silicon carbide carrier for wafer processing in vertical furnaces
08/22/1995US5443648 Vertical heat treatment apparatus with a rotary holder turning independently of a liner plate
08/22/1995US5443647 Method and apparatus for depositing a refractory thin film by chemical vapor deposition
08/22/1995US5443646 Method and apparatus for forming thin film and multilayer film
08/22/1995US5443645 Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure
08/22/1995US5443644 Gas exhaust system and pump cleaning system for a semiconductor manufacturing apparatus
08/22/1995US5443455 Guidewire comprising metal core, plasma deposited hydrocarbon residue tie layer, covalently bonded outer polymer coating
08/22/1995US5443033 Semiconductor crystal growth method
08/22/1995CA2074482C Diamond-coated hard material, throwaway insert and a process for the production thereof
08/17/1995WO1995021948A1 Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance
08/17/1995DE4404690A1 Method of forming two-layer gas and vapour barrier
08/16/1995EP0667043A1 Process for sealing high-temperature fuel cells and fuel cells sealed according to this process.
08/16/1995EP0514384B1 Device for treating substrates in a gas-based plasma produced by microwaves
08/16/1995EP0468996B1 Method for providing a proportioned vapour flow and also apparatus for carrying it out
08/15/1995US5442160 Microwave fiber coating apparatus
08/15/1995US5441893 Method for monitoring the boron content of borophosphosilicate
08/15/1995US5441768 Multi-step chemical vapor deposition method for thin film transistors
08/15/1995US5441766 Method for the production of highly pure copper thin films by chemical vapor deposition
08/15/1995US5441703 Having conicoidal interior contour which homogeneously widens flow of reactant gases
08/15/1995US5441577 Thin film solar cell and production method therefor
08/15/1995US5441570 Apparatus for low pressure chemical vapor deposition
08/15/1995US5441569 Apparatus and method for laser deposition of durable coatings
08/15/1995US5441568 Exhaust baffle for uniform gas flow pattern
08/15/1995US5441013 Method for growing continuous diamond films
08/15/1995US5440887 Liquid vaporizer-feeder
08/15/1995CA1336704C Method of producing sintered hard metal with diamond film
08/10/1995DE4404077A1 Plasma workpiece processing
08/10/1995DE19502103A1 Blow-moulded, sterile, plasma-coated, plastic package
08/09/1995EP0666340A1 Method for in-situ liquid flow rate estimation and verification
08/09/1995EP0666339A1 Method and apparatus for cleaning a throttle valve
08/09/1995EP0666338A1 Method of synthesizing and polishing a flat diamond film
08/09/1995EP0666337A1 Method and apparatus for measuring the deposition rate of opaque films
08/09/1995EP0665903A1 Apparatus for chemical vapour phase deposition activated by a microwave plasma.
08/09/1995EP0665814A1 Precursors and processes for making metal oxides.
08/09/1995CN1106470A Quick growth method of artificial diamond film
08/09/1995CN1106469A Technique for prodn. of artificial diamond scalpel
08/08/1995US5439880 Forming superconducting alloy, oxidizing alloy, shaping
08/08/1995US5439850 Method for forming a layer of uniform thickness on a semiconductor wafer during rapid thermal processing
08/08/1995US5439845 Process for fabricating layered superlattice materials and making electronic devices including same
08/08/1995US5439844 Process for forming deposited film
08/08/1995US5439753 Vapor deposition of diamond like carbon film on a substrate
08/08/1995US5439715 Uniform films; temperature control; semiconductors; electrophotography, electronics
08/08/1995US5439706 Method for manufacturing inorganic membranes by organometallic chemical vapor deposition
08/08/1995US5439705 Encapsulated electroluminescent phosphor and method for making same
08/08/1995US5439552 Process of fabricating an enlongated microstructure element on a substrate
08/08/1995US5439524 Plasma processing apparatus
08/08/1995US5439492 Wear resistance
08/08/1995CA1336559C Refractory composite material and method of making such material
08/08/1995CA1336558C Composite refractory material
08/03/1995WO1995020823A1 Methods for improving semiconductor processing
08/03/1995WO1995020688A1 Plasma modification of lumen surface of artificial tubing
08/03/1995DE19502865A1 Sealed reactor used to produce silicon@ of semiconductor quality
08/03/1995CA2181915A1 Plasma modification of lumen surface of artificial tubing
08/02/1995EP0665577A1 Method and apparatus for monitoring the deposition rate of films during physical vapour deposition
08/02/1995EP0665307A2 Film forming CVD-apparatus and method effected by the same
08/02/1995EP0665306A1 Apparatus and method for igniting plasma in a process module
08/02/1995EP0665305A1 Method of producing layers of silicon carbide and an associated product
08/02/1995EP0665304A1 Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same
08/02/1995EP0391906B1 Chemical vapor deposition system
08/02/1995CN1029442C Method and system for manufacturing semiconductor devices
08/01/1995US5437895 Intermittent generation the high frequency discharge, applying electrode to vapor deposition
08/01/1995US5437891 Chemical vapor deposition of polycrystalline diamond with <100> orientation and <100> growth facets
08/01/1995US5437728 Apparatus and method for chemical vapor deposition of diamond
08/01/1995US5437725 Device for the continuous coating of a metallic material in motion with a polymer deposition having a composition gradient
08/01/1995US5437542 Positive displacement pump system
07/1995
07/27/1995WO1995020253A2 Using lasers to fabricate coatings on substrates
07/27/1995WO1995020127A1 Chemical refill system for high purity chemicals
07/27/1995CA2181440A1 Using lasers to fabricate coatings on substrates
07/26/1995EP0664592A1 Semiconductor laser with AlInP or AlGaInP burying layer and fabrication method thereof
07/26/1995EP0664560A2 Method of forming insulating film
07/26/1995EP0664346A1 Apparatus for chemical vapor deposition of diamond
07/26/1995EP0664345A1 Insulating boards and method of manufacturing the same
07/26/1995EP0664344A1 Process for barrier coating of plastic objects
07/26/1995EP0664343A2 Method for improving substrate adhesion in fluoropolymer deposition processes
07/26/1995EP0663963A1 Improvements in the method and apparatus of vacuum deposition
07/26/1995EP0526644B1 Semiconductor manufacturing equipment
07/25/1995US5436200 Increasing the adhesion of tungsten and silicon oxide layer by first forming a silicon layer, then tungsten silicide with tungsten fluoride, reducing to tungsten
07/25/1995US5436071 Cermet cutting tool and process for producing the same
07/25/1995US5436036 Method of synthesizing hard material
07/25/1995US5435889 Preparation and coating of composite surfaces
07/25/1995US5435881 Apparatus for producing planar plasma using varying magnetic poles
07/25/1995US5435880 Plasma processing apparatus
07/25/1995US5435849 Apparatus for plasma deposition
07/25/1995US5435815 Cutting tool employing vapor-deposited polycrystalline diamond for cutting edge and method of manufacturing the same
07/20/1995WO1995019457A1 Oxide coated cutting tool
07/20/1995WO1995019456A1 Method for depositing a film consisting of a metal or semi-metal and an oxide thereof
07/20/1995DE4446992A1 Appts. for depositing layers in gas phase on substrate
07/19/1995EP0663457A1 System for depositing material on a substrate
07/19/1995EP0663456A1 Method of producing coated particles
07/19/1995EP0662868A1 Method for synthesizing diamond and products produced thereby
07/19/1995EP0662025A4 Titanium-nitride and titanium-carbide coated grinding tools and method therefor.
07/19/1995CN1105366A Alkyzin compound and preparation and application of same
07/18/1995US5434110 Methods of chemical vapor deposition (CVD) of tungsten films on patterned wafer substrates
07/18/1995US5434102 Process for fabricating layered superlattice materials and making electronic devices including same
07/18/1995US5434090 Processing chamber for processing semiconductor substrates
07/18/1995US5433977 Enhanced adherence of diamond coatings by combustion flame CVD
07/18/1995US5433975 Deposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogen