Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1996
01/24/1996EP0693574A1 Aluminium oxide coated tool
01/24/1996EP0693573A1 Synthesizing diamond film
01/24/1996EP0693137A1 Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance
01/24/1996EP0516804B1 Method of depositing a silicon oxide film bonded to a polymer substrate
01/23/1996US5487127 Rapid thermal heating apparatus and method utilizing plurality of light pipes
01/23/1996US5486423 SiO2 electrets and process of making it
01/23/1996US5486380 Apparatus and method for depositing a substance on a rotating surface
01/23/1996US5486235 Plasma dry cleaning of semiconductor processing chambers
01/23/1996US5485804 Enhanced chemical vapor deposition of diamond and related materials
01/18/1996DE19522574A1 Reactor for coating flat substrates
01/17/1996EP0692553A1 Vaporization sequence for multiple liquid precursors
01/17/1996EP0692138A1 Reactive dc sputtering system
01/17/1996EP0585343A4 Primary flow cvd apparatus and method
01/17/1996EP0450016B1 Method for preparing vaporized reactants for chemical vapor deposition
01/17/1996CN1030722C Process for continuously forming large area functional deposited film by microwave PCVD method and apparatus suitable for practicing same
01/16/1996US5484749 Manufacturing method of semiconductor device
01/16/1996US5484658 Containing a semiconductor device
01/16/1996US5484629 Coating apparatus and method
01/16/1996US5484484 Thermal processing method and apparatus therefor
01/16/1996US5484468 Cemented carbide with binder phase enriched surface zone and enhanced edge toughness behavior and process for making same
01/16/1996CA2021584C Carbonaceous material protected against oxidation by boron carbonitride
01/11/1996WO1996000804A1 Apparatus for uniformly heating a substrate
01/11/1996WO1996000803A1 Charged particle deposition of electrically insulating films
01/11/1996WO1995033082A3 Plasma treatment and apparatus in electronic device manufacture
01/11/1996DE4423891A1 Layer structure and method of prodn. for motor vehicle industries
01/11/1996DE4423833A1 Organic prepn. layer for coating with hard cover layer
01/11/1996DE4212053C1 Metal surgical instrument for HF or laser surgery
01/11/1996DE19523181A1 Controlling selected carbon@ doping concn.
01/11/1996DE19522372A1 Coating sintered metal carbide substrates with diamond film
01/10/1996EP0691715A1 Optical waveguide for fibre-optic amplifier for wavelengths around 1550 nm
01/10/1996EP0691420A1 Plasma-inert cover and plasma cleaning process and apparatus employing same
01/10/1996EP0691413A2 Diamond reinforced composite material and method of preparing the same
01/10/1996EP0691313A1 Precursor for producing SiO2TiO2
01/10/1996EP0665305A4 Method of producing layers of silicon carbide and an associated product.
01/10/1996EP0615552B1 Process and device for coating substrate bodies with hard substances
01/09/1996US5483084 Diamond covered member and process for producing the same
01/09/1996US5482749 Preventing contamination of coated substrate, improving receptivity to silicide coating of first substrate treated after cleaning chamber
01/09/1996US5482748 Bbowl shape substrate coated with microwave plasma
01/09/1996US5482739 Silicon nitride deposition
01/09/1996US5482557 Silicon, silane gases and oxidizing agent
01/06/1996CA2153184A1 Method of making synthetic diamond film with reduced bowing
01/06/1996CA2153019A1 Single source volatile precursor for sio2 tio2 powders and films
01/04/1996WO1996000314A2 Reactor and process for coating flat substrates
01/03/1996EP0690666A1 Structure and method for semiconductor processing
01/03/1996EP0690487A1 Methods for forming oxide films
01/03/1996EP0689619A1 Apparatus and method for delivering reagents in vapor form to a cvd reactor
01/03/1996EP0689618A1 Method and apparatus for the combustion chemical vapor deposition of films and coatings
01/03/1996EP0632846B1 Arrangement for vacuum coating bulk goods
01/03/1996EP0502128B1 Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists
01/02/1996US5481081 Method and apparatus of synthesizing diamond in vapor phaase
01/02/1996US5480687 Vapor deposition
01/02/1996US5480686 Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges
01/02/1996US5480684 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds
01/02/1996US5480678 Apparatus for use with CVI/CVD processes
01/02/1996US5480489 Reactor for uniform heating of a substrate
01/02/1996US5480488 Apparatus for supplying CVD coating devices
01/02/1996US5479875 Microwave plasma vapor deposition, nucleation
01/02/1996US5479874 CVD diamond production using preheating
01/02/1996CA1337855C Processes for the preparation of polycrystalline diamond films
12/1995
12/27/1995EP0689232A2 Process for deposition of a tungsten layer on a semiconductor wafer
12/27/1995EP0689231A2 Process for deposition of a tungsten layer on a semi-conductor wafer
12/27/1995EP0688889A1 Method for passivating nickel and iron based superalloy parts
12/27/1995EP0688888A2 Apparatus and method for substrate processing
12/27/1995EP0688887A1 Wafer processing reactor
12/27/1995EP0688305A1 Coatings on glass
12/27/1995EP0527133B1 Plasma reaction chamber having conductive diamond-coated surfaces
12/27/1995EP0444205B1 Substrate support device for cvd apparatus
12/27/1995CN1113965A Method for gas phase synthetizing diamond
12/26/1995US5478610 Metalorganic chemical vapor deposition of layered structure oxides
12/26/1995US5478608 Plasma assisted chemical vapor deposition in tube having substrate holders with walls which act as liners to confine arc between anode and cathode
12/26/1995US5478513 CVD diamond growth on hydride-forming metal substrates
12/26/1995US5478400 Apparatus for fabricating semiconductor devices
12/26/1995US5478399 Unitary wafer plasma enhanced chemical vapor deposition holding device
12/26/1995US5478397 Heat treating device
12/26/1995US5478396 Production of high-purity polycrystalline silicon rod for semiconductor applications
12/26/1995US5478395 Process for supplying a gas, especially of diborane and silane
12/26/1995CA2026958C Methods of and apparatus for coating optical fibers
12/21/1995WO1995034698A1 Photo-assigned nitrogen doping of ii-vi semiconductor compounds during epitaxial growth using an amine
12/21/1995WO1995034376A1 Surface treatment method by gas jetting and surface treatment device
12/21/1995DE4421103A1 Potential guiding electrode for plasma supported thin layer deposition for mfg. electric-electronic thin film components
12/21/1995CA2192349A1 Surface treatment method by gas jetting and surface treatment device
12/20/1995EP0688045A1 Cleaning method
12/20/1995EP0687753A1 A synthesis process of diamond, synthesis apparatus and synthetic diamond
12/20/1995EP0687749A1 Apparatus for chemical vapour deposition
12/20/1995EP0687748A1 Boron nitride films and process of making same
12/20/1995EP0687747A1 Apparatus and method for chemical vapor deposition of diamond
12/20/1995EP0687677A1 Stabilization of precursors for thin film deposition
12/19/1995US5476694 Decomposing a germanium halogen compound in activation chamber; chemical interaction with second compound containing silicon and hydrogen; excitation
12/19/1995US5476693 Method for the deposition of diamond film by high density direct current glow discharge
12/19/1995US5476549 Process for an improved laminate of ZnSe and ZnS
12/19/1995US5476548 Reducing backside deposition in a substrate processing apparatus through the use of a shadow ring
12/19/1995US5476547 Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation
12/19/1995US5476359 Robotically loaded epitaxial deposition apparatus
12/17/1995CA2151650A1 Hard, transparent amorphous hydrogenated boron nitride films and process of making same
12/15/1995CA2150739A1 Method of depositing a composite diamond coating onto a hard substrate
12/14/1995WO1995033868A1 Method and apparatus for low temperature deposition of cvd and pecvd films
12/14/1995WO1995033867A1 Method and apparatus for producing thin films
12/14/1995WO1995033866A1 Method and apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
12/14/1995WO1995033865A1 Low temperature plasma-enhanced formation of integrated circuits
12/14/1995WO1995033864A1 Carbon-coated barrier films whith increased concentration