Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/1995
12/14/1995WO1995033863A1 Apparatus for deposition of thin-film, solid state batteries
12/14/1995WO1995033620A1 Composite structure
12/14/1995DE19520961A1 Verfahren zum Bilden eines ferroelektrischen Filmes A method for forming a ferroelectric film
12/14/1995CA2191458A1 Low temperature plasma-enhanced formation of integrated circuits
12/14/1995CA2191457A1 Method and apparatus for producing thin films
12/14/1995CA2191456A1 Method and apparatus for low temperature deposition of cvd and pecvd films
12/13/1995EP0686708A1 Film forming method and film forming apparatus
12/13/1995EP0686707A1 Surface coated cutting tool
12/13/1995EP0644952B1 Methods of chemical vapor deposition (cvd) of films on patterned wafer substrates
12/13/1995EP0599991B1 Process for forming low resistivity titanium nitride films
12/13/1995EP0562035A4 Minimization of particle generation in cvd reactors and methods
12/12/1995US5474808 Applying diamond-particle laden photoresist on a substrate, with binder, photolithography, chemical vapor deposition of diamond film; chemical/radiation/wear resistance protective coating
12/12/1995US5474659 Gasification for vapor deposition of integrated circuits as gallium arsenide can be performed in situ in electrochemical cell
12/12/1995US5474642 Apparatus for the treatment of a solid body
12/12/1995US5474641 Processing method and apparatus thereof
12/12/1995US5474614 Method and apparatus for releasing a semiconductor wafer from an electrostatic clamp
12/12/1995US5474613 Chemical vapor deposition furnace and furnace apparatus
12/12/1995US5474612 Vapor-phase deposition apparatus and vapor-phase deposition method
12/11/1995CA2151424A1 Optical waveguide for fiber-optic amplifiers for the wavelength region around 1550 nm
12/07/1995WO1995033082A2 Plasma treatment and apparatus in electronic device manufacture
12/06/1995EP0685876A2 Method of making two types of tin and the layers made by this method
12/06/1995EP0685873A1 Inductively coupled plasma reactor with an electrode for enhancing plasma ignition
12/06/1995EP0685572A2 Coated hard-alloy blade member
12/06/1995EP0684908A1 Safety document and process for producing the same
12/06/1995CN1112904A Toughended chemically vapor deposited diamond
12/06/1995CN1112863A Coated cutting tool
12/05/1995US5473090 Contacting metal with an alkyl halide in presence of an alkali metal; alkali metal halide
12/05/1995US5472912 Method of making an integrated circuit structure by using a non-conductive plug
12/05/1995US5472778 Containing plasma polymerized polysilicate undercoat and topcoat; corrosion resistance, durability
12/05/1995US5472650 Method of making chemical vapor infiltrated composites
12/05/1995US5472509 Gas plasma apparatus with movable film liners
12/05/1995US5472508 Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates
12/05/1995US5472505 Apparatus for monitoring films during MOCVD
12/05/1995US5471947 Preparation of diamond films on silicon substrates
11/1995
11/30/1995WO1995032317A1 Tool, process and device for producing it and its use
11/30/1995WO1995032316A1 Cold end glassware coating apparatus
11/30/1995WO1995032315A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method
11/30/1995WO1995032061A1 Method and apparatus for producing high purity and unagglomerated submicron particles
11/30/1995DE4092184C2 Appts. for vapour-phase diamond synthesis
11/30/1995DE19519178A1 Appts. for prodn. of semiconductor layer by rapid thermal processing
11/30/1995CA2191198A1 Method and apparatus for producing high purity and unagglomerated submicron particles
11/30/1995CA2190734A1 Cold end glassware coating apparatus
11/29/1995EP0684632A2 Method of forming a film at low temperature for a semiconductor device
11/29/1995EP0684106A2 Polishing apparatus and method to produce a hard material-coated wafer
11/29/1995EP0683825A1 Method for thin film deposition on a substrate using remote cold nitrogen plasma.
11/29/1995EP0573645A4 Method and means for coating a surface with a resistant facing by chemical-vapor deposition
11/29/1995EP0532758B1 Cvd semiconductor manufacturing equipment
11/29/1995CN1112790A Fluidized bed reactor arrangement and method for forming a metal carbide coating on a substrate containing graphite or carbon
11/28/1995US5470800 Wafers with silicon dioxide insulating layers on aluminum wires formed by vapor deposition
11/28/1995US5470784 Method of forming semiconducting materials and barriers using a multiple chamber arrangement
11/28/1995US5470661 Coating a diamond with a film of carbon for heat resistance
11/28/1995US5470619 Method of the production of polycrystalline silicon thin films
11/28/1995US5470611 Method for forming an oxide film of a semiconductor
11/28/1995US5470555 Process for purification of gaseous organometallic compound
11/28/1995US5470398 Dielectric thin film and method of manufacturing same
11/28/1995US5470390 Mixed gas supply system with a backup supply system
11/28/1995US5470389 Apparatus for forming deposited film
11/28/1995US5470388 Device for the vacuum coating of mass produced products
11/28/1995US5469806 Chlorination of semiconductor surfaces, dechlorination by forming hydrogen chloride with hydrogen and epitaxial crystallization
11/23/1995WO1995031592A1 Enhanced chemical vapor deposition of diamond and related materials
11/23/1995WO1995031585A1 Thermal cycle resistant seal for semiconductor processing apparatus
11/23/1995WO1995031584A1 Surface treatment techniques
11/23/1995WO1995031583A1 Apparatus and method for delivery of reactant gases
11/23/1995WO1995031582A1 Chemical vapor deposition reactor and method
11/23/1995WO1995023428A3 Chemical vapor deposition chamber
11/23/1995DE4417966A1 Modular contacting process for multilayer device
11/23/1995DE4417729A1 Tool used for rotating, sawing, drilling or threading
11/23/1995CA2189559A1 Apparatus and method for delivery of reactant gases
11/22/1995EP0683516A2 Multilayer circuit board and multichip module substrate
11/22/1995EP0683508A1 Selective crystal growth method of compound semiconductor
11/22/1995EP0683249A1 Method and apparatus for the growth of compound semiconductor layer
11/22/1995EP0683244A2 Coated hard alloy tool
11/22/1995EP0682719A1 Device and process for depositing solid materials, in particular very fine-grained materials, and use of said process
11/22/1995EP0682718A1 METHOD OF MAKING CVD Si 3?N 4?.
11/22/1995EP0682580A1 Cemented carbide with binder phase enriched surface zone and enhanced edge toughness behaviour
11/21/1995US5468689 Method for preparation of silicon nitride gallium diffusion barrier for use in molecular beam epitaxial growth of gallium arsenide
11/21/1995US5468684 Semiconductors
11/21/1995US5468679 Process for fabricating materials for ferroelectric, high dielectric constant, and integrated circuit applications
11/21/1995US5468642 Device for monitoring the boron content of borophosphosilicate
11/21/1995US5468521 Method for forming a photoelectric deposited film
11/21/1995US5468520 Process for barrier coating of plastic objects
11/21/1995US5468357 Electrically biasing; high speed; depth control; vapor deposition
11/21/1995US5468326 Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film
11/21/1995US5468299 Device comprising a flat susceptor rotating parallel to a reference surface about a shaft perpendicular to this surface
11/21/1995US5468298 Bottom purge manifold for CVD tungsten process
11/21/1995US5468296 Apparatus for igniting low pressure inductively coupled plasma
11/14/1995US5467220 Method and apparatus for improving semiconductor wafer surface temperature uniformity
11/14/1995US5466495 Thick film plasma enhanced chemical vapor deposition
11/14/1995US5466431 Diamond-like metallic nanocomposites
11/14/1995US5466295 ECR plasma generation apparatus and methods
11/14/1995US5465766 Chemical refill system for high purity chemicals
11/14/1995US5465603 Optically improved diamond wire die
11/14/1995CA1337560C Edged medical tool and method for preparation thereof
11/14/1995CA1337547C Refractory metal silicide deposit process for the production of integrated circuits
11/14/1995CA1337546C Bonding diamond to diamond
11/09/1995WO1995030031A1 Welded susceptor assembly
11/08/1995EP0680623A1 Chemical functionalization of surfaces
11/08/1995EP0680483A1 Rare earth compounds and their preparation
11/08/1995EP0680384A1 Microwave energized process for the preparation of high quality semiconductor material
11/07/1995US5465184 Hard disc drives and read/write heads formed from highly thermally conductive silicon carbide
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