Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1995
11/07/1995US5465151 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces
11/07/1995US5464667 Jet plasma process and apparatus
11/07/1995US5464666 Process for chemical vapor codeposition of copper and aluminum alloys
11/07/1995US5464665 Microwave RF, or AC/DC discharge assisted flame deposition of CVD diamond
11/07/1995US5464657 Vaporization and coating
11/07/1995US5464656 Method of applying single-source molecular organic chemical vapor deposition agents
11/07/1995US5464499 Multi-electrode plasma processing apparatus
11/07/1995US5464313 Heat treating apparatus
11/07/1995US5464031 Method of chamber cleaning in MOCVD applications
11/02/1995WO1995029273A1 Multi-frequency inductive method and apparatus for the processing of material
11/02/1995EP0680072A2 A method of operating a high density plasma CVD reactor with combined inductive and capacitive coupling
11/02/1995EP0680036A1 A process of treating slider bodies
11/02/1995EP0679732A1 Synthetic diamond film with reduced bowing and method of making same
11/01/1995CN1111033A Vacuum treating apparatus
10/1995
10/31/1995US5462899 Heating substrate, mixing and reacting organosilicon compound gas, oxygen gas containing ozone and second oxygen containing gas
10/31/1995US5462812 Fluorinated silicon nitride films
10/31/1995US5462800 Consists of silicon carbide and nonsiliconized carbon fibers; high mechanical strength and thermal shock resistance
10/31/1995US5462776 Energizing fullerene molecule by passage over a hot filament causing fragmentation and ionization by electron attachment or emission, depositing on diamond substrate causing thicknes of diamond or diamond-like film on substrate surface
10/31/1995US5462775 Method of producing hard multilayer film formed material
10/31/1995US5462767 CVD of conformal coatings over a depression using alkylmetal precursors
10/31/1995US5462603 Semiconductor processing apparatus
10/31/1995US5462014 Apparatus for growing a thin metallic film
10/31/1995US5462013 Chemical vapor deposition apparatus
10/31/1995CA1337484C Abrasion-resistant plastic articles and method for making them
10/29/1995CA2144924A1 Synthetic diamond film with reduced bowing and method of making same
10/26/1995DE4414083A1 Low pressure plasma appts. for applying coatings onto or etching on plastic substrates
10/25/1995EP0678903A1 Plasma treatment method and apparatus
10/25/1995EP0678895A1 Plasma processing apparatus
10/25/1995EP0678894A1 Plasma processing apparatus
10/25/1995EP0678594A1 Coated cutting tool
10/25/1995EP0678593A1 Plasma-enhanced chemical vapour deposition process
10/25/1995EP0678592A1 Improved CVD diamond
10/25/1995CN1110832A Vacuum plasma processing apparatus
10/25/1995CN1110723A Method and apparatus for forming deposited film
10/25/1995CN1110632A Procedure for depositing thin layer on surface of plastic matrix
10/24/1995US5460707 Etching or coating method and a plant therefor
10/24/1995US5460684 Stage having electrostatic chuck and plasma processing apparatus using same
10/24/1995US5460654 Apparatus for generating raw material gas used in apparatus for growing thin film
10/24/1995CA2001984C Silicon carbide monofilaments for improved composite properties and method
10/20/1995CA2145949A1 Process for plasma-induced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates
10/19/1995WO1995028002A1 Method and device for processing semiconductor wafer
10/19/1995WO1995027806A1 Process to produce diamond films
10/19/1995WO1995027570A1 Selective plasma deposition
10/19/1995CA2185217A1 Process to produce diamond films
10/18/1995EP0677595A1 Device for the vacuum-plasma treatment of articles
10/18/1995EP0677326A1 Method of manufacturing fine ceramic particles and apparatus therefor
10/18/1995EP0516714B1 Titanium nitride or tin oxide bonding to a coater surface
10/17/1995US5459108 Normal pressure CVD process for manufacture of a semiconductor device through reaction of a nitrogen containing organic source with ozone
10/17/1995US5459097 Method for selectively growing aluminum-containing layers
10/17/1995US5458927 Process for the formation of wear- and scuff-resistant carbon coatings
10/17/1995US5458919 Method for forming a film on a substrate by activating a reactive gas
10/17/1995US5458918 Gas injectors for reaction chambers in CVD systems
10/17/1995US5458754 Coating, electric arc
10/17/1995US5458733 Method for etching a diamond film
10/17/1995US5458689 Apparatus and method for growing semiconductor crystal
10/17/1995US5458687 Method of and apparatus for securing and cooling/heating a wafer
10/17/1995US5458685 Vertical heat treatment apparatus
10/17/1995US5458086 Apparatus for growing metal oxides using organometallic vapor phase epitaxy
10/12/1995WO1995027293A1 Method for depositing a dielectric and/or conductive material on a substrate
10/12/1995WO1995027292A1 Method for depositing a dielectric and/or conductive material on a substrate
10/12/1995WO1995026879A1 Barrier films having carbon-coated surfaces
10/12/1995CA2183664A1 Barrier films having carbon-coated high energy surfaces
10/11/1995EP0676793A2 Substrate holder and reaction apparatus
10/11/1995EP0676790A1 Focus ring for semiconductor wafer processing in a plasma reactor
10/11/1995EP0676772A1 X-ray windows
10/11/1995EP0676485A1 Diamond wafer and method of producing a diamond wafer
10/11/1995EP0676484A2 Transparent diamond films and method for making
10/11/1995EP0596936B1 Deposition of magnesium fluoride films
10/11/1995CN1029994C Microwave plasma chemical vapour deposition apparatus
10/11/1995CN1029993C Process for continuously forming large area functional deposited film by microwave PCVD method and apparatus suitable for practicing same
10/11/1995CN1029992C Microwave plasma treating apparatus
10/11/1995CN1029991C Plasma processing method and products thereof
10/10/1995US5456945 Integrated circuits
10/10/1995US5456796 Control of particle generation within a reaction chamber
10/10/1995US5456757 Made of aluminum nitride, resistance to fluorine corrosion; used to support semiconductor support
10/05/1995WO1995026571A1 Stabilized amorphous silicon and devices containing same
10/05/1995WO1995026427A1 Pcvd process and device for coating domed substrates
10/05/1995WO1995026355A1 Tantalum compounds
10/05/1995WO1995026169A1 Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys
10/05/1995WO1995024275A3 Highly abrasion-resistant, flexible coatings for soft substrates
10/05/1995CA2186261A1 Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys
10/04/1995EP0675524A1 Semiconductor wafer process chamber with susceptor back coating
10/04/1995EP0675212A1 Method for producing a diamond coated member
10/04/1995EP0675211A1 Process for preparing high crystallinity oxide thin film
10/04/1995EP0674722A1 Protective film for articles and method
10/04/1995EP0674607A1 Boron carbide coating.
10/03/1995US5455364 Removing an oxygen-containing impurity in a crude alkyl or cycloalkadienyl gallium or indium compound by mixing with an alkali halide, heat treating and vaporizing in an oxygen-free atmosphere
10/03/1995US5455138 Blocking and photoconductive layers on substrate; formed by plasma vapor deposition using glow discharge decomposition
10/03/1995US5455072 Initiation and bonding of diamond and other thin films
10/03/1995US5455070 Variable rate distribution gas flow reaction chamber
10/03/1995US5455069 Method of improving layer uniformity in a CVD reactor
10/03/1995US5455014 Liquid deposition source gas delivery system
10/03/1995US5454903 Using an etching gas; applying radio frequency
10/03/1995US5454902 Production of clean, well-ordered CdTe surfaces using laser ablation
10/03/1995US5454873 Cold end glassware coating apparatus
10/03/1995CA1337170C Method for forming crystalline deposited film
10/03/1995CA1337165C Chemical vapor deposition of tin oxide on float glass in the tin bath
09/1995
09/30/1995CA2145712A1 Process for preparing high crystallinity oxide thin film
09/28/1995WO1995025829A1 Batch loading system for cvd
09/28/1995WO1995025611A1 Diamond-coated body with integral chip former
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